JPWO2022004147A1 - - Google Patents

Info

Publication number
JPWO2022004147A1
JPWO2022004147A1 JP2022533715A JP2022533715A JPWO2022004147A1 JP WO2022004147 A1 JPWO2022004147 A1 JP WO2022004147A1 JP 2022533715 A JP2022533715 A JP 2022533715A JP 2022533715 A JP2022533715 A JP 2022533715A JP WO2022004147 A1 JPWO2022004147 A1 JP WO2022004147A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2022533715A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022004147A1 publication Critical patent/JPWO2022004147A1/ja
Priority to JP2025007831A priority Critical patent/JP7708341B2/ja
Ceased legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10Beam splitting or combining systems
    • G02B27/108Beam splitting or combining systems for sampling a portion of a beam or combining a small beam in a larger one, e.g. wherein the area ratio or power ratio of the divided beams significantly differs from unity, without spectral selectivity
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/24Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/02Objectives
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/18Arrangements with more than one light path, e.g. for comparing two specimens
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • G01J1/0242Control or determination of height or angle information of sensors or receivers; Goniophotometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N2021/4704Angular selective
    • G01N2021/4711Multiangle measurement
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity
    • G01N21/57Measuring gloss
    • G01N2021/575Photogoniometering

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Lenses (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2022533715A 2020-07-02 2021-05-13 Ceased JPWO2022004147A1 (https=)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025007831A JP7708341B2 (ja) 2020-07-02 2025-01-20 光学特性測定光学系および光学特性測定装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020114925 2020-07-02
PCT/JP2021/018221 WO2022004147A1 (ja) 2020-07-02 2021-05-13 光学特性測定光学系および光学特性測定装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025007831A Division JP7708341B2 (ja) 2020-07-02 2025-01-20 光学特性測定光学系および光学特性測定装置

Publications (1)

Publication Number Publication Date
JPWO2022004147A1 true JPWO2022004147A1 (https=) 2022-01-06

Family

ID=79315240

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022533715A Ceased JPWO2022004147A1 (https=) 2020-07-02 2021-05-13
JP2025007831A Active JP7708341B2 (ja) 2020-07-02 2025-01-20 光学特性測定光学系および光学特性測定装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025007831A Active JP7708341B2 (ja) 2020-07-02 2025-01-20 光学特性測定光学系および光学特性測定装置

Country Status (4)

Country Link
US (1) US12298240B2 (https=)
EP (1) EP4177659A4 (https=)
JP (2) JPWO2022004147A1 (https=)
WO (1) WO2022004147A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1031154A (ja) * 1996-04-04 1998-02-03 Boc Group Inc:The 物体の反射率の測定用光学システム
JP2001500986A (ja) * 1996-09-19 2001-01-23 モレキュラー・ダイナミックス・インコーポレイテッド 微小画像結像システム
JP2005195685A (ja) * 2003-12-26 2005-07-21 Unitec:Kk 反射光学系、拡散光源測定装置の反射光学系および拡散光源測定装置ならびにその測定方法
JP2017530394A (ja) * 2014-09-29 2017-10-12 エーエスエムエル ホールディング エヌ.ブイ. 高開口数対物レンズシステム

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2749388B1 (fr) * 1996-05-31 1998-08-07 Eldim Appareil de mesure des caracteristiques photometriques et colorimetriques d'un objet
JP3812051B2 (ja) * 1997-04-30 2006-08-23 株式会社ニコン 反射屈折投影光学系
JP2002055277A (ja) * 2000-08-11 2002-02-20 Nikon Corp リレー結像光学系、および該光学系を備えた照明光学装置並びに露光装置
US7405889B2 (en) * 2004-08-26 2008-07-29 Olympus Imaging Corp. And Olympus Corporation Optical system and imaging system incorporating it
EP1657580A1 (en) 2004-11-11 2006-05-17 Eldim Sa Optical device for determining the in-focus position of a fourier optics set-up
JP4802658B2 (ja) * 2005-10-25 2011-10-26 コニカミノルタオプト株式会社 変倍光学系、撮像レンズ装置及びデジタル機器
US8917457B2 (en) * 2010-03-26 2014-12-23 Konica Minolta Advanced Layers, Inc. Imaging lens, imaging optical device, and digital equipment
JP6305098B2 (ja) * 2014-02-19 2018-04-04 キヤノン株式会社 ズーム光学系及びそれを有する画像投射装置
JP6290804B2 (ja) * 2015-02-25 2018-03-07 富士フイルム株式会社 投写用光学系および投写型表示装置
JP6657863B2 (ja) * 2015-12-01 2020-03-04 コニカミノルタ株式会社 投影光学系及びプロジェクター
WO2021171695A1 (ja) * 2020-02-28 2021-09-02 富士フイルム株式会社 撮像システム、撮像システムの制御方法、及びプログラム

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1031154A (ja) * 1996-04-04 1998-02-03 Boc Group Inc:The 物体の反射率の測定用光学システム
JP2001500986A (ja) * 1996-09-19 2001-01-23 モレキュラー・ダイナミックス・インコーポレイテッド 微小画像結像システム
JP2005195685A (ja) * 2003-12-26 2005-07-21 Unitec:Kk 反射光学系、拡散光源測定装置の反射光学系および拡散光源測定装置ならびにその測定方法
JP2017530394A (ja) * 2014-09-29 2017-10-12 エーエスエムエル ホールディング エヌ.ブイ. 高開口数対物レンズシステム

Also Published As

Publication number Publication date
US20230288330A1 (en) 2023-09-14
JP7708341B2 (ja) 2025-07-15
JP2025063237A (ja) 2025-04-15
WO2022004147A1 (ja) 2022-01-06
EP4177659A4 (en) 2023-12-27
EP4177659A1 (en) 2023-05-10
US12298240B2 (en) 2025-05-13

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