JPWO2023021986A1 - - Google Patents

Info

Publication number
JPWO2023021986A1
JPWO2023021986A1 JP2022547859A JP2022547859A JPWO2023021986A1 JP WO2023021986 A1 JPWO2023021986 A1 JP WO2023021986A1 JP 2022547859 A JP2022547859 A JP 2022547859A JP 2022547859 A JP2022547859 A JP 2022547859A JP WO2023021986 A1 JPWO2023021986 A1 JP WO2023021986A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022547859A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023021986A1 publication Critical patent/JPWO2023021986A1/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Human Computer Interaction (AREA)
  • Multimedia (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
JP2022547859A 2021-08-20 2022-08-03 Pending JPWO2023021986A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021134670 2021-08-20
PCT/JP2022/029742 WO2023021986A1 (en) 2021-08-20 2022-08-03 Photosensitive composition, color filter substrate, fingerprint sensor, and display device

Publications (1)

Publication Number Publication Date
JPWO2023021986A1 true JPWO2023021986A1 (en) 2023-02-23

Family

ID=85240563

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022547859A Pending JPWO2023021986A1 (en) 2021-08-20 2022-08-03

Country Status (4)

Country Link
JP (1) JPWO2023021986A1 (en)
KR (1) KR20240044426A (en)
CN (1) CN117716293A (en)
WO (1) WO2023021986A1 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002296775A (en) * 2001-03-30 2002-10-09 Dainippon Printing Co Ltd Photosensitive resin composition, color filter and liquid crystal panel
JP6518436B2 (en) * 2014-12-19 2019-05-22 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. Colored curable resin composition
CN108700809B (en) 2016-03-25 2021-10-08 东丽株式会社 Colored resin composition, color filter substrate and liquid crystal display device
JP7275579B2 (en) 2017-02-17 2023-05-18 東レ株式会社 Coloring composition, color filter substrate and display device using the same

Also Published As

Publication number Publication date
WO2023021986A1 (en) 2023-02-23
CN117716293A (en) 2024-03-15
KR20240044426A (en) 2024-04-04

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