JPWO2022004514A1 - - Google Patents

Info

Publication number
JPWO2022004514A1
JPWO2022004514A1 JP2022533910A JP2022533910A JPWO2022004514A1 JP WO2022004514 A1 JPWO2022004514 A1 JP WO2022004514A1 JP 2022533910 A JP2022533910 A JP 2022533910A JP 2022533910 A JP2022533910 A JP 2022533910A JP WO2022004514 A1 JPWO2022004514 A1 JP WO2022004514A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022533910A
Other languages
Japanese (ja)
Other versions
JP7668034B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022004514A1 publication Critical patent/JPWO2022004514A1/ja
Application granted granted Critical
Publication of JP7668034B2 publication Critical patent/JP7668034B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2001—Maintaining constant desired temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2008—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated specially adapted for studying electrical or magnetical properties of objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20207—Tilt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20214—Rotation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20278—Motorised movement

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Sampling And Sample Adjustment (AREA)
JP2022533910A 2020-07-03 2021-06-23 試料ホルダー Active JP7668034B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020115844 2020-07-03
JP2020115844 2020-07-03
PCT/JP2021/023735 WO2022004514A1 (ja) 2020-07-03 2021-06-23 試料ホルダー

Publications (2)

Publication Number Publication Date
JPWO2022004514A1 true JPWO2022004514A1 (https=) 2022-01-06
JP7668034B2 JP7668034B2 (ja) 2025-04-24

Family

ID=79316275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022533910A Active JP7668034B2 (ja) 2020-07-03 2021-06-23 試料ホルダー

Country Status (3)

Country Link
US (1) US20230268157A1 (https=)
JP (1) JP7668034B2 (https=)
WO (1) WO2022004514A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7734404B2 (ja) * 2021-10-05 2025-09-05 株式会社メルビル ステージ

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000500265A (ja) * 1995-07-25 2000-01-11 エヌエムアイ ナツルヴィッセンサフトリヘス ウント メディジニシェス インスティチュト アン デル ユニヴェルシテート テュービンゲン イン ロイトリンゲン 高分解能透過電子顕微鏡におけるイオン薄肉化方法および装置
US20040108067A1 (en) * 2002-08-02 2004-06-10 Fischione Paul E. Method and apparatus for preparing specimens for microscopy
JP2007299753A (ja) * 2006-05-01 2007-11-15 Fei Co 温度スイッチを備える粒子−光学装置
JP2008508684A (ja) * 2004-07-30 2008-03-21 イー エイ フィシオネ インストルメンツ インコーポレーテッド イオンを利用して材料をミリング処理する装置及び方法
JP2012033335A (ja) * 2010-07-29 2012-02-16 Hitachi High-Technologies Corp イオンミリング装置
JP2016085066A (ja) * 2014-10-23 2016-05-19 浜松ホトニクス株式会社 Ｘ線像撮像用ユニット及びｘ線顕微鏡
JP2018129163A (ja) * 2017-02-08 2018-08-16 日本電子株式会社 試料移動装置及び電子顕微鏡

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5075555A (en) * 1990-08-10 1991-12-24 Kevex Instruments Peltier cooled lithium-drifted silicon x-ray spectrometer
US20060065853A1 (en) * 2004-09-30 2006-03-30 Chad Rue Apparatus and method for manipulating sample temperature for focused ion beam processing
WO2017073816A1 (ko) * 2015-10-30 2017-05-04 한국기초과학지원연구원 온도 조절이 가능한 tem 또는 stem용 시료홀더

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000500265A (ja) * 1995-07-25 2000-01-11 エヌエムアイ ナツルヴィッセンサフトリヘス ウント メディジニシェス インスティチュト アン デル ユニヴェルシテート テュービンゲン イン ロイトリンゲン 高分解能透過電子顕微鏡におけるイオン薄肉化方法および装置
US20040108067A1 (en) * 2002-08-02 2004-06-10 Fischione Paul E. Method and apparatus for preparing specimens for microscopy
JP2008508684A (ja) * 2004-07-30 2008-03-21 イー エイ フィシオネ インストルメンツ インコーポレーテッド イオンを利用して材料をミリング処理する装置及び方法
JP2007299753A (ja) * 2006-05-01 2007-11-15 Fei Co 温度スイッチを備える粒子−光学装置
JP2012033335A (ja) * 2010-07-29 2012-02-16 Hitachi High-Technologies Corp イオンミリング装置
JP2016085066A (ja) * 2014-10-23 2016-05-19 浜松ホトニクス株式会社 Ｘ線像撮像用ユニット及びｘ線顕微鏡
JP2018129163A (ja) * 2017-02-08 2018-08-16 日本電子株式会社 試料移動装置及び電子顕微鏡

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
北野精機械株式会社: "「ペルチェ式加熱・冷却ＴＥＭ試料ホルダー」", イプロスものづくり, JPN6021035350, 31 January 2020 (2020-01-31), JP, ISSN: 0005491984 *

Also Published As

Publication number Publication date
US20230268157A1 (en) 2023-08-24
JP7668034B2 (ja) 2025-04-24
WO2022004514A1 (ja) 2022-01-06

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