JPWO2022080195A1 - - Google Patents
Info
- Publication number
- JPWO2022080195A1 JPWO2022080195A1 JP2022557395A JP2022557395A JPWO2022080195A1 JP WO2022080195 A1 JPWO2022080195 A1 JP WO2022080195A1 JP 2022557395 A JP2022557395 A JP 2022557395A JP 2022557395 A JP2022557395 A JP 2022557395A JP WO2022080195 A1 JPWO2022080195 A1 JP WO2022080195A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020172868 | 2020-10-13 | ||
| PCT/JP2021/036865 WO2022080195A1 (ja) | 2020-10-13 | 2021-10-05 | 感放射線性樹脂組成物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022080195A1 true JPWO2022080195A1 (ja) | 2022-04-21 |
Family
ID=81208016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022557395A Pending JPWO2022080195A1 (ja) | 2020-10-13 | 2021-10-05 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2022080195A1 (ja) |
| KR (1) | KR20230086669A (ja) |
| CN (1) | CN116406453A (ja) |
| TW (1) | TW202227901A (ja) |
| WO (1) | WO2022080195A1 (ja) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6099313B2 (ja) * | 2012-03-14 | 2017-03-22 | 旭化成株式会社 | 感光性樹脂組成物、及び硬化レリーフパターンの製造方法 |
| WO2014030441A1 (ja) | 2012-08-23 | 2014-02-27 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置 |
| JP2016042127A (ja) | 2014-08-15 | 2016-03-31 | Jsr株式会社 | 感放射線性樹脂組成物、表示素子の層間絶縁膜、その形成方法及び表示素子 |
| JP7047652B2 (ja) * | 2017-09-28 | 2022-04-05 | Jsr株式会社 | 感放射線性樹脂組成物およびその用途 |
| JP7116669B2 (ja) * | 2018-11-22 | 2022-08-10 | サンアプロ株式会社 | 光酸発生剤及びフォトリソグラフィー用樹脂組成物 |
-
2021
- 2021-10-05 KR KR1020237010832A patent/KR20230086669A/ko unknown
- 2021-10-05 JP JP2022557395A patent/JPWO2022080195A1/ja active Pending
- 2021-10-05 CN CN202180068371.1A patent/CN116406453A/zh active Pending
- 2021-10-05 WO PCT/JP2021/036865 patent/WO2022080195A1/ja active Application Filing
- 2021-10-13 TW TW110137978A patent/TW202227901A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202227901A (zh) | 2022-07-16 |
| KR20230086669A (ko) | 2023-06-15 |
| WO2022080195A1 (ja) | 2022-04-21 |
| CN116406453A (zh) | 2023-07-07 |