JPWO2021106536A1 - - Google Patents

Info

Publication number
JPWO2021106536A1
JPWO2021106536A1 JP2021561266A JP2021561266A JPWO2021106536A1 JP WO2021106536 A1 JPWO2021106536 A1 JP WO2021106536A1 JP 2021561266 A JP2021561266 A JP 2021561266A JP 2021561266 A JP2021561266 A JP 2021561266A JP WO2021106536 A1 JPWO2021106536 A1 JP WO2021106536A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2021561266A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021106536A1 publication Critical patent/JPWO2021106536A1/ja
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
JP2021561266A 2019-11-29 2020-11-09 Abandoned JPWO2021106536A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019217608 2019-11-29
PCT/JP2020/041715 WO2021106536A1 (ja) 2019-11-29 2020-11-09 レジスト下層膜形成用組成物、パターン形成方法、及び、電子デバイスの製造方法

Publications (1)

Publication Number Publication Date
JPWO2021106536A1 true JPWO2021106536A1 (zh) 2021-06-03

Family

ID=76130175

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021561266A Abandoned JPWO2021106536A1 (zh) 2019-11-29 2020-11-09

Country Status (3)

Country Link
JP (1) JPWO2021106536A1 (zh)
TW (1) TW202120464A (zh)
WO (1) WO2021106536A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023048021A1 (ja) * 2021-09-24 2023-03-30 日産化学株式会社 レジスト下層膜形成組成物

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003241385A (ja) * 2001-12-03 2003-08-27 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法
JP2011022348A (ja) * 2009-07-15 2011-02-03 Jsr Corp 感放射線性樹脂組成物及びそれに用いられる重合体
JP2016135756A (ja) * 2014-12-15 2016-07-28 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 精製方法
JP2019020701A (ja) * 2016-08-10 2019-02-07 Jsr株式会社 半導体用レジスト下層膜形成組成物、レジスト下層膜、レジスト下層膜の形成方法及びパターニング基板の製造方法
JP6574849B2 (ja) * 2015-11-10 2019-09-11 富士フイルム株式会社 着色組成物、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003241385A (ja) * 2001-12-03 2003-08-27 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法
JP2011022348A (ja) * 2009-07-15 2011-02-03 Jsr Corp 感放射線性樹脂組成物及びそれに用いられる重合体
JP2016135756A (ja) * 2014-12-15 2016-07-28 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 精製方法
JP6574849B2 (ja) * 2015-11-10 2019-09-11 富士フイルム株式会社 着色組成物、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置
JP2019020701A (ja) * 2016-08-10 2019-02-07 Jsr株式会社 半導体用レジスト下層膜形成組成物、レジスト下層膜、レジスト下層膜の形成方法及びパターニング基板の製造方法

Also Published As

Publication number Publication date
WO2021106536A1 (ja) 2021-06-03
TW202120464A (zh) 2021-06-01

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