JPWO2020209145A1 - - Google Patents
Info
- Publication number
- JPWO2020209145A1 JPWO2020209145A1 JP2021513588A JP2021513588A JPWO2020209145A1 JP WO2020209145 A1 JPWO2020209145 A1 JP WO2020209145A1 JP 2021513588 A JP2021513588 A JP 2021513588A JP 2021513588 A JP2021513588 A JP 2021513588A JP WO2020209145 A1 JPWO2020209145 A1 JP WO2020209145A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019076313 | 2019-04-12 | ||
JP2019076313 | 2019-04-12 | ||
PCT/JP2020/014872 WO2020209145A1 (ja) | 2019-04-12 | 2020-03-31 | 水現像性フレキソ印刷版原版、フレキソ印刷版および感光性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2020209145A1 true JPWO2020209145A1 (ja) | 2020-10-15 |
JP7242838B2 JP7242838B2 (ja) | 2023-03-20 |
Family
ID=72751111
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021513588A Active JP7242838B2 (ja) | 2019-04-12 | 2020-03-31 | 水現像性フレキソ印刷版原版、フレキソ印刷版および感光性樹脂組成物 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP7242838B2 (ja) |
WO (1) | WO2020209145A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US12019374B2 (en) | 2021-01-20 | 2024-06-25 | Asahi Kasei Kabushiki Kaisha | Photosensitive resin structure for flexographic printing plate and method for producing flexographic printing plate |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0651511A (ja) * | 1991-08-09 | 1994-02-25 | Toyo Ink Mfg Co Ltd | 感光性樹脂組成物、その製造方法及びフレキソ印刷用原版 |
JPH09106068A (ja) * | 1995-10-13 | 1997-04-22 | Toyobo Co Ltd | 感光性樹脂組成物 |
JPH09171261A (ja) * | 1995-12-20 | 1997-06-30 | Toagosei Co Ltd | アルカリ現像液 |
JP2014205926A (ja) * | 2013-04-11 | 2014-10-30 | 東レ株式会社 | 炭素繊維束 |
JP2015102641A (ja) * | 2013-11-22 | 2015-06-04 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及び感光性樹脂構成体 |
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2020
- 2020-03-31 JP JP2021513588A patent/JP7242838B2/ja active Active
- 2020-03-31 WO PCT/JP2020/014872 patent/WO2020209145A1/ja active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0651511A (ja) * | 1991-08-09 | 1994-02-25 | Toyo Ink Mfg Co Ltd | 感光性樹脂組成物、その製造方法及びフレキソ印刷用原版 |
JPH09106068A (ja) * | 1995-10-13 | 1997-04-22 | Toyobo Co Ltd | 感光性樹脂組成物 |
JPH09171261A (ja) * | 1995-12-20 | 1997-06-30 | Toagosei Co Ltd | アルカリ現像液 |
JP2014205926A (ja) * | 2013-04-11 | 2014-10-30 | 東レ株式会社 | 炭素繊維束 |
JP2015102641A (ja) * | 2013-11-22 | 2015-06-04 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及び感光性樹脂構成体 |
Also Published As
Publication number | Publication date |
---|---|
JP7242838B2 (ja) | 2023-03-20 |
WO2020209145A1 (ja) | 2020-10-15 |
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