JPWO2020148277A5 - - Google Patents

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JPWO2020148277A5
JPWO2020148277A5 JP2021541026A JP2021541026A JPWO2020148277A5 JP WO2020148277 A5 JPWO2020148277 A5 JP WO2020148277A5 JP 2021541026 A JP2021541026 A JP 2021541026A JP 2021541026 A JP2021541026 A JP 2021541026A JP WO2020148277 A5 JPWO2020148277 A5 JP WO2020148277A5
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Priority claimed from DE102019200376.1A external-priority patent/DE102019200376A1/en
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光回折構成要素（６４；１１７；１１８；１１９；１２０；１２１）であって、
－ ３つの回折構造レベル（Ｎ1～Ｎ3；Ｎ1～Ｎ4；Ｎ1～Ｎ5）を有する回折構造を含む周期的格子構造プロファイルを含み、
－ 前記３つの回折構造レベルが、参照平面を基準にして異なる構造深さを事前画定し、
－ 前記回折構造の配列は、第１の目標波長が前記周期的格子構造プロファイルによって回折される赤外線波長範囲の第１の目標波長λ1のまわりの波長範囲が、前記第１の目標波長λ1の少なくとも０次および／または±１次の回折で、互いに破壊的に干渉する少なくとも３つの異なる位相を有する放射線成分を有するようなものであり、
－ 前記回折構造レベル（Ｎ1～Ｎ3；Ｎ1～Ｎ4；Ｎ1～Ｎ5）が、周期走行方向（ｘ）に沿って規則的に繰り返される前記周期的格子構造プロファイルの格子周期（ｐ）のトポグラフィーを事前画定し、
－ 前記回折構造レベル（Ｎ1～Ｎ3；Ｎ1～Ｎ4；Ｎ1～Ｎ5）が、
－－ ゼロの参照高さに対応するニュートラル回折構造レベル（Ｎ2）と、
－－ 前記ニュートラル回折構造レベル（Ｎ2）を基準にしてλ1／４±２０％の光路長だけ高く配列された正回折構造レベル（Ｎ1）と、
－－ 前記ニュートラル回折構造レベル（Ｎ2）を基準にしてλ1／４±２０％の光路長だけ低く配列された負回折構造レベル（Ｎ3；Ｎ3，Ｎ4；Ｎ3，Ｎ4，Ｎ5）と
を含む、光回折構成要素。 an optically diffractive component (64; 117; 118; 119; 120; 121),
- comprising a periodic grating structure profile comprising diffractive structures with three diffractive structure levels (N 1 -N 3 ; N 1 -N 4 ; N 1 -N 5 ),
- the three diffractive structure levels predefine different structure depths with respect to a reference plane,
- said array of diffractive structures is such that a wavelength range around a first target wavelength λ 1 in the infrared wavelength range at which said first target wavelength is diffracted by said periodic grating structure profile is said first target wavelength λ 1 having at least three out-of-phase radiation components that destructively interfere with each other in at least the 0th and/or ±1st diffraction orders of
- said diffraction structure levels (N 1 -N 3 ; N 1 -N 4 ; N 1 -N 5 ) are grating periods ( predefining the topography of p);
- said diffraction structure levels (N 1 -N 3 ; N 1 -N 4 ; N 1 -N 5 ) are
-- a neutral diffractive structure level ( N2 ) corresponding to a reference height of zero;
-- a forward diffraction structure level (N 1 ) arranged higher than the neutral diffraction structure level (N 2 ) by an optical path length of λ 1 /4±20%;
