JPWO2020262702A1 - - Google Patents

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Publication number
JPWO2020262702A1
JPWO2020262702A1 JP2021528306A JP2021528306A JPWO2020262702A1 JP WO2020262702 A1 JPWO2020262702 A1 JP WO2020262702A1 JP 2021528306 A JP2021528306 A JP 2021528306A JP 2021528306 A JP2021528306 A JP 2021528306A JP WO2020262702 A1 JPWO2020262702 A1 JP WO2020262702A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2021528306A
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Japanese (ja)
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JPWO2020262702A5 (https=
JP7201808B2 (ja
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Publication of JPWO2020262702A1 publication Critical patent/JPWO2020262702A1/ja
Publication of JPWO2020262702A5 publication Critical patent/JPWO2020262702A5/ja
Priority to JP2022205516A priority Critical patent/JP7311702B2/ja
Application granted granted Critical
Publication of JP7201808B2 publication Critical patent/JP7201808B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73921—Glass or ceramic substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1 ns or less
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073—Shaping the laser spot
    • B23K26/0736—Shaping the laser spot into an oval shape, e.g. elliptic shape
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/0823—Devices involving rotation of the workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B23K26/354—Working by laser beam, e.g. welding, cutting or boring for surface treatment by melting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B23K26/3568—Modifying rugosity
    • B23K26/3576—Diminishing rugosity, e.g. by grinding, polishing or smoothing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/02—Re-forming glass sheets
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B29/00—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins
    • C03B29/02—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a discontinuous way
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00—Severing cooled glass
    • C03B33/08—Severing cooled glass by fusing, i.e. by melting through the glass
    • C03B33/082—Severing cooled glass by fusing, i.e. by melting through the glass using a focussed radiation beam, e.g. laser
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/078—Glass compositions containing silica with 40% to 90% silica, by weight containing an oxide of a divalent metal, e.g. an oxide of zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic materials other than metals or composite materials
    • B23K2103/54—Glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04—Arrangements of vacuum systems or suction cups
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B35/00—Transporting of glass products during their manufacture, e.g. hot glass lenses, prisms
    • C03B35/14—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands
    • C03B35/22—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands on a fluid support bed, e.g. on molten metal
    • C03B35/24—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands on a fluid support bed, e.g. on molten metal on a gas support bed

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Laser Beam Processing (AREA)
  • Surface Treatment Of Glass (AREA)
  • Magnetic Record Carriers (AREA)
JP2021528306A 2019-06-28 2020-06-29 ガラス板の製造方法および磁気ディスクの製造方法 Active JP7201808B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022205516A JP7311702B2 (ja) 2019-06-28 2022-12-22 ガラス板および磁気ディスク

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019122243 2019-06-28
JP2019122243 2019-06-28
PCT/JP2020/025596 WO2020262702A1 (ja) 2019-06-28 2020-06-29 ガラス板の製造方法および磁気ディスクの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022205516A Division JP7311702B2 (ja) 2019-06-28 2022-12-22 ガラス板および磁気ディスク

Publications (3)

Publication Number Publication Date
JPWO2020262702A1 true JPWO2020262702A1 (https=) 2020-12-30
JPWO2020262702A5 JPWO2020262702A5 (https=) 2022-06-27
JP7201808B2 JP7201808B2 (ja) 2023-01-10

Family

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Family Applications (2)

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JP2021528306A Active JP7201808B2 (ja) 2019-06-28 2020-06-29 ガラス板の製造方法および磁気ディスクの製造方法
JP2022205516A Active JP7311702B2 (ja) 2019-06-28 2022-12-22 ガラス板および磁気ディスク

Family Applications After (1)

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Country Status (4)

Country Link
US (1) US20220227654A1 (https=)
JP (2) JP7201808B2 (https=)
CN (2) CN119143375A (https=)
WO (1) WO2020262702A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019151185A1 (ja) * 2018-01-31 2019-08-08 Hoya株式会社 磁気ディスク用ガラス基板の製造方法
WO2020111282A1 (ja) * 2018-11-30 2020-06-04 Hoya株式会社 ガラス板の製造方法、ガラス板の面取り方法、および磁気ディスクの製造方法
DE102020100051A1 (de) * 2020-01-03 2021-07-08 Schott Ag Verfahren zur Bearbeitung sprödharter Materialien
JP7523579B2 (ja) * 2020-11-25 2024-07-26 Hoya株式会社 ガラス板の製造方法、磁気ディスク用ガラス基板の製造方法、磁気ディスクの製造方法、及び円環形状のガラス板
WO2022163841A1 (ja) * 2021-01-28 2022-08-04 Hoya株式会社 ガラス板の製造方法、磁気ディスク用ガラス基板の製造方法、磁気ディスクの製造方法、およびガラス板の処理装置
JP2025069476A (ja) 2022-03-11 2025-05-01 Hoya株式会社 円盤状ガラス基板の製造方法、円環状ガラス基板の製造方法、磁気ディスク用ガラス基板の製造方法、円盤状ガラス基板、円環状ガラス基板、及び磁気ディスク用ガラス基板
CN114905343B (zh) * 2022-05-20 2023-06-30 广东工业大学 一种硬质颗粒光声共振辅助的玻璃加工方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002150546A (ja) * 2000-11-06 2002-05-24 Nippon Sheet Glass Co Ltd 情報記録媒体用ガラス基板の製造方法、及び該製造方法により製造された情報記録媒体用ガラス基板、並びに情報記録媒体
JP2006079800A (ja) * 2004-08-11 2006-03-23 Showa Denko Kk 磁気記録媒体用シリコン基板及びその製造方法並びに磁気記録媒体
JP2010519164A (ja) * 2007-02-23 2010-06-03 コーニング インコーポレイテッド 熱的エッジ仕上げ
JP2013004114A (ja) * 2011-06-13 2013-01-07 Asahi Glass Co Ltd 支持治具及び磁気記録媒体用ガラス基板の製造方法
JP2019011242A (ja) * 2015-12-28 2019-01-24 Hoya株式会社 円環状のガラス素板、円環状のガラス素板の製造方法、円環状のガラス基板の製造方法、及び磁気ディスク用ガラス基板の製造方法

