JPWO2020067118A1 - Dialkyl peroxide having a thioxanthone skeleton, a polymerizable composition containing the compound - Google Patents
Dialkyl peroxide having a thioxanthone skeleton, a polymerizable composition containing the compound Download PDFInfo
- Publication number
- JPWO2020067118A1 JPWO2020067118A1 JP2020549270A JP2020549270A JPWO2020067118A1 JP WO2020067118 A1 JPWO2020067118 A1 JP WO2020067118A1 JP 2020549270 A JP2020549270 A JP 2020549270A JP 2020549270 A JP2020549270 A JP 2020549270A JP WO2020067118 A1 JPWO2020067118 A1 JP WO2020067118A1
- Authority
- JP
- Japan
- Prior art keywords
- compound
- group
- meth
- polymerizable composition
- acrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical group C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 title claims abstract description 42
- 150000002978 peroxides Chemical class 0.000 title claims abstract description 34
- 150000001875 compounds Chemical class 0.000 title claims description 95
- 239000000203 mixture Substances 0.000 title claims description 82
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 15
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 14
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims abstract description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 10
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 6
- 125000001309 chloro group Chemical group Cl* 0.000 claims abstract description 6
- 125000001424 substituent group Chemical group 0.000 claims abstract description 6
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 5
- 239000003505 polymerization initiator Substances 0.000 claims description 43
- 238000010438 heat treatment Methods 0.000 claims description 25
- 229920005989 resin Polymers 0.000 claims description 21
- 239000011347 resin Substances 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 230000001678 irradiating effect Effects 0.000 claims description 13
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract description 13
- 229910052753 mercury Inorganic materials 0.000 abstract description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 53
- -1 peroxy ester Chemical class 0.000 description 53
- 239000000047 product Substances 0.000 description 31
- 238000000034 method Methods 0.000 description 27
- 238000003786 synthesis reaction Methods 0.000 description 27
- 230000015572 biosynthetic process Effects 0.000 description 26
- 239000002904 solvent Substances 0.000 description 21
- 239000011248 coating agent Substances 0.000 description 20
- 238000001723 curing Methods 0.000 description 20
- 238000001035 drying Methods 0.000 description 17
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 16
- 230000035945 sensitivity Effects 0.000 description 15
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- 239000000758 substrate Substances 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 12
- 239000000976 ink Substances 0.000 description 11
- 239000000853 adhesive Substances 0.000 description 10
- 230000001070 adhesive effect Effects 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 10
- 238000000354 decomposition reaction Methods 0.000 description 10
- 239000000178 monomer Substances 0.000 description 10
- 229940125782 compound 2 Drugs 0.000 description 9
- 239000003973 paint Substances 0.000 description 9
- 238000007639 printing Methods 0.000 description 9
- 150000003254 radicals Chemical class 0.000 description 9
- 238000003860 storage Methods 0.000 description 9
- 229920003067 (meth)acrylic acid ester copolymer Polymers 0.000 description 8
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 8
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical group C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 8
- 229940126214 compound 3 Drugs 0.000 description 8
- 239000003822 epoxy resin Substances 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 229920000647 polyepoxide Polymers 0.000 description 8
- 238000005160 1H NMR spectroscopy Methods 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 230000008033 biological extinction Effects 0.000 description 7
- 230000009977 dual effect Effects 0.000 description 7
- 238000002451 electron ionisation mass spectrometry Methods 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 6
- 239000003999 initiator Substances 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 6
- 238000009423 ventilation Methods 0.000 description 6
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 229940125904 compound 1 Drugs 0.000 description 5
- 150000004696 coordination complex Chemical class 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 5
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 description 4
- 235000017550 sodium carbonate Nutrition 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical class OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- UMGDCJDMYOKAJW-UHFFFAOYSA-N aminothiocarboxamide Natural products NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 3
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 3
- 239000000499 gel Substances 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 238000001879 gelation Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 235000011187 glycerol Nutrition 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 2
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- HEQOJEGTZCTHCF-UHFFFAOYSA-N 2-amino-1-phenylethanone Chemical class NCC(=O)C1=CC=CC=C1 HEQOJEGTZCTHCF-UHFFFAOYSA-N 0.000 description 2
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 2
- ZWVHTXAYIKBMEE-UHFFFAOYSA-N 2-hydroxyacetophenone Chemical class OCC(=O)C1=CC=CC=C1 ZWVHTXAYIKBMEE-UHFFFAOYSA-N 0.000 description 2
- DPNXHTDWGGVXID-UHFFFAOYSA-N 2-isocyanatoethyl prop-2-enoate Chemical compound C=CC(=O)OCCN=C=O DPNXHTDWGGVXID-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- 239000004480 active ingredient Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 229930006711 bornane-2,3-dione Natural products 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical class C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical group OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N itaconic acid Chemical class OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 238000007645 offset printing Methods 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 229920001610 polycaprolactone Polymers 0.000 description 2
- 239000004632 polycaprolactone Substances 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 235000011118 potassium hydroxide Nutrition 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 150000003623 transition metal compounds Chemical class 0.000 description 2
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 2
- 238000002371 ultraviolet--visible spectrum Methods 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- HYZQBNDRDQEWAN-LNTINUHCSA-N (z)-4-hydroxypent-3-en-2-one;manganese(3+) Chemical compound [Mn+3].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O HYZQBNDRDQEWAN-LNTINUHCSA-N 0.000 description 1
- FSJSYDFBTIVUFD-SUKNRPLKSA-N (z)-4-hydroxypent-3-en-2-one;oxovanadium Chemical compound [V]=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O FSJSYDFBTIVUFD-SUKNRPLKSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- FYADHXFMURLYQI-UHFFFAOYSA-N 1,2,4-triazine Chemical compound C1=CN=NC=N1 FYADHXFMURLYQI-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 1
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- XGIDEUICZZXBFQ-UHFFFAOYSA-N 1h-benzimidazol-2-ylmethanethiol Chemical compound C1=CC=C2NC(CS)=NC2=C1 XGIDEUICZZXBFQ-UHFFFAOYSA-N 0.000 description 1
- NMCYSHDHAZKJBA-UHFFFAOYSA-N 1h-benzimidazol-2-yloxymethanethiol Chemical compound C1=CC=C2NC(OCS)=NC2=C1 NMCYSHDHAZKJBA-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- GKZPEYIPJQHPNC-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)CO GKZPEYIPJQHPNC-UHFFFAOYSA-N 0.000 description 1
- VJZBTBIZXCDAMV-UHFFFAOYSA-N 2-(1,3-dioxo-5,6,7,7a-tetrahydro-4h-isoindol-3a-yl)ethyl prop-2-enoate Chemical compound C1CCCC2C(=O)NC(=O)C21CCOC(=O)C=C VJZBTBIZXCDAMV-UHFFFAOYSA-N 0.000 description 1
- MHDULSOPQSUKBQ-UHFFFAOYSA-N 2-(2-chlorophenyl)-1-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C(N1C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 MHDULSOPQSUKBQ-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- NLNVSTLNDJGLTL-UHFFFAOYSA-N 2-(4-ethoxynaphthalen-1-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C12=CC=CC=C2C(OCC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 NLNVSTLNDJGLTL-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- QTUVQQKHBMGYEH-UHFFFAOYSA-N 2-(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC=NC=N1 QTUVQQKHBMGYEH-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- LBEMXJWGHIEXRA-UHFFFAOYSA-N 2-[(2-carboxyphenyl)disulfanyl]benzoic acid Chemical compound OC(=O)C1=CC=CC=C1SSC1=CC=CC=C1C(O)=O LBEMXJWGHIEXRA-UHFFFAOYSA-N 0.000 description 1
- ZWOJQDQQXFCFQW-UHFFFAOYSA-N 2-chloro-7-propan-2-ylthioxanthen-9-one Chemical compound CC(C)C1=CC2=C(C=C1)SC3=C(C2=O)C=C(C=C3)Cl ZWOJQDQQXFCFQW-UHFFFAOYSA-N 0.000 description 1
- XUDBVJCTLZTSDC-UHFFFAOYSA-N 2-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=C XUDBVJCTLZTSDC-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- XRXANEMIFVRKLN-UHFFFAOYSA-N 2-hydroperoxy-2-methylbutane Chemical compound CCC(C)(C)OO XRXANEMIFVRKLN-UHFFFAOYSA-N 0.000 description 1
- BZGMEGUFFDTCNP-UHFFFAOYSA-N 2-hydroperoxy-2-methylpentane Chemical compound CCCC(C)(C)OO BZGMEGUFFDTCNP-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- AQLGEPGWXZOLIA-UHFFFAOYSA-N 2-methoxy-7-propan-2-ylthioxanthen-9-one Chemical compound CC(C)C1=CC2=C(C=C1)SC3=C(C2=O)C=C(C=C3)OC AQLGEPGWXZOLIA-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- NMUIIYJWWOPNIP-UHFFFAOYSA-N 2-pentan-3-ylidenebutanedioic acid Chemical compound CCC(CC)=C(C(O)=O)CC(O)=O NMUIIYJWWOPNIP-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 description 1
- HNNQYHFROJDYHQ-UHFFFAOYSA-N 3-(4-ethylcyclohexyl)propanoic acid 3-(3-ethylcyclopentyl)propanoic acid Chemical compound CCC1CCC(CCC(O)=O)C1.CCC1CCC(CCC(O)=O)CC1 HNNQYHFROJDYHQ-UHFFFAOYSA-N 0.000 description 1
- UJTRCPVECIHPBG-UHFFFAOYSA-N 3-cyclohexylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C2CCCCC2)=C1 UJTRCPVECIHPBG-UHFFFAOYSA-N 0.000 description 1
- RDFQSFOGKVZWKF-UHFFFAOYSA-N 3-hydroxy-2,2-dimethylpropanoic acid Chemical compound OCC(C)(C)C(O)=O RDFQSFOGKVZWKF-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- BWGRDBSNKQABCB-UHFFFAOYSA-N 4,4-difluoro-N-[3-[3-(3-methyl-5-propan-2-yl-1,2,4-triazol-4-yl)-8-azabicyclo[3.2.1]octan-8-yl]-1-thiophen-2-ylpropyl]cyclohexane-1-carboxamide Chemical compound CC(C)C1=NN=C(C)N1C1CC2CCC(C1)N2CCC(NC(=O)C1CCC(F)(F)CC1)C1=CC=CS1 BWGRDBSNKQABCB-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- CDSULTPOCMWJCM-UHFFFAOYSA-N 4h-chromene-2,3-dione Chemical compound C1=CC=C2OC(=O)C(=O)CC2=C1 CDSULTPOCMWJCM-UHFFFAOYSA-N 0.000 description 1
- FKBMTBAXDISZGN-UHFFFAOYSA-N 5-methyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)CCC2C(=O)OC(=O)C12 FKBMTBAXDISZGN-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- SDFDEPDISIEOKP-UHFFFAOYSA-N 6-methoxy-2-propan-2-ylthioxanthen-9-one Chemical compound CC(C)C1=CC2=C(C=C1)SC3=C(C2=O)C=CC(=C3)OC SDFDEPDISIEOKP-UHFFFAOYSA-N 0.000 description 1
- KNDQHSIWLOJIGP-UHFFFAOYSA-N 826-62-0 Chemical compound C1C2C3C(=O)OC(=O)C3C1C=C2 KNDQHSIWLOJIGP-UHFFFAOYSA-N 0.000 description 1
- KSMGAOMUPSQGTB-UHFFFAOYSA-N 9,10-dibutoxyanthracene Chemical compound C1=CC=C2C(OCCCC)=C(C=CC=C3)C3=C(OCCCC)C2=C1 KSMGAOMUPSQGTB-UHFFFAOYSA-N 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 239000004966 Carbon aerogel Substances 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- ZMDDERVSCYEKPQ-UHFFFAOYSA-N Ethyl (mesitylcarbonyl)phenylphosphinate Chemical compound C=1C=CC=CC=1P(=O)(OCC)C(=O)C1=C(C)C=C(C)C=C1C ZMDDERVSCYEKPQ-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- KFFQABQEJATQAT-UHFFFAOYSA-N N,N'-dibutylthiourea Chemical compound CCCCNC(=S)NCCCC KFFQABQEJATQAT-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- NUGPIZCTELGDOS-QHCPKHFHSA-N N-[(1S)-3-[4-(3-methyl-5-propan-2-yl-1,2,4-triazol-4-yl)piperidin-1-yl]-1-pyridin-3-ylpropyl]cyclopentanecarboxamide Chemical compound C(C)(C)C1=NN=C(N1C1CCN(CC1)CC[C@@H](C=1C=NC=CC=1)NC(=O)C1CCCC1)C NUGPIZCTELGDOS-QHCPKHFHSA-N 0.000 description 1
- LFZAGIJXANFPFN-UHFFFAOYSA-N N-[3-[4-(3-methyl-5-propan-2-yl-1,2,4-triazol-4-yl)piperidin-1-yl]-1-thiophen-2-ylpropyl]acetamide Chemical compound C(C)(C)C1=NN=C(N1C1CCN(CC1)CCC(C=1SC=CC=1)NC(C)=O)C LFZAGIJXANFPFN-UHFFFAOYSA-N 0.000 description 1
- IPCRBOOJBPETMF-UHFFFAOYSA-N N-acetylthiourea Chemical compound CC(=O)NC(N)=S IPCRBOOJBPETMF-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- HSZUHSXXAOWGQY-UHFFFAOYSA-N [2-methyl-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(C)(COC(=O)C=C)COC(=O)C=C HSZUHSXXAOWGQY-UHFFFAOYSA-N 0.000 description 1
- DBHQYYNDKZDVTN-UHFFFAOYSA-N [4-(4-methylphenyl)sulfanylphenyl]-phenylmethanone Chemical compound C1=CC(C)=CC=C1SC1=CC=C(C(=O)C=2C=CC=CC=2)C=C1 DBHQYYNDKZDVTN-UHFFFAOYSA-N 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005102 attenuated total reflection Methods 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 1
- 238000010504 bond cleavage reaction Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 150000001851 cinnamic acid derivatives Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229940120693 copper naphthenate Drugs 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- SEVNKWFHTNVOLD-UHFFFAOYSA-L copper;3-(4-ethylcyclohexyl)propanoate;3-(3-ethylcyclopentyl)propanoate Chemical compound [Cu+2].CCC1CCC(CCC([O-])=O)C1.CCC1CCC(CCC([O-])=O)CC1 SEVNKWFHTNVOLD-UHFFFAOYSA-L 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical class C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- 239000005548 dental material Substances 0.000 description 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-AATRIKPKSA-N diethyl fumarate Chemical compound CCOC(=O)\C=C\C(=O)OCC IEPRKVQEAMIZSS-AATRIKPKSA-N 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- ZJXZSIYSNXKHEA-UHFFFAOYSA-N ethyl dihydrogen phosphate Chemical compound CCOP(O)(O)=O ZJXZSIYSNXKHEA-UHFFFAOYSA-N 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000011899 heat drying method Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910000457 iridium oxide Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 150000002689 maleic acids Chemical class 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 1
- JDEJGVSZUIJWBM-UHFFFAOYSA-N n,n,2-trimethylaniline Chemical compound CN(C)C1=CC=CC=C1C JDEJGVSZUIJWBM-UHFFFAOYSA-N 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- OEDAJYOQELMMFC-UHFFFAOYSA-N octadecanoic acid;prop-2-enoic acid Chemical compound OC(=O)C=C.CCCCCCCCCCCCCCCCCC(O)=O OEDAJYOQELMMFC-UHFFFAOYSA-N 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- DOIRQSBPFJWKBE-UHFFFAOYSA-N phthalic acid di-n-butyl ester Natural products CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- MDDUHVRJJAFRAU-YZNNVMRBSA-N tert-butyl-[(1r,3s,5z)-3-[tert-butyl(dimethyl)silyl]oxy-5-(2-diphenylphosphorylethylidene)-4-methylidenecyclohexyl]oxy-dimethylsilane Chemical compound C1[C@@H](O[Si](C)(C)C(C)(C)C)C[C@H](O[Si](C)(C)C(C)(C)C)C(=C)\C1=C/CP(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 MDDUHVRJJAFRAU-YZNNVMRBSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000012855 volatile organic compound Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
- C07D335/12—Thioxanthenes
- C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
- C07D335/16—Oxygen atoms, e.g. thioxanthones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F4/00—Polymerisation catalysts
- C08F4/28—Oxygen or compounds releasing free oxygen
- C08F4/32—Organic compounds
- C08F4/34—Per-compounds with one peroxy-radical
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Polymerization Catalysts (AREA)
Abstract
一般式(1):
(式(1)中、R1、R2、R3およびR4は独立してメチル基またはエチル基を表し、R5は炭素数1〜6のアルキル基、またはフェニル基を表し、R6は独立した置換基であって、炭素数1〜4のアルキル基、炭素数1〜4のアルコキシ基、または塩素原子を表し、nは0から2の整数を表す。)で表されることを特徴とするチオキサントン基を有するジアルキルペルオキシド。当該ジアルキルペルオキシドは、高圧水銀ランプやLEDランプ等のランプから放射される波長365nm等の光を効率よく吸収してラジカルを発生できる光重合性と、熱によりラジカルを発生できる熱重合性を有する。General formula (1):
(In formula (1), R 1 , R 2 , R 3 and R 4 independently represent a methyl group or an ethyl group, R 5 represents an alkyl group or a phenyl group having 1 to 6 carbon atoms, and R 6 Is an independent substituent and represents an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, or a chlorine atom, and n represents an integer from 0 to 2). A dialkylperoxide having a characteristic thioxanthone group. The dialkyl peroxide has photopolymerizability capable of efficiently absorbing light having a wavelength of 365 nm or the like emitted from a lamp such as a high-pressure mercury lamp or an LED lamp to generate radicals, and thermopolymerizability capable of generating radicals by heat.
