JPWO2021240962A5 - - Google Patents

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JPWO2021240962A5
JPWO2021240962A5 JP2021574330A JP2021574330A JPWO2021240962A5 JP WO2021240962 A5 JPWO2021240962 A5 JP WO2021240962A5 JP 2021574330 A JP2021574330 A JP 2021574330A JP 2021574330 A JP2021574330 A JP 2021574330A JP WO2021240962 A5 JPWO2021240962 A5 JP WO2021240962A5
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Japan
Prior art keywords
light
sputtering
target
transmitting conductive
ratio
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JP2021574330A
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JP7059455B1 (en
JPWO2021240962A1 (en
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Priority claimed from PCT/JP2021/011147 external-priority patent/WO2021240962A1/en
Publication of JPWO2021240962A1 publication Critical patent/JPWO2021240962A1/ja
Priority to JP2022065809A priority Critical patent/JP7102637B2/en
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Publication of JP7059455B1 publication Critical patent/JP7059455B1/en
Publication of JPWO2021240962A5 publication Critical patent/JPWO2021240962A5/ja
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Claims (3)

複数のターゲットのそれぞれに電力を印加する複数回のスパッタリングによって、光透過性導電性層を、基材シートの厚み方向一方面に形成する工程を備え、
前記光透過性導電性層を形成する工程は、
前記複数のターゲットに含まれる第1ターゲットであって、酸化インジウムと酸化スズとを含み、前記酸化スズの含有率が8質量%を越えるインジウム-スズ複合酸化物からなる前記第1ターゲットに電力を印加して、内側層を前記基材シートの前記厚み方向一方面に形成する第1工程と、
前記第1ターゲット以外のターゲットに電力を印加して、外側層を前記内側層の厚み方向一方面に形成する第2工程とを備え、
前記複数のターゲットにおける合計の電力密度Pに対する、前記第1ターゲットにおける電力密度P1の比(P1/P)が、0.10以下であることを特徴とする、光透過性導電性シートの製造方法。
A step of forming a light-transmitting conductive layer on one surface in the thickness direction of a base sheet by a plurality of times of sputtering in which electric power is applied to each of a plurality of targets is provided.
The step of forming the light-transmitting conductive layer is
Power is supplied to the first target, which is a first target contained in the plurality of targets and is composed of an indium-tin composite oxide containing indium oxide and tin oxide and having a tin oxide content of more than 8% by mass. A first step of applying to form an inner layer on one side of the base sheet in the thickness direction,
A second step of applying electric power to a target other than the first target to form an outer layer on one surface in the thickness direction of the inner layer is provided.
A method for producing a light transmissive conductive sheet, wherein the ratio (P1 / P) of the power density P1 in the first target to the total power density P in the plurality of targets is 0.10 or less. ..
前記第1工程では、反応性ガスを含むスパッタリングガスの雰囲気下、スパッタリングし、
前記第2工程では、反応性ガスを含むスパッタリングガスの雰囲気下、スパッタリングし、
前記第2工程における前記スパッタリングガスにおける反応性ガスの割合R2に対する、前記第1工程における前記スパッタリングガスにおける反応性ガスの比R1の比(R1/R2)が、1以下であることを特徴とする、請求項1に記載の光透過性導電性シートの製造方法。
In the first step, sputtering is performed in an atmosphere of a sputtering gas containing a reactive gas.
In the second step, sputtering is performed in an atmosphere of a sputtering gas containing a reactive gas.
The ratio (R1 / R2) of the ratio R1 of the reactive gas in the sputtering gas in the first step to the ratio R2 of the reactive gas in the sputtering gas in the second step is 1 or less. The method for producing a light-transmitting conductive sheet according to claim 1.
前記第2工程の後に、前記光透過性導電層を結晶化する第3工程をさらに備えることを特徴とする、請求項1または2に記載の光透過性導電性シートの製造方法。 The method for producing a light-transmitting conductive sheet according to claim 1 or 2, further comprising a third step of crystallizing the light-transmitting conductive layer after the second step.
JP2021574330A 2020-05-25 2021-03-18 Manufacturing method of light-transmitting conductive sheet Active JP7059455B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022065809A JP7102637B2 (en) 2020-05-25 2022-04-12 Method for manufacturing a light-transmitting conductive sheet

Applications Claiming Priority (3)

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JP2020090595 2020-05-25
JP2020090595 2020-05-25
PCT/JP2021/011147 WO2021240962A1 (en) 2020-05-25 2021-03-18 Method for producing light-transmitting conductive sheet

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Publications (3)

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JPWO2021240962A1 JPWO2021240962A1 (en) 2021-12-02
JP7059455B1 JP7059455B1 (en) 2022-04-25
JPWO2021240962A5 true JPWO2021240962A5 (en) 2022-05-24

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JP (2) JP7059455B1 (en)
KR (1) KR20230015894A (en)
CN (1) CN115667573B (en)
TW (1) TW202202642A (en)
WO (1) WO2021240962A1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024005997A (en) * 2022-06-30 2024-01-17 日東電工株式会社 Production method of transparent conductive film

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3176812B2 (en) 1994-12-21 2001-06-18 住友ベークライト株式会社 Transparent conductive film
WO2002071414A1 (en) * 2001-03-07 2002-09-12 Ueyama Electric Co., Ltd. Substrate with deposited transparent condcutive film and method for fabricating color filter
JP4481593B2 (en) * 2003-05-26 2010-06-16 キヤノン株式会社 Display element
CN102666909B (en) * 2009-11-19 2016-06-22 株式会社爱发科 The manufacture method of nesa coating, the manufacture device of nesa coating, sputtering target and nesa coating
CN103548097A (en) * 2011-05-20 2014-01-29 旭硝子株式会社 Material for conductive film, conductive film laminate, electronic apparatus, and method for producing material for conductive film, conductive film laminate and electronic apparatus
JP6215062B2 (en) * 2013-01-16 2017-10-18 日東電工株式会社 Method for producing transparent conductive film
JP6239330B2 (en) * 2013-09-26 2017-11-29 日東電工株式会社 Method for producing transparent conductive film
US10270010B2 (en) * 2014-01-28 2019-04-23 Kaneka Corporation Substrate with transparent electrode and method for producing same
WO2015151687A1 (en) * 2014-03-31 2015-10-08 株式会社カネカ Method for producing transparent conductive film
US20160300632A1 (en) * 2014-05-20 2016-10-13 Nitto Denko Corporation Transparent conductive film and manufacturing method thereof
WO2016152808A1 (en) * 2015-03-24 2016-09-29 株式会社カネカ Transparent electrode-equipped substrate and method for producing transparent electrode-equipped substrate
JPWO2016163323A1 (en) * 2015-04-06 2018-02-01 株式会社カネカ Transparent conductive film and display device

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