JPWO2021112194A1 - - Google Patents

Info

Publication number
JPWO2021112194A1
JPWO2021112194A1 JP2021562728A JP2021562728A JPWO2021112194A1 JP WO2021112194 A1 JPWO2021112194 A1 JP WO2021112194A1 JP 2021562728 A JP2021562728 A JP 2021562728A JP 2021562728 A JP2021562728 A JP 2021562728A JP WO2021112194 A1 JPWO2021112194 A1 JP WO2021112194A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021562728A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021112194A1 publication Critical patent/JPWO2021112194A1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
JP2021562728A 2019-12-04 2020-12-03 Pending JPWO2021112194A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019219931 2019-12-04
PCT/JP2020/045103 WO2021112194A1 (ja) 2019-12-04 2020-12-03 リソグラフィー用下層膜形成用組成物、リソグラフィー用下層膜、レジストパターン形成方法及び、回路パターン形成方法、オリゴマー、及び、精製方法

Publications (1)

Publication Number Publication Date
JPWO2021112194A1 true JPWO2021112194A1 (zh) 2021-06-10

Family

ID=76221742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021562728A Pending JPWO2021112194A1 (zh) 2019-12-04 2020-12-03

Country Status (3)

Country Link
JP (1) JPWO2021112194A1 (zh)
TW (1) TW202134792A (zh)
WO (1) WO2021112194A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240117101A1 (en) * 2020-07-08 2024-04-11 Mitsubishi Gas Chemical Company, Inc. Composition for film formation, resist composition, radiation-sensitive composition, method for producing amorphous film, resist pattern formation method, composition for underlayer film formation for lithography, method for producing underlayer film for lithography, circuit pattern formation method, composition for optical member formation, resin for underlayer film formation, resist resin, radiation-sensitive resin, and resin for underlayer film formation for lithography
US20230391944A1 (en) * 2020-08-28 2023-12-07 Sekisui Chemical Co., Ltd. Compound, method for producing compound, adhesive composition and adhesive tape

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5177418B2 (ja) * 2008-12-12 2013-04-03 信越化学工業株式会社 反射防止膜形成材料、反射防止膜及びこれを用いたパターン形成方法
JP5485185B2 (ja) * 2011-01-05 2014-05-07 信越化学工業株式会社 レジスト下層膜材料及びこれを用いたパターン形成方法
WO2014171326A1 (ja) * 2013-04-17 2014-10-23 日産化学工業株式会社 レジスト下層膜形成組成物
JP6712188B2 (ja) * 2015-07-13 2020-06-17 信越化学工業株式会社 レジスト下層膜形成用組成物及びこれを用いたパターン形成方法

Also Published As

Publication number Publication date
WO2021112194A1 (ja) 2021-06-10
TW202134792A (zh) 2021-09-16

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Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20231010