JPWO2021045126A1 - - Google Patents

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Publication number
JPWO2021045126A1
JPWO2021045126A1 JP2021544011A JP2021544011A JPWO2021045126A1 JP WO2021045126 A1 JPWO2021045126 A1 JP WO2021045126A1 JP 2021544011 A JP2021544011 A JP 2021544011A JP 2021544011 A JP2021544011 A JP 2021544011A JP WO2021045126 A1 JPWO2021045126 A1 JP WO2021045126A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2021544011A
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Japanese (ja)
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JP7254194B2 (ja
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Publication date
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Publication of JPWO2021045126A1 publication Critical patent/JPWO2021045126A1/ja
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Publication of JP7254194B2 publication Critical patent/JP7254194B2/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/28—Di-epoxy compounds containing acyclic nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2021544011A 2019-09-05 2020-09-02 硬化性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、半導体デバイス、樹脂、及び、樹脂の製造方法 Active JP7254194B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019161727 2019-09-05
JP2019161727 2019-09-05
PCT/JP2020/033326 WO2021045126A1 (ja) 2019-09-05 2020-09-02 硬化性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、半導体デバイス、樹脂、及び、樹脂の製造方法

Publications (2)

Publication Number Publication Date
JPWO2021045126A1 true JPWO2021045126A1 (enrdf_load_stackoverflow) 2021-03-11
JP7254194B2 JP7254194B2 (ja) 2023-04-07

Family

ID=74853211

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021544011A Active JP7254194B2 (ja) 2019-09-05 2020-09-02 硬化性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、半導体デバイス、樹脂、及び、樹脂の製造方法

Country Status (3)

Country Link
JP (1) JP7254194B2 (enrdf_load_stackoverflow)
TW (1) TW202116876A (enrdf_load_stackoverflow)
WO (1) WO2021045126A1 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022044999A1 (ja) * 2020-08-25 2022-03-03 富士フイルム株式会社 硬化性樹脂組成物、硬化物、積層体、硬化物の製造方法、半導体デバイス、ポリイミド前駆体及びその製造方法
JP7530430B2 (ja) * 2020-08-25 2024-08-07 富士フイルム株式会社 硬化性樹脂組成物、硬化物、積層体、硬化物の製造方法、半導体デバイス、ポリイミド前駆体及びその製造方法
KR102821275B1 (ko) * 2021-04-13 2025-06-16 코오롱인더스트리 주식회사 감광성 수지 조성물 및 이를 이용한 드라이 필름 포토레지스트, 감광성 엘리먼트, 레지스터 패턴, 회로기판, 및 디스플레이 장치
JPWO2024111130A1 (enrdf_load_stackoverflow) * 2022-11-25 2024-05-30
WO2024185652A1 (ja) * 2023-03-08 2024-09-12 富士フイルム株式会社 樹脂組成物、硬化物、積層体、硬化物の製造方法、積層体の製造方法、半導体デバイスの製造方法、及び、半導体デバイス
WO2024195608A1 (ja) * 2023-03-20 2024-09-26 富士フイルム株式会社 感光性樹脂組成物、硬化物、積層体、硬化物の製造方法、積層体の製造方法、半導体デバイスの製造方法、及び、半導体デバイス
CN117326987A (zh) * 2023-09-26 2024-01-02 吉林大学 含侧链脲基结构的二胺单体、聚酰亚胺及其制备方法和应用

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57143329A (en) * 1981-03-03 1982-09-04 Nippon Telegr & Teleph Corp <Ntt> Photosensitive resin and its production
JPH03245148A (ja) * 1990-02-23 1991-10-31 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性エレメント
JPH10239841A (ja) * 1997-02-28 1998-09-11 Toray Ind Inc 感光性ポリイミド前駆体組成物
JP2003167337A (ja) * 2001-12-04 2003-06-13 Hitachi Chemical Dupont Microsystems Ltd 多層配線構造の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57143329A (en) * 1981-03-03 1982-09-04 Nippon Telegr & Teleph Corp <Ntt> Photosensitive resin and its production
JPH03245148A (ja) * 1990-02-23 1991-10-31 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性エレメント
JPH10239841A (ja) * 1997-02-28 1998-09-11 Toray Ind Inc 感光性ポリイミド前駆体組成物
JP2003167337A (ja) * 2001-12-04 2003-06-13 Hitachi Chemical Dupont Microsystems Ltd 多層配線構造の製造方法

Also Published As

Publication number Publication date
WO2021045126A1 (ja) 2021-03-11
JP7254194B2 (ja) 2023-04-07
TW202116876A (zh) 2021-05-01

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