Description
本発明は、チオキサントン骨格を有するジアルキルペルオキシド、該化合物を含有する重合開始剤とラジカル重合性化合物を含有する重合性組成物およびその硬化物と、当該硬化物の製造方法に関する。 The present invention relates to a dialkyl peroxide having a thioxanthone skeleton, a polymerizable composition containing a polymerization initiator containing the compound and a radically polymerizable compound, a cured product thereof, and a method for producing the cured product.
高分子等を合成するために、重合開始剤として、熱または光、酸化−還元によりラジカルを発生させるラジカル重合開始剤が広く用いられている。特に、光重合開始剤は、光等の活性エネルギー線を吸収することで、結合開裂や水素引き抜き反応によりラジカルを発生させることができ、ラジカル重合性化合物の重合開始剤として利用される。例えば、α―ヒドロキシアセトフェノン誘導体やα―アミノアセトフェノン誘導体、アシルホスフィンオキサイド誘導体、ハロメチルトリアジン誘導体、ベンジルケタール誘導体、チオキサントン誘導体等が利用されている。 In order to synthesize a polymer or the like, a radical polymerization initiator that generates radicals by heat, light, or oxidation-reduction is widely used as a polymerization initiator. In particular, the photopolymerization initiator can generate radicals by bond cleavage or hydrogen abstraction reaction by absorbing active energy rays such as light, and is used as a polymerization initiator of a radically polymerizable compound. For example, α-hydroxyacetophenone derivative, α-aminoacetophenone derivative, acylphosphine oxide derivative, halomethyltriazine derivative, benzylketal derivative, thioxanthone derivative and the like are used.
上記のような光重合開始剤とラジカル重合性化合物からなる光重合性組成物は、光照射により速やかに硬化するため、速硬化性や低VOC等の観点から、コーティング剤や塗料、印刷インキ、感光性印刷版、接着剤、各種フォトレジスト等の用途に適用されている。 Since the photopolymerizable composition composed of the above-mentioned photopolymerization initiator and radically polymerizable compound is rapidly cured by light irradiation, from the viewpoint of quick curing and low VOC, coating agents, paints, printing inks, etc. It is applied to applications such as photosensitive printing plates, adhesives, and various photoresists.
一方、特許文献1には、光または熱によりラジカルを発生する分子内に過酸化結合(−O−O−)を有するベンゾフェノン骨格を有するペルオキシエステルを有効成分とする重合開始剤が開示されている。また、特許文献2には、その重合開始剤とラジカル重合性化合物からなる接着剤組成物が開示されており、光重合性と熱重合性を併せ持つデュアルキュアタイプの特性を利用して、常温での光の照射による硬化と、その後の加熱による硬化を行なうデュアルキュアにより、接着剤が強固な接着強度と高耐久性を発揮している。 On the other hand, Patent Document 1 discloses a polymerization initiator containing a peroxy ester having a benzophenone skeleton having a peroxide bond (-O-O-) in a molecule that generates radicals by light or heat as an active ingredient. .. Further, Patent Document 2 discloses an adhesive composition composed of the polymerization initiator and a radically polymerizable compound, which utilizes the characteristics of a dual cure type having both photopolymerizability and thermopolymerizability at room temperature. Due to the dual cure, which cures by irradiating with light and then by heating, the adhesive exhibits strong adhesive strength and high durability.
このようにデュアルキュアタイプの重合性組成物は、暗部硬化性の向上においても活用することができる。デュアルキュアタイプの重合性組成物は、例えば、光を吸収や散乱する顔料やフィラーが高濃度に配合された重合性組成物の硬化や、フラットパネルディスプレイの製造工程における保護カバー周辺の黒枠やタッチパネル電極の下部等の光が届かない箇所の硬化にも有効である。 As described above, the dual cure type polymerizable composition can also be utilized for improving the curability in the dark part. Dual-cure type polymerizable compositions include, for example, curing of polymerizable compositions containing high concentrations of pigments and fillers that absorb or scatter light, and black frames and touch panels around protective covers in the manufacturing process of flat panel displays. It is also effective for curing areas where light does not reach, such as the lower part of the electrode.
しかしながら、特許文献1や特許文献2に記載されているベンゾフェノン骨格を有するペルオキシエステルは、高圧水銀ランプやLEDランプから放射される波長365nmより長波長の光の吸収が十分でないため、光重合開始剤の最も重要な基本特性である感度が十分ではなく、更なる感度の向上が課題として挙げられる。 However, the peroxyester having a benzophenone skeleton described in Patent Document 1 and Patent Document 2 does not sufficiently absorb light having a wavelength longer than 365 nm emitted from a high-pressure mercury lamp or an LED lamp, and thus is a photopolymerization initiator. Sensitivity, which is the most important basic characteristic of LED, is not sufficient, and further improvement of sensitivity is an issue.
また、特許文献1や特許文献2に記載されているベンゾフェノン骨格を有するペルオキシエステルを含有する重合性組成物は、室温での保存安定性は良好であるものの、輸送時等において高温下に保管された際にゲル化してしまうことから、高温下での保存安定性の改善が課題として挙げられる。 Further, the polymerizable composition containing the peroxyester having a benzophenone skeleton described in Patent Document 1 and Patent Document 2 has good storage stability at room temperature, but is stored at a high temperature during transportation and the like. Since it gels at that time, improvement of storage stability at high temperature is an issue.
従って、上記課題を解決すべく、本発明は、高圧水銀ランプやLEDランプ等のランプから放射される波長365nm等の光を効率よく吸収してラジカルを発生できる光重合性と、熱によりラジカルを発生できる熱重合性を併せ持つチオキサントン骨格を有するジアルキルペルオキシドを提供するものである。 Therefore, in order to solve the above problems, the present invention has photopolymerizability capable of efficiently absorbing light having a wavelength of 365 nm or the like emitted from a lamp such as a high-pressure mercury lamp or an LED lamp to generate radicals, and radicals by heat. It provides a dialkyl peroxide having a thioxanthone skeleton that also has a thermopolymerizable property that can be generated.
さらに、本発明は、上記のチオキサントン骨格を有するジアルキルペルオキシドを含む重合開始剤とラジカル重合性化合物を含有する保存安定性に優れた重合性組成物およびその硬化物と、当該硬化物の製造方法を提供するものである。 Further, the present invention provides a polymerizable composition having an excellent storage stability and a cured product thereof, which contains a polymerization initiator containing a dialkyl peroxide having a thioxanthone skeleton and a radically polymerizable compound, and a method for producing the cured product. It is to provide.
即ち、本発明は、一般式(1):
また、本発明は、前記チオキサントン骨格を有するジアルキルペルオキシドを含む(a)重合開始剤および(b)ラジカル重合性化合物を含有する重合性組成物、および該重合性組成物から形成される硬化物と、当該硬化物の製造方法、に関する。 Further, the present invention comprises (a) a polymerization initiator containing a dialkyl peroxide having a thioxanthone skeleton, (b) a polymerizable composition containing a radically polymerizable compound, and a cured product formed from the polymerizable composition. , The method for producing the cured product.
本発明のチオキサントン骨格を有するジアルキルペルオキシドは、高圧水銀ランプやLEDランプ等のランプから放射される波長365nm等の光を効率よく吸収して効率よくラジカルを発生でき、かつ分子内に過酸化結合を有するので、光および熱重合開始剤として有用なものである。よって、当該チオキサントン骨格を有するジアルキルペルオキシドとラジカル重合性化合物を含む重合性組成物は、光の照射により良好に硬化でき、かつ光の届かない暗部でも熱により良好に硬化することができる。 The dialkyl peroxide having a thioxanthone skeleton of the present invention can efficiently absorb light having a wavelength of 365 nm or the like emitted from a lamp such as a high-pressure mercury lamp or an LED lamp, efficiently generate radicals, and form a peroxide bond in the molecule. Since it has, it is useful as a light and thermal polymerization initiator. Therefore, the polymerizable composition containing the dialkyl peroxide having the thioxanthone skeleton and the radically polymerizable compound can be satisfactorily cured by irradiation with light, and can be satisfactorily cured by heat even in a dark part where light does not reach.
また、本発明のチオキサントン骨格を有するジアルキルペルオキシドは、ペルオキシドとしては熱安定性の高いジアルキルペルオキシド構造であるため、当該化合物とラジカル重合性化合物を含有する重合性組成物は保存安定性に優れる。 Further, since the dialkyl peroxide having the thioxanthone skeleton of the present invention has a dialkyl peroxide structure having high thermal stability as a peroxide, the polymerizable composition containing the compound and the radically polymerizable compound is excellent in storage stability.
<チオキサントン骨格を有するジアルキルペルオキシド>
本発明のチオキサントン骨格を有するジアルキルペルオキシドは、下記一般式(1)で表すことができる。
The dialkyl peroxide having the thioxanthone skeleton of the present invention can be represented by the following general formula (1).
前記一般式(1)中、R1、R2、R3およびR4は独立してメチル基またはエチル基を表す。R1、R2、R3およびR4は、前記チオキサントン骨格を有するジアルキルペルオキシドの分解温度が高いため、重合性組成物の保存安定性が高くなる観点から、メチル基が好ましい。In the general formula (1), R 1 , R 2 , R 3 and R 4 independently represent a methyl group or an ethyl group. R 1 , R 2 , R 3 and R 4 are preferably methyl groups from the viewpoint of increasing the storage stability of the polymerizable composition because the decomposition temperature of the dialkyl peroxide having the thioxanthone skeleton is high.
前記一般式(1)中、R5は、炭素数が1〜6のアルキル基、またはフェニル基である。前記アルキル基は、直鎖であってもよく、分岐鎖であってもよい。R5の具体例としては、メチル基、エチル基、プロピル基、2,2−ジメチルプロピル基、フェニル基が挙げられる。これらの中でも、前記チオキサントン骨格を有するジアルキルペルオキシドの合成が容易である観点から、メチル基、エチル基、プロピル基であることが好ましい。前記チオキサントン骨格を有するジアルキルペルオキシドの分解温度が高いため、重合性組成物の保存安定性が高くなり、さらにランプの光に対する感度が高い点から、メチル基、エチル基であることがより好ましい。In the general formula (1), R 5 is an alkyl group or a phenyl group, having 1 to 6 carbon atoms. The alkyl group may be a straight chain or a branched chain. Specific examples of R 5 include a methyl group, an ethyl group, a propyl group, a 2,2-dimethylpropyl group and a phenyl group. Among these, a methyl group, an ethyl group, and a propyl group are preferable from the viewpoint of facilitating the synthesis of the dialkyl peroxide having the thioxanthone skeleton. Since the decomposition temperature of the dialkyl peroxide having a thioxanthone skeleton is high, the storage stability of the polymerizable composition is high, and the sensitivity to the light of the lamp is high, so that the methyl group and the ethyl group are more preferable.
前記一般式(1)中、チオキサントンに対するジアルキルペルオキシドの置換位置は、特に限定されないが、ランプの光に対する感度が高い点から、チオキサントン骨格の2位、3位、または4位に置換されていることが好ましく、合成が容易である観点から、チオキサントン骨格の2位または3位に置換されていることがより好ましい。 In the general formula (1), the substitution position of the dialkyl peroxide with respect to thioxanthone is not particularly limited, but it is substituted with the 2-position, 3-position, or 4-position of the thioxanthone skeleton from the viewpoint of high sensitivity to the light of the lamp. Is preferable, and from the viewpoint of easy synthesis, it is more preferable that the thioxanthone skeleton is substituted at the 2- or 3-position.
前記一般式(1)中、R6は独立した置換基であって、炭素数1〜4のアルキル基、炭素数1〜4のアルコキシ基、または塩素原子を表す。使用するランプの発光波長に対して、これら置換基にかかるプッシュ・プル効果より、前記チオキサントン骨格を有するジアルキルペルオキシドの光の吸収特性を調整することができ、ランプの光を効率よく吸収することができる。In the general formula (1), R 6 is an independent substituent and represents an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, or a chlorine atom. The light absorption characteristics of the dialkyl peroxide having the thioxanthone skeleton can be adjusted by the push-pull effect applied to these substituents with respect to the emission wavelength of the lamp to be used, and the light of the lamp can be efficiently absorbed. can.
前記一般式(1)中、nは0から2の整数を表す。前記チオキサントン骨格を有するジアルキルペルオキシドの合成が容易である観点から、nは0から1の整数が好ましく、0がより好ましい。 In the general formula (1), n represents an integer from 0 to 2. From the viewpoint of facilitating the synthesis of the dialkyl peroxide having a thioxanthone skeleton, n is preferably an integer of 0 to 1, and more preferably 0.
前記一般式(1)中、nが1から2の整数の場合、前記R6の置換位置は、特に限定されないが、ランプの光に対する感度が高い点から、チオキサントン骨格の6位または7位に置換されていることが好ましく、前記チオキサントン骨格を有するジアルキルペルオキシドの合成が容易である観点から、チオキサントン骨格の7位に置換されていることがより好ましい。In the general formula (1), when n is an integer of 1 to 2, the substitution position of R 6 is not particularly limited, but is set to the 6th or 7th position of the thioxanthone skeleton from the viewpoint of high sensitivity to the light of the lamp. It is preferably substituted, and it is more preferable that it is substituted at the 7-position of the thioxanthone skeleton from the viewpoint of facilitating the synthesis of the dialkyl peroxide having the thioxanthone skeleton.
前記R6の具体例としては、例えば、メチル基、エチル基、イソプロピル基、n−ブチル基等のアルキル基;メトキシ基、エトキシ基、n−プロピルオキシ基、sec−ブチルオキシ基、tert−ブチルオキシ基等のアルコキシ基;塩素原子等が挙げられる。ランプの光に対する感度が高い点から、メトキシ基、エトキシ基であることがより好ましい。Specific examples of the R 6 include alkyl groups such as methyl group, ethyl group, isopropyl group and n-butyl group; methoxy group, ethoxy group, n-propyloxy group, sec-butyloxy group and tert-butyloxy group. Alkyl groups such as; chlorine atoms and the like. A methoxy group or an ethoxy group is more preferable because the lamp has high sensitivity to light.
