JPWO2021220851A1 - - Google Patents

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Publication number
JPWO2021220851A1
JPWO2021220851A1 JP2022517637A JP2022517637A JPWO2021220851A1 JP WO2021220851 A1 JPWO2021220851 A1 JP WO2021220851A1 JP 2022517637 A JP2022517637 A JP 2022517637A JP 2022517637 A JP2022517637 A JP 2022517637A JP WO2021220851 A1 JPWO2021220851 A1 JP WO2021220851A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2022517637A
Other versions
JP7373059B2 (ja
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Publication of JPWO2021220851A1 publication Critical patent/JPWO2021220851A1/ja
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Publication of JP7373059B2 publication Critical patent/JP7373059B2/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
JP2022517637A 2020-04-28 2021-04-16 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、マスクブランクス、パターン形成方法及び電子デバイスの製造方法 Active JP7373059B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020079747 2020-04-28
JP2020079747 2020-04-28
PCT/JP2021/015782 WO2021220851A1 (ja) 2020-04-28 2021-04-16 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、マスクブランクス、パターン形成方法及び電子デバイスの製造方法

Publications (2)

Publication Number Publication Date
JPWO2021220851A1 true JPWO2021220851A1 (ja) 2021-11-04
JP7373059B2 JP7373059B2 (ja) 2023-11-01

Family

ID=78374087

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022517637A Active JP7373059B2 (ja) 2020-04-28 2021-04-16 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、マスクブランクス、パターン形成方法及び電子デバイスの製造方法

Country Status (3)

Country Link
JP (1) JP7373059B2 (ja)
TW (1) TW202146477A (ja)
WO (1) WO2021220851A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024048462A1 (ja) * 2022-08-31 2024-03-07 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法及び重合体
WO2024084970A1 (ja) * 2022-10-21 2024-04-25 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015024989A (ja) * 2013-06-17 2015-02-05 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
WO2017169626A1 (ja) * 2016-03-30 2017-10-05 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、及び、電子デバイスの製造方法
JP2019045864A (ja) * 2017-09-04 2019-03-22 富士フイルム株式会社 反転パターン形成方法、電子デバイスの製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101706409B1 (ko) 2009-09-30 2017-02-13 제이에스알 가부시끼가이샤 중합체, 감방사선성 조성물 및 단량체, 및 그의 제조 방법
JP6070203B2 (ja) * 2013-01-16 2017-02-01 Jsr株式会社 半導体素子及び表示素子
JP7124413B2 (ja) * 2017-06-13 2022-08-24 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015024989A (ja) * 2013-06-17 2015-02-05 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
WO2017169626A1 (ja) * 2016-03-30 2017-10-05 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、及び、電子デバイスの製造方法
JP2019045864A (ja) * 2017-09-04 2019-03-22 富士フイルム株式会社 反転パターン形成方法、電子デバイスの製造方法

Also Published As

Publication number Publication date
TW202146477A (zh) 2021-12-16
WO2021220851A1 (ja) 2021-11-04
JP7373059B2 (ja) 2023-11-01

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