JPWO2021060060A1 - - Google Patents

Info

Publication number
JPWO2021060060A1
JPWO2021060060A1 JP2021548823A JP2021548823A JPWO2021060060A1 JP WO2021060060 A1 JPWO2021060060 A1 JP WO2021060060A1 JP 2021548823 A JP2021548823 A JP 2021548823A JP 2021548823 A JP2021548823 A JP 2021548823A JP WO2021060060 A1 JPWO2021060060 A1 JP WO2021060060A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021548823A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021060060A1 publication Critical patent/JPWO2021060060A1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2021548823A 2019-09-27 2020-09-14 Pending JPWO2021060060A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019177239 2019-09-27
PCT/JP2020/034791 WO2021060060A1 (ja) 2019-09-27 2020-09-14 感放射線性樹脂組成物

Publications (1)

Publication Number Publication Date
JPWO2021060060A1 true JPWO2021060060A1 (zh) 2021-04-01

Family

ID=75166644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021548823A Pending JPWO2021060060A1 (zh) 2019-09-27 2020-09-14

Country Status (5)

Country Link
JP (1) JPWO2021060060A1 (zh)
KR (1) KR20220069932A (zh)
CN (1) CN114402258A (zh)
TW (1) TW202116906A (zh)
WO (1) WO2021060060A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113671794A (zh) * 2021-08-25 2021-11-19 Oppo广东移动通信有限公司 正型光刻胶及制备方法、玻璃壳体的制备方法和电子设备

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4438080B2 (ja) * 2000-09-29 2010-03-24 日本ゼオン株式会社 絶縁膜形成用感放射線性樹脂組成物及び有機エレクトロルミネッセンス素子用絶縁膜
US9399547B2 (en) 2012-12-27 2016-07-26 Sarong Societa' Per Azioni Capsule for beverages
EP3121652B1 (en) 2014-03-20 2019-09-04 Zeon Corporation Radiation-sensitive resin composition and electronic component
KR102473325B1 (ko) * 2017-03-30 2022-12-01 니폰 제온 가부시키가이샤 감방사선 수지 조성물 및 전자 부품
JP2018173471A (ja) * 2017-03-31 2018-11-08 住友ベークライト株式会社 感光性樹脂組成物および半導体装置

Also Published As

Publication number Publication date
TW202116906A (zh) 2021-05-01
KR20220069932A (ko) 2022-05-27
CN114402258A (zh) 2022-04-26
WO2021060060A1 (ja) 2021-04-01

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Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230822