以下に本発明のチオキサントン骨格を有するジアルキルペルオキシドの具体例を以下に示すが、本発明はこれらに限定されるものではない。 Specific examples of the dialkyl peroxide having the thioxanthone skeleton of the present invention are shown below, but the present invention is not limited thereto.
前記チオキサントン骨格を有するジアルキルペルオキシドとしては、好ましくは化合物1から化合物9が挙げられ、より好ましくは化合物1、化合物2、化合物3、化合物7、化合物8が挙げられる。 Examples of the dialkyl peroxide having a thioxanthone skeleton include compounds 1 to 9, and more preferably compounds 1, compound 2, compound 3, compound 7, and compound 8.
<チオキサントン骨格を有するジアルキルペルオキシドの製造方法>
前記一般式(1)で表されるチオキサントン骨格を有するジアルキルペルオキシドの製造方法は、例えば、下記反応式のように、イソアルキル基置換チオキサントン誘導体を、金属錯体の存在下、ヒドロペルオキシドを反応させる工程(以下、工程(A)とも称す)を含む方法が挙げられる。なお、反応後には、余剰の原料等を減圧留去(除去)する工程や、精製工程を含んでも良い。
The method for producing a dialkyl peroxide having a thioxanthone skeleton represented by the general formula (1) is, for example, a step of reacting an isoalkyl group-substituted thioxanthone derivative with a hydroperoxide in the presence of a metal complex, as shown in the following reaction formula. Hereinafter, a method including the step (A)) can be mentioned. After the reaction, a step of distilling off (removing) excess raw materials under reduced pressure and a purification step may be included.
前記工程(A)において、前記イソアルキル基置換チオキサントン誘導体は、市販品を利用できる。なお、市販品がない場合、例えば、J.Chem.Soc.99,645(1911)に記載のように、2,2’−ジチオ二安息香酸を芳香族化合物と硫酸中で反応させることにより合成することができる。 In the step (A), a commercially available product can be used as the isoalkyl group-substituted thioxanthone derivative. If there is no commercially available product, for example, J.A. Chem. Soc. As described in 99,645 (1911), it can be synthesized by reacting 2,2'-dithiodibenzoic acid with an aromatic compound in sulfuric acid.
前記工程(A)において、ヒドロペルオキシドは、イソアルキル基置換チオキサントン誘導体1.0モルに対して、目的物の収率性を高める観点から、0.8モル以上反応させることが好ましく、1.0モル以上反応させることがより好ましく、そして、10.0モル以下反応させることが好ましく、6.0モル以下反応させることがより好ましい。なお、ヒドロペルオキシドは、市販品を利用でき、市販品がない場合、特開昭58−72557号公報等に記載の公知の合成法に準じて合成することができる。 In the step (A), the hydroperoxide is preferably reacted with 1.0 mol of the isoalkyl group-substituted thioxanthone derivative in an amount of 0.8 mol or more, preferably 1.0 mol, from the viewpoint of increasing the yield of the target product. The above reaction is more preferable, the reaction is preferably 10.0 mol or less, and the reaction is more preferably 6.0 mol or less. As the hydroperoxide, a commercially available product can be used, and if there is no commercially available product, the hydroperoxide can be synthesized according to a known synthesis method described in JP-A-58-72557 and the like.
前記工程(A)において、金属錯体は、第4および第5周期の遷移金属の中から選ばれる金属の金属錯体を用いることができる。金属錯体の金属としては、例えば、銅、コバルト、マンガン、鉄、クロム、亜鉛などであり、配位子としては、例えば、臭素、塩素等のハロゲン、硫酸、リン酸、硝酸、炭酸等の鉱酸、ギ酸、酢酸、ナフテン酸、オクテン酸、グルコン酸等の有機酸、シアン、アセチルアセトナート等が挙げられる。金属錯体は、ヒドロペルオキシド1.0モルに対して、目的物の収率性を高める観点から、0.0001モル以上使用することが好ましく、0.001モル以上使用することがより好ましく、そして、1.0モル以下使用することが好ましく、0.1モル以下使用することがより好ましい。 In the step (A), as the metal complex, a metal complex of a metal selected from the transition metals of the 4th and 5th periods can be used. Examples of the metal of the metal complex include copper, cobalt, manganese, iron, chromium and zinc, and examples of the ligand include halogens such as bromine and chlorine, and ores such as sulfuric acid, phosphoric acid, nitrate and carbon dioxide. Examples thereof include organic acids such as acid, formic acid, acetic acid, naphthenic acid, octenoic acid and gluconic acid, cyanide and acetylacetonate. The metal complex is preferably used in an amount of 0.0001 mol or more, more preferably 0.001 mol or more, and more preferably 0.001 mol or more, based on 1.0 mol of hydroperoxide, from the viewpoint of increasing the yield of the target product. It is preferable to use 1.0 mol or less, and more preferably 0.1 mol or less.
前記工程(A)において、反応温度は、目的物の収率性を高める観点から、0℃以上であることが好ましく、20℃以上であることがより好ましく、そして、100℃以下であることが好ましく、80℃以下であることがより好ましい。反応時間は、原料や反応温度等によって異なるので一概には決定できないが、通常、目的物の収率性を高める観点から、1時間から60時間が好ましい。 In the step (A), the reaction temperature is preferably 0 ° C. or higher, more preferably 20 ° C. or higher, and 100 ° C. or lower from the viewpoint of increasing the yield of the target product. It is preferably 80 ° C. or lower, more preferably 80 ° C. or lower. The reaction time cannot be unconditionally determined because it varies depending on the raw material, the reaction temperature, and the like, but is usually preferably 1 hour to 60 hours from the viewpoint of increasing the yield of the target product.
前記工程(A)において、有機溶媒を使用することが好ましく、有機溶媒としては、例えば、ベンゼン、トルエン、クロロベンゼン、o−ジクロロベンゼン、ニトロベンゼン等を使用することができる。前記有機溶媒は、単独で用いてもよく2種類以上を併用してもよい。前記有機溶媒の使用量は、通常、原料の合計量100質量部に対して50〜1000質量部程度である。有機溶媒は工程(A)の後に留去することで、チオキサントン骨格を有するジアルキルペルオキシドを取り出してもよく、取り扱い性の向上や熱分解時の危険性を低減させるため、トリアジンペルオキシド誘導体を有機溶媒の希釈品として使用してもよい。 In the step (A), it is preferable to use an organic solvent, and as the organic solvent, for example, benzene, toluene, chlorobenzene, o-dichlorobenzene, nitrobenzene and the like can be used. The organic solvent may be used alone or in combination of two or more. The amount of the organic solvent used is usually about 50 to 1000 parts by mass with respect to 100 parts by mass of the total amount of the raw materials. The organic solvent may be distilled off after the step (A) to take out the dialkyl peroxide having a thioxanthone skeleton, and in order to improve the handleability and reduce the risk at the time of thermal decomposition, the triazine peroxide derivative is used as the organic solvent. It may be used as a diluted product.
前記工程(A)は、常圧、加圧、減圧下の何れの条件化でも実施できるが、窒素等の不活性ガス雰囲気で実施することが好ましい。 The step (A) can be carried out under any of the conditions of normal pressure, pressurization and reduced pressure, but it is preferably carried out in an atmosphere of an inert gas such as nitrogen.
前記精製工程としては、余剰の原料や副生物を除去するために、例えば、イオン交換水や、炭酸水素ナトリウム、炭酸水素カリウム、炭酸ナトリウム、炭酸カリウム、水酸化ナトリウム、水酸化カリウム等の塩基性水溶液、亜硫酸ナトリウム水溶液等の塩基性水溶液や、塩酸や硫酸等の酸性水溶液を用いて洗浄し、目的物を精製する工程が挙げられる。 In the purification step, in order to remove excess raw materials and by-products, for example, ion-exchanged water or basicity such as sodium hydrogen carbonate, potassium hydrogen carbonate, sodium carbonate, potassium carbonate, sodium hydroxide, potassium hydroxide and the like Examples thereof include a step of purifying the target product by washing with a basic aqueous solution such as an aqueous solution or an aqueous solution of sodium carbonate, or an acidic aqueous solution such as hydrochloric acid or sulfuric acid.
<重合性組成物>
本発明の重合性組成物は、前記一般式(1)で表されるチオキサントン骨格を有するジアルキルペルオキシドを含む(a)重合開始剤、および(b)ラジカル重合性化合物を含有する。さらに、重合性組成物は、(c)アルカリ可溶性樹脂を含有することで現像性を付与することができる。また、重合性組成物は、その他の成分を適宜組み合わせて含有させることができる。<Polymerizable composition>
The polymerizable composition of the present invention contains (a) a polymerization initiator containing a dialkyl peroxide having a thioxanthone skeleton represented by the general formula (1), and (b) a radically polymerizable compound. Further, the polymerizable composition can be imparted with developability by containing (c) an alkali-soluble resin. In addition, the polymerizable composition can contain other components in an appropriate combination.
<(a)重合開始剤>
本発明の(a)重合開始剤は、前記一般式(1)で表されるチオキサントン骨格を有するジアルキルペルオキシドを含有する。(a)重合開始剤は、活性エネルギー線または熱により分解し、発生したラジカルが(b)ラジカル重合性化合物の重合(硬化)を開始する働きを有する。チオキサントン骨格を有するジアルキルペルオキシドは、単独で用いてもよく2種類以上を併用してもよい。<(A) Polymerization initiator>
The (a) polymerization initiator of the present invention contains a dialkyl peroxide having a thioxanthone skeleton represented by the general formula (1). The (a) polymerization initiator has a function of being decomposed by active energy rays or heat, and the generated radicals (b) initiating the polymerization (curing) of the radically polymerizable compound. The dialkyl peroxide having a thioxanthone skeleton may be used alone or in combination of two or more.
また、前記(a)重合開始剤は、チオキサントン骨格を有するジアルキルペルオキシド以外の重合開始剤(以下、他の重合開始剤とも称す)を含有することができる。吸収帯の異なる2種類以上のチオキサントン骨格を有するジアルキルペルオキシドや他の重合開始剤を使用することで、例えば、高圧水銀ランプ等の複数の波長の光が放射されるランプに対し、重合性組成物の高感度化を図ることができる。また、重合性組成物に含まれる(b)ラジカル重合性化合物の重合性、重合性組成物に含まれる光を吸収や散乱する顔料等の種類、硬化物の膜厚等を考慮して、他の重合開始剤を用いることで、重合性組成物の表面硬化性や深部硬化性、透明性等を改良することができる。 In addition, the (a) polymerization initiator may contain a polymerization initiator (hereinafter, also referred to as another polymerization initiator) other than the dialkyl peroxide having a thioxanthone skeleton. By using a dialkyl peroxide having two or more types of thioxanthone skeletons having different absorption bands or another polymerization initiator, a polymerizable composition is used for a lamp that emits light of multiple wavelengths, for example, a high-pressure mercury lamp. It is possible to increase the sensitivity of the. In addition, in consideration of (b) the polymerizable property of the radically polymerizable compound contained in the polymerizable composition, the type of pigment or the like that absorbs or scatters light contained in the polymerizable composition, the film thickness of the cured product, etc. By using the above-mentioned polymerization initiator, the surface curability, deep curability, transparency and the like of the polymerizable composition can be improved.
前記他の重合開始剤としては、公知のものが使用でき、例えば、1−ヒドロキシシクロヘキシルフェニルケトン、2−ヒドロキシ−2−メチル−プロピオフェノン、4’−(2−ヒドロキシエトキシ)−2−ヒドロキシ−2−メチルプロピオフェノン、2−ヒロドキシ−1−(4−(4−(2−ヒドロキシ−2−メチルプロピオニル)ベンジル)フェニル)−2−メチルプロパン−1−オン等のα―ヒドロキシアセトフェノン誘導体;2−メチル−4’−メチルチオ−2−モルホリノプロピオフェノン、2−ベンジル−2−(N,N−ジメチルアミノ)−1−(4−モルホリノフェニル)ブタン−1−オン、2−(ジメチルアミノ)−2−(4−メチルベンジル)−1−(4−モルホリノフェニル)ブタン−1−オン等のα―アミノアセトフェノン誘導体;ジフェニル−2,4,6−トリメチルベンゾイルホスフィンオキシド、フェニルビス(2,4,6−トリメチルベンゾイル)ホスフィンオキシド、エチル(メシチルカルボニル)フェニルホスフィナート等のアシルホスフィンオキサイド誘導体;1−[4−(フェニルチオ)フェニル]オクタン−1,2−ジオン−2−(O−ベンゾイルオキシム)、1−[({1−[9−エチル−6−(2−メチルベンゾイル)−9H−カルバゾール−3−イル]エチリデン}アミノ)オキシ]エタノン、等のオキシムエステル誘導体;2−(4−メトキシフェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(3,4−ジメトキシスチリル)−4,6−ビス(トリクロロメチル)1,3,5−トリアジン、2−(4−エトキシナフチル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン等のハロメチルトリアジン誘導体;2,2−ジメトキシ−2−フエニルアセトフエノン等のベンジルケタール誘導体;イソプロピルチオキサントン等のチオキサントン誘導体、4−(4−メチルフェニルチオ)ベンゾフェノン等のベンゾフェノン誘導体;3−ベンゾイルー7−ジエチルアミノクマリン、3,3‘−カルボニルビス(7−ジエチルアミノクマリン)等のクマリン誘導体;2−(2−クロロフェニル)−1−[2−(2−クロロフェニル)−4,5−ジフェニル−1,3−ジアゾール−2−イル]−4,5−ジフェニルイミダゾール等のイミダゾール誘導体;3,3‘、4,4’−テトラキス(tert−ブチルペルオキシカルボニル)ベンゾフェノン、ジベンゾイルペルオキシド等の有機過酸化物;アゾビスイソブチロニトリル等のアゾ化合物;カンファーキノン等が挙げられる。他の重合開始剤は、単独で用いてもよく2種類以上を併用してもよい。 As the other polymerization initiator, known ones can be used, for example, 1-hydroxycyclohexylphenylketone, 2-hydroxy-2-methyl-propiophenone, 4'-(2-hydroxyethoxy) -2-hydroxy. Α-Hydroxyacetophenone derivatives such as -2-methylpropiophenone, 2-hirodoxy-1- (4- (4- (2-hydroxy-2-methylpropionyl) benzyl) phenyl) -2-methylpropan-1-one 2-Methyl-4'-methylthio-2-morpholinopropiophenone, 2-benzyl-2- (N, N-dimethylamino) -1- (4-morpholinophenyl) butane-1-one, 2- (dimethyl) Α-Aminoacetophenone derivatives such as amino) -2- (4-methylbenzyl) -1- (4-morpholinophenyl) butane-1-one; diphenyl-2,4,6-trimethylbenzoylphosphine oxide, phenylbis (2) , 4,6-trimethylbenzoyl) phosphine oxide, acylphosphine oxide derivatives such as ethyl (mesitylcarbonyl) phenylphosphinate; 1- [4- (phenylthio) phenyl] octane-1,2-dione-2- (O) -Oxime ester derivatives such as-benzoyloxime), 1-[({1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-3-yl] etylidene} amino) oxy] etanone; 2- (4-Methenylphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (3,4-dimethoxystyryl) -4,6-bis (trichloromethyl) 1,3,5 -Halomethyltriazine derivatives such as -triazine, 2- (4-ethoxynaphthyl) -4,6-bis (trichloromethyl) -1,3,5-triazine; 2,2-dimethoxy-2-phenylacetophenylone and the like. Benzyl ketal derivatives; thioxanthone derivatives such as isopropylthioxanthone, benzophenone derivatives such as 4- (4-methylphenylthio) benzophenone; Kumarin derivative; imidazole derivative such as 2- (2-chlorophenyl) -1- [2- (2-chlorophenyl) -4,5-diphenyl-1,3-diazol-2-yl] -4,5-diphenylimidazole; 3,3', 4,4'-tetrakis (tert-butylperoxycarbonyl) Organic peroxides such as nzophenone and dibenzoyl peroxide; azo compounds such as azobisisobutyronitrile; camphorquinone and the like can be mentioned. The other polymerization initiators may be used alone or in combination of two or more.
