JPWO2021107986A5 - - Google Patents
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- Publication number
- JPWO2021107986A5 JPWO2021107986A5 JP2022530818A JP2022530818A JPWO2021107986A5 JP WO2021107986 A5 JPWO2021107986 A5 JP WO2021107986A5 JP 2022530818 A JP2022530818 A JP 2022530818A JP 2022530818 A JP2022530818 A JP 2022530818A JP WO2021107986 A5 JPWO2021107986 A5 JP WO2021107986A5
- Authority
- JP
- Japan
- Prior art keywords
- metrology
- landscape
- sensitivity
- sensitivity index
- operable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000035945 sensitivity Effects 0.000 claims 43
- 238000000034 method Methods 0.000 claims 22
- 238000005259 measurement Methods 0.000 claims 18
- 239000004065 semiconductor Substances 0.000 claims 10
- 230000009897 systematic effect Effects 0.000 claims 6
- 238000004519 manufacturing process Methods 0.000 claims 3
- 238000000513 principal component analysis Methods 0.000 claims 1
- 238000011002 quantification Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962941726P | 2019-11-28 | 2019-11-28 | |
| US62/941,726 | 2019-11-28 | ||
| PCT/US2020/039476 WO2021107986A1 (en) | 2019-11-28 | 2020-06-25 | Systems and methods for metrology optimization based on metrology landscapes |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023504001A JP2023504001A (ja) | 2023-02-01 |
| JPWO2021107986A5 true JPWO2021107986A5 (zh) | 2023-06-29 |
| JP7539467B2 JP7539467B2 (ja) | 2024-08-23 |
Family
ID=76130374
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022530818A Active JP7539467B2 (ja) | 2019-11-28 | 2020-06-25 | 計測ランドスケープに基づく計測最適化のためのシステムおよび方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11725934B2 (zh) |
| EP (1) | EP4049307A4 (zh) |
| JP (1) | JP7539467B2 (zh) |
| KR (1) | KR20220107006A (zh) |
| CN (1) | CN114762094A (zh) |
| TW (1) | TW202136899A (zh) |
| WO (1) | WO2021107986A1 (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12067745B2 (en) | 2022-09-27 | 2024-08-20 | Kla Corporation | Image pre-processing for overlay metrology using decomposition techniques |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7502715B1 (en) * | 2004-09-21 | 2009-03-10 | Asml Netherlands B.V | Observability in metrology measurements |
| CN112698551B (zh) | 2014-11-25 | 2024-04-23 | 科磊股份有限公司 | 分析及利用景观 |
| KR102152301B1 (ko) * | 2015-12-04 | 2020-09-07 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 데이터로부터의 통계적 계층 재구성 |
| WO2017146785A1 (en) | 2016-02-25 | 2017-08-31 | Kla-Tencor Corporation | Analyzing root causes of process variation in scatterometry metrology |
| US10699969B2 (en) * | 2017-08-30 | 2020-06-30 | Kla-Tencor Corporation | Quick adjustment of metrology measurement parameters according to process variation |
| KR102665146B1 (ko) * | 2017-11-29 | 2024-05-09 | 케이엘에이 코포레이션 | 디바이스 검사 시스템을 사용한 오버레이 에러의 측정 |
| US11333982B2 (en) * | 2019-01-28 | 2022-05-17 | Kla Corporation | Scaling metric for quantifying metrology sensitivity to process variation |
-
2020
- 2020-06-25 US US16/964,748 patent/US11725934B2/en active Active
- 2020-06-25 JP JP2022530818A patent/JP7539467B2/ja active Active
- 2020-06-25 EP EP20892175.9A patent/EP4049307A4/en active Pending
- 2020-06-25 KR KR1020227021352A patent/KR20220107006A/ko active Search and Examination
- 2020-06-25 CN CN202080082662.1A patent/CN114762094A/zh active Pending
- 2020-06-25 WO PCT/US2020/039476 patent/WO2021107986A1/en unknown
- 2020-11-27 TW TW109141861A patent/TW202136899A/zh unknown
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