JPWO2020261523A1 - - Google Patents
Info
- Publication number
- JPWO2020261523A1 JPWO2020261523A1 JP2021528816A JP2021528816A JPWO2020261523A1 JP WO2020261523 A1 JPWO2020261523 A1 JP WO2020261523A1 JP 2021528816 A JP2021528816 A JP 2021528816A JP 2021528816 A JP2021528816 A JP 2021528816A JP WO2020261523 A1 JPWO2020261523 A1 JP WO2020261523A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Electrochemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2019/025750 WO2020261523A1 (ja) | 2019-06-27 | 2019-06-27 | 転写型感光性フィルム、樹脂硬化膜の形成方法及び樹脂硬化膜付基板の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2020261523A1 true JPWO2020261523A1 (https=) | 2020-12-30 |
Family
ID=74061558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021528816A Pending JPWO2020261523A1 (https=) | 2019-06-27 | 2019-06-27 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPWO2020261523A1 (https=) |
| WO (1) | WO2020261523A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024024864A1 (ja) * | 2022-07-28 | 2024-02-01 | 富士フイルム株式会社 | 感光性転写材料及びその製造方法、樹脂パターンの製造方法、並びに、回路配線の製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009096292A1 (ja) * | 2008-01-29 | 2009-08-06 | Asahi Kasei E-Materials Corporation | 感光性樹脂積層体 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101335181B1 (ko) * | 2009-12-30 | 2013-11-29 | 코오롱인더스트리 주식회사 | 드라이 필름 포토레지스트 |
| WO2016175220A1 (ja) * | 2015-04-28 | 2016-11-03 | 富士フイルム株式会社 | 積層体およびキット |
| MY196431A (en) * | 2015-07-30 | 2023-04-10 | Hitachi Chemical Co Ltd | Photosensitive Element, Resin Composition For Forming Barrier Layer, Method For Forming Resist Pattern, And Method For Producing Printed Wiring Board |
| JP2017111044A (ja) * | 2015-12-17 | 2017-06-22 | 凸版印刷株式会社 | 電気化学測定装置、および、電気化学測定方法 |
-
2019
- 2019-06-27 JP JP2021528816A patent/JPWO2020261523A1/ja active Pending
- 2019-06-27 WO PCT/JP2019/025750 patent/WO2020261523A1/ja not_active Ceased
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009096292A1 (ja) * | 2008-01-29 | 2009-08-06 | Asahi Kasei E-Materials Corporation | 感光性樹脂積層体 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020261523A1 (ja) | 2020-12-30 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20211209 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20221213 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20230613 |