JPWO2021049489A1 - - Google Patents
Info
- Publication number
- JPWO2021049489A1 JPWO2021049489A1 JP2021545549A JP2021545549A JPWO2021049489A1 JP WO2021049489 A1 JPWO2021049489 A1 JP WO2021049489A1 JP 2021545549 A JP2021545549 A JP 2021545549A JP 2021545549 A JP2021545549 A JP 2021545549A JP WO2021049489 A1 JPWO2021049489 A1 JP WO2021049489A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
- C07D209/14—Radicals substituted by nitrogen atoms, not forming part of a nitro radical
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/10—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019164900 | 2019-09-10 | ||
PCT/JP2020/033955 WO2021049489A1 (ja) | 2019-09-10 | 2020-09-08 | 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2021049489A1 true JPWO2021049489A1 (zh) | 2021-03-18 |
Family
ID=74866154
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021545549A Pending JPWO2021049489A1 (zh) | 2019-09-10 | 2020-09-08 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2021049489A1 (zh) |
KR (1) | KR20220061910A (zh) |
CN (1) | CN113727971A (zh) |
TW (1) | TW202116731A (zh) |
WO (1) | WO2021049489A1 (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022224835A1 (ja) * | 2021-04-22 | 2022-10-27 | 株式会社Adeka | 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1751269A (zh) * | 2003-02-19 | 2006-03-22 | 西巴特殊化学品控股有限公司 | 卤代肟衍生物和其作为潜在的酸的用途 |
WO2004074242A2 (en) * | 2003-02-19 | 2004-09-02 | Ciba Specialty Chemicals Holding Inc. | Halogenated oxime derivatives and the use thereof as latent acids |
KR101193824B1 (ko) * | 2004-07-20 | 2012-10-24 | 시바 홀딩 인크 | 옥심 유도체 및 잠산으로서의 이의 용도 |
US8088868B2 (en) * | 2006-12-19 | 2012-01-03 | Bridgestone Corporation | Polymers functionalized with protected oxime compounds |
JP2010164964A (ja) * | 2008-12-19 | 2010-07-29 | Fujifilm Corp | 感光性組成物、カラーフィルタ、および液晶表示装置 |
JP5944898B2 (ja) * | 2011-07-08 | 2016-07-05 | 新日鉄住金化学株式会社 | 光重合開始剤、感光性組成物及び硬化物 |
CN103389621B (zh) * | 2013-07-26 | 2016-03-16 | 常州强力先端电子材料有限公司 | 一种磺酸肟酯类光产酸剂 |
WO2015152153A1 (ja) * | 2014-04-04 | 2015-10-08 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
US10030083B2 (en) * | 2014-05-15 | 2018-07-24 | Bridgestone Corporation | Polymers functionalized with protected oxime compounds containing a cyano group |
JP6605820B2 (ja) | 2015-03-11 | 2019-11-13 | 株式会社Adeka | オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物 |
CN108603094A (zh) | 2016-01-26 | 2018-09-28 | 株式会社Adeka | 热产酸剂及使用其的抗蚀剂组合物 |
CN107163169B (zh) * | 2017-05-25 | 2018-08-24 | 同济大学 | 一类香豆素并咔唑型肟酯类化合物及其制备方法和应用 |
JP7314055B2 (ja) * | 2017-12-13 | 2023-07-25 | 株式会社Adeka | 化合物、潜在性塩基発生剤、該化合物を含有する感光性樹脂組成物、及び硬化物 |
CN110806677A (zh) * | 2018-08-06 | 2020-02-18 | 常州强力先端电子材料有限公司 | 光致抗蚀剂组合物、其图案形成方法及应用 |
CN111324009A (zh) * | 2018-12-13 | 2020-06-23 | 常州强力先端电子材料有限公司 | 光固化组合物及其应用 |
-
2020
- 2020-09-08 KR KR1020217033344A patent/KR20220061910A/ko unknown
- 2020-09-08 CN CN202080030294.6A patent/CN113727971A/zh active Pending
- 2020-09-08 WO PCT/JP2020/033955 patent/WO2021049489A1/ja active Application Filing
- 2020-09-08 JP JP2021545549A patent/JPWO2021049489A1/ja active Pending
- 2020-09-09 TW TW109130991A patent/TW202116731A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
KR20220061910A (ko) | 2022-05-13 |
CN113727971A (zh) | 2021-11-30 |
WO2021049489A1 (ja) | 2021-03-18 |
TW202116731A (zh) | 2021-05-01 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230821 |