JPWO2022054331A5 - - Google Patents

Description

According to the present invention, in the process of manufacturing a workpiece to be a product, such as a process for processing extremely thin semiconductor wafers or semiconductor substrates, after the workpiece temporarily held by the supporting substrate is peeled off from the supporting substrate, the workpiece is removed. The present invention relates to a work cleaning device used to remove unnecessary substances remaining on a surface, a work cleaning method using the work cleaning device, and a paddle jig used in the work cleaning device.

Conventionally, this type of workpiece cleaning apparatus includes a substrate holding portion that holds a substrate attached to a tape fixed to a frame via the tape, a frame cover that protects the frame from the cleaning liquid, and a frame cover for the frame. A frame cover fixing part that is separably fixed, a rotation driving part that integrally rotates the substrate holding part and the frame cover fixing part, and a liquid supply mechanism that supplies cleaning liquid toward the substrate rotating together with the substrate holding part. There is an exfoliation system equipped with (see, for example, Patent Document 1).
The peeling system includes a peeling device for peeling a polymerized substrate obtained by bonding a substrate to be processed and a support substrate via a bonding layer to the substrate to be processed and the support substrate, and a first cleaning device for cleaning the substrate to be processed after peeling. device.
In the cleaning method using the first cleaning device, in the first cleaning liquid supply step, the rotation driving section integrally rotates the substrate holding section and the frame cover fixing section when the cleaning liquid nozzle of the liquid supply mechanism supplies the first cleaning liquid. The cleaning liquid spreads toward the periphery of the substrate to be processed by centrifugal force, the adhesive layer attached to the bonding surface of the substrate to be processed is immersed in the cleaning liquid, and the release agent layer is gradually dissolved.
In the subsequent suction step, the liquid on the substrate to be processed is sucked to remove the liquid in which the release agent layer is dissolved. At this time, the substrate holder and the like are integrally rotated by the rotation driving section so that no liquid remains.
In the subsequent second cleaning liquid supplying step, when the cleaning liquid nozzle supplies the first cleaning liquid, the rotation driving section integrally rotates the substrate holding section and the like to dissolve the protective agent layer and to dissolve the second cleaning liquid. peel off under pressure.
In the subsequent rinse liquid supply step, when the rinse liquid nozzle of the liquid supply mechanism supplies the rinse liquid, the rotation driving section integrally rotates the substrate holding section and the like so that the liquid on the substrate to be processed is removed by centrifugal force. is replaced or diluted with a rinse solution.
In the subsequent drying process, the rotation drive unit rotates the substrate holding unit and the like integrally to shake off the residual liquid on the substrate to be processed by centrifugal force.
In addition, the body of the frame cover that protects the frame from the cleaning liquid (organic solvent such as thinner) is made of fluorine-based resin such as Teflon (registered trademark) that has corrosion resistance to the cleaning liquid to protect it from the cleaning liquid.

JP 2016-143722 A

By the way, the time required for immersion cleaning with the first cleaning liquid (immersion liquid such as a solvent) is the time required for subsequent dissolution cleaning with the second cleaning liquid (solution liquid such as a solvent), rinsing with a rinse liquid, and drying. found to be the longest compared to The reason for this is that it takes time for the immersion liquid to soak into the unnecessary matter (release agent layer of the bonding layer) remaining on the surface of the substrate to be processed, dissolve everything, and remove it completely. More than several times the total washing and drying time was required.
However, in Patent Document 1, a first cleaning liquid (immersion liquid), a second cleaning liquid (dissolving liquid), and a rinsing liquid are supplied from a liquid supply mechanism toward a substrate to be processed that is rotated together with a substrate holding section by a rotation drive section. are sequentially supplied, immersion cleaning, solvent cleaning, and rinsing are performed, and the substrate to be processed after peeling is dried by rotation by the rotary drive unit. In other words, while the substrate to be processed is set in the rotating cleaning unit, all processes from immersion cleaning to solvent cleaning, rinsing, and drying are performed.
In particular, in immersion cleaning, the first cleaning liquid (immersion liquid) flows at a predetermined flow rate as the substrate to be processed is rotated by the rotary drive unit, so that the immersion liquid is less likely to soak into the unnecessary matter (the release agent layer of the bonding layer). It takes a long time to dissolve all the layers.
For this reason, while a series of immersion cleaning, solvent cleaning, rinsing, and drying is being performed for one substrate to be processed, the rotary cleaning unit is occupied, and immersion cleaning for other substrates to be processed is performed in parallel. could not be executed. As a result, solvent cleaning, rinsing, and immersion cleaning, which takes more time than drying after immersion cleaning, have a strong effect, and the tact time for one substrate to be processed after peeling becomes long, resulting in a large number of substrates being processed. can not be performed in a short time, the operating rate is inferior and the cost is high.
As a method to solve such a problem, it is possible to arrange a plurality of rotary washing units by a rotary drive section, and perform a series of immersion washing, solvent washing, rinsing and drying in parallel by the plurality of rotary washing units. Conceivable. However, in this case, there is a problem that not only does the size of the entire apparatus increase, but also the facility cost increases significantly due to the increase in the number of rotary cleaning units.
In addition, the fluorine-based resin such as Teflon (registered trademark) that forms the main body of the frame cover is soft and has almost no elasticity. There is also the problem of not being able to expect Therefore, if an elastic material such as rubber, which has excellent sealing performance, is used in place of the fluororesin, the elastic material will corrode due to the cleaning liquid (organic solvent such as thinner) and the like, making it difficult to withstand repeated use. There is a problem of contaminating the substrate with dissolved components from the material.

In order to solve such problems, a work cleaning apparatus according to the present invention is a work cleaning apparatus in which the surface of a work separated from a support substrate is subjected to immersion cleaning with an immersion liquid and subsequent post-cleaning treatment. a paddle jig provided separably in the thickness direction of the work and having an inlet for the immersion liquid; an immersion liquid supply mechanism for supplying the immersion liquid to the inlet of the paddle jig in which the work is incorporated by the set mechanism; a post-cleaning processing mechanism installed in a post-cleaning processing region formed separately from the immersion cleaning region where the immersion liquid supply mechanism is installed, and performing the post-cleaning processing on the surface of the work that has been immersed and cleaned. The paddle jig has a storage part in which the immersion liquid supplied from the immersion liquid supply mechanism to the inlet is stored in contact with the surface of the workpiece, and the immersion cleaning area supplies the immersion liquid. a plurality of the paddle jigs having a plurality of immersion cleaning buffers temporarily stored; A transfer mechanism is provided for transferring the work taken out from the tool .
Further, in order to solve such problems, a work cleaning method according to the present invention is a work cleaning method in which the surface of a work separated from a support substrate is subjected to immersion cleaning with an immersion liquid, followed by post-cleaning treatment. a setting step of detachably assembling the work in a paddle jig having an inlet for the immersion liquid so that the inlet faces the surface of the workpiece while sandwiching the workpiece in the thickness direction thereof; an immersion liquid supply step of supplying the immersion liquid to the input port of the paddle jig into which the workpiece is assembled by an immersion liquid supply mechanism ; an immersion cleaning step of immersing and cleaning the surface of the workpiece with a liquid; and a post-cleaning step of performing the post-cleaning treatment on the surface of the workpiece that has been immersed and cleaned by a post-cleaning mechanism , wherein An immersion cleaning area formed separately from the post-cleaning treatment area in which the post-cleaning treatment is performed has an immersion cleaning buffer in which a plurality of the paddle jigs to which the immersion liquid is supplied are temporarily stored. The paddle jig or the workpiece taken out from the paddle jig is transferred by a transfer mechanism over the liquid supply mechanism, the immersion cleaning buffer and the post-cleaning mechanism .
Further, in order to solve such problems, a paddle jig according to the present invention is a work cleaning apparatus in which the surface of a work separated from a support substrate is subjected to immersion cleaning with an immersion liquid and subsequent post-cleaning treatment. a paddle jig used to move over the immersion liquid supply mechanism and the post-cleaning mechanism, wherein the lid frame portion is provided so as to surround the surface of the work and has an inlet for the immersion liquid; and a bottom surface portion provided so as to cover the back surface of the work and having the immersion liquid storage portion between the lid frame portion and the lid frame portion, wherein the lid frame portion is attached to the work. In addition, a projection is provided on the rim of the inlet that contacts the holding sheet so that the holding sheet is pushed and bent, and is elastically sandwiched between the holding sheet and the bottom portion .

BRIEF DESCRIPTION OF THE DRAWINGS It is explanatory drawing (longitudinal front view) which shows the whole structure of the workpiece|work washing apparatus which concerns on embodiment (1st embodiment) of this invention. It is the same top view. BRIEF DESCRIPTION OF THE DRAWINGS It is explanatory drawing which shows the workpiece|work washing method which concerns on embodiment (1st embodiment) of this invention, and is a reduction vertical cross-sectional front view of process order. BRIEF DESCRIPTION OF THE DRAWINGS It is explanatory drawing which shows the whole structure of the paddle jig|tool which concerns on embodiment of this invention, (a) is an enlarged longitudinal front view, (b) is the same enlarged plan view, (c) is an enlarged longitudinal front view of an exploded state. be. It is an explanatory view showing a modification of the paddle jig according to the embodiment of the present invention, (a) is a longitudinal front view partially enlarging the main part of the first modification, (b) is the second modification FIG. 11C is a longitudinal front view partially enlarging the main part, and FIG. 11C is a longitudinal front view partially enlarging the main part of the third modified example; 1 is an explanatory diagram (longitudinal front view) showing the overall configuration of a work cleaning apparatus according to an embodiment (second embodiment) of the present invention; FIG. It is the same top view. It is explanatory drawing which shows the workpiece|work washing method which concerns on embodiment (2nd embodiment) of this invention, and is a reduction vertical cross-sectional front view of process order. It is an explanatory view (vertical front view) showing the overall configuration of a work cleaning apparatus according to an embodiment (third embodiment) of the present invention. It is the same top view. It is explanatory drawing which shows the workpiece|work washing method which concerns on embodiment (3rd embodiment) of this invention, and is a reduction vertical cross-sectional front view of process order. It is an explanatory view (longitudinal front view) showing the overall configuration of a work cleaning apparatus according to an embodiment (fourth embodiment) of the present invention. It is the same top view. It is explanatory drawing which shows the workpiece|work washing method which concerns on embodiment (4th embodiment) of this invention, and is a reduction vertical cross-sectional front view of process order. It is an explanatory view (longitudinal front view) showing the overall configuration of a work cleaning apparatus according to an embodiment (fifth embodiment) of the present invention. It is the same top view. FIG. 10 is an explanatory view showing the work cleaning method according to the embodiment (fifth embodiment) of the present invention, and is a reduced longitudinal sectional front view in order of steps.

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described in detail based on the drawings.
As shown in FIGS. 1 to 17, in the work cleaning apparatus A and the work cleaning method according to the embodiment of the present invention, a thin plate-like work W and a support substrate (not shown) holding the work W are formed of a bonding layer. a cleaning device for removing an unnecessary bonding layer remaining on the surface W1 of the work W after the work W and the support substrate are separated from the polymerized substrate (not shown) obtained by polymerization via a (not shown). cleaning method.
Such a work cleaning apparatus A and work cleaning method are suitable for processing ultra-thin wafers and manufacturing semiconductor packages such as WLP (wafer level packaging) and PLP (panel level packaging). used for
When the work cleaning device A is configured separately from a work separation device (not shown) that separates the work W from the polymerized substrate by denaturation (alteration) of the bonding layer due to laser light, heat (infrared rays), other light irradiation, etc. Alternatively, as described in the above-mentioned Patent Document 1 (Japanese Patent Application Laid-Open No. 2016-143722), it may be configured integrally with the work separation device.

The workpiece W consists of a device substrate Wd including a circuit substrate subjected to semiconductor processes such as circuit formation processing and thinning processing, and has a circular wafer shape or a rectangular shape (quadrilateral with right angles including rectangles and squares). Semiconductor wafers and semiconductor substrates formed in a panel shape and having a small thickness are included.
The support substrate is a carrier substrate or a support substrate having necessary strength so as to prevent damage or deformation of the work 1 by supporting the work 1 during the work 1 thinning process, various processing processes, transportation processes, and the like. is called.
The polymerized substrate before peeling off the supporting substrate and the work W after peeling off the supporting substrate are coated with a dicing tape (adhesive tape) on the back surface W2 of the work W as shown in FIGS. A holding sheet Wc such as a dicing frame is attached to the holding sheet Wc, and a ring-shaped frame Wf such as a dicing frame is attached to the outer peripheral portion of the holding sheet Wc to integrate the work W, thereby reinforcing the workpiece W and enabling safe transportation. is preferred.
As a method for removing the unnecessary matter (bonding layer) remaining on the surface W1 of the work W, immersion cleaning with the immersion liquid C1, and subsequent post-cleaning treatment include solvent cleaning with the dissolving liquid C2, rinsing with the rinsing liquid C3, Drying by centrifugal force or gas injection is performed sequentially.
Incidentally, as shown in FIGS. 1 to 17, the workpiece W is usually placed so that its front surface W1 and rear surface W2 face up and down. The thickness direction of the workpiece W is hereinafter referred to as the "Z direction". Two directions intersecting with the thickness direction (Z direction) are hereinafter referred to as "XY directions".

More specifically, the work cleaning apparatus A according to the embodiment of the present invention includes a paddle jig 1 that is separable in the thickness direction of the work W, and a paddle jig 1 that sandwiches the work W in the thickness direction. a set mechanism 2 that detachably mounts the work W in the paddle jig 1 by the set mechanism 2; A post-cleaning processing mechanism 4 for performing subsequent post-cleaning processing is provided as a main component.
In addition to this, a separation mechanism 5 for taking out the workpiece W from the paddle jig 1, and a control unit (not shown) for controlling operations of the setting mechanism 2, the immersion liquid supply mechanism 3, the post-cleaning treatment mechanism 4, the separation mechanism 5, and the like. , are provided.