-- Negative diffraction structure levels ( N3; N3 , N4 ; N3 , N4 , N 5 ). 前記周期的格子構造プロファイルの格子周期が、前記回折構造レベルの４つの周期セクションに細分され、前記４つの周期セクションのうちの２つが、前記ニュートラル回折構造レベル（Ｎ2）を有するニュートラル回折構造セクションとして具現化され、前記４つの格子周期セクションのうちの１つが、前記正回折構造レベルを有する正回折構造セクション（Ｎ1）として具現化され、前記４つの周期セクションのうちの１つが、前記負回折構造レベルを有する負回折構造セクション（Ｎ3）として具現化されることを特徴とする請求項１に記載の光回折構成要素。 A grating period of the periodic grating structure profile is subdivided into four periodic sections of the diffractive structure level, two of the four periodic sections being neutral diffractive structure sections having the neutral diffractive structure level ( N2 ). , one of said four grating period sections being embodied as a positive diffractive structure section (N 1 ) having said positive diffractive structure level and one of said four periodic sections being embodied as said negative 2. The optically diffractive component according to claim 1, characterized in that it is embodied as a negative diffractive structure section ( N3) with diffractive structure levels. 前記４つの周期セクションが、前記周期走行方向（ｘ）に沿って同じ長さ（ｘN）±２０％を有する
ことを特徴とする請求項２に記載の光回折構成要素。 3. A light-diffractive component according to claim 2, characterized in that the four periodic sections have the same length ( xN ) ±20% along the periodic travel direction (x). 前記４つの周期セクションの以下のシーケンス、すなわち、正回折構造レベル（Ｎ1）、ニュートラル回折構造レベル（Ｎ2）、負回折構造レベル（Ｎ3）、ニュートラル回折構造レベル（Ｎ2）を特徴とする請求項２または３に記載の光回折構成要素。 characterized by the following sequence of said four periodic sections: positive diffractive structure level (N 1 ), neutral diffractive structure level (N 2 ), negative diffractive structure level (N 3 ), neutral diffractive structure level (N 2 ) 4. A light diffractive component according to claim 2 or 3. 前記回折構造の前記配列は、前記周期的格子構造プロファイルによって回折される前記赤外線波長範囲の前記第１の目標波長λ1を含む目標波長範囲が、前記第１の目標波長λ1の少なくとも前記０次および／または±１次の回折で、互いに破壊的に干渉する少なくとも３つの異なる位相を有する放射線成分を有するようなものであり、前記目標波長範囲が、前記第１の目標波長λ1に加えて、それと異なる第２の目標波長λ2をさらに含み、前記回折構造の前記配列は、前記周期的格子構造プロファイルによって回折される前記赤外線波長範囲の前記第２の目標波長λ2のまわりの波長範囲が、前記第２の目標波長λ2の少なくとも前記０次および／または±１次の回折で、互いに破壊的に干渉する少なくとも３つの異なる位相を有する放射線成分をさらに有するようなものであり、前記２つの目標波長λ1およびλ2に対して、（λ1－λ2）2／（λ1＋λ2）2＜２０％が当てはまることを特徴とする請求項１～４のいずれかに記載の光回折構成要素。 The arrangement of the diffractive structures is such that a target wavelength range including the first target wavelength λ 1 in the infrared wavelength range diffracted by the periodic grating structure profile is at least the 0 of the first target wavelength λ 1 . having at least three out-of-phase radiation components destructively interfering with each other in the diffraction orders and/or ±1st orders, said target wavelength range being in addition to said first target wavelength λ 1 . and a second target wavelength λ 2 different therefrom, wherein said array of said diffractive structures comprises wavelengths around said second target wavelength λ 2 in said infrared wavelength range diffracted by said periodic grating structure profile. is such that the range further comprises at least three out-of-phase radiation components that destructively interfere with each other in at least the 0th and/or ±1st diffraction orders of the second target wavelength λ 2 ; 5. A method according to any one of claims 1 to 4, characterized in that for the two target wavelengths λ 1 and λ 2 (λ 1 -λ 2 ) 2 /(λ 1 +λ 2 ) 2 <20% holds true. The optical diffraction component of . 破壊的干渉によって少なくとも１つの目標波長（λN）を抑制するための光回折構成要素（３４；４６；４７；５７；５８；５９；６０；６４；７１；７６；８０；８６；９１；９２；９３；９４；９５；１１７；１１８；１１９；１２０；１２１）であって、