前記(a)重合開始剤の含有量は、(b)ラジカル重合性化合物100質量部に対して、0.1から40質量部であることが好ましく、0.5から20質量部であることがより好ましく、1から15質量部であることがさらに好ましい。(a)重合開始剤の含有量は、(b)ラジカル重合性化合物100質量部に対して、0.1質量部未満では硬化反応が進行しないため好ましくない。また、(a)重合開始剤の含有量は、(b)ラジカル重合性化合物100質量部に対して、40質量部より多い場合、(b)ラジカル重合性化合物への溶解度が飽和に達し、重合性組成物の成膜時に(a)重合開始剤の結晶が析出し、皮膜表面の荒れが問題になる場合や、(a)重合開始剤の分解残渣の増加により、硬化物の塗膜の強度が低下する場合があるため、好ましくない。 The content of the (a) polymerization initiator is preferably 0.1 to 40 parts by mass and 0.5 to 20 parts by mass with respect to 100 parts by mass of the (b) radically polymerizable compound. More preferably, it is 1 to 15 parts by mass. The content of the (a) polymerization initiator is not preferable if it is less than 0.1 parts by mass with respect to 100 parts by mass of the (b) radically polymerizable compound because the curing reaction does not proceed. Further, when the content of (a) the polymerization initiator is more than 40 parts by mass with respect to 100 parts by mass of (b) the radically polymerizable compound, (b) the solubility in the radically polymerizable compound reaches saturation and polymerization is achieved. Strength of the coating film of the cured product due to (a) precipitation of crystals of the polymerization initiator during film formation of the sex composition and roughening of the film surface, or (a) increase in decomposition residue of the polymerization initiator. Is not preferable because it may decrease.
なお、前記(a)重合開始剤に、前記他の重合開始剤を含む場合、他の重合開始剤の割合は、ランプ等から放射される波長等に応じて適宜設定できるが、例えば、(a)重合開始剤中、80質量%以下、50質量%以下が例示できる。 When the (a) polymerization initiator contains the other polymerization initiator, the proportion of the other polymerization initiator can be appropriately set according to the wavelength emitted from the lamp or the like, and for example, (a). ) 80% by mass or less and 50% by mass or less can be exemplified in the polymerization initiator.
<(b)ラジカル重合性化合物>
本発明の(b)ラジカル重合性化合物としては、エチレン性不飽和基を有する化合物を好ましく用いることができる。(b)ラジカル重合性化合物としては、例えば、(メタ)アクリル酸エステル類、スチレン類、マレイン酸エステル類、フマル酸エステル類、イタコン酸エステル類、桂皮酸エステル類、クロトン酸エステル類、ビニルエーテル類、ビニルエステル類、ビニルケトン類、アリルエーテル類、アリルエステル類、N−置換マレイミド類、N−ビニル化合物類、不飽和ニトリル類、オレフィン類等が挙げられる。これらの中でも、反応性が高い(メタ)アクリル酸エステル類を含むことが好ましい。(b)ラジカル重合性化合物は、単独で用いてもよく2種類以上を併用してもよい。<(B) Radical polymerizable compound>
As the radically polymerizable compound (b) of the present invention, a compound having an ethylenically unsaturated group can be preferably used. Examples of the radically polymerizable compound include (meth) acrylic acid esters, styrenes, maleic acid esters, fumaric acid esters, itaconic acid esters, cinnamic acid esters, crotonic acid esters, and vinyl ethers. , Vinyl esters, vinyl ketones, allyl ethers, allyl esters, N-substituted maleimides, N-vinyl compounds, unsaturated nitriles, olefins and the like. Among these, it is preferable to contain highly reactive (meth) acrylic acid esters. (B) The radically polymerizable compound may be used alone or in combination of two or more.
前記(メタ)アクリル酸エステル類は、単官能化合物および多官能化合物を使用することができる。単官能化合物としては、メチル(メタ)アクリレート、エチル(メタ)アクリレート、ブチル(メタ)アクリレート、tert−ブチル(メタ)アクリレート、2−エチルヘキシル(メタ)アクリレート、ラウリル(メタ)アクリレート、ステアリル(メタ)アクリレート等のアルキル(メタ)アクリレート;シクロヘキシル(メタ)アクリレート、イソボルニル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレ−ト、ジシクロペンテニル(メタ)アクリレ−ト、ジシクロペンテニルオキシエチル(メタ)アクリレ−ト、2―エチル−2−アダマンチル(メタ)アクリレート等の(メタ)アクリル酸と脂環族アルコールとのエステル化合物;フェニル(メタ)アクリレート、ベンジル(メタ)アクリレート等のアリール(メタ)アクリレート;2−ヒドロキシエチル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレート、2−ヒドロキシ−3−フェノキシプロピル(メタ)アクリレート、3−ヒドロキシ−1−アダマンチル(メタ)アクリレート、ポリエチレングリコールモノ(メタ)アクリレート、ポリプロピレングリコールモノ(メタ)アクリレート等のヒドロキシ基を有するモノマー;メトキシエチル(メタ)アクリレート、メトキシポリエチレングリコール(メタ)アクリレート、フェノキシポリエチレングリコール(メタ)アクリレート、2−フェニルフェノキシエチル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート、(2−メチル−2−エチル−1,3−ジオキソラン−4−イル)メチル(メタ)アクリレート、(3−エチルオキセタン−3−イル)メチル(メタ)アクリレート、環状トリメチロールプロパンホルマール(メタ)アクリレート等の鎖状または環状のエーテル結合を有するモノマー等;N,N−ジメチルアミノエチル(メタ)アクリレート、N,N−ジメチル(メタ)アクリルアミド、N−メチロール(メタ)アクリルアミド、N−イソプロピル(メタ)アクリルアミド、N,N−ジメチルアミノプロピル(メタ)アクリルアミド、ジアセトン(メタ)アクリルアミド、(メタ)アクリロイルモルホリン、N−(メタ)アクリロイルオキシエチルヘキサヒドロフタルイミド等の窒素原子を有するモノマー;2−(メタ)アクリロイルオキシエチルイソシアネート等のイソシアネート基を有するモノマー;グリシジル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレートグリシジルエーテル等のエポキシ基を有するモノマー;リン酸2−((メタ)アクリロイルオキシ)エチル等のリン原子を有するモノマー;3−(メタ)アクリロキシプロピルトリメトキシシラン等のケイ素原子を有するモノマー;2,2,2−トリフルオロエチル(メタ)アクリレート、2,2,3,3,3−ペンタフルオロプロピル(メタ)アクリレート、2−(パーフルオロヘキシル)エチル(メタ)アクリレート等のフッ素原子を有するモノマー;(メタ)アクリル酸、コハク酸モノ(2−(メタ)アクリロイルオキシエチル)、フタル酸モノ(2−(メタ)アクリロイルオキシエチル)、マレイン酸モノ(2−(メタ)アクリロイルオキシエチル)、ω−カルボキシ-ポリカプロラクトンモノ(メタ)アクリレート等のカルボキシル基を有するモノマー等が挙げられる。 As the (meth) acrylic acid esters, monofunctional compounds and polyfunctional compounds can be used. Examples of the monofunctional compound include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, tert-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, lauryl (meth) acrylate, and stearyl (meth). Alkyl (meth) acrylates such as acrylates; cyclohexyl (meth) acrylates, isobornyl (meth) acrylates, dicyclopentanyl (meth) acrylicates, dicyclopentenyl (meth) acrylicates, dicyclopentenyloxyethyl (meth) Acrylate, ester compound of (meth) acrylic acid such as 2-ethyl-2-adamantyl (meth) acrylate and alicyclic alcohol; aryl (meth) acrylate such as phenyl (meth) acrylate and benzyl (meth) acrylate 2-Hydroxyethyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, 3-hydroxy-1-adamantyl (meth) acrylate, polyethylene glycol mono (meth) Monomer having a hydroxy group such as acrylate, polypropylene glycol mono (meth) acrylate; methoxyethyl (meth) acrylate, methoxypolyethylene glycol (meth) acrylate, phenoxypolyethylene glycol (meth) acrylate, 2-phenylphenoxyethyl (meth) acrylate, Tetrahydrofurfuryl (meth) acrylate, (2-methyl-2-ethyl-1,3-dioxolan-4-yl) methyl (meth) acrylate, (3-ethyloxetane-3-yl) methyl (meth) acrylate, cyclic Monomer having a chain or cyclic ether bond such as trimethylolpropaneformal (meth) acrylate; N, N-dimethylaminoethyl (meth) acrylate, N, N-dimethyl (meth) acrylamide, N-methylol (meth) Nitrogen atoms such as acrylamide, N-isopropyl (meth) acrylamide, N, N-dimethylaminopropyl (meth) acrylamide, diacetone (meth) acrylamide, (meth) acryloylmorpholine, N- (meth) acryloyloxyethyl hexahydrophthalimide, etc. Monomer having: Monomer having an isocyanate group such as 2- (meth) acryloyloxyethyl isocyanate; Glysidyl (meth) acrylate, 4 − Monomers having an epoxy group such as hydroxybutyl (meth) acrylate glycidyl ether; Monomers having a phosphorus atom such as 2-((meth) acryloyloxy) ethyl phosphate; Monomer with silicon atom; 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3,3-pentafluoropropyl (meth) acrylate, 2- (perfluorohexyl) ethyl (meth) acrylate Monomers having fluorine atoms such as (meth) acrylic acid, mono succinate (2- (meth) acryloyloxyethyl), mono phthalate (2- (meth) acryloyloxyethyl), mono (2- (meth) maleate). ) Acryloyloxyethyl), ω-carboxy-polycaprolactone Mono (meth) acrylate and other monomers having a carboxyl group can be mentioned.
前記多官能化合物としては、エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、ポリエチレングリコールジ(メタ)アクリレート、ポリプロピレングリコールジ(メタ)アクリレート、1,4−ブタンジオールジ(メタ)アクリレート、1,6−ヘキサンジオールジ(メタ)アクリレート、1,9−ノナンジオールジ(メタ)アクリレート、グリセリンジ(メタ)アクリレート、グリセリントリ(メタ)アクリレート、グリセリンプロポキシトリ(メタ)アクリレート、トリメチロールエタントリ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ペンタエリスリトールジ(メタ)アクリレートモノステアレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、ヒドロキシピバリン酸ネオペンチルグリコールジ(メタ)アクリレート、トリシクロデカンジメタノールジ(メタ)アクリレート、2,2−ビス(4−(メタ)アクリロキシエトキシフェニル)プロパン、2,2−ビス(4−(メタ)アクリロキシポリエトキシフェニル)プロパン、9,9−ビス(4−(2−(メタ)アクリロイルオキシエトキシ)フェニル)フルオレン、9,9−ビス(4−(2−(2−(メタ)アクリロイルオキシエトキシ)エトキシ)フェニル)フルオレン等の多価アルコールと(メタ)アクリル酸とのエステル化合物;ビス(4−(メタ)アクリロキシフェニル)スルフィド、ビス(4−(メタ)アクリロイルチオフェニル)スルフィド、トリス(2−(メタ)アクリロイルオキシエチル)イソシアヌレート、エチレンビス(メタ)アクリルアミド、(メタ)アクリル酸亜鉛、(メタ)アクリル酸ジルコニウム、脂肪族ウレタンアクリレート、芳香族ウレタンアクリレート、エポキシアクリレート、ポリエステルアクリレート等が挙げられる。 Examples of the polyfunctional compound include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, and 1,4-butanediol di (meth) acrylate. 1,6-Hexanediol di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, glycerin di (meth) acrylate, glycerin tri (meth) acrylate, glycerin propoxytri (meth) acrylate, trimethyl ethanetri (Meta) Acrylate, Trimethylol Propanetri (Meta) Acrylate, Pentaerythritol Tri (Meta) Acrylate, Pentaerythritol Tetra (Meta) Acrylate, Pentaerythritol Di (Meta) Acrylate Monostearate, Dipentaerythritol Penta (Meta) Acrylate, Dipentaerythritol hexa (meth) acrylate, neopentyl glycol di (meth) acrylate of hydroxypivalate, tricyclodecanedimethanol di (meth) acrylate, 2,2-bis (4- (meth) acryloxiethoxyphenyl) propane, 2,2-bis (4- (meth) acryloxypolyethoxyphenyl) propane, 9,9-bis (4- (2- (meth) acryloyloxyethoxy) phenyl) fluorene, 9,9-bis (4-( An ester compound of a polyhydric alcohol such as 2- (2- (meth) acryloyloxyethoxy) ethoxy) phenyl) fluorene and (meth) acrylic acid; bis (4- (meth) acryloyloxyphenyl) sulfide, bis (4-) (Meta) acryloylthiophenyl) sulfide, tris (2- (meth) acryloyloxyethyl) isocyanurate, ethylenebis (meth) acrylamide, zinc (meth) acrylate, zirconium (meth) acrylate, aliphatic urethane acrylate, aromatic Group urethane acrylate, epoxy acrylate, polyester acrylate and the like can be mentioned.
前記(メタ)アクリル酸エステル類は、重合性組成物の感度の向上、酸素阻害の低減や、硬化物の塗膜の機械的強度や硬度、耐熱性、耐久性、耐薬品性の向上の観点から、前記多価アルコールと(メタ)アクリル酸とのエステル化合物が好ましく、特に、トリメチロールエタントリアクリレート、トリメチロールプロパントリアクリレート、ペンタエリスリトールトリアクリレート、ペンタエリスリトールテトラアクリレート、ジペンタエリスリトールペンタアクリレート、ジペンタエリスリトールヘキサアクリレートが好ましい。 The (meth) acrylic acid esters are used from the viewpoints of improving the sensitivity of the polymerizable composition, reducing oxygen inhibition, and improving the mechanical strength, hardness, heat resistance, durability, and chemical resistance of the coating film of the cured product. Therefore, the ester compound of the polyhydric alcohol and (meth) acrylic acid is preferable, and in particular, trimethylol ethane triacrylate, trimethylol propantriacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol pentaacrylate. Pentaerythritol hexaacrylate is preferred.
なお、前記重合性組成物は、前記(b)ラジカル重合性化合物から得られた共重合体を加えることができる。 A copolymer obtained from the radically polymerizable compound (b) can be added to the polymerizable composition.
<(c)アルカリ可溶性樹脂>
前記重合性組成物は、さらに(c)アルカリ可溶性樹脂を配合することにより、ネガ型レジストとして好適に使用することができる。(c)アルカリ可溶性樹脂としては、ネガ型レジストに一般的に使用されるものを用いることができ、アルカリ水溶液に可溶な樹脂であれば特に限定されないが、カルボキシル基を含む樹脂であることが好ましい。(c)アルカリ可溶性樹脂は、単独で用いてもよく2種類以上を併用してもよい。<(C) Alkali-soluble resin>
The polymerizable composition can be suitably used as a negative resist by further blending (c) an alkali-soluble resin. (C) As the alkali-soluble resin, those generally used for negative resists can be used, and the resin is not particularly limited as long as it is soluble in an aqueous alkali solution, but it may be a resin containing a carboxyl group. preferable. (C) The alkali-soluble resin may be used alone or in combination of two or more.
本発明の(c)アルカリ可溶性樹脂には、例えば、カルボキシル基含有(メタ)アクリル酸エステル共重合物、カルボキシル基含有エポキシアクリレート樹脂等が好ましく使用される。 As the alkali-soluble resin (c) of the present invention, for example, a carboxyl group-containing (meth) acrylic acid ester copolymer, a carboxyl group-containing epoxy acrylate resin, or the like is preferably used.
