JPWO2022030163A1 - - Google Patents
Info
- Publication number
- JPWO2022030163A1 JPWO2022030163A1 JP2022541167A JP2022541167A JPWO2022030163A1 JP WO2022030163 A1 JPWO2022030163 A1 JP WO2022030163A1 JP 2022541167 A JP2022541167 A JP 2022541167A JP 2022541167 A JP2022541167 A JP 2022541167A JP WO2022030163 A1 JPWO2022030163 A1 JP WO2022030163A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020132562 | 2020-08-04 | ||
JP2020132562 | 2020-08-04 | ||
PCT/JP2021/025556 WO2022030163A1 (ja) | 2020-08-04 | 2021-07-07 | 化学増幅型感光性組成物、感光性ドライフィルム、めっき用鋳型付き基板の製造方法、及びめっき造形物の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2022030163A1 true JPWO2022030163A1 (ja) | 2022-02-10 |
JP7444999B2 JP7444999B2 (ja) | 2024-03-06 |
Family
ID=80118022
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022541167A Active JP7444999B2 (ja) | 2020-08-04 | 2021-07-07 | 化学増幅型感光性組成物、感光性ドライフィルム、めっき用鋳型付き基板の製造方法、及びめっき造形物の製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20230273521A1 (ja) |
JP (1) | JP7444999B2 (ja) |
KR (1) | KR20230048364A (ja) |
CN (1) | CN116157739A (ja) |
TW (1) | TW202216807A (ja) |
WO (1) | WO2022030163A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116675836B (zh) * | 2023-08-02 | 2023-10-20 | 宁波聚嘉新材料科技有限公司 | 一种液晶聚合物、薄膜及其制备方法、太阳能电池背板 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3937466B2 (ja) | 1995-12-28 | 2007-06-27 | 東洋インキ製造株式会社 | 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物および硬化性組成物 |
JP3921748B2 (ja) | 1997-08-08 | 2007-05-30 | 住友化学株式会社 | フォトレジスト組成物 |
JP3796560B2 (ja) | 1999-01-27 | 2006-07-12 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト組成物及びパターン形成方法 |
JP4507381B2 (ja) | 2000-10-11 | 2010-07-21 | 日油株式会社 | 脱架橋型樹脂の製造方法 |
EP1752479B1 (en) | 2004-05-31 | 2013-02-27 | Nippon Soda Co., Ltd. | Acrylic star polymer |
US7494759B2 (en) | 2004-05-31 | 2009-02-24 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist compositions and process for the formation of resist patterns with the same |
JP4767552B2 (ja) | 2005-02-21 | 2011-09-07 | 日本曹達株式会社 | フェノール系スターポリマー |
WO2006134967A1 (ja) | 2005-06-15 | 2006-12-21 | Tokyo Ohka Kogyo Co., Ltd. | ポジ型レジスト組成物およびレジストパターン形成方法 |
WO2008093507A1 (ja) | 2007-01-31 | 2008-08-07 | Jsr Corporation | 感放射線性樹脂組成物 |
JP2012063728A (ja) | 2010-09-17 | 2012-03-29 | Fujifilm Corp | 感活性光線性又は感放射線性樹脂組成物、並びに、該組成物を用いたレジスト膜及びパターン形成方法 |
JP6554214B1 (ja) | 2018-07-26 | 2019-07-31 | 東京応化工業株式会社 | 化学増幅型ポジ型感光性樹脂組成物、鋳型付き基板の製造方法、及びめっき造形物の製造方法 |
TW202036162A (zh) | 2018-12-26 | 2020-10-01 | 日商東京應化工業股份有限公司 | 化學增幅型正型感光性樹脂組成物、感光性乾薄膜、感光性乾薄膜之製造方法、圖型化阻劑膜之製造方法、附鑄型基板之製造方法及鍍敷造形物之製造方法 |
-
2021
- 2021-07-07 US US18/006,987 patent/US20230273521A1/en active Pending
- 2021-07-07 KR KR1020237007548A patent/KR20230048364A/ko active Search and Examination
- 2021-07-07 WO PCT/JP2021/025556 patent/WO2022030163A1/ja active Application Filing
- 2021-07-07 CN CN202180058111.6A patent/CN116157739A/zh active Pending
- 2021-07-07 JP JP2022541167A patent/JP7444999B2/ja active Active
- 2021-07-21 TW TW110126803A patent/TW202216807A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
KR20230048364A (ko) | 2023-04-11 |
US20230273521A1 (en) | 2023-08-31 |
TW202216807A (zh) | 2022-05-01 |
WO2022030163A1 (ja) | 2022-02-10 |
CN116157739A (zh) | 2023-05-23 |
JP7444999B2 (ja) | 2024-03-06 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230131 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230905 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231102 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20231114 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240112 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20240130 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20240222 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7444999 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |