JPWO2022014316A1 - - Google Patents

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Publication number
JPWO2022014316A1
JPWO2022014316A1 JP2022536229A JP2022536229A JPWO2022014316A1 JP WO2022014316 A1 JPWO2022014316 A1 JP WO2022014316A1 JP 2022536229 A JP2022536229 A JP 2022536229A JP 2022536229 A JP2022536229 A JP 2022536229A JP WO2022014316 A1 JPWO2022014316 A1 JP WO2022014316A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022536229A
Other languages
Japanese (ja)
Other versions
JP7345663B2 (ja
JPWO2022014316A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Publication of JPWO2022014316A1 publication Critical patent/JPWO2022014316A1/ja
Publication of JPWO2022014316A5 publication Critical patent/JPWO2022014316A5/ja
Application granted granted Critical
Publication of JP7345663B2 publication Critical patent/JP7345663B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/14—Electrodes, e.g. composition, counter electrode for pad-plating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C25D5/06—Brush or pad plating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/04—Tubes; Rings; Hollow bodies

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
JP2022536229A 2020-07-14 2021-06-29 めっき装置およびめっき方法 Active JP7345663B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020120768 2020-07-14
JP2020120768 2020-07-14
PCT/JP2021/024554 WO2022014316A1 (ja) 2020-07-14 2021-06-29 めっき電極、めっき装置およびめっき方法

Publications (3)

Publication Number Publication Date
JPWO2022014316A1 true JPWO2022014316A1 (zh) 2022-01-20
JPWO2022014316A5 JPWO2022014316A5 (ja) 2022-11-16
JP7345663B2 JP7345663B2 (ja) 2023-09-15

Family

ID=79555413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022536229A Active JP7345663B2 (ja) 2020-07-14 2021-06-29 めっき装置およびめっき方法

Country Status (2)

Country Link
JP (1) JP7345663B2 (zh)
WO (1) WO2022014316A1 (zh)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4921220B1 (zh) * 1970-12-23 1974-05-30
JPS506419B1 (zh) * 1970-12-25 1975-03-13
JPS5224022U (zh) * 1975-08-07 1977-02-19
JPS53142524U (zh) * 1977-04-14 1978-11-10
JPS57171689A (en) * 1981-04-13 1982-10-22 Tokio Osaki Plating device
JPS61103475U (zh) * 1984-12-14 1986-07-01
CN108315773A (zh) * 2018-01-25 2018-07-24 郑州大学 一种精密3d打印金属微模具的方法及装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3312905C2 (de) * 1983-04-11 1986-03-27 Battelle-Institut E.V., 6000 Frankfurt Vorrichtung zur galvanischen Innenbeschichtung von Hohlteilen
JPH0635680B2 (ja) * 1988-11-04 1994-05-11 川崎製鉄株式会社 金属材表面の局部電解処理装置
JP3291103B2 (ja) * 1993-12-22 2002-06-10 住友特殊金属株式会社 連続表面処理装置
CN104775141B (zh) * 2015-04-29 2017-04-12 江苏理工学院 零件内孔修复用电刷镀装置及方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4921220B1 (zh) * 1970-12-23 1974-05-30
JPS506419B1 (zh) * 1970-12-25 1975-03-13
JPS5224022U (zh) * 1975-08-07 1977-02-19
JPS53142524U (zh) * 1977-04-14 1978-11-10
JPS57171689A (en) * 1981-04-13 1982-10-22 Tokio Osaki Plating device
JPS61103475U (zh) * 1984-12-14 1986-07-01
CN108315773A (zh) * 2018-01-25 2018-07-24 郑州大学 一种精密3d打印金属微模具的方法及装置

Also Published As

Publication number Publication date
WO2022014316A1 (ja) 2022-01-20
JP7345663B2 (ja) 2023-09-15

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