前記カルボキシル基含有(メタ)アクリル酸エステル共重合物は、前述の(メタ)アクリル酸エステル類の単官能化合物から選ばれる少なくとも1種(但し、前記カルボキシル基を有するモノマーを除く)と、(メタ)アクリル酸、(メタ)アクリル酸の二量体、イタコン酸、クロトン酸、マレイン酸、フマル酸、ビニル安息香酸、桂皮酸、コハク酸モノ(2−(メタ)アクリロイルオキシエチル)、フタル酸モノ(2−(メタ)アクリロイルオキシエチル)、マレイン酸モノ(2−(メタ)アクリロイルオキシエチル)、ω−カルボキシ-ポリカプロラクトンモノ(メタ)アクリレート、およびそれらの酸無水物等のエチレン性不飽和基含有カルボン酸から選ばれる少なくとも1種を含む共重合物である。 The carboxyl group-containing (meth) acrylic acid ester copolymer includes at least one selected from the above-mentioned monofunctional compounds of (meth) acrylic acid esters (excluding the monomer having the carboxyl group) and (meth). ) Acrylic acid, dimer of (meth) acrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl benzoic acid, cinnamic acid, monosuccinate (2- (meth) acryloyloxyethyl), monophthalate Ethyl unsaturated groups such as (2- (meth) acryloyloxyethyl), mono (2- (meth) acryloyloxyethyl), ω-carboxy-polycaprolactone mono (meth) acrylate, and their acid anhydrides. It is a copolymer containing at least one selected from the contained carboxylic acids.
前記カルボキシル基含有(メタ)アクリル酸エステル共重合物としては、例えば、メチルメタクリレートと、シクロヘキシルメタクリレートと、メタクリル酸の共重合物等が挙げられる。さらに、スチレン、α−メチルスチレン、N−ビニル−2−ピロリドン、N−メチルマレイミド、N−フェニルマレイミド、N−シクロヘキシルマレイミド、フマル酸ジエチル、イタコン酸ジエチル等が共重合されても良い。 Examples of the carboxyl group-containing (meth) acrylic acid ester copolymer include a copolymer of methyl methacrylate, cyclohexyl methacrylate, and methacrylic acid. Further, styrene, α-methylstyrene, N-vinyl-2-pyrrolidone, N-methylmaleimide, N-phenylmaleimide, N-cyclohexylmaleimide, diethyl fumarate, diethyl itaconic acid and the like may be copolymerized.
また、前記カルボキシル基含有(メタ)アクリル酸エステル共重合物は、ネガ型レジストの現像性と耐熱性、硬度、耐薬品性等の被膜特性を両立させる観点から、エチレン性不飽和基等の反応性基が側鎖に導入されたカルボキシル基含有(メタ)アクリル酸エステル共重合物も好ましく使用される。上記の側鎖にエチレン性不飽和基を導入する方法として、例えば、カルボキシル基含有(メタ)アクリル酸エステル共重合物のカルボキシル基の一部に、グリシジル(メタ)アクリレート等の分子内にエポキシ基とエチレン性不飽和基を有する化合物を付加させる方法や、エポキシ基およびカルボキシル基含有(メタ)アクリル酸エステル共重合物に、メタクリル酸等のエチレン性不飽和基含有モノカルボン酸を付加させる方法や、水酸基およびカルボキシル基含有(メタ)アクリル酸エステル共重合物に、2−(メタ)アクリロイルオキシエチルイソシアネート等の分子内にイソシアネート基とエチレン性不飽和基を有する化合物を付加させる方法等が挙げられる。 Further, the carboxyl group-containing (meth) acrylic acid ester copolymer is a reaction of an ethylenically unsaturated group or the like from the viewpoint of achieving both the developability of a negative resist and the coating properties such as heat resistance, hardness and chemical resistance. A carboxyl group-containing (meth) acrylic acid ester copolymer in which a sex group is introduced into a side chain is also preferably used. As a method for introducing an ethylenically unsaturated group into the above side chain, for example, a part of the carboxyl group of the carboxyl group-containing (meth) acrylic acid ester copolymer has an epoxy group in the molecule such as glycidyl (meth) acrylate. And a method of adding a compound having an ethylenically unsaturated group, or a method of adding an ethylenically unsaturated group-containing monocarboxylic acid such as methacrylic acid to an epoxy group and a carboxyl group-containing (meth) acrylic acid ester copolymer. , A method of adding a compound having an isocyanate group and an ethylenically unsaturated group in a molecule such as 2- (meth) acryloyloxyethyl isocyanate to a (meth) acrylic acid ester copolymer containing a hydroxyl group and a carboxyl group can be mentioned. ..
前記カルボキシル基含有エポキシアクリレート樹脂としては、エポキシ化合物と前記エチレン性不飽和基含有カルボン酸との反応物であるエポキシアクリレート樹脂に、更に酸無水物を反応させた化合物が好適である。 As the carboxyl group-containing epoxy acrylate resin, a compound obtained by further reacting an acid anhydride with an epoxy acrylate resin which is a reaction product of an epoxy compound and the ethylenically unsaturated group-containing carboxylic acid is preferable.
前記エポキシ樹脂としては、例えば、(o,m,p−)クレゾールノボラック型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、トリスフェノールメタン型エポキシ樹脂、ビスフェニルフルオレン型エポキシ樹脂等が挙げられる。エポキシ樹脂は、単独で用いてもよく2種類以上を併用してもよい。 Examples of the epoxy resin include (o, m, p-) cresol novolac type epoxy resin, phenol novolac type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, trisphenol methane type epoxy resin, and bisphenyl fluorene. Examples include type epoxy resins. The epoxy resin may be used alone or in combination of two or more.
前記酸無水物としては、例えば、無水マレイン酸、無水コハク酸、無水フタル酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、4−メチルヘキサヒドロ無水フタル酸、エンドメチレンテトラヒドロ無水フタル酸、無水クロレインド酸、無水トリメリット酸、無水ピロメリット酸、ベンゾフェノンテトラカルボン酸ニ無水物、ビフェニルテトラカルボン酸ニ無水物、無水イタコン酸等が挙げられる。 Examples of the acid anhydride include maleic anhydride, succinic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, 4-methylhexahydrophthalic anhydride, endomethylenetetrahydrophthalic anhydride, and chloreindic anhydride. , Trimellitic anhydride, pyromellitic anhydride, benzophenone tetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, itaconic anhydride and the like.
さらに、カルボキシル基含有エポキシアクリレート樹脂の合成の際に、必要に応じて、無水トリメリット酸等のトリカルボン酸無水物を用いて、反応後に残った酸無水物基を加水分解することにより、カルボキシル基を増やすことができる。また、エチレン性不飽和基含有の無水マレイン酸を用いて、更にエチレン性二重結合を増やすこともできる。 Further, in the synthesis of the carboxyl group-containing epoxy acrylate resin, if necessary, a tricarboxylic acid anhydride such as trimellitic anhydride is used to hydrolyze the acid anhydride group remaining after the reaction to obtain a carboxyl group. Can be increased. Further, the ethylenically double bond can be further increased by using maleic anhydride containing an ethylenically unsaturated group.
前記(c)アルカリ可溶性樹脂の酸価は、20から300mgKOH/gであることが好ましく、40から180mg/KOHであることがさらに好ましい。酸価が20mgKOH/gよりも少ない場合、アルカリ水溶液への溶解性が乏しいため、未露光部の現像が困難となるため好ましくない。また、酸価が300mgKOH/gよりも多い場合、現像時に露光部も基材から脱離しやすい傾向にあるため、好ましくない。 The acid value of the alkali-soluble resin (c) is preferably 20 to 300 mgKOH / g, more preferably 40 to 180 mg / KOH. When the acid value is less than 20 mgKOH / g, the solubility in an alkaline aqueous solution is poor, which makes it difficult to develop the unexposed portion, which is not preferable. Further, when the acid value is more than 300 mgKOH / g, the exposed portion tends to be easily separated from the substrate during development, which is not preferable.
前記(c)アルカリ可溶性樹脂の重量平均分子量は、1,000から100,000であることが好ましく、1,500から30,000であることが好ましい。重量平均分子量が1,000よりも小さい場合、露光部の耐熱性や硬度等が乏しいため、好ましくない。重量平均分子量が100,000よりも大きい場合は、未露光部の現像が困難となる場合があるため、好ましくない。尚、前記重量平均分子量は、ゲル浸透クロマトグラフィー(GPC)法によって測定することができる。一例として、GPC装置としてHLC-8220GPC(東ソー社製)、カラムとして3本のTSKgelHZM-M(東ソー社製)を使用して、展開溶媒としてテトラヒドロフラン、カラム温度40℃、流速0.3ミリリットル/分、RI検出器、試料注入濃度0.5質量%、注入量10マイクロリットルの条件下、クロマトグラフィーを行ない、ポリスチレン換算の重量平均分子量として求めることができる。 The weight average molecular weight of the alkali-soluble resin (c) is preferably 1,000 to 100,000, preferably 1,500 to 30,000. If the weight average molecular weight is smaller than 1,000, the heat resistance and hardness of the exposed portion are poor, which is not preferable. If the weight average molecular weight is larger than 100,000, it may be difficult to develop the unexposed portion, which is not preferable. The weight average molecular weight can be measured by a gel permeation chromatography (GPC) method. As an example, using HLC-8220GPC (manufactured by Tosoh) as a GPC device and three TSKgelHZM-M (manufactured by Tosoh) as columns, tetrahydrofuran as a developing solvent, column temperature 40 ° C., flow velocity 0.3 ml / min. , RI detector, sample injection concentration 0.5% by mass, injection amount 10 microliters, chromatography can be performed to obtain the weight average molecular weight in terms of polystyrene.
また、(c)アルカリ可溶性樹脂の割合は、重合性組成物の全固形分中、10から70質量%であることが好ましく、15から60質量%であることがより好ましい。前記割合が10質量%よりも少ない場合、現像性が乏しいため、好ましくない。前記割合が70質量%よりも多い場合、パターン形状の再現性や耐熱性が低下するため、好ましくない。 The proportion of the alkali-soluble resin (c) is preferably 10 to 70% by mass, more preferably 15 to 60% by mass, based on the total solid content of the polymerizable composition. If the ratio is less than 10% by mass, the developability is poor, which is not preferable. If the ratio is more than 70% by mass, the reproducibility of the pattern shape and the heat resistance are lowered, which is not preferable.
なお、前記(c)アルカリ可溶性樹脂は、合成反応後に有効成分であるアルカリ可溶性樹脂を単離精製したものを用いることができる他、合成反応により得られた反応溶液、その乾燥物等をそのまま用いることもできる。 As the alkali-soluble resin (c), an alkali-soluble resin which is an active ingredient after the synthesis reaction can be isolated and purified, or a reaction solution obtained by the synthesis reaction, a dried product thereof, or the like can be used as it is. You can also do it.
<その他の成分>
前記その他の成分として、硬化促進剤を用いることで、重合性組成物の加熱による硬化を低温で行なうこともできる。硬化促進剤としては、例えば、アミン化合物、チオ尿素化合物、2−メルカプトベンズイミダゾール系化合物、オルトベンゾイックスルフィミド、第4周期遷移金属化合物等を使用することができる。硬化促進剤は、単独で用いてもよく2種類以上を併用してもよい。<Other ingredients>
By using a curing accelerator as the other component, the polymerizable composition can be cured by heating at a low temperature. As the curing accelerator, for example, an amine compound, a thiourea compound, a 2-mercaptobenzimidazole compound, an orthobenzoixulfimide, a fourth period transition metal compound and the like can be used. The curing accelerator may be used alone or in combination of two or more.
前記アミン化合物としては、第三級アミンが好ましく、例えば、N,N−ジメチルアニリン、N,N−ジメチルトルイジン、N,N−ジエチルアニリン、N,N−ビス(2−ヒドロキシエチル)−p−トルイジン、4−(ジメチルアミノ)安息香酸エチル、4−ジメチルアミノ安息香酸(2−メタクリロイルオキシ)エチル等が挙げられる。 The amine compound is preferably a tertiary amine, for example, N, N-dimethylaniline, N, N-dimethyltoluidine, N, N-diethylaniline, N, N-bis (2-hydroxyethyl) -p-. Examples thereof include toluidine, ethyl 4- (dimethylamino) benzoate, ethyl 4-dimethylaminobenzoate (2-methacryloyloxy) and the like.
前記チオ尿素としては、例えば、アセチルチオ尿素、N,N’ジブチルチオ尿素等が挙げられる。 Examples of the thiourea include acetylthiourea, N, N'dibutylthiourea and the like.
前記2−メルカプトベンズイミダゾール系化合物としては、例えば、2−メルカプトベンズイミダゾール、2−メルカプトメチルベンズイミダゾール、2−メルカプトメトキシベンズイミダゾール等が挙げられる。 Examples of the 2-mercaptobenzimidazole compound include 2-mercaptobenzimidazole, 2-mercaptomethylbenzimidazole, 2-mercaptomethoxybenzimidazole and the like.
前記第4周期遷移金属化合物としては、バナジウム、コバルト、銅等の有機酸塩または金属キレート化合物から選択することができ、例えば、オクチル酸コバルト、ナフテン酸コバルト、ナフテン酸銅、ナフテン酸バナジウム、銅アセチルアセトネート、マンガンアセチルアセトネート、バナジルアセチルアセトネート等が挙げられる。 The fourth cycle transition metal compound can be selected from organic acid salts such as vanadium, cobalt and copper or metal chelate compounds, for example, cobalt octylate, cobalt naphthenate, copper naphthenate, vanadium naphthenate and copper. Examples thereof include acetylacetonate, manganese acetylacetonate, vanadylacetylacetonate and the like.
前記硬化促進剤は、重合性組成物を使用する直前に配合することが好ましい。硬化促進剤の含有量は、(b)ラジカル重合性化合物100質量部に対して、0.1から20質量部であることが好ましく、0.2から10質量部であることがより好ましい。 The curing accelerator is preferably blended immediately before using the polymerizable composition. The content of the curing accelerator is preferably 0.1 to 20 parts by mass, and more preferably 0.2 to 10 parts by mass with respect to 100 parts by mass of the (b) radically polymerizable compound.
前記その他の成分として、重合性組成物には、コーティング剤や塗料、印刷インキ、感光性印刷版、接着剤、カラーレジストやブラックレジスト等の各種フォトレジスト等の用途で一般的に使用されている添加剤を配合できる。添加剤としては、例えば、増感剤(4,4’−ビス(ジエチルアミノ)ベンゾフェノン、9,10−ジブトキシアントラセン、クマリン、ケトクマリン、アクリジンオレンジ、カンファーキノン等)、重合禁止剤(p−メトキシフェノール、ヒドロキノン、2,6−ジ−t−ブチル−4−メチルフェノール、フェノチアジン等)、紫外線吸収剤、赤外線吸収剤、連鎖移動剤、光安定剤、酸化防止剤、レベリング剤、表面調整剤、界面活性剤、増粘剤、消泡剤、接着促進剤、可塑剤、エポキシ化合物、チオール化合物、エチレン性不飽和結合を有する樹脂、飽和樹脂、着色染料、蛍光染料、顔料(有機顔料、無機顔料)、炭素系材料(炭素繊維、カーボンブラック、黒鉛、黒鉛化カーボンブラック、活性炭、カーボンナノチューブ、フラーレン、グラフェン、カーボンマイクロコイル、カーボンナノホーン、カーボンエアロゲル等)、金属酸化物(酸化チタン、酸化イリジウム、酸化亜鉛、アルミナ、シリカ等)、金属(銀、銅等)、無機化合物(ガラス粉末、層状粘度鉱物、マイカ、タルク、炭酸カルシウム等)、分散剤、難燃剤等が挙げられる。添加剤は、単独で用いてもよく2種類以上を併用してもよい。 As the other components, the polymerizable composition is generally used in applications such as coating agents, paints, printing inks, photosensitive printing plates, adhesives, and various photoresists such as color resists and black resists. Additives can be added. Examples of the additive include a sensitizer (4,4'-bis (diethylamino) benzophenone, 9,10-dibutoxyanthracene, coumarin, ketocoumarin, acrydin orange, camphorquinone, etc.) and a polymerization inhibitor (p-methoxyphenol). , Hydroquinone, 2,6-di-t-butyl-4-methylphenol, phenothiazine, etc.), UV absorber, infrared absorber, chain transfer agent, light stabilizer, antioxidant, leveling agent, surface conditioner, interface Activators, thickeners, defoaming agents, adhesion promoters, plasticizers, epoxy compounds, thiol compounds, resins with ethylenically unsaturated bonds, saturated resins, coloring dyes, fluorescent dyes, pigments (organic pigments, inorganic pigments) , Carbon-based materials (carbon fibers, carbon black, graphite, graphitized carbon black, activated carbon, carbon nanotubes, fullerene, graphene, carbon microcoils, carbon nanohorns, carbon aerogels, etc.), metal oxides (titanium oxide, iridium oxide, oxidation Examples include zinc, alumina, silica, etc.), metals (silver, copper, etc.), inorganic compounds (glass powder, layered viscosity minerals, mica, talc, calcium carbonate, etc.), dispersants, flame retardants, and the like. The additive may be used alone or in combination of two or more.
前記添加剤の含有量は、使用目的に応じて適宜選択され、特に制限されるものではないが、通常、(b)ラジカル重合性化合物100質量部に対して、500質量部以下でありことが好ましく、100質量部以下であることより好ましい。 The content of the additive is appropriately selected according to the purpose of use and is not particularly limited, but is usually 500 parts by mass or less with respect to 100 parts by mass of the (b) radically polymerizable compound. It is preferably 100 parts by mass or less.
前記重合性組成物には、粘度や塗装性、硬化膜の平滑性の改良のため、更に溶媒を加えることもできる。溶媒は、前記(a)重合開始剤、前記(b)ラジカル重合性化合物、前記(c)アルカリ可溶性樹脂、前記その他の成分を、溶解または分散することができるものであり、乾燥温度において揮発する溶媒であれば、特に制限されるものではない。 A solvent may be further added to the polymerizable composition in order to improve the viscosity, coatability, and smoothness of the cured film. The solvent can dissolve or disperse the (a) polymerization initiator, the (b) radically polymerizable compound, the (c) alkali-soluble resin, and the other components, and volatilizes at a drying temperature. As long as it is a solvent, it is not particularly limited.
前記溶媒としては、例えば、水、アルコール系溶媒、カルビトール系溶媒、エステル系溶媒、ケトン系溶媒、エーテル系溶媒、ラクトン系溶媒、不飽和炭化水素系溶媒、セロソルブアセテート系溶媒、カルビトールアセテート系溶媒やプロピレングリコールモノメチルエーテルアセテート、ジエチレングリコールジメチルエーテル等が挙げられる。溶媒は、単独で用いてもよく2種類以上を併用してもよい。 Examples of the solvent include water, alcohol-based solvent, carbitol-based solvent, ester-based solvent, ketone-based solvent, ether-based solvent, lactone-based solvent, unsaturated hydrocarbon-based solvent, cellosolve acetate-based solvent, and carbitol acetate-based solvent. Examples thereof include a solvent, propylene glycol monomethyl ether acetate, and diethylene glycol dimethyl ether. The solvent may be used alone or in combination of two or more.
前記溶媒の使用量は、重合性組成物の固形分100質量部に対して、10から1000質量部であることが好ましく、20から500質量部であることがより好ましい。 The amount of the solvent used is preferably 10 to 1000 parts by mass, more preferably 20 to 500 parts by mass, based on 100 parts by mass of the solid content of the polymerizable composition.
<重合性組成物の調製方法>
前記重合性組成物を調製する場合には、収納容器内に前記(a)重合開始剤、前記(b)ラジカル重合性化合物、必要に応じて、前記(c)アルカリ可溶性樹脂や前記その他の成分を投入し、ペイントシェーカー、ビーズミル、サンドグラインドミル、ボールミル、アトライターミル、2本ロールミル、3本ロールミル等を用いて、常法に従って溶解または分散させればよい。また、必要に応じて、メッシュまたはメンブレンフィルター等を通してもろ過してもよい。<Method for preparing polymerizable composition>
When preparing the polymerizable composition, the above-mentioned (a) polymerization initiator, the above-mentioned (b) radically polymerizable compound, and, if necessary, the above-mentioned (c) alkali-soluble resin and the above-mentioned other components are placed in a storage container. May be melted or dispersed according to a conventional method using a paint shaker, a bead mill, a sand grind mill, a ball mill, an attritor mill, a two-roll mill, a three-roll mill, or the like. Further, if necessary, it may be filtered through a mesh or a membrane filter or the like.
なお、前記重合性組成物の調製において、前記(a)重合開始剤は、重合性組成物に最初から添加しておいてもよいが、重合性組成物を比較的長時間保存する場合には、使用直前に(a)重合開始剤を(b)ラジカル重合性化合物を含む組成物中に溶解または分散させることが好ましい。 In the preparation of the polymerizable composition, the (a) polymerization initiator may be added to the polymerizable composition from the beginning, but when the polymerizable composition is stored for a relatively long time, it may be added. It is preferable to dissolve or disperse (a) the polymerization initiator in the composition containing (b) the radically polymerizable compound immediately before use.
<硬化物の製造方法>
本発明の硬化物は、前記重合性組成物から形成されるものである。硬化物の製造方法は、重合性組成物を基板上に塗布後、当該重合性組成物を活性エネルギー線で照射する工程、および当該重合性組成物を加熱する工程のいずれかの工程を含む製造方法である。また、前記活性エネルギー線で照射する工程と前記加熱する工程の両方を含む工程を、デュアルキュア工程ともいう。<Manufacturing method of cured product>
The cured product of the present invention is formed from the polymerizable composition. The method for producing a cured product includes one of a step of applying the polymerizable composition on a substrate and then irradiating the polymerizable composition with an active energy ray, and a step of heating the polymerizable composition. The method. Further, a step including both the step of irradiating with the active energy ray and the step of heating is also referred to as a dual cure step.
前記塗布方法としては、例えば、スピンコート法、バーコート法、スプレーコート法、ディップコート法、フローコート法、スリットコート法、ドクターブレードコート法、グラビアコート法、スクリーン印刷法、オフセット印刷法、インクジェット印刷法、ディスペンサー印刷法等の種々の方法が挙げられる。また、前記基板は、例えば、ガラス、シリコンウエハ、金属、プラスチック等のフィルムやシート、および立体形状の成形品等が挙げられ、基板の形状が制限されることは無い。 Examples of the coating method include spin coating method, bar coating method, spray coating method, dip coating method, flow coating method, slit coating method, doctor blade coating method, gravure coating method, screen printing method, offset printing method, and inkjet. Various methods such as a printing method and a dispenser printing method can be mentioned. Further, examples of the substrate include films and sheets such as glass, silicon wafers, metals and plastics, and three-dimensional molded products, and the shape of the substrate is not limited.
上記の重合性組成物を活性エネルギー線で照射する工程は、電子線、紫外線、可視光線、放射線等の活性エネルギー線の照射により、(a)重合開始剤を分解させて、(b)ラジカル重合性化合物を重合させることで、硬化物を得ることができるものである。 In the step of irradiating the above-mentioned polymerizable composition with active energy rays, (a) the polymerization initiator is decomposed by irradiation with active energy rays such as electron beam, ultraviolet rays, visible light, and radiation, and (b) radical polymerization. A cured product can be obtained by polymerizing the sex compound.
活性エネルギー線は、活性エネルギー線の波長が250から450nmの光であることが好ましく、硬化を迅速に行うことができる観点から、350から410nmの光であることがより好ましい。 The active energy ray is preferably light having a wavelength of 250 to 450 nm, and more preferably 350 to 410 nm from the viewpoint of rapid curing.
前記光の照射の光源としては、低圧水銀ランプ、高圧水銀ランプ、超高圧水銀ランプ、メタルハライドランプ、紫外線無電極ランプ、LEDランプ、キセノンアークランプ、カーボンアークランプ、太陽光、YAGレーザー等の固体レーザー、半導体レーザー、アルゴンレーザー等のガスレーザー等を使用することができる。なお、(a)重合開始剤の吸収が少ない可視光から赤外光の光を用いる場合には、前記添加剤として、その光を吸収する増感剤を使用することにより硬化を行なうことができる。 The light source for irradiating the light is a solid-state laser such as a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a metal halide lamp, an ultraviolet electrodeless electrode lamp, an LED lamp, a xenon arclamp, a carbon arclamp, sunlight, and a YAG laser. , A gas laser such as a semiconductor laser or an argon laser can be used. When (a) light from visible light to infrared light, which absorbs little of the polymerization initiator, is used, curing can be performed by using a sensitizer that absorbs the light as the additive. ..
前記活性エネルギー線の露光量は、活性エネルギー線の波長や強度、重合性組成物の組成に応じて適宜設定すべきである。一例として、UV−A領域での露光量は、10から5,000mJ/cm2であることが好ましく、30から1,000mJ/cm2であることがより好ましい。なお、上記の硬化物の製造方法として、デュアルキュア工程を適用し、かつ前記活性エネルギー線で照射する工程の後に、加熱する工程を行う場合、(a)重合開始剤が、活性エネルギー線により完全に分解してしまわないように、露光量を適宜設定すべきである。The exposure amount of the active energy ray should be appropriately set according to the wavelength and intensity of the active energy ray and the composition of the polymerizable composition. As an example, the exposure amount in the UV-A region is preferably 10 to 5,000 mJ / cm 2 , and more preferably 30 to 1,000 mJ / cm 2 . When the dual cure step is applied as the method for producing the cured product and the step of heating is performed after the step of irradiating with the active energy ray, (a) the polymerization initiator is completely removed by the active energy ray. The exposure amount should be set appropriately so that it does not decompose into.
上記の重合性組成物を加熱する工程は、熱により(a)重合開始剤を分解させて、(b)ラジカル重合性化合物を重合させることで、硬化物を得ることができるものである。 In the step of heating the above-mentioned polymerizable composition, a cured product can be obtained by (a) decomposing the polymerization initiator by heat and (b) polymerizing the radically polymerizable compound.
前記重合性組成物を加熱する工程において、加熱する手法は、例えば、加熱、通風加熱等が挙げられる。加熱の方式としては、特に制限されることはないが、例えば、オーブン、ホットプレート、赤外線照射、電磁波照射等が挙げられる。また、通風加熱の方式としては、例えば、送風式乾燥オーブン等が挙げられる。 In the step of heating the polymerizable composition, examples of the heating method include heating, ventilation heating and the like. The heating method is not particularly limited, and examples thereof include an oven, a hot plate, infrared irradiation, and electromagnetic wave irradiation. Further, as a method of ventilation heating, for example, a ventilation type drying oven or the like can be mentioned.
前記重合性組成物を加熱する工程において、加熱温度は高いほど、(a)重合開始剤の分解速度は加速される。しかし、分解速度が速すぎると、(b)ラジカル重合性化合物の分解残渣が多くなる傾向を有する。一方、加熱温度は低いほど、(a)重合開始剤の分解速度は遅いため、硬化に長時間を必要とする。よって、加熱温度と加熱時間は、前記重合性組成物の組成により適宜設定すべきである。一例として、加熱温度は、50から230℃であることが好ましく、100から200℃であることがより好ましい。また、前記重合性組成物に、前記硬化促進剤を配合する場合には、その種類や配合量により、加熱温度は室温から160℃で任意に調整することができる。一方、加熱時間は1から180分であることが好ましく、5から120分であることがさらに好ましい。 In the step of heating the polymerizable composition, the higher the heating temperature, the faster the decomposition rate of (a) the polymerization initiator. However, if the decomposition rate is too fast, (b) the decomposition residue of the radically polymerizable compound tends to increase. On the other hand, the lower the heating temperature, the slower the decomposition rate of (a) the polymerization initiator, so that it takes a long time to cure. Therefore, the heating temperature and the heating time should be appropriately set according to the composition of the polymerizable composition. As an example, the heating temperature is preferably 50 to 230 ° C, more preferably 100 to 200 ° C. When the curing accelerator is added to the polymerizable composition, the heating temperature can be arbitrarily adjusted from room temperature to 160 ° C. depending on the type and amount of the curing accelerator. On the other hand, the heating time is preferably 1 to 180 minutes, more preferably 5 to 120 minutes.
前記硬化物の製造方法として、前記デュアルキュア工程を適用する場合、特に、重合性組成物を活性エネルギー線で照射する工程の後に、加熱する工程を行うことが、光を吸収や散乱する着色顔料を高濃度に含む重合組成物の塗膜の深部や、光が遮光されて光が届いていない箇所の硬化を効率よく行なうことができるため、好ましい。 When the dual cure step is applied as a method for producing the cured product, in particular, a step of heating the polymerizable composition after the step of irradiating the polymerizable composition with an active energy ray is a coloring pigment that absorbs or scatters light. It is preferable because it is possible to efficiently cure the deep part of the coating film of the polymerization composition containing a high concentration of light and the portion where the light is blocked and the light does not reach.
また、前記重合組成物に前記溶媒を含む場合、前記硬化物の製造方法は、乾燥工程を含むことができる。特に、重合性組成物を基板上に塗布後に、続いて、前記活性エネルギー線で照射する工程を適用する場合、当該活性エネルギー線で照射する工程の前に、乾燥工程を設けることが好ましい。 When the polymerization composition contains the solvent, the method for producing the cured product can include a drying step. In particular, when the step of irradiating the polymerizable composition on the substrate and then irradiating with the active energy ray is applied, it is preferable to provide a drying step before the step of irradiating with the active energy ray.
前記乾燥工程において、溶媒を乾燥させる手法は、例えば、加熱乾燥、通風加熱乾燥、減圧乾燥等が挙げられる。加熱乾燥の方式としては、特に制限されることはないが、例えば、オーブン、ホットプレート、赤外線照射、電磁波照射等が挙げられる。また、通風加熱乾燥の方式としては、例えば、送風式乾燥オーブン等が挙げられる。 Examples of the method for drying the solvent in the drying step include heat drying, ventilation heating drying, and vacuum drying. The heat-drying method is not particularly limited, and examples thereof include an oven, a hot plate, infrared irradiation, and electromagnetic wave irradiation. Further, as a method of ventilation heating and drying, for example, a ventilation type drying oven and the like can be mentioned.
また、前記乾燥工程において、重合性組成物の温度は、溶媒の蒸発潜熱によって、乾燥の設定温度よりも低くなるため、重合性組成物のゲル化するまでの時間を長く確保することができる。このゲル化するまでの時間は、乾燥手法や膜厚等にも影響されるため、溶媒の選定を含めて乾燥温度と時間は適宜設定すべきである。一例として、乾燥温度は、20から120℃であることが好ましく、40から100℃であることがより好ましい。乾燥時間は1から60分であることが好ましく、1から30分であることがより好ましい。また、前記重合禁止剤を使用することで、ゲル化までの時間を長く確保することもできる。なお、前記チオキサントン骨格を有するジアルキルペルオキシドは熱により分解するが、90℃で5分の加熱した際の当該化合物の分解率は0.1%未満であるため、この程度の条件であれば重合性組成物が増粘やゲル化することはない。 Further, in the drying step, the temperature of the polymerizable composition becomes lower than the set temperature of drying due to the latent heat of vaporization of the solvent, so that a long time until the polymerizable composition gels can be secured. Since the time until gelation is affected by the drying method, film thickness, etc., the drying temperature and time should be appropriately set including the selection of the solvent. As an example, the drying temperature is preferably 20 to 120 ° C, more preferably 40 to 100 ° C. The drying time is preferably 1 to 60 minutes, more preferably 1 to 30 minutes. Further, by using the polymerization inhibitor, it is possible to secure a long time until gelation. The dialkyl peroxide having the thioxanthone skeleton is decomposed by heat, but the decomposition rate of the compound when heated at 90 ° C. for 5 minutes is less than 0.1%, so that the compound is polymerizable under such conditions. The composition does not thicken or gel.
前記重合性組成物の乾燥膜厚(硬化物の膜厚)は、用途に応じて適宜設定されるが、0.05から500μmであることが好ましく、0.1から100μmであることがより好ましい。 The dry film thickness (film thickness of the cured product) of the polymerizable composition is appropriately set depending on the intended use, but is preferably 0.05 to 500 μm, more preferably 0.1 to 100 μm. ..
<パターン形成方法>
前記重合性組成物が(c)アルカリ可溶性樹脂を含む場合、フォトリソグラフィー法によりパターンを形成することができる。前述と同様にして重合性組成物を基材に塗布し、必要に応じて、乾燥して乾燥被膜を形成する。そして、乾燥被膜にマスクを介して活性エネルギー線を照射することにより、露光部では(b)ラジカル重合性化合物が重合することで硬化膜となる。一方、レーザーを用いた直接描画により、マスクを介さずに高精度なパターン形状を作製することもできる。<Pattern formation method>
When the polymerizable composition contains (c) an alkali-soluble resin, a pattern can be formed by a photolithography method. The polymerizable composition is applied to the substrate in the same manner as described above, and if necessary, dried to form a dry film. Then, by irradiating the dry film with active energy rays via a mask, the radically polymerizable compound (b) is polymerized in the exposed portion to form a cured film. On the other hand, it is also possible to produce a highly accurate pattern shape without using a mask by direct drawing using a laser.
上記の露光後、未露光部は、例えば、0.3から3質量%の炭酸ナトリウム水溶液等のアルカリ現像液により現像除去され、パターン化した硬化膜が得られる。さらに、硬化膜と基材との密着性を高めること等を目的に、後乾燥として180から250℃、20から90分でのポストベークが行われる。このようにして、硬化膜に基づく所望のパターンが形成される。 After the above exposure, the unexposed portion is developed and removed with an alkaline developer such as 0.3 to 3% by mass of sodium carbonate aqueous solution to obtain a patterned cured film. Further, for the purpose of improving the adhesion between the cured film and the base material, post-baking is performed at 180 to 250 ° C. and 20 to 90 minutes as post-drying. In this way, a desired pattern based on the cured film is formed.
本発明の重合性組成物は、ハードコート剤、光ディスク用コート剤、光ファイバー用コート剤、モバイル端末用塗料、家電用塗料、化粧品容器用塗料、木工用塗料、光学素子用内面反射防止塗料、高・低屈折率コート剤、遮熱コート剤、放熱コート剤、防曇剤等の塗料・コーティング剤;オフセット印刷インキ、グラビア印刷インキ、スクリーン印刷インキ、インクジェット印刷インキ、導電性インキ、絶縁性インキ、導光板用インキ等の印刷インキ;感光性印刷版;ナノインプリント材料;3Dプリンター用樹脂;ホログラフィー記録材料;歯科用材料;導波路用材料;レンズシート用ブラックストライプ;コンデンサ用グリーンシートおよび電極材料;FPD用接着剤、HDD用接着剤、光ピックアップ用接着剤、イメージセンサー用接着剤、有機EL用シール剤、タッチパネル用OCA、タッチパネル用OCR等の接着剤・シール剤;カラーレジスト、ブラックレジスト、カラーフィルター用保護膜、フォトスペーサー、ブラックカラムスペーサー、額縁レジスト、TFT配線用フォトレジスト、層間絶縁膜等のFPD用レジスト;液状ソルダーレジスト、ドライフィルムレジスト等のプリント基板用レジスト;半導体レジスト、バッファーコート膜等の半導体用材料等の各種用途に使用でき、その用途に特に制限は無い。 The polymerizable composition of the present invention includes a hard coating agent, a coating agent for optical disks, a coating agent for optical fibers, a paint for mobile terminals, a paint for home appliances, a paint for cosmetic containers, a paint for woodwork, an internal antireflection paint for optical elements, and a high coating agent. -Paints / coating agents such as low refractive index coating agents, heat shielding coating agents, heat dissipation coating agents, antifogging agents; offset printing inks, gravure printing inks, screen printing inks, inkjet printing inks, conductive inks, insulating inks, Printing inks such as light guide plate inks; Photosensitive printing plates; Nanoimprint materials; Resins for 3D printers; Holography recording materials; Dental materials; Waveguide materials; Black stripes for lens sheets; Green sheets and electrode materials for capacitors; FPD Adhesives for, HDD adhesives, optical pickup adhesives, image sensor adhesives, organic EL sealants, touch panel OCA, touch panel OCR adhesives / sealants; color resists, black resists, color filters Protective film, photo spacer, black column spacer, frame resist, photoresist for TFT wiring, resist for FPD such as interlayer insulating film; resist for printed substrate such as liquid solder resist, dry film resist; semiconductor resist, buffer coat film, etc. It can be used for various purposes such as materials for semiconductors, and there is no particular limitation on the application.
以下に実施例を挙げて本発明をさらに詳細に説明するが、本発明はこれらの実施例のみに限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.
(1)チオキサントン骨格を有するジアルキルペルオキシドの合成
[合成例1:化合物1の合成]
200mL四つ口フラスコに、ベンゼン30mL、2−イソプロピルチオキサントン6.10g(24.0mmol)、塩化銅(I)0.0238g(0.24mmol)を入れ、室温下で撹拌した。69質量%tert−ブチルヒドロペルオキシド水溶液15.7g(120mmol)を徐々に加えた。窒素気流下で65℃に加温し、60時間反応させた。反応液を冷却し、酢酸エチル20mLを添加した後に、水相を分液した。油相を5質量%塩酸、5質量%水酸化ナトリウム水溶液、イオン交換水で洗浄し、無水硫酸マグネシウムで乾燥した。ろ過後、油相を減圧下で濃縮し、粗体を得た。粗体をシリカゲルカラムクロマトグラフィー(n−ヘキサン/酢酸エチル=5/1)で精製し、2.55g(収率31%)の化合物1を得た。得られた化合物1のEI−MSおよび1H−NMRによる分析結果を表1に示す。(1) Synthesis of dialkyl peroxide having a thioxanthone skeleton [Synthesis Example 1: Synthesis of Compound 1]
30 mL of benzene, 6.10 g (24.0 mmol) of 2-isopropylthioxanthone, and 0.0238 g (0.24 mmol) of copper (I) chloride were placed in a 200 mL four-necked flask and stirred at room temperature. 15.7 g (120 mmol) of a 69 mass% tert-butyl hydroperoxide aqueous solution was gradually added. The mixture was heated to 65 ° C. under a nitrogen stream and reacted for 60 hours. The reaction mixture was cooled, 20 mL of ethyl acetate was added, and then the aqueous phase was separated. The oil phase was washed with 5% by mass hydrochloric acid, 5% by mass aqueous sodium hydroxide solution and ion-exchanged water, and dried over anhydrous magnesium sulfate. After filtration, the oil phase was concentrated under reduced pressure to obtain a crude product. The crude product was purified by silica gel column chromatography (n-hexane / ethyl acetate = 5/1) to obtain 2.55 g (yield 31%) of Compound 1. Table 1 shows the analysis results of the obtained compound 1 by EI-MS and 1 1 H-NMR.
[合成例2:化合物2の合成]
本発明の化合物2は、合成例1に記載の69質量%tert−ブチルヒドロペルオキシド水溶液を、85質量%tert−アミルヒドロペルオキシドに変更したこと以外は、合成例1に記載の方法に準じて合成した。得られた化合物2のEI−MSおよび1H−NMRによる分析結果を表1に示す。[Synthesis Example 2: Synthesis of Compound 2]
Compound 2 of the present invention was synthesized according to the method described in Synthesis Example 1 except that the 69% by mass tert-butyl hydroperoxide aqueous solution described in Synthesis Example 1 was changed to 85% by mass tert-amyl hydroperoxide. bottom. Table 1 shows the analysis results of the obtained compound 2 by EI-MS and 1 1 H-NMR.
[合成例3:化合物3の合成]
本発明の化合物3は、合成例1に記載の69質量%tert−ブチルヒドロペルオキシド水溶液を、90質量%tert−ヘキシルヒドロペルオキシドに変更したこと以外は、合成例1に記載の方法に準じて合成した。得られた化合物3のEI−MSおよび1H−NMRによる分析結果を表1に示す。[Synthesis Example 3: Synthesis of Compound 3]
Compound 3 of the present invention was synthesized according to the method described in Synthesis Example 1 except that the 69% by mass tert-butyl hydroperoxide aqueous solution described in Synthesis Example 1 was changed to 90% by mass tert-hexyl hydroperoxide. bottom. Table 1 shows the analysis results of the obtained compound 3 by EI-MS and 1 1 H-NMR.
[合成例4:化合物7の合成]
本発明の化合物7は、合成例1に記載の2−イソプロピルチオキサントンを、2−メトキシ−7−イソプロピルチオキサントンに変更したこと以外は、合成例1に記載の方法に準じて合成した。得られた化合物7のEI−MSおよび1H−NMRによる分析結果を表1に示す。[Synthesis Example 4: Synthesis of Compound 7]
Compound 7 of the present invention was synthesized according to the method described in Synthesis Example 1 except that 2-isopropylthioxanthone described in Synthesis Example 1 was changed to 2-methoxy-7-isopropylthioxanthone. Table 1 shows the analysis results of the obtained compound 7 by EI-MS and 1 1 H-NMR.
[合成例5:化合物8の合成]
本発明の化合物8は、合成例1に記載の2−イソプロピルチオキサントンを、3−メトキシ−7−イソプロピルチオキサントンに変更したこと以外は、合成例1に記載の方法に準じて合成した。得られた化合物8のEI−MSおよび1H−NMRによる分析結果を表1に示す。[Synthesis Example 5: Synthesis of Compound 8]
Compound 8 of the present invention was synthesized according to the method described in Synthesis Example 1 except that 2-isopropylthioxanthone described in Synthesis Example 1 was changed to 3-methoxy-7-isopropylthioxanthone. Table 1 shows the analysis results of the obtained compound 8 by EI-MS and 1 1 H-NMR.
[合成例6:化合物9の合成]
本発明の化合物2は、合成例1に記載の2−イソプロピルチオキサントンを、2−クロロ−7−イソプロピルチオキサントンに変更したこと以外は、合成例1に記載の方法に準じて合成した。得られた化合物9のEI−MSおよび1H−NMRによる分析結果を表1に示す。[Synthesis Example 6: Synthesis of Compound 9]
Compound 2 of the present invention was synthesized according to the method described in Synthesis Example 1 except that 2-isopropylthioxanthone described in Synthesis Example 1 was changed to 2-chloro-7-isopropylthioxanthone. Table 1 shows the analysis results of the obtained compound 9 by EI-MS and 1 1 H-NMR.
(2)UV吸収特性の評価
<実施例1から6、比較例1>
表1に記載される化合物のアセトニトリル溶液について、UV−VISスペクトル測定装置(1.0cm石英セル、島津製作所製、UV−2450)を用いて、波長200から600nmにおけるUV−VISスペクトルを測定した。その結果を表2に示す。(2) Evaluation of UV absorption characteristics <Examples 1 to 6, Comparative Example 1>
The UV-VIS spectrum of the acetonitrile solution of the compound shown in Table 1 was measured at a wavelength of 200 to 600 nm using a UV-VIS spectrum measuring device (1.0 cm quartz cell, manufactured by Shimadzu Corporation, UV-2450). The results are shown in Table 2.
また、比較例として、化合物R1の結果を表2に示す。なお、化合物R1は特開昭59−197401号公報に記載の製法に準じて合成し、EI−MSおよび1H−NMRによって同定した。
表2において、λmaxは最大吸収波長(nm)、εmaxは最大吸収波長にけるモル吸光係数(L・mol−1・cm−1)、ε365は波長365nmにおけるモル吸光係数(L・mol−1・cm−1)、ε385は波長385nmにおけるモル吸光係数(L・mol−1・cm−1)を示す。In Table 2, λ max is the maximum absorption wavelength (nm), ε max is the molar extinction coefficient (L · mol -1 · cm -1 ) at the maximum absorption wavelength, and ε 365 is the molar extinction coefficient (L · mol) at a wavelength of 365 nm. -1 · cm -1 ) and ε 385 indicate the molar extinction coefficient (L · mol -1 · cm -1 ) at a wavelength of 385 nm.
一般的に、露光波長における光重合開始剤のモル吸光係数が大きいほど、光が吸収されやすく、ラジカルの発生が起こりやすい。すなわち、光重合開始剤の高感度化には、露光波長におけるモル吸光係数が大きい化合物が好適である。UV硬化で広く使用される超高圧水銀ランプや高圧水銀ランプは波長365nm(i線)を主波長とした光を効率よく放射する。また、印刷インキ分野等で使用されるLEDランプは波長385nmの単一波長の光を効率よく放射する。表2の結果より、ベンゾフェノン骨格を有するパーオキシエステルである化合物R1に対して、本発明の化合物1、化合物2、化合物3、化合物7、化合物8、および化合物9は、波長365nmおよび波長385nmのモル吸光係数が大きいことが分かる。 In general, the larger the molar extinction coefficient of the photopolymerization initiator at the exposure wavelength, the easier it is for light to be absorbed and for the generation of radicals to occur. That is, a compound having a large molar extinction coefficient at the exposure wavelength is suitable for increasing the sensitivity of the photopolymerization initiator. Ultra-high pressure mercury lamps and high pressure mercury lamps widely used in UV curing efficiently emit light having a wavelength of 365 nm (i-line) as the main wavelength. Further, LED lamps used in the field of printing ink and the like efficiently emit light of a single wavelength having a wavelength of 385 nm. From the results in Table 2, the compounds 1, compound 2, compound 3, compound 7, compound 8 and compound 9 of the present invention have a wavelength of 365 nm and a wavelength of 385 nm with respect to compound R1 which is a peroxyester having a benzophenone skeleton. It can be seen that the molar absorption coefficient is large.
(3)重合性組成物の調製
<重合性組成物(A)の調製>
表3に示す量の(b)ラジカル重合性化合物、(c)アルカリ可溶性樹脂、その他の成分を混合撹拌し、(a)重合開始剤を添加してよく撹拌し、実施例7〜12、実施例19比較例2、および比較例8の重合性組成物(A)を調製した。(3) Preparation of polymerizable composition <Preparation of polymerizable composition (A)>
The amounts of (b) radically polymerizable compound, (c) alkali-soluble resin, and other components shown in Table 3 were mixed and stirred, and (a) a polymerization initiator was added and stirred well. Example 19 The polymerizable composition (A) of Comparative Example 2 and Comparative Example 8 was prepared.
上記表3中、DPHAは、ジペンタエリスリトールペンタアクリレートおよびジペンタエリスリトールヘキサアクリレートの混合物(商品名:アロニックスM−402、東亞合成社製);
RD200は、メタクリル酸メチル/メタクリル酸/シクロヘキシルマレイミド(質量%:61/14/25)共重合物、重量平均分子量:17,000、酸価:90(合成品);
F−477は、フッ素系レベリング剤(商品名:メガファックF−477、DIC社製);
PGMEAは、プロピレングリコールモノメチルエーテルアセテート(和光純薬工業試薬);を示す。In Table 3 above, DPHA is a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate (trade name: Aronix M-402, manufactured by Toagosei Co., Ltd.);
RD200 is a copolymer of methyl methacrylate / methacrylic acid / cyclohexyl maleimide (mass%: 61/14/25), weight average molecular weight: 17,000, acid value: 90 (synthetic product);
F-477 is a fluorine-based leveling agent (trade name: Megafuck F-477, manufactured by DIC Corporation);
PGMEA represents propylene glycol monomethyl ether acetate (Wako Pure Chemical Industries, Ltd. reagent);
<重合性組成物(B)の調製>
表4に示す量の(b)ラジカル重合性化合物、溶媒を混合撹拌し、(a)重合開始剤を添加してよく撹拌し、実施例13から18、実施例26から31、比較例5〜6、および比較例10の重合性組成物(B)を調製した。<Preparation of polymerizable composition (B)>
The amounts of (b) radically polymerizable compound and solvent shown in Table 4 were mixed and stirred, and (a) a polymerization initiator was added and stirred well, and Examples 13 to 18, Examples 26 to 31, and Comparative Examples 5 and 5 were added. The polymerizable composition (B) of 6 and Comparative Example 10 was prepared.
上記表4中、TMPTAは、トリメチロールプロパントリアクリレート(商品名:NKエステルA−TMPT、重合禁止剤(ヒドロキノンモノメチルエーテル)98ppm含有)を示す。 In Table 4 above, TMPTA represents trimethylolpropane triacrylate (trade name: NK ester A-TMPT, containing 98 ppm of a polymerization inhibitor (hydroquinone monomethyl ether)).
(4)超高圧水銀ランプによる感度の評価
<実施例7から12、比較例2>
上記で調製した重合性組成物(A)を、スピンコーターを用いて、アルミニウム基板上に塗布した。塗布後、アルミニウム基板を90℃のクリーンオーブン中で2.5分間乾燥処理により溶媒を乾燥させ、厚さ1.5μmの均一な塗布膜を作製した。次いで、超高圧水銀灯を光源とするプロキシミティー露光機を用い、マスクパターンを介して10から1000mJ/cm2の範囲で、段階露光を行った。露光後のアルミニウム基板を1.0質量%の炭酸ナトリウム水溶液に23℃で60秒間浸漬して、現像による未露光部の除去を行った。続いて純水にて30秒間洗浄を行い、パターン形状を得た。パターン形状が形成される最低露光量を「感度」として評価した。各(a)重合開始剤の評価結果を、表5に示す。(4) Evaluation of Sensitivity by Ultra High Pressure Mercury Lamp <Examples 7 to 12, Comparative Example 2>
The polymerizable composition (A) prepared above was applied onto an aluminum substrate using a spin coater. After coating, the aluminum substrate was dried in a clean oven at 90 ° C. for 2.5 minutes to dry the solvent to prepare a uniform coating film having a thickness of 1.5 μm. Next, using a proximity exposure machine using an ultra-high pressure mercury lamp as a light source, stepwise exposure was performed in the range of 10 to 1000 mJ / cm 2 via a mask pattern. The exposed aluminum substrate was immersed in a 1.0 mass% sodium carbonate aqueous solution at 23 ° C. for 60 seconds to remove the unexposed portion by development. Subsequently, it was washed with pure water for 30 seconds to obtain a pattern shape. The minimum exposure amount at which the pattern shape was formed was evaluated as "sensitivity". The evaluation results of each (a) polymerization initiator are shown in Table 5.
表5の結果より、ベンゾフェノン骨格を有するパーオキシエステルである化合物R1に対して、本発明の化合物1、化合物2、化合物3、化合物7、化合物8、および化合物9の感度が高いことが明らかとなった。これらの化合物は波長365nmのモル吸光係数が高いため、感度が高いと推測される。 From the results in Table 5, it is clear that the sensitivities of Compound 1, Compound 2, Compound 3, Compound 7, Compound 8, and Compound 9 of the present invention are high with respect to Compound R1, which is a peroxyester having a benzophenone skeleton. became. Since these compounds have a high molar extinction coefficient at a wavelength of 365 nm, they are presumed to have high sensitivity.
(5)波長385nmのLEDランプによる感度の評価
<実施例13から18、比較例3から7>
上記で調製した重合性組成物(B)を、バーコーター(#18)を用いて、易接着処理が施されたPETフィルム(コスモシャインA4300、東洋紡社製)上に塗布した。塗布後、PETフィルムを90℃の乾燥機中で2分間乾燥処理により溶媒を乾燥させ、厚さ3μmの均一な塗布膜を作製した。次いで、波長385nmのLEDランプ(UniJet E110III、ウシオ電機社製)を用い、1000mJ/cm2の光照射を行った。その硬化膜部分を減衰全反射赤外分光法(ATR−IR)にて硬化度(%)を測定した。その際、二重結合基の面外変角振動の吸収スペクトル(810cm−1)および露光前後で変化のないカルボニル基の吸収スペクトル(1740cm−1)のピーク面積を用いて、以下の式に基づいて硬化率(硬化度)を算出した。その結果を表6に示す。
The polymerizable composition (B) prepared above was applied onto a PET film (Cosmo Shine A4300, manufactured by Toyobo Co., Ltd.) that had been subjected to an easy-adhesion treatment using a bar coater (# 18). After coating, the PET film was dried in a dryer at 90 ° C. for 2 minutes to dry the solvent to prepare a uniform coating film having a thickness of 3 μm. Next, an LED lamp having a wavelength of 385 nm (UniJet E110III, manufactured by Ushio, Inc.) was used to irradiate light at 1000 mJ / cm 2. The degree of curing (%) of the cured film portion was measured by attenuated total reflection infrared spectroscopy (ATR-IR). At that time, using the peak areas of the absorption spectrum of the out-of-plane variable angle vibration of the double bond group (810 cm -1 ) and the absorption spectrum of the carbonyl group that does not change before and after exposure (1740 cm -1 ), based on the following equation. The curing rate (curing degree) was calculated. The results are shown in Table 6.
また、比較例として、化合物R1から化合物R5の結果を表6に示す。なお、化合物R2はイルガキュア184(BASF製)、化合物R3はイルガキュア819(BASF製)、化合物R4はイルガキュア369(BASF製)、化合物R5はイルガキュアOXE02(BASF製)を使用した。 As a comparative example, the results of compounds R1 to R5 are shown in Table 6. The compound R2 used was Irgacure 184 (manufactured by BASF), the compound R3 used Irgacure 819 (manufactured by BASF), the compound R4 used Irgacure 369 (manufactured by BASF), and the compound R5 used Irgacure OXE02 (manufactured by BASF).
表6の結果より、ベンゾフェノン基を骨格とするパーオキシエステルである化合物R1や他の光重合開始剤(化合物R2〜R5)に対して、化合物1、化合物2、化合物3、化合物7、化合物8、および化合物9の感度が高いことが明らかとなった。これらの化合物は波長385nmのモル吸光係数が高いため、感度が高いと推測される。 From the results in Table 6, the compounds 1, compound 2, compound 3, compound 7, and compound 8 were compared with respect to compound R1 which is a peroxy ester having a benzophenone group as a skeleton and other photopolymerization initiators (compounds R2 to R5). , And compound 9 were found to be highly sensitive. Since these compounds have a high molar extinction coefficient at a wavelength of 385 nm, they are presumed to have high sensitivity.
(6)デュアルキュア硬化特性の評価
<実施例19、比較例8>
上記で調製した重合性組成物(A)を、スピンコーターを用いて、アルミニウム基板上に塗布した。塗布後、アルミニウム基板を90℃の送風定温恒温機中で2.5分間乾燥処理により溶媒を乾燥させ、厚さ1.5μmの均一な塗布膜を作製した。そして、高圧水銀ランプが設置されたコンベア式UV照射装置(ECS−4011GX、アイグラフィックス社製)を使用して100mJ/cm2の光照射を行い、硬化度を測定した。さらに、光照射後のアルミニウム基板を170℃の送風定温恒温機中で30分間加熱処理を行い、硬化度を測定した。その結果を表7に示す。
The polymerizable composition (A) prepared above was applied onto an aluminum substrate using a spin coater. After coating, the aluminum substrate was dried in a constant temperature and constant temperature machine at 90 ° C. for 2.5 minutes to dry the solvent to prepare a uniform coating film having a thickness of 1.5 μm. Then, a conveyor type UV irradiation device (ECS-4011GX, manufactured by Eye Graphics Co., Ltd.) equipped with a high-pressure mercury lamp was used to irradiate light at 100 mJ / cm 2 , and the degree of curing was measured. Further, the aluminum substrate after the light irradiation was heat-treated for 30 minutes in a blower constant temperature incubator at 170 ° C., and the degree of curing was measured. The results are shown in Table 7.
表7の結果より、本発明の化合物は、光硬化性と熱硬化性を有することを特長とすることが明らかである。 From the results in Table 7, it is clear that the compound of the present invention is characterized by having photocurability and thermosetting property.
(7)チオキサントン骨格を有するジアルキルペルオキシドの熱分解の評価
<実施例20から25、比較例9>
ステンレス鋼製密封セルに、1〜2mgの試料を入れ、示差走査型熱量計(DSC、セイコーインスツル社製、EXSTAR6200)にセットし、10℃/分の昇温速度で加熱し、測定した。分解熱による発熱曲線において、変曲点における接線とベースラインの交点を分解開始温度(℃)とした。各(a)重合開始剤の評価結果を、表8に示す。(7) Evaluation of thermal decomposition of dialkyl peroxide having a thioxanthone skeleton <Examples 20 to 25, Comparative Example 9>
A sample of 1 to 2 mg was placed in a stainless steel sealed cell, set in a differential scanning calorimeter (DSC, manufactured by Seiko Instruments Inc., EXSTAR6200), heated at a heating rate of 10 ° C./min, and measured. In the heat generation curve due to heat of decomposition, the intersection of the tangent line and the baseline at the inflection point was defined as the decomposition start temperature (° C.). The evaluation results of each (a) polymerization initiator are shown in Table 8.
表8の結果より、ベンゾフェノン骨格を有するペルオキシエステルである化合物R1に対して、本発明の化合物1、化合物2、化合物3、化合物7、化合物8、および化合物9はより高い温度で分解することが明らかとなった。 From the results in Table 8, compound 1, compound 2, compound 3, compound 7, compound 8 and compound 9 of the present invention can be decomposed at a higher temperature with respect to compound R1 which is a peroxy ester having a benzophenone skeleton. It became clear.
(8)重合性組成物の暗所保存安定性の評価
<実施例26から31、比較例10>
上記で調製した重合性組成物(B)を、褐色のガラス瓶中に入れ、アルミホイルで遮光した後に、60℃に設定した定温恒温機内に静置した。目視でゲル化が生じた日数を、表9に示す。
The polymerizable composition (B) prepared above was placed in a brown glass bottle, shielded from light with aluminum foil, and then allowed to stand in a constant temperature incubator set at 60 ° C. Table 9 shows the number of days when gelation occurred visually.
表9の結果より、ベンゾフェノン骨格を有するペルオキシエステルである化合物R1を含有する重合性組成物に対して、本発明の化合物1、化合物2、化合物3、化合物7、化合物8、および化合物9を含有する重合性組成物は、暗所での保存安定性に優れることが明らかとなった。 From the results in Table 9, the polymerizable composition containing the compound R1 which is a peroxyester having a benzophenone skeleton contains the compound 1, the compound 2, the compound 3, the compound 7, the compound 8 and the compound 9 of the present invention. It has been clarified that the polymerizable composition is excellent in storage stability in a dark place.
Claims (6)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018179726 | 2018-09-26 | ||
JP2018179726 | 2018-09-26 | ||
PCT/JP2019/037507 WO2020067118A1 (en) | 2018-09-26 | 2019-09-25 | Dialkyl peroxide including thioxanthone skeleton and polymerizable composition containing said compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2020067118A1 true JPWO2020067118A1 (en) | 2021-09-02 |
JP7421169B2 JP7421169B2 (en) | 2024-01-24 |
Family
ID=69951921
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020549270A Active JP7421169B2 (en) | 2018-09-26 | 2019-09-25 | Dialkyl peroxide having a thioxanthone skeleton, polymerizable composition containing the compound |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7421169B2 (en) |
KR (1) | KR20210068387A (en) |
CN (1) | CN112236420B (en) |
TW (1) | TWI818087B (en) |
WO (1) | WO2020067118A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7385830B2 (en) | 2020-03-13 | 2023-11-24 | 日油株式会社 | Method for manufacturing cured product |
JP7354891B2 (en) * | 2020-03-19 | 2023-10-03 | 日油株式会社 | light curing ink |
JP7382010B2 (en) | 2020-03-19 | 2023-11-16 | 日油株式会社 | Polymerization initiator mixture, polymerizable composition, cured product, and method for producing cured product |
JP7371548B2 (en) * | 2020-03-19 | 2023-10-31 | 日油株式会社 | Adhesive composition and adhesive sheet |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59197401A (en) * | 1983-04-26 | 1984-11-09 | Nippon Oil & Fats Co Ltd | Photopolymerization initiator |
GB8312721D0 (en) * | 1983-05-09 | 1983-06-15 | Vickers Plc | Photoinitiators |
JPS63146903A (en) * | 1986-12-10 | 1988-06-18 | Hitachi Chem Co Ltd | Photopolymerization initiator and photopolymerizable composition using said initiator |
JP2734101B2 (en) * | 1989-07-19 | 1998-03-30 | 日本油脂株式会社 | Dialkyl peroxides and their uses |
JP2734113B2 (en) * | 1989-09-05 | 1998-03-30 | 日本油脂株式会社 | Dialkyl peroxides and their uses |
US5091586A (en) * | 1989-07-19 | 1992-02-25 | Nippon Oil And Fats Company, Limited | Novel dialkyl peroxides, production method and use thereof |
JP4213792B2 (en) | 1998-09-24 | 2009-01-21 | 日東電工株式会社 | Thermosetting pressure-sensitive adhesive and its adhesive sheets |
JP4211096B2 (en) | 1998-10-26 | 2009-01-21 | 日油株式会社 | Polymerization initiator for acrylonitrile copolymer and method for producing acrylonitrile copolymer using the same |
JP6923130B2 (en) * | 2017-08-31 | 2021-08-18 | 学校法人東京理科大学 | A benzophenone derivative having a peroxyester group, a polymerizable composition containing the compound, a cured product thereof, and a method for producing the cured product. |
JP6995309B2 (en) * | 2017-08-31 | 2022-01-14 | 学校法人東京理科大学 | A polymerizable composition containing a thioxanthone derivative having a peroxyester group, a cured product thereof, and a method for producing the cured product. |
-
2019
- 2019-09-25 CN CN201980037771.9A patent/CN112236420B/en active Active
- 2019-09-25 JP JP2020549270A patent/JP7421169B2/en active Active
- 2019-09-25 TW TW108134528A patent/TWI818087B/en active
- 2019-09-25 WO PCT/JP2019/037507 patent/WO2020067118A1/en active Application Filing
- 2019-09-25 KR KR1020217001305A patent/KR20210068387A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP7421169B2 (en) | 2024-01-24 |
TWI818087B (en) | 2023-10-11 |
CN112236420A (en) | 2021-01-15 |
CN112236420B (en) | 2023-11-24 |
WO2020067118A1 (en) | 2020-04-02 |
TW202024048A (en) | 2020-07-01 |
KR20210068387A (en) | 2021-06-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6923130B2 (en) | A benzophenone derivative having a peroxyester group, a polymerizable composition containing the compound, a cured product thereof, and a method for producing the cured product. | |
JP7021668B2 (en) | Triazine peroxide derivative, a polymerizable composition containing the compound | |
JP6995309B2 (en) | A polymerizable composition containing a thioxanthone derivative having a peroxyester group, a cured product thereof, and a method for producing the cured product. | |
JP6970922B2 (en) | A peroxycinnamate derivative, a polymerizable composition containing the compound and a cured product thereof, and a method for producing the cured product. | |
JP7031605B2 (en) | Peroxycinnamate derivative, polymerizable composition containing the compound | |
JP7421169B2 (en) | Dialkyl peroxide having a thioxanthone skeleton, polymerizable composition containing the compound | |
JP7382010B2 (en) | Polymerization initiator mixture, polymerizable composition, cured product, and method for producing cured product | |
JP7371554B2 (en) | Bisoxime ester photopolymerization initiator, polymerizable composition, cured product and method for producing the same | |
JP2020152776A (en) | Photopolymerizable composition and cured product thereof | |
JP7385830B2 (en) | Method for manufacturing cured product | |
JP2022069041A (en) | Polymerization initiator mixture, polymerizable composition, cured object and production method of cured object | |
WO2023054225A1 (en) | Triazine peroxide derivative and production method thereof, polymerizable composition, and cured product and production method thereof | |
TW202344502A (en) | Polymerization initiator, polymerizable composition, cured product and hydroperoxide having thioxanthone skeleton | |
JP2024093292A (en) | Manufacturing method of the cured product | |
JP2022092141A (en) | Polymerizable composition, cured product, and method of producing cured product | |
JP2022097777A (en) | Polymerizable composition, cured product, and method for producing cured product | |
JP2023119202A (en) | Oxygen inhibition reducing agent, polymerizable composition, cured product, and method of producing cured product | |
JP2021147538A (en) | Photocurable ink |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20201014 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20201014 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220906 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230928 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20231213 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20231226 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7421169 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |