JPWO2020194516A1 - - Google Patents

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Publication number
JPWO2020194516A1
JPWO2020194516A1 JP2021508478A JP2021508478A JPWO2020194516A1 JP WO2020194516 A1 JPWO2020194516 A1 JP WO2020194516A1 JP 2021508478 A JP2021508478 A JP 2021508478A JP 2021508478 A JP2021508478 A JP 2021508478A JP WO2020194516 A1 JPWO2020194516 A1 JP WO2020194516A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2021508478A
Other versions
JP7283686B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of JPWO2020194516A1 publication Critical patent/JPWO2020194516A1/ja
Application granted granted Critical
Publication of JP7283686B2 publication Critical patent/JP7283686B2/ja
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Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/1312—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/0912—Electronics or drivers for the pump source, i.e. details of drivers or circuitry specific for laser pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14—Circuit arrangements
    • H05B41/30—Circuit arrangements in which the lamp is fed by pulses, e.g. flash lamp
    • H05B41/34—Circuit arrangements in which the lamp is fed by pulses, e.g. flash lamp to provide a sequence of flashes

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
JP2021508478A 2019-03-26 2019-03-26 高電圧パルス発生装置、ガスレーザ装置、及び電子デバイスの製造方法 Active JP7283686B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/012902 WO2020194516A1 (ja) 2019-03-26 2019-03-26 高電圧パルス発生装置、ガスレーザ装置、及び電子デバイスの製造方法

Publications (2)

Publication Number Publication Date
JPWO2020194516A1 true JPWO2020194516A1 (ja) 2020-10-01
JP7283686B2 JP7283686B2 (ja) 2023-05-30

Family

ID=72609123

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021508478A Active JP7283686B2 (ja) 2019-03-26 2019-03-26 高電圧パルス発生装置、ガスレーザ装置、及び電子デバイスの製造方法

Country Status (4)

Country Link
US (1) US20210367394A1 (ja)
JP (1) JP7283686B2 (ja)
CN (1) CN113383468B (ja)
WO (1) WO2020194516A1 (ja)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001217492A (ja) * 2000-02-01 2001-08-10 Ushio Inc 放電励起ガスレーザ装置
JP2004064935A (ja) * 2002-07-30 2004-02-26 Ushio Inc 高電圧パルス発生装置及びそれを用いた放電励起ガスレーザ装置
JP2004242409A (ja) * 2003-02-05 2004-08-26 Mitsubishi Electric Corp パルス発生装置
JP2005130576A (ja) * 2003-10-22 2005-05-19 Matsushita Electric Ind Co Ltd 電源装置
JP2005347586A (ja) * 2004-06-04 2005-12-15 Ushio Inc 巻線機器、巻線機器を用いた高電圧パルス発生回路、およびこの高電圧パルス発生回路を設けた放電励起ガスレーザ装置
JP2016506616A (ja) * 2012-11-28 2016-03-03 パー システムズ （ピーティーワイ） エルティーディー レーザ励起パルス化システム
WO2016152738A1 (ja) * 2015-03-25 2016-09-29 国立大学法人長岡技術科学大学 高電圧パルス発生装置及びガスレーザ装置
CN106452158A (zh) * 2016-09-30 2017-02-22 西安交通大学 一种变压器型组合波发生电路
CN106532412A (zh) * 2016-12-30 2017-03-22 华中科技大学 射频板条放电的二维电压分布模型及均压方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW393816B (en) * 1997-12-15 2000-06-11 Cymer Inc High pulse rate pulse power system
JP2004087645A (ja) * 2002-08-26 2004-03-18 Meidensha Corp パルス電源装置
US8238400B2 (en) * 2010-08-09 2012-08-07 Coherent Gmbh High-precision synchronization of pulsed gas-discharge lasers
CN102447213A (zh) * 2011-12-09 2012-05-09 中国科学院安徽光学精密机械研究所 一种高重复率全固态高压脉冲发生器
WO2016143105A1 (ja) * 2015-03-11 2016-09-15 ギガフォトン株式会社 エキシマレーザチャンバ装置
JP6608939B2 (ja) * 2015-09-14 2019-11-20 ギガフォトン株式会社 レーザシステム
CN109478757B (zh) * 2016-08-05 2021-04-16 极光先进雷射株式会社 气体激光装置
CN107069421B (zh) * 2017-02-28 2019-03-01 中国科学院合肥物质科学研究院 用于高重复率准分子激光的无二次放电高效激励电路

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001217492A (ja) * 2000-02-01 2001-08-10 Ushio Inc 放電励起ガスレーザ装置
JP2004064935A (ja) * 2002-07-30 2004-02-26 Ushio Inc 高電圧パルス発生装置及びそれを用いた放電励起ガスレーザ装置
JP2004242409A (ja) * 2003-02-05 2004-08-26 Mitsubishi Electric Corp パルス発生装置
JP2005130576A (ja) * 2003-10-22 2005-05-19 Matsushita Electric Ind Co Ltd 電源装置
JP2005347586A (ja) * 2004-06-04 2005-12-15 Ushio Inc 巻線機器、巻線機器を用いた高電圧パルス発生回路、およびこの高電圧パルス発生回路を設けた放電励起ガスレーザ装置
JP2016506616A (ja) * 2012-11-28 2016-03-03 パー システムズ （ピーティーワイ） エルティーディー レーザ励起パルス化システム
WO2016152738A1 (ja) * 2015-03-25 2016-09-29 国立大学法人長岡技術科学大学 高電圧パルス発生装置及びガスレーザ装置
CN106452158A (zh) * 2016-09-30 2017-02-22 西安交通大学 一种变压器型组合波发生电路
CN106532412A (zh) * 2016-12-30 2017-03-22 华中科技大学 射频板条放电的二维电压分布模型及均压方法

Also Published As

Publication number Publication date
CN113383468B (zh) 2024-04-09
CN113383468A (zh) 2021-09-10
WO2020194516A1 (ja) 2020-10-01
US20210367394A1 (en) 2021-11-25
JP7283686B2 (ja) 2023-05-30

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