JPWO2021205970A1 - - Google Patents
Info
- Publication number
- JPWO2021205970A1 JPWO2021205970A1 JP2021557856A JP2021557856A JPWO2021205970A1 JP WO2021205970 A1 JPWO2021205970 A1 JP WO2021205970A1 JP 2021557856 A JP2021557856 A JP 2021557856A JP 2021557856 A JP2021557856 A JP 2021557856A JP WO2021205970 A1 JPWO2021205970 A1 JP WO2021205970A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
- C04B35/645—Pressure sintering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020068648 | 2020-04-06 | ||
| PCT/JP2021/014067 WO2021205970A1 (ja) | 2020-04-06 | 2021-03-31 | ターゲット、焼結体及びこれらの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2021205970A1 true JPWO2021205970A1 (ko) | 2021-10-14 |
Family
ID=78024022
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021557856A Pending JPWO2021205970A1 (ko) | 2020-04-06 | 2021-03-31 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2021205970A1 (ko) |
| TW (1) | TWI836206B (ko) |
| WO (1) | WO2021205970A1 (ko) |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4727664B2 (ja) * | 2005-06-15 | 2011-07-20 | Ｊｘ日鉱日石金属株式会社 | スパッタリングターゲット用酸化クロム粉末及びスパッタリングターゲット |
| US8623511B2 (en) * | 2008-06-06 | 2014-01-07 | Idemitsu Kosan Co., Ltd. | Sputtering target for oxide thin film and process for producing the sputtering target |
| JP2011214136A (ja) * | 2010-03-15 | 2011-10-27 | Mitsubishi Materials Corp | 薄膜形成用の蒸着材及び該薄膜を備える薄膜シート並びに積層シート |
| JP2012031346A (ja) * | 2010-08-02 | 2012-02-16 | Sumitomo Metal Mining Co Ltd | 赤色蛍光体 |
| CN103620084B (zh) * | 2011-07-06 | 2016-03-02 | 出光兴产株式会社 | 溅射靶 |
| JP2013139387A (ja) * | 2013-03-22 | 2013-07-18 | Sumitomo Electric Ind Ltd | Ｉｎ−Ｇａ−Ｚｎ系複合酸化物焼結体の製造方法 |
| SG11201604727UA (en) * | 2014-03-25 | 2016-07-28 | Jx Nippon Mining & Metals Corp | Sputtering target of sintered sb-te-based alloy |
| WO2015178430A1 (ja) * | 2014-05-23 | 2015-11-26 | 住友金属鉱山株式会社 | 酸化物焼結体、スパッタリング用ターゲット、及びそれを用いて得られる酸化物半導体薄膜 |
| JP2019012810A (ja) * | 2017-06-29 | 2019-01-24 | Tdk株式会社 | 磁気抵抗効果素子、磁気ヘッド、センサ、高周波フィルタ及び発振素子 |
| JP2020027896A (ja) * | 2018-08-14 | 2020-02-20 | 三星電子株式会社Ｓａｍｓｕｎｇ Ｅｌｅｃｔｒｏｎｉｃｓ Ｃｏ．，Ｌｔｄ． | 磁気トンネル接合素子及び磁気抵抗メモリ装置 |
-
2021
- 2021-03-31 JP JP2021557856A patent/JPWO2021205970A1/ja active Pending
- 2021-03-31 TW TW110111894A patent/TWI836206B/zh active
- 2021-03-31 WO PCT/JP2021/014067 patent/WO2021205970A1/ja active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| WO2021205970A1 (ja) | 2021-10-14 |
| TW202138599A (zh) | 2021-10-16 |
| TWI836206B (zh) | 2024-03-21 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230922 |