JPWO2022113663A1 - - Google Patents
Info
- Publication number
- JPWO2022113663A1 JPWO2022113663A1 JP2022565165A JP2022565165A JPWO2022113663A1 JP WO2022113663 A1 JPWO2022113663 A1 JP WO2022113663A1 JP 2022565165 A JP2022565165 A JP 2022565165A JP 2022565165 A JP2022565165 A JP 2022565165A JP WO2022113663 A1 JPWO2022113663 A1 JP WO2022113663A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2026006565A JP2026065160A (ja) | 2020-11-26 | 2026-01-19 | 化合物及び感放射線性酸発生剤 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020196137 | 2020-11-26 | ||
| PCT/JP2021/040335 WO2022113663A1 (ja) | 2020-11-26 | 2021-11-02 | 感放射線性樹脂組成物、及びパターン形成方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2026006565A Division JP2026065160A (ja) | 2020-11-26 | 2026-01-19 | 化合物及び感放射線性酸発生剤 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022113663A1 true JPWO2022113663A1 (https=) | 2022-06-02 |
Family
ID=81754400
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022565165A Pending JPWO2022113663A1 (https=) | 2020-11-26 | 2021-11-02 | |
| JP2026006565A Pending JP2026065160A (ja) | 2020-11-26 | 2026-01-19 | 化合物及び感放射線性酸発生剤 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2026006565A Pending JP2026065160A (ja) | 2020-11-26 | 2026-01-19 | 化合物及び感放射線性酸発生剤 |
Country Status (3)
| Country | Link |
|---|---|
| JP (2) | JPWO2022113663A1 (https=) |
| TW (1) | TW202220950A (https=) |
| WO (1) | WO2022113663A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW202346263A (zh) * | 2022-05-23 | 2023-12-01 | 日商Jsr 股份有限公司 | 感放射線性樹脂組成物及圖案形成方法 |
| TW202346264A (zh) * | 2022-05-23 | 2023-12-01 | 日商Ｊｓｒ股份有限公司 | 感放射線性樹脂組成物及圖案形成方法 |
| CN119768738A (zh) * | 2022-11-30 | 2025-04-04 | Jsr株式会社 | 感放射线性树脂组合物、图案形成方法及感放射线性酸产生剂 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012073565A (ja) * | 2010-02-18 | 2012-04-12 | Tokyo Ohka Kogyo Co Ltd | レジストパターン形成方法、ネガ型現像用レジスト組成物 |
| JP2012220570A (ja) * | 2011-04-05 | 2012-11-12 | Tokyo Ohka Kogyo Co Ltd | レジスト組成物及びレジストパターン形成方法 |
-
2021
- 2021-10-21 TW TW110138985A patent/TW202220950A/zh unknown
- 2021-11-02 WO PCT/JP2021/040335 patent/WO2022113663A1/ja not_active Ceased
- 2021-11-02 JP JP2022565165A patent/JPWO2022113663A1/ja active Pending
-
2026
- 2026-01-19 JP JP2026006565A patent/JP2026065160A/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012073565A (ja) * | 2010-02-18 | 2012-04-12 | Tokyo Ohka Kogyo Co Ltd | レジストパターン形成方法、ネガ型現像用レジスト組成物 |
| JP2012220570A (ja) * | 2011-04-05 | 2012-11-12 | Tokyo Ohka Kogyo Co Ltd | レジスト組成物及びレジストパターン形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202220950A (zh) | 2022-06-01 |
| WO2022113663A1 (ja) | 2022-06-02 |
| JP2026065160A (ja) | 2026-04-14 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240430 |
|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20250214 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20250610 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250730 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20251022 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20260119 |