JPWO2021220648A5 - - Google Patents

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Publication number
JPWO2021220648A5
JPWO2021220648A5 JP2022517543A JP2022517543A JPWO2021220648A5 JP WO2021220648 A5 JPWO2021220648 A5 JP WO2021220648A5 JP 2022517543 A JP2022517543 A JP 2022517543A JP 2022517543 A JP2022517543 A JP 2022517543A JP WO2021220648 A5 JPWO2021220648 A5 JP WO2021220648A5
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JP
Japan
Prior art keywords
formula
examples
limited
compound represented
following compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022517543A
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English (en)
Japanese (ja)
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JPWO2021220648A1 (es
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Publication date
Application filed filed Critical
Priority claimed from PCT/JP2021/010568 external-priority patent/WO2021220648A1/ja
Publication of JPWO2021220648A1 publication Critical patent/JPWO2021220648A1/ja
Publication of JPWO2021220648A5 publication Critical patent/JPWO2021220648A5/ja
Pending legal-status Critical Current

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JP2022517543A 2020-04-27 2021-03-16 Pending JPWO2021220648A1 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020077908 2020-04-27
PCT/JP2021/010568 WO2021220648A1 (ja) 2020-04-27 2021-03-16 感放射線性樹脂組成物及びそれを用いたレジストパターンの形成方法、並びに、スルホン酸塩化合物及びそれを含む感放射線性酸発生剤

Publications (2)

Publication Number Publication Date
JPWO2021220648A1 JPWO2021220648A1 (es) 2021-11-04
JPWO2021220648A5 true JPWO2021220648A5 (es) 2023-01-23

Family

ID=78331946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022517543A Pending JPWO2021220648A1 (es) 2020-04-27 2021-03-16

Country Status (3)

Country Link
JP (1) JPWO2021220648A1 (es)
TW (1) TW202140420A (es)
WO (1) WO2021220648A1 (es)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240112834A (ko) * 2021-12-01 2024-07-19 제이에스알 가부시끼가이샤 감방사선성 수지 조성물, 패턴 형성 방법, 기판의 제조 방법, 및 화합물
WO2024070091A1 (ja) * 2022-09-29 2024-04-04 東洋合成工業株式会社 オニウム塩、光酸発生剤、ポリマー、レジスト組成物及び、該レジスト組成物を用いたデバイスの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003057825A (ja) * 2001-08-16 2003-02-28 Fuji Photo Film Co Ltd ポジ型レジスト組成物
US7678528B2 (en) * 2005-11-16 2010-03-16 Az Electronic Materials Usa Corp. Photoactive compounds
US8455176B2 (en) * 2008-11-12 2013-06-04 Az Electronic Materials Usa Corp. Coating composition
JP5522165B2 (ja) * 2009-04-21 2014-06-18 Ｊｓｒ株式会社 感放射線性樹脂組成物、重合体及びレジストパターン形成方法
JP5618619B2 (ja) * 2010-05-17 2014-11-05 富士フイルム株式会社 Ｘ線、電子線又はｅｕｖ光露光用の感活性光線性又は感放射線性樹脂組成物、並びに該組成物を用いたレジスト膜及びパターン形成方法

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