Family Cites Families (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5096017A (en) * 1986-03-24 1992-03-17 Intersonics Incorporated Aero-acoustic levitation device and method
JPH0248423A (ja) * 1988-08-08 1990-02-19 Matsushita Electric Ind Co Ltd 面取り方法
US6795274B1 (en) * 1999-09-07 2004-09-21 Asahi Glass Company, Ltd. Method for manufacturing a substantially circular substrate by utilizing scribing
RU2200361C2 (ru) * 2000-07-13 2003-03-10 Государственное унитарное предприятие научно-исследовательский институт лазерной физики Модуль твердотельного пластинчатого лазера с диодной накачкой
JP4274708B2 (ja) * 2001-05-14 2009-06-10 Ｈｏｙａ株式会社 磁気記録媒体用ガラス基板及びその製造方法
US6521862B1 (en) * 2001-10-09 2003-02-18 International Business Machines Corporation Apparatus and method for improving chamfer quality of disk edge surfaces with laser treatment
JP2003160348A (ja) * 2001-11-21 2003-06-03 Nippon Sheet Glass Co Ltd 情報記録媒体用ガラス基板及びその製造方法
KR101213991B1 (ko) * 2005-12-16 2012-12-20 엘아이지에이디피 주식회사 기판 이송 장치 및 방법
US20080041833A1 (en) * 2006-08-21 2008-02-21 Nicholas Dominic Cavallaro Thermal tensioning during thermal edge finishing
US20080088830A1 (en) * 2006-10-16 2008-04-17 Shigeru Serikawa Optical system of detecting peripheral surface defect of glass disk and device of detecting peripheral surface defect thereof
JP4495752B2 (ja) * 2007-11-06 2010-07-07 東京エレクトロン株式会社 基板処理装置及び塗布装置
JP5180608B2 (ja) * 2008-01-30 2013-04-10 株式会社日立ハイテクノロジーズ ディスク表面の欠陥検査方法及び欠陥検査装置
US9346130B2 (en) * 2008-12-17 2016-05-24 Electro Scientific Industries, Inc. Method for laser processing glass with a chamfered edge
US8484590B2 (en) * 2009-06-02 2013-07-09 Jesse Conrad Newcomb Method of predicting electronic circuit floating gates
KR101142959B1 (ko) * 2009-06-29 2012-05-08 김영태 평판 정밀 플로팅 시스템
US8110279B2 (en) * 2009-11-30 2012-02-07 Corning Incorporated Method for improving the edge strength of tempered glass sheet articles
KR101196756B1 (ko) * 2010-12-30 2012-11-05 삼성코닝정밀소재 주식회사 강화유리 제조장치 및 방법
KR101248380B1 (ko) * 2010-12-30 2013-03-28 삼성코닝정밀소재 주식회사 패턴드 강화유리 제조 장치 및 방법
US8584490B2 (en) * 2011-02-18 2013-11-19 Corning Incorporated Laser cutting method
US9336810B2 (en) * 2011-04-27 2016-05-10 Hoya Corporation Method for manufacturing glass blank for magnetic disk, method for manufacturing glass substrate for magnetic disk
CN103687824B (zh) * 2011-07-20 2017-02-08 旭硝子株式会社 平板玻璃、平板玻璃的制造方法及平板玻璃的制造装置
JP5335983B2 (ja) * 2011-10-05 2013-11-06 Ｈｏｙａ株式会社 磁気ディスク用ガラス基板および磁気記録媒体
US9365446B2 (en) * 2012-05-14 2016-06-14 Richard Green Systems and methods for altering stress profiles of glass
WO2014050241A1 (ja) * 2012-09-28 2014-04-03 Hoya株式会社 磁気ディスク用ガラス基板、磁気ディスク、磁気ディスク用ガラス基板の製造方法
US9595286B2 (en) * 2013-03-01 2017-03-14 Hoya Corporation Glass substrate for magnetic disk and magnetic disk
JP5994022B2 (ja) 2013-04-30 2016-09-21 Hoya株式会社 研削砥石、磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法
JP6327823B2 (ja) 2013-09-30 2018-05-23 Hoya株式会社 磁気ディスク用ガラス基板の製造方法及び円盤形状のガラス基板
