JPWO2020194986A1 - - Google Patents
Info
- Publication number
- JPWO2020194986A1 JPWO2020194986A1 JP2021508782A JP2021508782A JPWO2020194986A1 JP WO2020194986 A1 JPWO2020194986 A1 JP WO2020194986A1 JP 2021508782 A JP2021508782 A JP 2021508782A JP 2021508782 A JP2021508782 A JP 2021508782A JP WO2020194986 A1 JPWO2020194986 A1 JP WO2020194986A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/201—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring small-angle scattering
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
- G01N23/20016—Goniometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
- G01N23/20025—Sample holders or supports therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
- G01N2223/054—Investigating materials by wave or particle radiation by diffraction, scatter or reflection small angle scatter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/307—Accessories, mechanical or electrical features cuvettes-sample holders
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/309—Accessories, mechanical or electrical features support of sample holder
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/33—Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts
- G01N2223/3306—Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts object rotates
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/611—Specific applications or type of materials patterned objects; electronic devices
- G01N2223/6116—Specific applications or type of materials patterned objects; electronic devices semiconductor wafer
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022210972A JP7401130B2 (ja) | 2019-03-28 | 2022-12-27 | 透過型小角散乱装置 |
| JP2022210973A JP7401131B2 (ja) | 2019-03-28 | 2022-12-27 | 透過型小角散乱装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019065112 | 2019-03-28 | ||
| JP2019065112 | 2019-03-28 | ||
| PCT/JP2020/000234 WO2020194986A1 (ja) | 2019-03-28 | 2020-01-08 | 透過型小角散乱装置 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022210972A Division JP7401130B2 (ja) | 2019-03-28 | 2022-12-27 | 透過型小角散乱装置 |
| JP2022210973A Division JP7401131B2 (ja) | 2019-03-28 | 2022-12-27 | 透過型小角散乱装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2020194986A1 true JPWO2020194986A1 (ja) | 2020-10-01 |
| JP7210065B2 JP7210065B2 (ja) | 2023-01-23 |
Family
ID=72609717
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021508782A Active JP7210065B2 (ja) | 2019-03-28 | 2020-01-08 | 透過型小角散乱装置 |
| JP2022210972A Active JP7401130B2 (ja) | 2019-03-28 | 2022-12-27 | 透過型小角散乱装置 |
| JP2022210973A Active JP7401131B2 (ja) | 2019-03-28 | 2022-12-27 | 透過型小角散乱装置 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022210972A Active JP7401130B2 (ja) | 2019-03-28 | 2022-12-27 | 透過型小角散乱装置 |
| JP2022210973A Active JP7401131B2 (ja) | 2019-03-28 | 2022-12-27 | 透過型小角散乱装置 |
Country Status (8)
| Country | Link |
|---|---|
| US (3) | US11754515B2 (ja) |
| JP (3) | JP7210065B2 (ja) |
| KR (2) | KR102650008B1 (ja) |
| CN (1) | CN113631913A (ja) |
| DE (1) | DE112020001594T5 (ja) |
| IL (1) | IL286449B2 (ja) |
| TW (2) | TWI808308B (ja) |
| WO (1) | WO2020194986A1 (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7458935B2 (ja) * | 2020-08-26 | 2024-04-01 | キオクシア株式会社 | 計測装置、及び、計測方法 |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004177248A (ja) * | 2002-11-27 | 2004-06-24 | Rigaku Corp | Ｘ線分析装置 |
| JP2005221363A (ja) * | 2004-02-05 | 2005-08-18 | Rigaku Corp | Ｘ線分析用試料支持装置及びｘ線分析装置 |
| JP2005221362A (ja) * | 2004-02-05 | 2005-08-18 | Rigaku Corp | Ｘ線分析装置及び試料分析システム |
| WO2007026461A1 (ja) * | 2005-08-29 | 2007-03-08 | Rigaku Corporation | 縦横小角ｘ線散乱装置及び小角ｘ線散乱の測定方法 |
| US20170307548A1 (en) * | 2016-04-22 | 2017-10-26 | Kla-Tencor Corporation | Beam Shaping Slit For Small Spot Size Transmission Small Angle X-Ray Scatterometry |
| WO2018016430A1 (ja) * | 2016-07-16 | 2018-01-25 | 株式会社リガク | 複合検査システム |
| JP2018028470A (ja) * | 2016-08-18 | 2018-02-22 | 株式会社リガク | Ｘ線回折装置 |
| US20180113084A1 (en) * | 2016-10-21 | 2018-04-26 | Kla-Tencor Corporation | Calibration Of A Small Angle X-Ray Scatterometry Based Metrology System |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5116014B2 (ja) * | 2007-06-21 | 2013-01-09 | 株式会社リガク | 小角広角ｘ線測定装置 |
| EP2326941B1 (de) * | 2008-09-24 | 2014-09-17 | GE Sensing & Inspection Technologies GmbH | Vorrichtung zur materialprüfung von prüfobjekten mittels röntgenstrahlung |
| US9606073B2 (en) * | 2014-06-22 | 2017-03-28 | Bruker Jv Israel Ltd. | X-ray scatterometry apparatus |
| KR102144281B1 (ko) * | 2014-10-14 | 2020-08-13 | 가부시키가이샤 리가쿠 | X선 박막 검사 장치 |
| WO2016092614A1 (ja) * | 2014-12-08 | 2016-06-16 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置、表示装置、及び欠陥分類装置 |
| US10684238B2 (en) | 2016-01-11 | 2020-06-16 | Bruker Technologies Ltd. | Method and apparatus for X-ray scatterometry |
| US10876978B2 (en) | 2016-07-15 | 2020-12-29 | Rigaku Corporation | X-ray inspecting device, X-ray thin film inspecting method, and method for measuring rocking curve |
| US11047806B2 (en) | 2016-11-30 | 2021-06-29 | Kla-Tencor Corporation | Defect discovery and recipe optimization for inspection of three-dimensional semiconductor structures |
| JP2018132491A (ja) * | 2017-02-17 | 2018-08-23 | 株式会社コベルコ科研 | 検査装置、検査システム、および検査方法 |
| KR102311459B1 (ko) * | 2017-03-14 | 2021-10-13 | 가부시키가이샤 코쿠사이 엘렉트릭 | 기판 처리 장치, 반도체 장치의 제조 방법, 및 프로그램 |
| US11073487B2 (en) | 2017-05-11 | 2021-07-27 | Kla-Tencor Corporation | Methods and systems for characterization of an x-ray beam with high spatial resolution |
| US10634628B2 (en) * | 2017-06-05 | 2020-04-28 | Bruker Technologies Ltd. | X-ray fluorescence apparatus for contamination monitoring |
| CN109387531B (zh) * | 2018-10-31 | 2022-11-15 | 宁波英飞迈材料科技有限公司 | 一种衍射消光摇摆曲线成像测量装置和方法 |
-
2020
- 2020-01-08 DE DE112020001594.7T patent/DE112020001594T5/de active Pending
- 2020-01-08 CN CN202080024801.5A patent/CN113631913A/zh active Pending
- 2020-01-08 IL IL286449A patent/IL286449B2/en unknown
- 2020-01-08 KR KR1020217030910A patent/KR102650008B1/ko active IP Right Grant
- 2020-01-08 US US17/442,169 patent/US11754515B2/en active Active
- 2020-01-08 KR KR1020247008987A patent/KR20240042152A/ko unknown
- 2020-01-08 JP JP2021508782A patent/JP7210065B2/ja active Active
- 2020-01-08 WO PCT/JP2020/000234 patent/WO2020194986A1/ja active Application Filing
- 2020-02-24 TW TW109105789A patent/TWI808308B/zh active
- 2020-02-24 TW TW112121553A patent/TW202340710A/zh unknown
-
2022
- 2022-12-27 JP JP2022210972A patent/JP7401130B2/ja active Active
- 2022-12-27 JP JP2022210973A patent/JP7401131B2/ja active Active
-
2023
- 2023-07-31 US US18/228,021 patent/US20230384248A1/en active Pending
- 2023-07-31 US US18/228,024 patent/US20230375485A1/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004177248A (ja) * | 2002-11-27 | 2004-06-24 | Rigaku Corp | Ｘ線分析装置 |
| JP2005221363A (ja) * | 2004-02-05 | 2005-08-18 | Rigaku Corp | Ｘ線分析用試料支持装置及びｘ線分析装置 |
| JP2005221362A (ja) * | 2004-02-05 | 2005-08-18 | Rigaku Corp | Ｘ線分析装置及び試料分析システム |
| WO2007026461A1 (ja) * | 2005-08-29 | 2007-03-08 | Rigaku Corporation | 縦横小角ｘ線散乱装置及び小角ｘ線散乱の測定方法 |
| US20170307548A1 (en) * | 2016-04-22 | 2017-10-26 | Kla-Tencor Corporation | Beam Shaping Slit For Small Spot Size Transmission Small Angle X-Ray Scatterometry |
| WO2018016430A1 (ja) * | 2016-07-16 | 2018-01-25 | 株式会社リガク | 複合検査システム |
| JP2018028470A (ja) * | 2016-08-18 | 2018-02-22 | 株式会社リガク | Ｘ線回折装置 |
| US20180113084A1 (en) * | 2016-10-21 | 2018-04-26 | Kla-Tencor Corporation | Calibration Of A Small Angle X-Ray Scatterometry Based Metrology System |
Non-Patent Citations (1)
| Title |
|---|
| "X線・中性子小角散乱で何がわかるか?", SPRING-8産業利用研究会(第26回)-放射光X線による金属材料評価技術-, JPN7020000657, 9 December 2008 (2008-12-09), JP, ISSN: 0004930569 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113631913A (zh) | 2021-11-09 |
| DE112020001594T5 (de) | 2021-12-23 |
| TW202340710A (zh) | 2023-10-16 |
| IL286449B1 (en) | 2023-11-01 |
| WO2020194986A1 (ja) | 2020-10-01 |
| KR20210144723A (ko) | 2021-11-30 |
| JP2023052136A (ja) | 2023-04-11 |
| JP7210065B2 (ja) | 2023-01-23 |
| TWI808308B (zh) | 2023-07-11 |
| KR102650008B1 (ko) | 2024-03-22 |
| TW202037909A (zh) | 2020-10-16 |
| IL286449B2 (en) | 2024-03-01 |
| JP2023033347A (ja) | 2023-03-10 |
| US20230384248A1 (en) | 2023-11-30 |
| KR20240042152A (ko) | 2024-04-01 |
| JP7401130B2 (ja) | 2023-12-19 |
| US20220170869A1 (en) | 2022-06-02 |
| IL286449A (en) | 2021-12-01 |
| JP7401131B2 (ja) | 2023-12-19 |
| US11754515B2 (en) | 2023-09-12 |
| US20230375485A1 (en) | 2023-11-23 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20211220 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220328 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20221128 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20221228 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7210065 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |