JPWO2021053731A1 - - Google Patents

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Publication number
JPWO2021053731A1
JPWO2021053731A1 JP2021546090A JP2021546090A JPWO2021053731A1 JP WO2021053731 A1 JPWO2021053731 A1 JP WO2021053731A1 JP 2021546090 A JP2021546090 A JP 2021546090A JP 2021546090 A JP2021546090 A JP 2021546090A JP WO2021053731 A1 JPWO2021053731 A1 JP WO2021053731A1
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JP
Japan
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JP2021546090A
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JP7322957B2 (ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Surface Treatment Of Glass (AREA)
JP2021546090A 2019-09-17 2019-09-17 研磨剤、ガラスの研磨方法、及びガラスの製造方法 Active JP7322957B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/036421 WO2021053731A1 (ja) 2019-09-17 2019-09-17 研磨剤、ガラスの研磨方法、及びガラスの製造方法

Publications (2)

Publication Number Publication Date
JPWO2021053731A1 true JPWO2021053731A1 (ja) 2021-03-25
JP7322957B2 JP7322957B2 (ja) 2023-08-08

Family

ID=74884160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021546090A Active JP7322957B2 (ja) 2019-09-17 2019-09-17 研磨剤、ガラスの研磨方法、及びガラスの製造方法

Country Status (3)

Country Link
JP (1) JP7322957B2 (ja)
CN (1) CN114423842A (ja)
WO (1) WO2021053731A1 (ja)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010162649A (ja) * 2009-01-15 2010-07-29 Admatechs Co Ltd 研磨用組成物、研磨用部材、及び研磨方法
WO2013187358A1 (ja) * 2012-06-13 2013-12-19 コニカミノルタ株式会社 研磨材組成物及びその製造方法
WO2015046542A1 (ja) * 2013-09-28 2015-04-02 Hoya株式会社 ガラス基板の製造方法及び磁気ディスクの製造方法
JP2018158875A (ja) * 2017-03-23 2018-10-11 富士ゼロックス株式会社 シリカ複合粒子及びその製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100641348B1 (ko) * 2005-06-03 2006-11-03 주식회사 케이씨텍 Ｃｍｐ용 슬러리와 이의 제조 방법 및 기판의 연마 방법
JPWO2013118648A1 (ja) * 2012-02-06 2015-05-11 旭硝子株式会社 ガラス製品の製造方法および磁気ディスクの製造方法
JPWO2015019820A1 (ja) * 2013-08-09 2017-03-02 株式会社フジミインコーポレーテッド 研磨用組成物
JP6393231B2 (ja) * 2015-05-08 2018-09-19 信越化学工業株式会社 合成石英ガラス基板用研磨剤及び合成石英ガラス基板の研磨方法
JP7137081B2 (ja) * 2017-06-15 2022-09-14 株式会社スリーボンド 表面処理方法及び表面処理用組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010162649A (ja) * 2009-01-15 2010-07-29 Admatechs Co Ltd 研磨用組成物、研磨用部材、及び研磨方法
WO2013187358A1 (ja) * 2012-06-13 2013-12-19 コニカミノルタ株式会社 研磨材組成物及びその製造方法
WO2015046542A1 (ja) * 2013-09-28 2015-04-02 Hoya株式会社 ガラス基板の製造方法及び磁気ディスクの製造方法
JP2018158875A (ja) * 2017-03-23 2018-10-11 富士ゼロックス株式会社 シリカ複合粒子及びその製造方法

Also Published As

Publication number Publication date
WO2021053731A1 (ja) 2021-03-25
JP7322957B2 (ja) 2023-08-08
CN114423842A (zh) 2022-04-29

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