JP2015076115A (ja) * 2013-10-11 2015-04-20 旭硝子株式会社 磁気記録媒体用円盤状ガラス基板、及び磁気記録媒体用円盤状ガラス基板の製造方法
US10442719B2 (en) * 2013-12-17 2019-10-15 Corning Incorporated Edge chamfering methods
JP6270270B2 (ja) * 2014-03-17 2018-01-31 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
US9947572B2 (en) * 2014-03-26 2018-04-17 SCREEN Holdings Co., Ltd. Substrate processing apparatus
US9499908B2 (en) * 2015-02-13 2016-11-22 Eastman Kodak Company Atomic layer deposition apparatus
US20160240419A1 (en) * 2015-02-13 2016-08-18 Eastman Kodak Company Atomic-layer deposition substrate
US9499906B2 (en) * 2015-02-13 2016-11-22 Eastman Kodak Company Coating substrate using bernoulli atomic-layer deposition
DE102015104815A1 (de) * 2015-03-27 2016-09-29 Schott Ag Verfahren und Vorrichtung zum kontinuierlichen Trennen von Glas
US10384306B1 (en) * 2015-06-10 2019-08-20 Seagate Technology Llc Laser cutting array with multiple laser source arrangement
JP2018174005A (ja) 2015-09-02 2018-11-08 Ａｇｃ株式会社 情報記録媒体用ガラス基板の製造方法、情報記録媒体の製造方法、情報記録媒体用ガラス基板、並びに磁気記録媒体
US20190047893A1 (en) * 2016-01-29 2019-02-14 Corning Incorporated Thermally strengthened photochromic glass and related systems and methods
CN108602719A (zh) * 2016-01-31 2018-09-28 康宁股份有限公司 具有特征性近边缘延迟的热强化玻璃板
EP3408234A4 (en) * 2016-01-31 2019-10-23 Corning Incorporated THERMALLY REINFORCED GLASS SHEETS HAVING REDUCED REFRACTIVE INDEX OR BIRRAFRINGENCE INDEX
JP6938543B2 (ja) * 2016-05-06 2021-09-22 コーニング インコーポレイテッド 透明基板からの、輪郭設定された形状のレーザ切断及び取り外し
CN206537949U (zh) * 2016-11-02 2017-10-03 K.C.科技股份有限公司 基板移送装置以及包含其的基板处理系统与基板处理装置
US11081133B2 (en) * 2016-11-14 2021-08-03 Hoya Corporation Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium and glass spacer for magnetic recording and reproducing apparatus
CN109822215A (zh) * 2019-03-18 2019-05-31 华中科技大学 一种清除微粒的装置及方法
MY209913A (en) * 2019-07-31 2025-08-12 Hoya Corp Method for manufacturing annular glass plate, method for manufacturing glass substrate for magnetic disk, method for manufacturing magnetic disk, annular glass plate, glass substrate for magnetic disk, and magnetic disk
US12344545B2 (en) * 2019-08-20 2025-07-01 Hoya Corporation Method for manufacturing glass plate, method for manufacturing magnetic-disk glass substrate, and method for manufacturing magnetic disk
CN114787093A (zh) * 2019-12-13 2022-07-22 豪雅株式会社 磁记录介质基板用或磁记录再生装置用玻璃间隔物用的玻璃、磁记录介质基板、磁记录介质、磁记录再生装置用玻璃间隔物和磁记录再生装置
JP2022062525A (ja) * 2020-10-08 2022-04-20 株式会社東芝 磁気記録再生装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002150546A (ja) * 2000-11-06 2002-05-24 Nippon Sheet Glass Co Ltd 情報記録媒体用ガラス基板の製造方法、及び該製造方法により製造された情報記録媒体用ガラス基板、並びに情報記録媒体
JP2006079800A (ja) * 2004-08-11 2006-03-23 Showa Denko Kk 磁気記録媒体用シリコン基板及びその製造方法並びに磁気記録媒体
JP2010519164A (ja) * 2007-02-23 2010-06-03 コーニング インコーポレイテッド 熱的エッジ仕上げ
JP2013004114A (ja) * 2011-06-13 2013-01-07 Asahi Glass Co Ltd 支持治具及び磁気記録媒体用ガラス基板の製造方法
JP2019011242A (ja) * 2015-12-28 2019-01-24 Hoya株式会社 円環状のガラス素板、円環状のガラス素板の製造方法、円環状のガラス基板の製造方法、及び磁気ディスク用ガラス基板の製造方法

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