－ 参照平面を基準にして異なる構造深さ（ｄi）を事前画定する少なくとも３つの回折構造レベル（Ｎi）を含み、
－ 前記３つの回折構造レベル（Ｎi）が、少なくとも２つの回折構造グループ（３５，３６；６１，６２；６５，６６；７２，７３；７７，７８，７９；８１，８２，８３；８７，８８，８９；Ｎ1，Ｎ2；Ｎ2，Ｎ3；Ｎ3，Ｎ1；Ｎn，Ｎn+1）に割り当て可能であり、
－ 前記回折構造グループのうちの第１のもの（３５；６１；６５；７２；７７；８１；８７；Ｎn，Ｎn+1）が、０次の回折で第１の目標波長λ1を抑制するために具現化され、
－ 前記回折構造グループのうちの第２のもの（３６；６２；６６；７３；７８；８２；８８；Ｎn+1，Ｎn+2）が、前記０次の回折で第２の目標波長λ1を抑制するために具現化され、
－ 前記２つの目標波長λ1およびλ2に対して、（λ1－λ2）2／（λ1＋λ2）2＜２０％が当てはまり、
－ 前記回折構造レベル（Ｎi）のトポグラフィーが、２つのバイナリ回折構造グループ（３５，３６；６１，６２；６５，６６；７２，７３；７７，７８，７９；８１，８２，８３；８７，８８，８９）の重ね合わせとして記述され得るものであり、
－ 前記バイナリ回折構造グループの各々が、
－－ 第１の構造深さを有する第１の表面セクション（６１P；６２P）と、
－－ 第２の構造深さを有し、走行方向（ｘ）に沿って前記第１の表面セクション（６１P、６１N）と交互になる第２の表面セクション（６１N；６２N）と、
を有し、
－ 前記バイナリ回折構造グループ（３５，３６；６１，６２；６５，６６；７２，７３；７７，７８，７９；８１，８２，８３；８７，８８，８９；Ｎ1，Ｎ2；Ｎ2，Ｎ3；Ｎ3，Ｎ1；Ｎn，Ｎn+1）の各々の隣接する表面セクション（６１P，６１N；６２P，６２N）間の境界領域（Ｎ3／Ｎ1，Ｎ2／Ｎ4，Ｎ4／Ｎ3，Ｎ1／Ｎ2）が、直線状コースを有し、
－－ 前記２つのバイナリ回折構造グループ（３５，３６；６１，６２；６５，６６；７２，７３；７７，７８，７９；８１，８２，８３；８７，８８，８９；Ｎ1，Ｎ2；Ｎ2，Ｎ3；Ｎ3，Ｎ1；Ｎn，Ｎn+1）のうちの前記第１のものの第１の境界領域（Ｎ3／Ｎ1，Ｎ2／Ｎ4）、および
－－ 前記２つのバイナリ回折構造グループ（３５，３６；６１，６２；６５，６６；７２，７３；７７，７８，７９；８１，８２，８３；８７，８８，８９；Ｎ1，Ｎ2；Ｎ2，Ｎ3；Ｎ3，Ｎ1；Ｎn，Ｎn+1）のうちの前記第２のものの第２の境界領域（Ｎ4／Ｎ3，Ｎ1／Ｎ2）が、
－－ せいぜいそれらの直線状コースのセクションに沿って互いに重ね合わされる、光回折構成要素。 an optically diffractive component (34; 46; 47; 57; 58; 59; 60; 64; 71; 76; 80; 86; 91; 92 for suppressing at least one target wavelength (λ N ) by destructive interference; 93; 94; 95; 117; 118; 119; 120; 121),
- comprising at least three diffractive structure levels (N i ) predefining different structure depths (d i ) with respect to the reference plane,
- said three diffractive structure levels (N i ) comprise at least two diffractive structure groups (35,36; 61,62; 65,66; 72,73; 77,78,79; 81,82,83; 87, N1 , N2 ; N2 , N3; N3, N1; Nn, Nn +1 ) ;
- a first one of said group of diffractive structures (35; 61; 65; 72; 77; 81; 87; N n , N n+1 ) transmits a first target wavelength λ 1 in the 0th diffraction order; embodied to suppress,
- the second one of said group of diffractive structures (36; 62; 66; 73; 78; 82; 88; N n+1 , N n+2 ) has a second target wavelength in said 0th diffraction order; embodied to suppress λ1,
- for said two target wavelengths λ 1 and λ 2 , (λ 1 −λ 2 ) 2 /(λ 1 +λ 2 ) 2 < 20% holds,
- said diffractive structure level (N i ) topography comprises two binary diffractive structure groups (35,36; 61,62; 65,66; 72,73; 77,78,79; 81,82,83;87 , 88, 89), and
- each of said binary diffractive structure groups,
-- a first surface section (61 P ; 62 P ) having a first structure depth;
-- second surface sections (61 N ; 62 N ) having a second structural depth and alternating with said first surface sections (61 P , 61 N ) along the direction of travel (x); ,
has
- said binary diffraction structure group (35,36; 61,62; 65,66; 72,73; 77,78,79; 81,82,83; 87,88,89 ; N1, N2 ; N2 , N3; N3, N1; Nn , Nn+1 ) border regions ( N3 / N1 , N2 ) between adjacent surface sections ( 61P , 61N; 62P , 62N ). / N4 , N4 /N3 , N1/ N2 ) has a linear course,
-- the two binary diffraction structure groups (35, 36; 61, 62; 65, 66; 72, 73; 77, 78, 79; 81, 82, 83; 87, 88, 89; N2 , N3; N3, N1 ; Nn , Nn+1 ) of said first one (N3/N1 , N2 / N4 ), and -- 61,62; 65,66; 72,73; 77,78,79; 81,82,83; 87,88,89 ;N1, N2 ; N2 , N3; N3, N1; Nn, Nn+1 ) , the second boundary region ( N4 / N3 , N1 / N2 ) of the second one of
-- Optically diffractive components superimposed on each other along sections of their linear course at most. 前記２つのバイナリ回折構造グループ（６１，６２；６５，６６；７２，７３；７７，７８，７９；８１，８２，８３；８７，８８，８９；Ｎ1，Ｎ2；Ｎ2，Ｎ3；Ｎ3，Ｎ1；Ｎn，Ｎn+1）のうちの前記第１のものの前記第１の境界領域（Ｎ3／Ｎ1，Ｎ2／Ｎ4）および前記２つのバイナリ回折構造グループ（６１，６２；６５，６６；７２，７３；７７，７８，７９；８１，８２，８３；８７，８８，８９；Ｎ1，Ｎ2；Ｎ2，Ｎ3；Ｎ3，Ｎ1；Ｎn，Ｎn+1）のうちの前記第２のものの前記第２の境界領域（Ｎ4／Ｎ3，Ｎ1／Ｎ2）が、互いに完全に別個に延びることを特徴とする請求項６に記載の光回折構成要素。 65,66; 72,73; 77,78,79; 81,82,83; 87,88,89 ; N1, N2 ; N2 , N3; N 3 , N 1 ; N n , N n+1 ) of said first boundary region (N 3 /N 1 , N 2 /N 4 ) and said two binary diffraction structure groups ( 61,62;65,66;72,73; 77,78,79 ; 81,82,83 ; 87,88,89 ;N1 , N2 ; N2 , N3;N3,N1;Nn , N n+1 ) , wherein said second boundary regions (N 4 /N 3 , N 1 /N 2 ) of said second ones extend completely independently of each other. A light-diffractive component as described. 前記回折構造グループのうちの第１のもの（３５；６１；６５；７２；７７；８１；８７）が、第１の回折格子として具現化され、前記第１の回折格子が、格子表面（３３）に配列され、
－－ 第１の格子周期（ｐｈ；ｐ1）を有し、
－－ 第１の回折正構造（３７）と第１の回折負構造（３８）との間の、これらの第１の構造（３７，３８）をそれぞれ囲む前記格子表面（３３）の表面セクションに対して垂直な光路差として測定される第１の構造深さ（ｄｈ；ｄ1）を有し、
－ 前記回折構造グループのうちの第２のもの（３６；６２；６６；７３；７８；８２；８８）が、第２の回折格子として具現化され、前記第２の回折格子が、前記格子表面（３３）に配列され、
－－ 第２の格子周期（ｐｖ；ｐ2）を有し、
－－ 第２の回折正構造（４０）と第２の回折負構造（４１）との間の、これらの第２の構造（４０，４１）をそれぞれ囲む前記格子表面（３３）の表面セクションに対して垂直な光路差として測定される第２の構造深さ（ｄｖ；ｄ2）を有することを特徴とする請求項６または７に記載の光回折構成要素。 A first one of said diffraction structure groups (35; 61; 65; 72; 77; 81; 87) is embodied as a first diffraction grating, said first diffraction grating comprising a grating surface (33 ), and
-- having a first grating period (ph; p 1 ),
-- in the surface section of said grating surface (33) between a first diffractive positive structure (37) and a first diffractive negative structure (38) and surrounding these first structures (37, 38) respectively; having a first structure depth (dh; d 1 ) measured as the optical path difference perpendicular to
- a second one of said groups of diffraction structures (36; 62; 66; 73; 78; 82; 88) is embodied as a second diffraction grating, said second diffraction grating comprising said grating surface; (33) and
-- having a second grating period (pv; p 2 ),
-- in the surface section of said grating surface (33) between a second positive diffractive structure (40) and a second negative diffractive structure (41) and surrounding these second structures (40, 41) respectively; 8. A light-diffractive component according to claim 6 or 7 , characterized in that it has a second structure depth (dv; d2) measured as the optical path difference perpendicular to it. － 前記第１の格子周期（ｐｈ）が、前記第１の回折格子（３５）の第１の周期走行方向（３９）に沿って延び、
－ 前記第２の格子周期（ｐｖ）が、前記第２の回折格子（３６）の第２の周期走行方向（４２）に沿って延び、
－ 前記２つの周期走行方向（３９，４２）が、互いに平行に延びないことを特徴とする請求項８に記載の光回折構成要素。 - said first grating period (ph) extends along a first period running direction (39) of said first diffraction grating (35),
- said second grating period (pv) extends along a second period running direction (42) of said second grating (36),
- the light-diffractive component according to claim 8 , characterized in that the two periodic directions of travel (39, 42) do not run parallel to each other. 前記格子表面（３３）に配列された少なくとも１つのさらなる回折格子（４８）であり、
－ さらなる回折正構造（４９）およびさらなる回折負構造（５０）を有し、前記さらなる回折負構造（５０）の表面積に対する前記さらなる回折正構造（４９）の表面積の表面積比が０．９と１．１との間の範囲にあり、
－ さらなる格子周期（ｐｄ）を有し、
－ 前記さらなる回折正構造（４９）と前記さらなる回折負構造（５０）との間の、これらのさらなる構造（４９，５０）をそれぞれ囲む前記格子表面（３３）の表面セクションに対して垂直な光路差として測定されるさらなる構造深さ（ｄｄ）を有する、
少なくとも１つのさらなる回折格子（４８）を特徴とする請求項８または９に記載の光回折構成要素。 at least one further diffraction grating (48) arranged on said grating surface (33);
- a further diffractive positive structure (49) and a further diffractive negative structure (50) with a surface area ratio of the surface area of said further diffractive positive structure (49) to the surface area of said further diffractive negative structure (50) between 0.9 and 1 is in the range between .1 and
- has an additional grating period (pd),
- an optical path between said further diffractive positive structure (49) and said further diffractive negative structure (50) perpendicular to the surface sections of said grating surface (33) surrounding these further structures (49, 50) respectively; with additional structural depth (dd) measured as a difference,
10. Optically diffractive component according to claim 8 or 9 , characterized by at least one further diffraction grating (48). － １０よりも大きい、前記さらなる格子周期（ｐｄ）と前記さらなる構造深さ（ｄｄ）との間の比（ｐｄ／ｄｄ）、および／または
－ ０．９と１．１との間の範囲の、前記さらなる格子周期（ｐｄ）に対する前記第１の格子周期（ｐｈ）の周期比（ｐｈ／ｐｄ）、および／または
－－ 前記第１の格子周期（ｐｈ）が、前記第１の回折格子（３５）の第１の周期走行方向（３９）に沿って延び、
－－ 前記さらなる格子周期（ｐｄ）が、前記さらなる回折格子（４８）のさらなる周期走行方向（５１）に沿って延び、
－－ 前記２つの周期走行方向（３９，５１）が、互いに平行に延びないことを特徴とする請求項１０に記載の光回折構成要素。 - the ratio (pd/dd) between said further grating period (pd) and said further structure depth (dd) greater than 10, and/or - in the range between 0.9 and 1.1 , the period ratio (ph/pd) of said first grating period (ph) to said further grating period (pd), and/or -- said first grating period (ph) is greater than said first grating ( 35) extending along the first periodic direction of travel (39);
-- said further grating period (pd) extends along a further period running direction (51) of said further grating (48),
-- Light-diffractive component according to claim 10 , characterized in that the two periodic directions of travel (39, 51) do not run parallel to each other. 前記様々な回折構造グループ（３５，３６，４８）の前記回折正構造（３７，４０，４９）および前記回折負構造（３８，４１，５０）の前記表面区域が、前記格子表面（３３）全体に等しく寄与することを特徴とする請求項６～１１のいずれかに記載の光回折構成要素。 The surface areas of the positive diffractive structures (37,40,49) and the negative diffractive structures (38,41,50) of the various diffractive structure groups (35,36,48) extend over the entire grating surface (33). A light-diffractive component according to any one of claims 6 to 11 , characterized in that it contributes equally to 請求項１～１２のいずれかに記載の光回折構成要素（３４；４６；４７；５７；５８；５９；６０；６４；７１；７６；８０；８６；９１；９２；９３；９４；９５；１１７；１１８；１１９；１２０；１２１）を含む、投影露光装置で使用するためのコレクタ（２４）。 13. A light diffractive component (34; 46; 47; 57; 58; 59; 60; 64; 71; 76; 80; 86; 91; 92; 93; 94; 95; 117; 118; 119; 120; 121) for use in a projection exposure apparatus. 請求項１～１２のいずれかに記載の光回折構成要素（３４；４６；４７；５７；５８；５９；６０；６４；７１；７６；８０；８６；９１；９２；９３；９４；９５；１１７；１１８；１１９；１２０；１２１）を含む、ＥＵＶ投影露光装置で使用するためのＥＵＶコレクタとして具現化される、請求項１３に記載のコレクタ。 13. A light diffractive component (34; 46; 47; 57; 58; 59; 60; 64; 71; 76; 80; 86; 91; 92; 93; 94; 95; 117; 118; 119; 120; 121), embodied as an EUV collector for use in an EUV projection exposure apparatus. 前記コレクタミラーが、放射線（３）を焦点領域（２６）の方に導くように具現化され、前記光回折構成要素が、前記少なくとも１つの目標波長の前記放射線（３０）を前記焦点領域（２６）から離れたところに導くように具現化されることを特徴とする請求項１３または１４に記載のコレクタ。 The collector mirror is embodied to direct radiation (3) towards a focal region (26) and the light diffractive component directs the radiation (30) of the at least one target wavelength to the focal region (26). 15. A collector according to claim 13 or 14, characterized in that it is embodied so as to lead away from the ). 請求項１３～１５のいずれかに記載のコレクタ（２４）を含み、結像されるべき物体（１０）を配列することができる物体視野（４）を照明するための照明光学ユニット（６）を含む照明系。 an illumination optical unit (6) for illuminating an object field (4) in which an object (10) to be imaged can be arranged, comprising a collector (24) according to any of claims 13-15 Lighting system including. 請求項１６に記載の照明系を含み、基板（１１）が配列され得るものであり、結像されるべき物体（１０）のセクションが結像され得る像視野（８）に前記物体視野（４）を結像するための投影光学ユニット（７）を含む光学系。 17, comprising an illumination system according to claim 16, wherein the substrate (11) can be arranged such that a section of the object (10) to be imaged is imaged into an image field (8) in which the object field (4) can be imaged; ), comprising a projection optical unit (7) for imaging. 請求項１７に記載の光学系を含み、光源（２）を含む投影露光装置（１）。 A projection exposure apparatus (1) comprising an optical system according to claim 17 and comprising a light source (2). 前記光源（２）が、ＥＵＶ光源として具現化され、ＥＵＶ波長を発生するプラズマを生成するためにポンプ光源を含み、前記ポンプ光源が、プレパルス光波長を有するプレパルスを生成するために、および主パルス光波長を有する主パルスを生成するために具現化され、前記プレパルス光波長が前記主パルス光波長と異なることを特徴とする請求項１８に記載の投影露光装置（１）。 Said light source (2) is embodied as an EUV light source and comprises a pump light source for generating a plasma generating an EUV wavelength, said pump light source for generating a pre-pulse having a pre-pulse light wavelength and a main pulse 19. Projection exposure apparatus (1) according to claim 18, embodied for generating a main pulse having a light wavelength, said pre-pulse light wavelength being different from said main pulse light wavelength. 構造化構成要素を生成するための方法であって、以下の方法ステップ、すなわち、
－ レチクル（１０）およびウェハ（１１）を用意するステップと、
－ 請求項１８または１９に記載の前記投影露光装置の助けによって、前記レチクル（１０）の構造を前記ウェハ（１１）の感光層上に投影するステップと、
－ 前記ウェハ（１１）にミクロ構造および／またはナノ構造を生成するステップと
を含む、方法。 A method for generating structured components, comprising the following method steps:
- providing a reticle (10) and a wafer (11);
- projecting structures of the reticle (10) onto a photosensitive layer of the wafer (11) with the aid of the projection exposure apparatus according to claim 18 or 19;
- producing microstructures and/or nanostructures in said wafer (11). 請求項２０に記載の方法に従って生成される構造化構成要素。 A structured component generated according to the method of claim 20. 請求項１～１２のいずれかに記載の光回折構成要素を生成するための方法であって、以下のステップ、すなわち、
－ 基板を用意するステップと、
－ エッチング媒体のために前記基板と源との間に配列される、エッチング媒体を通さないマスク領域（１１３，１１５；１２８，１２９，１３２，１３３；１３８，１３９，１４２，１４３；１４９，１５０，１５３；１５８，１５９，１６２）を有し、介在マスク間隙（１１４，１１６；１３０，１３１，１３４，１３５；１４０，１４１，１４４，１４５；１５１，１５２，１５４；１６０，１６１，１６３）を有する少なくとも１つのマスク構造（１０５，１０６；１１１，１１２；１２６，１２７；１３６，１３７；１４７，１４８；１５６，１５７）を用意するステップと、
－ 前記エッチング媒体によって前記基板の第１のエッチングを行うステップと、
－ 前記マスク構造（１１１；１２６；１３６；１４７；１５６）をさらなるマスク構造（１１２；１２７；１３７；１４８；１５７）と交換する、および／または前記走行方向（ｘ）に沿って前記マスク構造（１０５；１２６）を変位させるステップと、
－ 前記エッチング媒体によって前記基板の第２のエッチングを行うステップと
を含む、方法。 A method for producing an optically diffractive component according to any of claims 1-12, comprising the steps of:
- providing a substrate;
- etching medium impervious mask areas (113, 115; 128, 129, 132, 133; 138, 139, 142, 143; 149, 150, 149, 150, 153; 158, 159, 162) with intervening mask gaps (114, 116; 130, 131, 134, 135; 140, 141, 144, 145; 151, 152, 154; 160, 161, 163) providing at least one mask structure (105, 106; 111, 112; 126, 127; 136, 137; 147, 148; 156, 157);
- performing a first etching of the substrate with the etching medium;
- replacing said mask structures (111; 126; 136; 147; 156) with further mask structures (112; 127; 137; 148; 157) and/or along said running direction (x) said mask structures ( 105; 126);
- performing a second etching of said substrate with said etching medium.
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