The interior of the work cleaning apparatus A includes an immersion cleaning area F1 in which the surface W1 of the work W is immersed and cleaned with an immersion liquid C1, and a post-cleaning treatment area F2 in which post-cleaning treatment is performed on the surface W1 of the work W that has been immersed and cleaned. , are divided and formed. Further, it is preferable to form a transfer area F3 for transferring the work W over the immersion cleaning area F1, the post-cleaning processing area F2, and the like.
At least one or more paddle jigs 1 are prepared in the immersion cleaning area F1. An immersion liquid supply mechanism 3 is provided to supply liquid C1.
The immersion cleaning area F1 preferably has an immersion cleaning buffer F11 in which the paddle jig 1 supplied with the immersion liquid C1 is temporarily stored. In the immersion cleaning buffer F11, it is preferable to temporarily store a plurality of paddle jigs 1 being immersed and cleaned in the immersion fluid C1. Specific examples of this case include "stacked storage" in which a plurality of paddle jigs 1 being immersed and cleaned are stacked and stored in the Z direction, and "stacked storage" in which a plurality of paddle jigs 1 being immersed and cleaned are stored side by side in the XY direction. Parallel storage” and the like.
A transfer mechanism 6 for transferring the paddle jig 1 or the workpiece W over the set mechanism 2, the immersion liquid supply mechanism 3, the immersion cleaning buffer F11, the post-cleaning treatment mechanism 4, and the like is provided in the transfer area F3.
In the post-cleaning processing area F2, in addition to the post-cleaning processing mechanism 4, a reversing mechanism 7 is provided for changing the attitude of the paddle jig 1 that has been dipped and cleaned so that the front and back surfaces are reversed as necessary.
In addition, when the work cleaning device A is configured separately from a work separation device (not shown), a loading/unloading device for receiving the work W separated by the work separation device and delivering the work W for which the post-cleaning process has been completed. A mechanism 8 is provided.

As shown in FIGS. 4 and 5, the paddle jig 1 detachably holds a work W and has a plurality of working positions (see FIG. 4 and FIG. 5) where at least the immersion liquid supply mechanism 3 and the post-cleaning treatment mechanism 4 are arranged. (such as the immersion cleaning area F1 and the post-cleaning treatment area F2). The paddle jig 1 includes a lid frame portion 11 provided so as to surround the front surface W1 of the work W, a bottom surface portion 12 provided so as to face and cover the back surface W2 of the work W, a separated lid frame portion 11, and and a locking portion 13 provided to engage between the bottom portions 12 .
The lid frame portion 11 is made of a material such as a metal that does not react with the immersion liquid C1 used in the immersion cleaning, the solution C2 used in the post-cleaning treatment, and the rinse liquid C3, and has a frame shape larger than the size of the workpiece W. formed in In the center of the lid frame portion 11, an inlet 11a for the immersion liquid C1 is opened. The input port 11a is formed so as to open slightly larger than the outer circumference size of the work W, and is formed so that only the surface W1 of the work W is exposed inside the input port 11a.
Between the lid frame portion 11 and the bottom surface portion 12, a reservoir portion 11b for the immersion liquid C1 is recessed inside the inlet 11a so as to face the surface W1 of the work W. As shown in FIG. The depth of the reservoir 11b is set so that the immersion liquid C1 supplied by the immersion liquid supply mechanism 3, which will be described later, is in contact with the entire surface W1 of the workpiece W. As shown in FIG.
The bottom portion 12 is formed in a flat plate shape larger than the size of the work W, and has a support surface 12a that comes into surface contact with the back surface W2 side of the work W. As shown in FIG.
The locking portion 13 is provided so as to be engaged from one of the lid frame portion 11 and the bottom portion 12 toward the other. is immovably incorporated in the thickness direction (Z direction) and fixed inseparably, the paddle jig 1 and the work W are integrated.

4A to 4C as an example of the paddle jig 1, a lid frame portion 11 is in contact with a holding sheet Wc attached to a device substrate Wd made of a circular ultra-thin wafer as a work W. A sealing material 14 that is elastically deformable in the thickness direction (Z direction) is provided on the facing surface of the holding sheet Wc, and the sealing material 14 is brought into close contact with the holding sheet Wc.
A plurality of locking portions 13 are supported on the outer circumference of the bottom portion 12 toward the lid frame portion 11 so as to be swingable, and the tip of each locking portion 13 is configured to engage with the outer circumference of the lid frame portion 11 . ing. As a result, when the workpiece W is sandwiched by the engagement of the lock portions 13, the holding sheet Wc and the frame Wf are hermetically covered with the sealing material 14 to prevent the immersion liquid C1 from leaking.
5(a) to 5(c) as another example of the paddle jig 1, the holding sheet Wc of the work W (device substrate Wd) is bent against the rim of the inlet 11a. 4(a) to 4(c) differs from the example shown in FIGS. 4(a) to 4(c). It is the same as the example shown in c).
The projection 15 is integrally formed on the rear side surface of the lid frame portion 11 facing the bottom portion 12 or by fixing a separate piece to the projection 15 so as to protrude annularly along the rim of the inlet 11a. It is preferable that the distal end portion of the projection 15 is formed so as to be in contact with the holding sheet Wc with an arcuate surface that is not sharp. In a state where the workpiece W is sandwiched between the lid frame portion 11 and the bottom surface portion 12 by the engagement of the locking portion 13, the holding sheet Wc is pushed by bringing the projections 15 into contact (butting against) the holding sheet Wc. The holding sheet Wc is elastically sandwiched between the support surface 12a of the bottom surface portion 12 and the support surface 12a of the bottom surface portion 12 by being partially bent. Therefore, at the abutting portion between the protrusion 15 and the holding sheet Wc, the tip of the protrusion 15 and the sheet surface of the holding sheet Wc are in close contact and sealed.

In the paddle jig 1 of the first modified example shown in FIG. 5( a ), a first protrusion 15 a having an acute-angled cross section is protruded as the protrusion 15 by inclining the inlet 11 a of the lid frame portion 11 . A cushioning member 16 made of a material such as rubber that is elastically deformable in the thickness direction (Z direction) is laid on the support surface 12a of the bottom surface portion 12 along the holding sheet Wc. Therefore, the holding sheet Wc is pushed into the cushioning member 16 by the collision of the first protrusion 15a, and the first protrusion 11c and the bent portion of the holding sheet Wc are in close contact with each other due to the repulsive force of the cushioning member 16 .
A paddle jig 1 of the second modification shown in FIG. A second projection 15b having a cross-sectional angle larger than that of one projection 11c is provided, and the holding sheet Wc is pushed into the cushioning member 16 at the abutment of the second projection 15b, unlike the first modified example. Other configurations are the same as those of the first modified example. As a result, the contact of the second projections 15b against the holding sheet Wc is less sharp than the contact of the first projections 15a of the first modified example, so that the holding sheet Wc is less likely to be damaged even if it is strongly struck against the holding sheet Wc.
In the paddle jig 1 of the third modification shown in FIG. 5(c), a third projection 15c protruding with an arcuate cross section is provided as the projection 15, and the holding sheet Wc is pushed by the cushioning member when the third projection 15c abuts. 16 is different from the first and second modifications, and the rest of the construction is the same as the first and second modifications. As a result, the contact of the third protrusion 15c against the holding sheet Wc becomes sharper than the contact of the first protrusion 15a of the first modification and the contact of the second protrusion 15b of the second modification, so that the holding sheet Wc is strongly hit. Also, the holding sheet Wc is less likely to be damaged.
As other examples (not shown), the structure of the paddle jig 1 is changed to a structure other than the example shown, such as by changing the structure of the work W to a structure other than the example shown, or by providing the lock portion 13 in the lid frame portion 11. is also possible.

The setting mechanism 2 sandwiches the workpiece W carried in by the carrying-in/carrying-out mechanism 8 (to be described later) between the lid frame portion 11 and the bottom portion 12 separated in the Z direction in the Z direction. is positioned so as to face the surface W1 of the work W (device substrate Wd), and an actuator or the like is used for detachably incorporating and locking.
As a specific example of the setting mechanism 2 shown in FIG. 4(c), it has a separating moving part 21 made up of a lift pin or the like, which is movable in the Z direction. 11 is supported so as to move toward or away from the bottom portion 12 in the Z direction. The workpiece W is inserted between the lid frame portion 11 and the bottom portion 12 separated by the separation moving portion 21 by the loading/unloading mechanism 8 described later, and is supported by a lift pin or the like that is movable in the Z direction. It is handed over to the unit 22 . After the carry-in/carry-out mechanism 8 is withdrawn, the work supporting portion 22 is actuated to move the work W closer to the bottom portion 12, and the separation moving portion 21 is actuated to move the lid frame portion 11 closer to the bottom portion 12 in the Z direction. As a result, the workpiece W is held immovably. Subsequently, the lock portion 13 is closed.
Moreover, although not shown as another example, it is also possible to change the structure of the setting mechanism 2 to a structure other than the example shown.
Furthermore, the setting mechanism 2 can function as a separating mechanism 5 for taking out the work W from the paddle jig 1 by operating in the reverse order of the operation described above. That is, as shown in FIGS. 1 and 2, the setting mechanism 2 and the separation mechanism 5 can be integrally provided.
In addition, as shown in FIGS. 9 and 10, it is also possible to dispose the separating mechanism 5 separately from the setting mechanism 2. FIG.
The paddle jig 1 from which the work W has been removed by the separation mechanism 5 is incorporated with a new work W by the set mechanism 2 and reused repeatedly.

The immersion liquid supply mechanism 3 is an immersion nozzle 31 that supplies the immersion liquid C1 from a supply source (not shown) of the immersion liquid C1 toward the inlet 11a of the paddle jig 1 (cover frame portion 11). A predetermined amount of immersion liquid C1 is stored in the storage portion 11b of the tool 1 (lid frame portion 11).
As the immersion liquid C1, a solvent (organic solvent such as thinner) is mixed with gas or the like as necessary. The (bonding layer) is subjected to immersion cleaning for soaking and dissolving the immersion liquid C1.
In the immersion cleaning with the immersion liquid C1, it is necessary to infiltrate the immersion liquid C1 into the bonding layer remaining on the surface W1 of the work W to the deeper layer than the reaction layer (peeling reaction layer) generated at the time of peeling. For example, when modification of the bonding layer by irradiation of laser light is used as a method for peeling the workpiece W, the peeling reaction layer becomes the laser reaction layer, and in Patent Document 1, the peeling reaction layer corresponds to the adhesive layer, and the inner layer. corresponds to the release agent layer and protective agent layer.
However, it takes a certain amount of time for the immersion liquid C1 to pass through the peeling reaction layer and infiltrate the back layer.
Therefore, in the immersion cleaning of the present invention, the immersion liquid C1 is poured into the paddle jig 1 (storage portion 11b of the lid frame portion 11) for a predetermined period of time so that the immersion liquid C1 surely infiltrates to the layer on the inner side of the peeling reaction layer. The immersion liquid C1 is sufficiently stored over a period of time, and the flow of the immersion liquid C1 caused by the dissolution of the peeling reaction layer is maintained without forcibly flowing the immersion liquid C1. As a result, the immersion liquid C1 smoothly infiltrates to the layer on the inner side of the peeling reaction layer.

On the other hand, when the immersion liquid C1 stored in the reservoir 11b of the paddle jig 1 dissolves the unnecessary matter (bonding layer) remaining on the surface W1 of the work W, the immersion liquid C1 contains soot and undissolved residues. Since they are mixed, they may deposit on the surface W1 of the workpiece W in the immersion liquid C1.
The post-cleaning mechanism 4 is a mechanism for performing solvent cleaning with the dissolving liquid C2 placed in the post-cleaning processing area F2, rinsing with the rinsing liquid C3, drying the surface W1 of the work W, and the like.
Solvent cleaning with the dissolving liquid C2 is performed to dissolve undissolved residues remaining on the surface W1 of the workpiece W even after immersion cleaning, soot and undissolved residues deposited by immersion cleaning.
The solvent cleaning mechanism 41 includes a solvent injection port 41a and a solvent nozzle 41b for supplying a solution C2 made of a solvent similar to the immersion liquid C1 toward the input port 11a of the paddle jig 1 (cover frame portion 11). Alternatively, a solvent nozzle 41c that supplies the work W taken out from the paddle jig 1 toward the surface W1 and a spin unit 41d that rotates the work W are used together.
The rinsing with the rinsing liquid C3 is performed to wash away the dissolving liquid C2, soot, and residue remaining on the surface W1 of the work W after solvent cleaning.
The rinsing mechanism 42 supplies a rinsing liquid C3 such as pure water or isopropyl alcohol (IPA) toward the inlet 11a of the paddle jig 1 (lid frame portion 11). It is composed of a rinse nozzle 42b that supplies the work W taken out from the tool 1 toward the surface W1, and a spin unit 42c that rotates the work W.
Drying is performed to remove residual liquid on the surface W1 of the work W that has been wetted by rinsing.
The drying mechanism 43 has a drying injection port 43a that supplies the drying gas C4 toward the input port 11a of the paddle jig 1 (cover frame portion 11), or a drying jet port 43a that supplies the drying gas C4 toward the work W taken out from the paddle jig 1. It is composed of a combination of a drying injection port 43b for supplying the gas C4 and a spin unit 43c for rotating the workpiece W, and the like.
When the spin unit 43c is used, it is also possible to dry the work W only by the centrifugal force due to the rotation of the work W without supplying the drying gas C4.

The transport mechanism 6 is provided for transporting the paddle jig 1 in which the work W is assembled by the set mechanism 2, or the work W only to the immersion cleaning buffer F11 and the immersion liquid supply mechanism 3 mainly in the XY directions. Conveyor 61, transfer robot 62, and the like.
The reversing mechanism 7 is an actuator or the like provided in all or part of the post-cleaning processing mechanism 4 as required, and detachably attaches and detaches the paddle jig 1 after immersion cleaning transferred by the transfer mechanism 6 from the immersion cleaning buffer F11. In addition, the paddle jig 1 is turned upside down to change the orientation of the upward inlet 11a downward. In other words, there are a reversing post-cleaning mechanism 4 having a reversing mechanism 7 and a non-reversing post-cleaning mechanism 4 without the reversing mechanism 7, which performs post-cleaning on the paddle jig 1 after immersion cleaning. It works before or during the post-cleaning process.
Therefore, when using the reversible post-cleaning mechanism 4, a waste liquid unit (not shown) for draining the immersion liquid C1 that has flowed out of the reservoir 11b of the paddle jig 1 (cover frame 11) due to the reversal is required. ) and a recovery unit (not shown) for recovering the dissolving liquid C2 and the rinsing liquid C3. When the non-reversing type post-cleaning mechanism 4 is used, a suction waste liquid unit (not shown) for sucking the immersion liquid C1 from the storage unit 11b and draining the immersion liquid C1 and the dissolving liquid C2 and the rinsing liquid C3 are sucked. A recovery unit (not shown) is provided for recovery.
Since the solution C2 and the rinse solution C3 have a higher degree of cleanliness than the immersion solution C1, all or part of the filtered solution C2 is immersed by collecting and filtering (filtering) the solution. It is possible to reuse the liquid C1 or the dissolving liquid C2, or to reuse all or part of the filtered rinse liquid C3.
The carry-in/carry-out mechanism 8 is a transport robot or the like that receives the work W separated by the work separation device and delivers the work W that has undergone the post-cleaning process to a subsequent machine (not shown) of the work separation device work cleaning device A. It is a transfer mechanism.

The control unit is provided in the apparatus and electrically connected to the setting mechanism 2, the immersion liquid supply mechanism 3, the post-cleaning treatment mechanism 4, the separation mechanism 5, the transfer mechanism 6, the reversing mechanism 7, the loading/unloading mechanism 8, and the like. is the controller.
Furthermore, when the work cleaning device A is configured separately from the work separating device of the preceding machine and the succeeding machine, this controller is also electrically connected to the work separating device and the succeeding machine.
A controller, which is a control unit, sequentially controls operations at preset timings according to a preset program in its control circuit (not shown).

A program set in the control circuit of the controller will be described as a work cleaning method by the work cleaning apparatus A. FIG.
The work cleaning method using the work cleaning apparatus A according to the embodiment of the present invention includes a setting step S1 in which the work W is sandwiched in the Z direction with respect to the paddle jig 1 and is detachably assembled, and the paddle jig 1 is put in. An immersion liquid supply step S2 of supplying the immersion liquid C1 to the port 11a, an immersion cleaning step S3 of immersing and cleaning the surface W1 of the work W with the immersion liquid C1 stored in the reservoir 11b, and an immersion and cleaning of the surface of the work W. A post-cleaning process step S4 of performing a post-cleaning process in W1 is included as a main process.
In addition to this, a separation step S5 of taking out the workpiece W from the paddle jig 1 is included. The separation step S5 is performed after the post-cleaning step S4 or between the immersion cleaning step S3 and the post-cleaning step S4.
In the setting step S1, as shown in FIG. The input port 11a of the work W is opposed to the surface W1 of the work W and is detachably assembled.
In the immersion liquid supply step S2, the immersion liquid supply mechanism 3 operates to supply the immersion liquid C1 toward the inlet 11a of the paddle jig 1 (lid frame portion 11), as shown in FIG. .
In the immersion cleaning step S3, as shown in FIG. 3 and the like, the immersion liquid C1 stored in the storage portion 11b of the paddle jig 1 comes into contact with the surface W1 of the work W, and unnecessary substances (bonding layer) remaining on the surface W1 are removed. Immersion cleaning is started to dissolve the
In particular, when a plurality of paddle jigs 1 being immersed and cleaned with the immersion liquid C1 are temporarily stored in the immersion cleaning buffer F11 of the immersion cleaning area F1 in the immersion cleaning step S3, each immersion cleaning is performed in parallel. it is possible to proceed.
Here, "performing each immersion cleaning in parallel" means that although the start timing of immersion cleaning is delayed, each immersion cleaning is performed in parallel due to a time lag and is sequentially completed after a set time. and "simultaneous parallel cleaning" in which the immersion cleanings are started at substantially the same time, the respective immersion cleanings are performed in parallel without any time lag, and are completed at substantially the same time after a set period of time.

In the post-cleaning step S4, a solvent cleaning step S41 with the dissolving liquid C2, a rinsing step S42 with the rinsing liquid C3, a drying step S43, and the like are sequentially performed.
In the solvent cleaning step S41, as shown in FIG. 3 and the like, the solvent cleaning mechanism 41 (solvent injection port 41a, solvent nozzle 41b) is operated to feed liquid into the inlet 11a of the paddle jig 1 (lid frame portion 11). Dissolving liquid C2 is supplied to the Alternatively, as shown in FIG. 14 and the like, the solvent cleaning mechanism 41 (solvent nozzle 41c, spin unit 41d) is operated simultaneously to supply the solution C2 toward the surface W1 of the work W picked up from the paddle jig 1. Meanwhile, the centrifugal force due to the rotation of the work W promotes dissolution and washing.
In the rinsing step S42, as shown in FIG. 3 and the like, the rinsing mechanism 42 (the rinsing injection port 42a) is operated so that the rinsing liquid C3 is directed toward the input port 11a of the paddle jig 1 (the lid frame portion 11). supply. Alternatively, as shown in FIG. 11 and the like, the rinsing mechanism 42 (rinsing nozzle 42b, spin unit 42c) is simultaneously operated to supply the rinsing liquid C3 toward the surface W1 of the work W picked up from the paddle jig 1. Meanwhile, the centrifugal force due to the rotation of the work W accelerates the rinsing. By the operation, the work W picked up from the paddle jig 1 is supplied toward the surface W1.
In the drying step S43, as shown in FIG. 3 and the like, the drying mechanism 43 (drying injection port 43a) is operated to direct the drying gas C4 toward the input port 11a of the paddle jig 1 (lid frame portion 11). Feed and dry. Alternatively, as shown in FIG. 11 and the like, the drying mechanism 43 (drying injection port 43b, spin unit 43c) is simultaneously operated to supply drying gas C4 toward the surface W1 of the work W picked up from the paddle jig 1. At the same time, centrifugal force due to the rotation of the work W promotes drying. Alternatively, the workpiece W is dried only by the centrifugal force due to the rotation of the workpiece W without supplying the drying gas C4.
In the separation step S5, as shown in FIG. 11 and the like, the separation mechanism 5 operates to move the workpiece W, which has undergone the solvent cleaning step S41, into the paddle jig 1 (between the lid frame portion 11 and the bottom portion 12). take out from Alternatively, as shown in FIG. 14 or the like, the workpiece W for which the immersion cleaning step S3 has been completed is taken out. Alternatively, as shown in FIG. 3 and the like, the workpiece W for which the drying step S43 has been completed is taken out.

Next, representative examples (first embodiment to fifth embodiment) in which the structure of the immersion cleaning buffer F11 and the structure and arrangement of the post-cleaning treatment mechanism 4 are different will be described.
The work cleaning apparatus A1 of the first embodiment shown in FIGS. 1 to 3 is "stacked storage" in which the immersion cleaning buffer F11 stacks and stores a plurality of paddle jigs 1 being immersed and cleaned in the Z direction. This is the case where the reversible post-cleaning mechanism 4 is provided integrally and arranged at the same location.
In the illustrated example, a transfer area F3 is formed to overlap the entire immersion cleaning area F1 and the post-cleaning treatment area F2, and a transfer conveyor 61 is used as the transfer mechanism 6. FIG.
In the immersion cleaning area F1 of the illustrated example, there are a setting mechanism 2 and a separation mechanism 5, a immersion cleaning buffer F11 of "stacked storage", an integrated solvent cleaning mechanism 41, a rinsing mechanism 42 and a drying mechanism 43, are arranged in parallel in the X direction or the Y direction, and the paddle jig 1 can be transferred by a transfer conveyor 61 serving as a transfer mechanism 6 over these.
In the immersion cleaning buffer F11 of the illustrated example, "stacked storage" is adopted in which a plurality of paddle jigs 1 being immersed and cleaned are stacked in multiple stages in the Z direction and stored.
In the post-cleaning processing mechanism 4 of the illustrated example, the paddle jig 1 after immersion cleaning transferred by the transfer conveyor 61 from the immersion cleaning buffer F11 is reversed by the reversing mechanism 7, and the front and back surfaces of the paddle jig 1 are reversed to be immersed. After discharging the liquid C1 to the waste liquid section, the solvent cleaning mechanism 41, the rinsing mechanism 42, the drying mechanism 43, and the separation mechanism 5 are operated in sequence.
In the solvent cleaning step S41, the solution C2 is sprayed and supplied from the solvent injection port 41a toward the surface W1 of the work W of the inverted (downward) paddle jig 1, thereby promoting the solvent cleaning. The dissolved liquid C2 is discharged to the waste liquid section.
In the rinsing step S42, the rinsing liquid C3 is jetted from the rinsing injection port 42a toward the surface W1 of the work W of the inverted paddle jig 1, thereby facilitating the rinsing and at the same time the rinsing liquid C3 is released. It is discharged to the waste liquid section.
In the drying step S43, the drying is accelerated by spraying the drying gas C4 toward the surface W1 of the work W of the inverted paddle jig 1 from the drying injection port 43a.
In the separation step S5, the work W for which the drying step S43 has been completed is taken out.
As a result, in the work cleaning apparatus A1 of the first embodiment, since a plurality of paddle jigs 1 being immersed and cleaned are collectively stored (stored) in one place in the immersion cleaning buffer F11, the immersion cleaning buffer F11 is occupied. The space is minimized, and the space occupied by the post-cleaning mechanism 4 (solvent cleaning mechanism 41, rinsing mechanism 42, drying mechanism 43) is minimized, and compactness in the XY direction can be achieved.

The work cleaning apparatus A2 of the second embodiment shown in FIGS. 6 to 8 has a structure in which the reversible post-cleaning mechanism 4 is divided into a solvent cleaning mechanism 41, a rinsing mechanism 42 and a drying mechanism 43 as described above. Unlike the first embodiment, other configurations are the same as those of the first embodiment.
In the illustrated example, a transfer area F3 is formed separately from the immersion cleaning area F1 and the post-cleaning processing area F2, and includes a setting mechanism 2, a separation mechanism 5, an immersion cleaning buffer F11 for "stacked storage", and a solvent cleaning mechanism 41. , the rinsing mechanism 42 and the drying mechanism 43, the transfer robot 62 serving as the transfer mechanism 6 makes it possible to transfer the paddle jig 1. As shown in FIG.
The paddle jig 1 after immersion washing transferred by the transfer robot 62 from the immersion washing buffer F11 is transferred to the solvent washing mechanism 41, the rinsing mechanism 42, and the drying mechanism 43 of the illustrated example by the reversing mechanism 7. , and after the immersion liquid C1 is discharged to the waste liquid portion, the solvent cleaning mechanism 41 is operated substantially simultaneously with the rinsing mechanism 42 and the drying mechanism 43 .
As a result, in the workpiece cleaning apparatus A2 of the second embodiment, the post-cleaning mechanism 4 is divided into the solvent cleaning mechanism 41, the rinsing mechanism 42 and the drying mechanism 43, so that the workpiece cleaning apparatus A1 of the first embodiment Although the occupied space becomes larger in the XY direction than the above, they can be progressed in parallel. Therefore, the solvent cleaning mechanism 41, the rinsing mechanism 42, and the drying mechanism 43 can be efficiently executed.

The work cleaning apparatus A3 of the third embodiment shown in FIGS. The configuration provided with the separation mechanism 5 is different from that of the above-described second embodiment, and the configuration other than that is the same as that of the second embodiment.
In the illustrated example, the transfer robot 62 of the transfer mechanism 6 over the setting mechanism 2, the soaking washing buffer F11 of "stacked storage", the solvent washing mechanism 41, the separating mechanism 5, the rinsing mechanism 42 and the drying mechanism 43 , the paddle jig 1 is transportable.
The separation mechanism 5 in the illustrated example takes out the workpiece W after solvent cleaning from the paddle jig 1 after the solvent cleaning mechanism 41 is activated.
The rinsing mechanism 42 in the illustrated example uses both a rinse nozzle 42b and a spin unit 42c, and the drying mechanism 43 uses both a drying injection port 43b and a spin unit 43c, or uses the spin unit 43c alone. .
As a result, in the workpiece cleaning apparatus A3 of the third embodiment, the post-cleaning mechanism 4 is of a non-reversing type and does not require the reversing mechanism 7, so the structure can be simplified accordingly.

The work cleaning apparatus A4 of the fourth embodiment shown in FIGS. 12 to 14 has a configuration in which a non-reversing post-cleaning mechanism 4 is integrally provided separately from the separation mechanism 5 and arranged at the same location. Unlike the third embodiment described above, other configurations are the same as those of the third embodiment.
In the illustrated example, the transfer mechanism 6 includes the set mechanism 2, the "stack storage" soak washing buffer F11, the separation mechanism 5, and the integrated solvent washing mechanism 41, rinse mechanism 42 and drying mechanism 43. A transfer robot 62 enables the paddle jig 1 to be transferred.
The separation mechanism 5 in the illustrated example takes out the work W after immersion cleaning from the paddle jig 1 transferred from the immersion cleaning buffer F11.
The illustrated solvent cleaning mechanism 41 uses both a solvent nozzle 41c and a spin unit 41d.
As a result, in the work cleaning apparatus A4 of the fourth embodiment, the post-cleaning mechanism 4 is of the non-reversing type and does not require the reversing mechanism 7 as in the third embodiment, so the structure can be simplified accordingly.

The work cleaning apparatus A5 of the fifth embodiment shown in FIGS. 15 to 17 is a "parallel storage" in which the immersion cleaning buffer F11 stores a plurality of paddle jigs 1 being immersed and cleaned side by side in the XY direction. The configuration provided with the setting mechanism 2 and the separating mechanism 5 is different from that of the fourth embodiment described above, and the configuration other than that is the same as that of the fourth embodiment.
In the illustrated example, only the workpiece W can be transferred by the transfer robot 62 of the transfer mechanism 6 over the "parallel storage" immersion washing buffer F11, integrated solvent washing mechanism 41, rinsing mechanism 42 and drying mechanism 43. I have to.
In the “parallel storage” immersion cleaning buffer F11 in the illustrated example, a plurality (two) of a plurality of paddle jigs 1 being immersed and cleaned are arranged in the Y direction.
The separation mechanism 5 in the illustrated example takes out the work W after immersion cleaning from the paddle jig 1 in the immersion cleaning buffer F11.
As a result, in the workpiece cleaning apparatus A5 of the fifth embodiment, although the occupied space in the XY direction is larger than that of the immersion cleaning buffer F11 of "stacked storage", the structure is smaller than that of the immersion cleaning buffer F11 of "stacked storage". It can be simplified. Furthermore, since the transfer robot 62 transfers only the workpiece W without transferring the paddle jig 1, the weight of the transfer robot 62 can be reduced, the frequency of use of the paddle jig 1 can be reduced, and deterioration can be suppressed.

According to the work cleaning apparatus A and the work cleaning method according to the embodiment of the present invention, the work after peeling is placed in the immersion cleaning area F1 separated from the post-cleaning treatment area F2 in which the post-cleaning treatment following the immersion cleaning is performed. At least one or more paddle jigs 1 in which W is incorporated by the set mechanism 2 are arranged, and the immersion liquid C1 from the immersion liquid supply mechanism 3 is stored in the reservoir 11b.
Therefore, the immersion liquid C1 in the reservoir 11b comes into contact with the surface W1 of the work W, and immersion cleaning is started. As a result, the post-cleaning process (solvent cleaning with the dissolving liquid C2, rinsing with the rinsing liquid C3, and drying) can be performed in parallel with the progress of immersion cleaning for the surface W1 of at least one or more workpieces W.
Furthermore, since the immersion liquid C1 stored in the storage part 11b is not forcibly flowed by the rotation driving part or the like, it easily permeates into unnecessary substances (bonding layer) remaining on the surface W1 of the work W, and the total dissolution time of the unnecessary substances is is shortened.
Therefore, in parallel with the immersion cleaning of the surface W1 of the work W incorporated in at least one or more paddle jigs 1, the post-cleaning process (solvent cleaning with the dissolving liquid C2, rinsing with the rinse liquid C3, and drying) can be performed efficiently. can progress well.
As a result, the immersion cleaning and post-cleaning process of the surface W1 of the work W is more efficient than the conventional one in which the rotating cleaning unit is occupied during the execution of a series of immersion cleaning, solvent cleaning, rinsing and drying for each substrate to be processed. Since (solvent cleaning with the dissolving liquid C2, rinsing with the rinsing liquid C3, and drying) can be executed separately, the tact time for one work W after peeling is shortened.
As a result, a large number of substrates can be processed in a short period of time without being affected by the immersion cleaning time, which takes longer than the post-cleaning process following the immersion cleaning, and the operating rate can be improved and the cost can be reduced.
In addition, compared to a system in which multiple rotating cleaning units are arranged and a series of immersion cleaning or the like is performed in parallel by a plurality of rotating cleaning units, it is possible to cope with this by simply increasing the number of paddle jigs 1, so the entire apparatus can be reduced. There is no upsizing and there is no significant increase in equipment cost.

In particular, the immersion cleaning area F1 preferably has an immersion cleaning buffer F11 in which a plurality of paddle jigs 1 supplied with the immersion liquid C1 are temporarily stored.
In this case, the plurality of paddle jigs 1 being immersed and cleaned in the immersion cleaning buffer F11 are temporarily stored (stacked storage or parallel storage) so that the surfaces of the plurality of works W can be cleaned by the plurality of paddle jigs 1. The immersion cleaning for W1 can proceed in parallel independently of the post-cleaning process.
Therefore, it is possible to ensure sufficient immersion cleaning time for the surfaces W1 of the plurality of works W in the immersion cleaning buffer F11.
As a result, the immersion cleaning can be continued until the unnecessary matter (bonding layer) remaining on the surface W1 of the workpiece W after peeling is dissolved.
If necessary, it is also possible to discard the first immersion liquid C1 and then supply the next immersion liquid C1 to repeat the immersion cleaning multiple times. As a result, unnecessary substances (bonding layer) remaining on the surface W1 of the workpiece W after peeling can be completely dissolved.
Also, when a plurality of paddle jigs 1 being dipped and cleaned in the dipping cleaning buffer F11 are stacked and stored, the space occupied by the dipping cleaning buffer F11 can be minimized, and the entire apparatus can be made more compact.

Furthermore, it is preferable to provide a transport mechanism 6 for transporting the paddle jig 1 or the work W over the immersion cleaning buffer F11 and the post-cleaning process.
In this case, regardless of the paddle jig 1 temporarily stored in the immersion cleaning buffer F11, another paddle jig 1 that has been immersed and cleaned and the work W can be smoothly directed toward the post-cleaning processing mechanism 4. be transportable.
Therefore, the post-cleaning process (solvent cleaning with the dissolving liquid C2, rinsing with the rinsing liquid C3, and drying) can be quickly started in parallel with the immersion cleaning in the immersion cleaning buffer F11.
As a result, the tact time for one work W after peeling is further shortened.

Further, the post-cleaning step S4 preferably includes solvent cleaning with the solution C2 as the post-cleaning treatment, and the solution C2 used in the solvent cleaning is recovered and reused for immersion cleaning or solvent cleaning.
In this case, by recovering the used solution C2 in the previous solvent cleaning and reusing it in the next immersion cleaning and solvent cleaning, the supply amount of the immersion liquid C1 for the next immersion cleaning and , the supply amount of the solution C2 for the next solvent cleaning decreases.
Therefore, the amount of the immersion liquid C1 and the dissolution liquid C2 used in the apparatus as a whole can be suppressed.
As a result, cost reduction can be achieved.
By the way, if the immersion liquid C1 is insufficient during the immersion cleaning, the dissolution component may be insufficient for the unnecessary matter (bonding layer) remaining on the surface W1 of the work W, and sufficient dissolution ability may not be exhibited.
Therefore, by collecting and reusing the dissolving liquid C2 that has been used in the previous solvent cleaning, the amount of the immersing liquid C1 that can be used in one immersion cleaning increases, so the dissolution during each immersion cleaning Ability can be guaranteed.

Further, according to the paddle jig 1 according to the embodiment of the present invention, the workpiece W is sandwiched between the separated lid frame portion 11 and the bottom surface portion 12, and subsequently the lid frame portion 11 and the bottom surface portion 12 are brought closer together. By engaging the locking portion 13, the work W is immovably incorporated and integrated. By supplying the immersion liquid C1 from the inlet 11a of the lid frame portion 11 in this locked state, the immersion liquid C1 is stored in the storage portion 11b so as to be in contact with the surface W1 of the work W, thereby enabling immersion cleaning.
Therefore, the immersion cleaning of the surface W1 of the work W can be reliably performed independently of the post-cleaning treatment (solvent cleaning with the dissolving liquid C2, rinsing with the rinsing liquid C3, and drying) with a simple structure.
As a result, compared to the conventional immersion cleaning performed by a rotary cleaning unit, the immersion cleaning can be performed without rotating the surface W1 of the work W, and the rotary cleaning unit becomes unnecessary, thereby simplifying the overall structure. Not only is it easy to maintain, but the equipment cost can be greatly reduced.

In the example shown in FIGS. 5A to 5C, the lid frame portion 11 is arranged so that the holding sheet Wc attached to the workpiece W is pushed and bent against the edge of the inlet 11a that contacts the holding sheet Wc. It has projections 15 that are elastically sandwiched between the bottom portion 12 and the bottom portion 12 in contact with each other.
In this case, the holding sheet Wc of the workpiece W is partially pressed and bent by bringing the projection 15 on the edge of the holding sheet Wc into contact with the holding sheet Wc of the workpiece W while the workpiece W is sandwiched between the holding sheet Wc and the holding sheet Wc. The sheet Wc is elastically sandwiched and hermetically sealed.
Therefore, it is possible to prevent leakage of the immersion liquid C1 by bringing the rim of the inlet 11a and the holding sheet Wc of the work W into close contact with each other with a simple structure.
As a result, simply by setting and sandwiching the holding sheet Wc of the workpiece W between the lid frame portion 11 and the bottom portion 12, simple and reliable sealing can be performed.
In addition to this, when the lid frame portion 11 is made of a material such as a metal that does not react with the immersion liquid C1 used in the immersion cleaning, the main body of the frame cover may be made of Teflon ( It can be used repeatedly over a long period of time, has excellent durability, and can also have a high level of sealing performance, compared to conventional ones made of fluorine-based resins such as (registered trademark). In addition, it is possible to prevent contamination of the workpiece W due to dissolved components from the elastic material, as in the case of using an elastic material such as rubber.

In the above-described embodiments (first embodiment to fifth embodiment), the case where the workpiece cleaning device A (A1 to A5) is configured separately from the workpiece separating device (not shown) has been described. is not limited to, and may be configured integrally with the work separation device.
Furthermore, in the illustrated examples of the first to fifth embodiments, the device substrate Wd made of a circular ultra-thin wafer is attached to the frame Wf by the holding sheet Wc for reinforcement, but the present invention is not limited to this. A rectangular panel may be used as the device substrate Wd.
In addition, in the illustrated examples of the first to fourth embodiments, a plurality of paddle jigs 1 are stacked in multiple stages in the Z direction as "stacked storage", but the present invention is not limited to this, and a plurality of paddle jigs can be stored. 1 may be stacked in multiple stages such as two stages or three stages in the Z direction. In the illustrated example of the fifth embodiment, a plurality of (two) paddle jigs 1 are arranged in the Y direction as "parallel storage", but the present invention is not limited to this. Three or more may be arranged in a direction or the like.
Even in these cases, the same actions and advantages as those of the first to fifth embodiments described above can be obtained.

A Work cleaning device 1 Paddle jig 11 Lid frame 11a Input port 11b Storing part 12 Bottom part 13 Lock part 15 Protrusion 2 Setting mechanism 3 Immersion fluid supply mechanism 4 Post-cleaning mechanism 6 Transfer mechanism C1 Immersion fluid F1 Immersion cleaning area F2 Post-cleaning processing area F11 Immersion cleaning buffer W Work W1 Front surface W2 Back surface Wc Holding sheet

Claims (6)

A workpiece cleaning apparatus for performing immersion cleaning with an immersion liquid and subsequent post-cleaning treatment on the surface of a workpiece separated from a support substrate,
a paddle jig provided separably in the thickness direction of the work and having an inlet for the immersion liquid;
a setting mechanism for sandwiching the work in the thickness direction with respect to the paddle jig and performing detachable assembly such that the input port faces the surface of the work;
an immersion liquid supply mechanism that supplies the immersion liquid to the inlet of the paddle jig into which the workpiece is installed by the set mechanism;
a post-cleaning treatment mechanism installed in a post-cleaning treatment area formed separately from the immersion cleaning area where the immersion liquid supply mechanism is installed, and performing the post-cleaning treatment on the surface of the work that has been immersed and washed; prepared,
The paddle jig has a storage part in which the immersion liquid supplied from the immersion liquid supply mechanism to the inlet is stored in contact with the surface of the workpiece,
The immersion cleaning area has an immersion cleaning buffer in which a plurality of the paddle jigs supplied with the immersion liquid are temporarily stored, respectively;
A transport mechanism is provided for transporting the paddle jig or the workpiece taken out from the paddle jig over the immersion liquid supply mechanism, the immersion cleaning buffer, and the post-cleaning treatment mechanism . Work washing device. 2. The work cleaning apparatus according to claim 1 , wherein the plurality of paddle jigs being immersed and cleaned are stacked in multiple stages and stored in the immersion cleaning buffer . 3. A work cleaning apparatus according to claim 1 , wherein said transfer mechanism is a transfer conveyor or a transfer robot . A workpiece cleaning method in which the surface of a workpiece separated from a support substrate is subjected to immersion cleaning with an immersion liquid and subsequent post-cleaning treatment,
a setting step of detachably assembling the work in a paddle jig having an inlet for the immersion liquid so that the inlet faces the surface of the workpiece while sandwiching the workpiece in the thickness direction;
an immersion liquid supply step of supplying the immersion liquid to the input port of the paddle jig in which the workpiece is incorporated by an immersion liquid supply mechanism ;
an immersion cleaning step of immersing and cleaning the surface of the workpiece in the immersion liquid stored in the reservoir from the inlet of the paddle jig;
a post-cleaning treatment step of performing the post-cleaning treatment by a post-cleaning treatment mechanism on the surface of the work that has been immersed and cleaned ,
an immersion cleaning area formed separately from the post-cleaning treatment area in which the post-cleaning treatment is performed has an immersion cleaning buffer in which a plurality of the paddle jigs supplied with the immersion liquid are temporarily stored, respectively; A work cleaning characterized by transferring the paddle jig or the work taken out from the paddle jig through the immersion liquid supply mechanism, the immersion cleaning buffer and the post-cleaning treatment mechanism by a transfer mechanism. Method. The post-cleaning treatment step includes solvent cleaning with a solution as the post-cleaning treatment, and the solution used in the solvent cleaning is recovered and reused for the immersion cleaning or the solvent cleaning. 5. The work cleaning method according to claim 4. A paddle used to move across an immersion liquid supply mechanism and a post-cleaning treatment mechanism in a work cleaning apparatus in which immersion cleaning with an immersion liquid and subsequent post-cleaning treatment are performed on the surface of a work separated from a support substrate. a jig,
a lid frame portion provided so as to surround the surface of the work and having an inlet for the immersion liquid;
a bottom surface portion provided to face and cover the back surface of the work and having the immersion liquid storage portion between the lid frame portion and the lid frame portion;
The cover frame portion has a projection elastically sandwiched between the bottom portion and the opening edge of the input opening that contacts the holding sheet attached to the work so that the holding sheet is pushed and bent. A paddle jig characterized by comprising: