JPWO2021039320A1 - - Google Patents

Info

Publication number
JPWO2021039320A1
JPWO2021039320A1 JP2021542688A JP2021542688A JPWO2021039320A1 JP WO2021039320 A1 JPWO2021039320 A1 JP WO2021039320A1 JP 2021542688 A JP2021542688 A JP 2021542688A JP 2021542688 A JP2021542688 A JP 2021542688A JP WO2021039320 A1 JPWO2021039320 A1 JP WO2021039320A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021542688A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021039320A1 publication Critical patent/JPWO2021039320A1/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013Fillers, pigments or reinforcing additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/02Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/10Materials in mouldable or extrudable form for sealing or packing joints or covers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Sealing Material Composition (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2021542688A 2019-08-29 2020-08-05 Pending JPWO2021039320A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019157438 2019-08-29
PCT/JP2020/029924 WO2021039320A1 (en) 2019-08-29 2020-08-05 Photocurable composition, cured body thereof, sealing material, protective material, waterproof structure, and cured body production method

Publications (1)

Publication Number Publication Date
JPWO2021039320A1 true JPWO2021039320A1 (en) 2021-03-04

Family

ID=74684768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021542688A Pending JPWO2021039320A1 (en) 2019-08-29 2020-08-05

Country Status (4)

Country Link
JP (1) JPWO2021039320A1 (en)
KR (1) KR20220055451A (en)
CN (1) CN113993912A (en)
WO (1) WO2021039320A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024117230A1 (en) * 2022-12-01 2024-06-06 積水化学工業株式会社 Photocurable resin composition, adhesive sheet, and method for manufacturing laminate

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59178448A (en) * 1983-03-30 1984-10-09 Sekisui Chem Co Ltd Photopolymerizable image forming composition
JP2006243018A (en) * 2005-02-28 2006-09-14 Sekisui Chem Co Ltd Liquid crystal display element, shading sealant therefor, and vertical conduction material
JP4572985B2 (en) * 2009-02-26 2010-11-04 オムロン株式会社 Curing degree evaluation method, hardening degree evaluation sheet, and hardening degree evaluation system for active energy ray-curable resin composition
JP2011088975A (en) * 2009-10-21 2011-05-06 Hitachi Chem Co Ltd Photocurable moisture-proof insulating coating material and method for manufacturing moisture-proof insulated electronic part using the same
WO2012090298A1 (en) * 2010-12-28 2012-07-05 日立化成工業株式会社 Photocurable resin composition, protective coating agent, hard coating film, liquid crystal display module, and method for manufacturing same
JP6357734B2 (en) * 2013-06-25 2018-07-18 日立化成株式会社 Photocurable resin composition, photocurable light-shielding coating material using the same, light leakage prevention material, liquid crystal display panel and liquid crystal display device, and photocuring method
JP2015172176A (en) * 2014-02-18 2015-10-01 日立化成株式会社 Photocurable resin composition, photocurable light-shielding coating and light leakage prevention material using the composition, liquid crystal panel, liquid crystal display and photo-curing method
WO2016129568A1 (en) 2015-02-09 2016-08-18 株式会社スリーボンド Method for curing photocurable resin composition and cured product
US20190185657A1 (en) * 2016-07-05 2019-06-20 Sekisui Polymatech Co., Ltd. Sealant composition and sealant
JP6919886B2 (en) * 2017-05-29 2021-08-18 積水ポリマテック株式会社 Encapsulant composition and encapsulant
TWI700183B (en) * 2017-12-20 2020-08-01 日商旭化成股份有限公司 Photosensitive resin laminate

Also Published As

Publication number Publication date
WO2021039320A1 (en) 2021-03-04
KR20220055451A (en) 2022-05-03
CN113993912A (en) 2022-01-28

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