JPWO2021059846A1 - - Google Patents
Info
- Publication number
- JPWO2021059846A1 JPWO2021059846A1 JP2021548447A JP2021548447A JPWO2021059846A1 JP WO2021059846 A1 JPWO2021059846 A1 JP WO2021059846A1 JP 2021548447 A JP2021548447 A JP 2021548447A JP 2021548447 A JP2021548447 A JP 2021548447A JP WO2021059846 A1 JPWO2021059846 A1 JP WO2021059846A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/20—Esters of polyhydric alcohols or polyhydric phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
- C08K5/3415—Five-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3442—Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
- C08K5/3462—Six-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019175788 | 2019-09-26 | ||
JP2019175788 | 2019-09-26 | ||
PCT/JP2020/032332 WO2021059846A1 (ja) | 2019-09-26 | 2020-08-27 | 近赤外吸収組成物、膜、光学フィルタ及びその製造方法、固体撮像素子、赤外線センサ、カメラモジュール、並びに、インクジェットインク |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2021059846A1 true JPWO2021059846A1 (zh) | 2021-04-01 |
JP7271692B2 JP7271692B2 (ja) | 2023-05-11 |
Family
ID=75166082
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021548447A Active JP7271692B2 (ja) | 2019-09-26 | 2020-08-27 | 近赤外吸収組成物、膜、光学フィルタ及びその製造方法、固体撮像素子、赤外線センサ、カメラモジュール、並びに、インクジェットインク |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7271692B2 (zh) |
TW (1) | TW202113023A (zh) |
WO (1) | WO2021059846A1 (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117980429A (zh) * | 2021-09-21 | 2024-05-03 | 株式会社力森诺科 | 粘接剂用组合物及层叠体 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012098377A (ja) * | 2010-10-29 | 2012-05-24 | Kao Corp | カラーフィルター用顔料分散体の製造方法 |
JP2013151675A (ja) * | 2011-12-27 | 2013-08-08 | Fujifilm Corp | 赤外線吸収性組成物、これを用いた赤外線カットフィルタ及びその製造方法、並びに、カメラモジュール及びその製造方法 |
WO2015182384A1 (ja) * | 2014-05-27 | 2015-12-03 | 富士フイルム株式会社 | 遮光性組成物 |
WO2018055966A1 (ja) * | 2016-09-21 | 2018-03-29 | 富士フイルム株式会社 | 組成物、形成体、積層体、遠赤外線透過フィルタ、固体撮像素子、赤外線カメラおよび赤外線センサ |
WO2019039159A1 (ja) * | 2017-08-24 | 2019-02-28 | 富士フイルム株式会社 | 硬化性組成物、膜、近赤外線カットフィルタ、固体撮像素子、画像表示装置および赤外線センサ |
WO2019107015A1 (ja) * | 2017-11-29 | 2019-06-06 | 富士フイルム株式会社 | 組成物、膜、赤外線透過フィルタ、固体撮像素子および光センサ |
WO2019155770A1 (ja) * | 2018-02-06 | 2019-08-15 | 富士フイルム株式会社 | 組成物、膜、近赤外線カットフィルタ、固体撮像素子、画像表示装置および赤外線センサ |
-
2020
- 2020-08-27 WO PCT/JP2020/032332 patent/WO2021059846A1/ja active Application Filing
- 2020-08-27 JP JP2021548447A patent/JP7271692B2/ja active Active
- 2020-09-08 TW TW109130795A patent/TW202113023A/zh unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012098377A (ja) * | 2010-10-29 | 2012-05-24 | Kao Corp | カラーフィルター用顔料分散体の製造方法 |
JP2013151675A (ja) * | 2011-12-27 | 2013-08-08 | Fujifilm Corp | 赤外線吸収性組成物、これを用いた赤外線カットフィルタ及びその製造方法、並びに、カメラモジュール及びその製造方法 |
WO2015182384A1 (ja) * | 2014-05-27 | 2015-12-03 | 富士フイルム株式会社 | 遮光性組成物 |
WO2018055966A1 (ja) * | 2016-09-21 | 2018-03-29 | 富士フイルム株式会社 | 組成物、形成体、積層体、遠赤外線透過フィルタ、固体撮像素子、赤外線カメラおよび赤外線センサ |
WO2019039159A1 (ja) * | 2017-08-24 | 2019-02-28 | 富士フイルム株式会社 | 硬化性組成物、膜、近赤外線カットフィルタ、固体撮像素子、画像表示装置および赤外線センサ |
WO2019107015A1 (ja) * | 2017-11-29 | 2019-06-06 | 富士フイルム株式会社 | 組成物、膜、赤外線透過フィルタ、固体撮像素子および光センサ |
WO2019155770A1 (ja) * | 2018-02-06 | 2019-08-15 | 富士フイルム株式会社 | 組成物、膜、近赤外線カットフィルタ、固体撮像素子、画像表示装置および赤外線センサ |
Also Published As
Publication number | Publication date |
---|---|
TW202113023A (zh) | 2021-04-01 |
JP7271692B2 (ja) | 2023-05-11 |
WO2021059846A1 (ja) | 2021-04-01 |
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