JPWO2022065225A1 - - Google Patents

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Publication number
JPWO2022065225A1
JPWO2022065225A1 JP2021574809A JP2021574809A JPWO2022065225A1 JP WO2022065225 A1 JPWO2022065225 A1 JP WO2022065225A1 JP 2021574809 A JP2021574809 A JP 2021574809A JP 2021574809 A JP2021574809 A JP 2021574809A JP WO2022065225 A1 JPWO2022065225 A1 JP WO2022065225A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021574809A
Other languages
Japanese (ja)
Other versions
JP7173380B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022065225A1 publication Critical patent/JPWO2022065225A1/ja
Application granted granted Critical
Publication of JP7173380B2 publication Critical patent/JP7173380B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/04—Polythioethers from mercapto compounds or metallic derivatives thereof
    • C08G75/045—Polythioethers from mercapto compounds or metallic derivatives thereof from mercapto compounds and unsaturated compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Materials For Photolithography (AREA)
JP2021574809A 2020-09-23 2021-09-17 Polymer, method for producing polymer, polymer solution and photosensitive resin composition Active JP7173380B2 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2020158807 2020-09-23
JP2020158807 2020-09-23
JP2020201731 2020-12-04
JP2020201731 2020-12-04
PCT/JP2021/034280 WO2022065225A1 (en) 2020-09-23 2021-09-17 Polymer, polymer solution, and photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPWO2022065225A1 true JPWO2022065225A1 (en) 2022-03-31
JP7173380B2 JP7173380B2 (en) 2022-11-16

Family

ID=80845387

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021574809A Active JP7173380B2 (en) 2020-09-23 2021-09-17 Polymer, method for producing polymer, polymer solution and photosensitive resin composition

Country Status (5)

Country Link
JP (1) JP7173380B2 (en)
KR (1) KR20230071160A (en)
CN (1) CN116194501A (en)
TW (1) TW202222848A (en)
WO (1) WO2022065225A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117903372A (en) * 2024-03-19 2024-04-19 拓烯科技(衢州)有限公司 Polar cycloolefin copolymer and composite film and preparation method thereof

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012133741A1 (en) * 2011-03-31 2012-10-04 大日本印刷株式会社 Photo-curable resin composition
JP2013536287A (en) * 2010-08-25 2013-09-19 ダウ グローバル テクノロジーズ エルエルシー Copolymer
WO2017154439A1 (en) * 2016-03-08 2017-09-14 住友ベークライト株式会社 Method for manufacturing polymer, method for manufacturing negative-type photosensitive resin composition, method for manufacturing resin film, method for manufacturing electronic device, and polymer
WO2018131351A1 (en) * 2017-01-10 2018-07-19 住友ベークライト株式会社 Negative photosensitive resin composition, resin film and electronic device
JP2018172700A (en) * 2015-08-21 2018-11-08 住友ベークライト株式会社 Resin composition, photosensitive resin composition, resin film and electronic device
US20190041747A1 (en) * 2016-06-14 2019-02-07 Samsung Sdi Co., Ltd. Photosensitive resin composition, photosensitive resin layer and color filter using same
WO2020226052A1 (en) * 2019-05-08 2020-11-12 住友ベークライト株式会社 Photosensitive resin composition, resin film, and electronic device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5696091B2 (en) 2011-04-25 2015-04-08 富士フイルム株式会社 Photosensitive resin composition, color filter, protective film, photospacer, substrate for liquid crystal display device, liquid crystal display device and solid-state imaging device
KR101918433B1 (en) 2014-12-25 2018-11-13 쇼와 덴코 가부시키가이샤 Resin composition, color filter and method for producing same, and image display element

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013536287A (en) * 2010-08-25 2013-09-19 ダウ グローバル テクノロジーズ エルエルシー Copolymer
WO2012133741A1 (en) * 2011-03-31 2012-10-04 大日本印刷株式会社 Photo-curable resin composition
JP2018172700A (en) * 2015-08-21 2018-11-08 住友ベークライト株式会社 Resin composition, photosensitive resin composition, resin film and electronic device
WO2017154439A1 (en) * 2016-03-08 2017-09-14 住友ベークライト株式会社 Method for manufacturing polymer, method for manufacturing negative-type photosensitive resin composition, method for manufacturing resin film, method for manufacturing electronic device, and polymer
US20190041747A1 (en) * 2016-06-14 2019-02-07 Samsung Sdi Co., Ltd. Photosensitive resin composition, photosensitive resin layer and color filter using same
WO2018131351A1 (en) * 2017-01-10 2018-07-19 住友ベークライト株式会社 Negative photosensitive resin composition, resin film and electronic device
WO2020226052A1 (en) * 2019-05-08 2020-11-12 住友ベークライト株式会社 Photosensitive resin composition, resin film, and electronic device

Also Published As

Publication number Publication date
WO2022065225A1 (en) 2022-03-31
KR20230071160A (en) 2023-05-23
TW202222848A (en) 2022-06-16
CN116194501A (en) 2023-05-30
JP7173380B2 (en) 2022-11-16

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