JPWO2021059581A1 - - Google Patents

Info

Publication number
JPWO2021059581A1
JPWO2021059581A1 JP2021548325A JP2021548325A JPWO2021059581A1 JP WO2021059581 A1 JPWO2021059581 A1 JP WO2021059581A1 JP 2021548325 A JP2021548325 A JP 2021548325A JP 2021548325 A JP2021548325 A JP 2021548325A JP WO2021059581 A1 JPWO2021059581 A1 JP WO2021059581A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021548325A
Other versions
JP7273377B2 (ja
JPWO2021059581A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021059581A1 publication Critical patent/JPWO2021059581A1/ja
Publication of JPWO2021059581A5 publication Critical patent/JPWO2021059581A5/ja
Application granted granted Critical
Publication of JP7273377B2 publication Critical patent/JP7273377B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/80Constructional details
    • H10N30/87Electrodes or interconnections, e.g. leads or terminals
    • H10N30/875Further connection or lead arrangements, e.g. flexible wiring boards, terminal pins
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/05Holders; Supports
    • H03H9/10Mounting in enclosures
    • H03H9/1007Mounting in enclosures for bulk acoustic wave [BAW] devices
    • H03H9/1014Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device
    • H03H9/1021Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device the BAW device being of the cantilever type
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/05Holders; Supports
    • H03H9/0504Holders; Supports for bulk acoustic wave devices
    • H03H9/0514Holders; Supports for bulk acoustic wave devices consisting of mounting pads or bumps
    • H03H9/0519Holders; Supports for bulk acoustic wave devices consisting of mounting pads or bumps for cantilever
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/15Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H03H9/19Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator consisting of quartz
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • H03H2003/0414Resonance frequency
    • H03H2003/0485Resonance frequency during the manufacture of a cantilever

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
JP2021548325A 2019-09-26 2020-05-14 圧電振動子及びその製造方法 Active JP7273377B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019175977 2019-09-26
JP2019175977 2019-09-26
PCT/JP2020/019308 WO2021059581A1 (ja) 2019-09-26 2020-05-14 圧電振動子及びその製造方法

Publications (3)

Publication Number Publication Date
JPWO2021059581A1 true JPWO2021059581A1 (ja) 2021-04-01
JPWO2021059581A5 JPWO2021059581A5 (ja) 2022-04-08
JP7273377B2 JP7273377B2 (ja) 2023-05-15

Family

ID=75166005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021548325A Active JP7273377B2 (ja) 2019-09-26 2020-05-14 圧電振動子及びその製造方法

Country Status (4)

Country Link
US (1) US20220199892A1 (ja)
JP (1) JP7273377B2 (ja)
CN (1) CN114208028A (ja)
WO (1) WO2021059581A1 (ja)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57107624A (en) * 1980-12-25 1982-07-05 Seikosha Co Ltd Piezoelectric oscillator
JPS62165421A (ja) * 1986-01-16 1987-07-22 Murata Mfg Co Ltd 電子部品およびその製造方法
JPH1141051A (ja) * 1997-07-16 1999-02-12 Matsushita Electric Ind Co Ltd 圧電共振部品およびその製造方法
JP2003198312A (ja) * 2001-12-25 2003-07-11 Seiko Epson Corp 圧電デバイスとその製造方法、及び圧電デバイスを利用した携帯電話装置ならびに圧電デバイスを利用した電子機器
JP2010232806A (ja) * 2009-03-26 2010-10-14 Seiko Epson Corp 圧電振動子、圧電発振器、電子機器、及び圧電振動子の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57107624A (en) * 1980-12-25 1982-07-05 Seikosha Co Ltd Piezoelectric oscillator
JPS62165421A (ja) * 1986-01-16 1987-07-22 Murata Mfg Co Ltd 電子部品およびその製造方法
JPH1141051A (ja) * 1997-07-16 1999-02-12 Matsushita Electric Ind Co Ltd 圧電共振部品およびその製造方法
JP2003198312A (ja) * 2001-12-25 2003-07-11 Seiko Epson Corp 圧電デバイスとその製造方法、及び圧電デバイスを利用した携帯電話装置ならびに圧電デバイスを利用した電子機器
JP2010232806A (ja) * 2009-03-26 2010-10-14 Seiko Epson Corp 圧電振動子、圧電発振器、電子機器、及び圧電振動子の製造方法

Also Published As

Publication number Publication date
US20220199892A1 (en) 2022-06-23
CN114208028A (zh) 2022-03-18
WO2021059581A1 (ja) 2021-04-01
JP7273377B2 (ja) 2023-05-15

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