JPWO2019206548A5 - - Google Patents

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Publication number
JPWO2019206548A5
JPWO2019206548A5 JP2020559478A JP2020559478A JPWO2019206548A5 JP WO2019206548 A5 JPWO2019206548 A5 JP WO2019206548A5 JP 2020559478 A JP2020559478 A JP 2020559478A JP 2020559478 A JP2020559478 A JP 2020559478A JP WO2019206548 A5 JPWO2019206548 A5 JP WO2019206548A5
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JP
Japan
Prior art keywords
actuator
less
support member
common actuator
support
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JP2020559478A
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Japanese (ja)
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JP7079858B2 (en
JP2021522544A (en
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Priority claimed from EP18169639.4A external-priority patent/EP3385792A3/en
Application filed filed Critical
Priority claimed from PCT/EP2019/057672 external-priority patent/WO2019206548A1/en
Publication of JP2021522544A publication Critical patent/JP2021522544A/en
Publication of JPWO2019206548A5 publication Critical patent/JPWO2019206548A5/ja
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Description

一実施形態では、例えば、図６ｂに示されるように、支持部材１０３は、１０μｍ以下、好ましくは５μｍ以下、より好ましくは１μｍ以下の増分で第１の方向に移動可能であるように構成されている。前記増分は、例えば、アクチュエータ１０３．１及び／又は共通アクチュエータ１５１によって達成される。 In one embodiment, for example, as shown in FIG. 6b, the support member 103 is movable in the first direction in increments of 10 μm or less, preferably 5 μm or less, more preferably 1 μm or less. It is configured. The increment is achieved, for example, by actuator 103.1 and / or common actuator 151.

一実施形態では、アクチュエータ１０３．１及び／又は共通アクチュエータ１５１は、支持部材１０３を約１１ｍｍの範囲にわたって第１の方向に移動させるように配置されている。 In one embodiment, the actuator 103.1 and / or the common actuator 151 is arranged to move the support member 103 in a first direction over a range of about 11 mm .

一実施形態では、ステージ装置１０１は、支持部材１０３が支持構成にあるときに、第１の方向の空間補償が最大５５０μｍである物体を収容するように配置されるのがよい。 In one embodiment, the stage device 101 is preferably arranged to accommodate an object having a spatial compensation of up to 550 μm in the first direction when the support member 103 is in the support configuration.

JP2020559478A 2018-04-26 2019-03-27 Stage equipment, lithography equipment, control units and methods Active JP7079858B2 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP18169639.4 2018-04-26
EP18169639.4A EP3385792A3 (en) 2018-04-26 2018-04-26 Stage apparatus for use in a lithographic apparatus
EP19150671.6 2019-01-08
EP19150671 2019-01-08
PCT/EP2019/057672 WO2019206548A1 (en) 2018-04-26 2019-03-27 Stage apparatus, lithographic apparatus, control unit and method

Publications (3)

Publication Number Publication Date
JP2021522544A JP2021522544A (en) 2021-08-30
JPWO2019206548A5 true JPWO2019206548A5 (en) 2022-02-15
JP7079858B2 JP7079858B2 (en) 2022-06-02

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020559478A Active JP7079858B2 (en) 2018-04-26 2019-03-27 Stage equipment, lithography equipment, control units and methods

Country Status (6)

Country Link
US (1) US11243476B2 (en)
JP (1) JP7079858B2 (en)
KR (1) KR102493253B1 (en)
CN (1) CN112041750A (en)
NL (1) NL2022818A (en)
WO (1) WO2019206548A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3764165A1 (en) 2019-07-12 2021-01-13 ASML Netherlands B.V. Substrate shape measuring device
DE102019008104A1 (en) * 2019-11-21 2021-05-27 Vat Holding Ag Method for monitoring, determining and positioning a pin lifting system

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8300220A (en) 1983-01-21 1984-08-16 Philips Nv DEVICE FOR THE RADIATION LITHOGRAPHIC TREATMENT OF A THIN SUBSTRATE.
JP3477777B2 (en) * 1993-01-22 2003-12-10 株式会社日立製作所 Projection exposure apparatus and method
JPH0758191A (en) * 1993-08-13 1995-03-03 Toshiba Corp Wafer stage device
US5563684A (en) 1994-11-30 1996-10-08 Sgs-Thomson Microelectronics, Inc. Adaptive wafer modulator for placing a selected pattern on a semiconductor wafer
JPH1154423A (en) * 1997-07-31 1999-02-26 Horiba Ltd Aligner
US6020964A (en) 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
JP2002064132A (en) * 2000-08-22 2002-02-28 Tokyo Electron Ltd Delivery method of member to be treated, placement mechanism for the member and probing device
SG2010050110A (en) 2002-11-12 2014-06-27 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2004228453A (en) 2003-01-27 2004-08-12 Renesas Technology Corp Method of manufacturing semiconductor device
US6805338B1 (en) 2003-06-13 2004-10-19 Lsi Logic Corporation Semiconductor wafer chuck assembly for a semiconductor processing device
WO2005119802A2 (en) 2004-05-28 2005-12-15 Board Of Regents, The University Of Texas System Adaptive shape substrate support system and method
DE102005043569A1 (en) 2005-09-12 2007-03-22 Dr. Johannes Heidenhain Gmbh Position measuring device
JP2007189181A (en) 2006-01-10 2007-07-26 Horon:Kk Exposure stage device
KR20070119386A (en) * 2006-06-15 2007-12-20 세메스 주식회사 Apparatus for manufacturing flat panel display
JP5090079B2 (en) 2007-06-27 2012-12-05 大日本スクリーン製造株式会社 Vacuum dryer
JP5406475B2 (en) 2008-07-28 2014-02-05 大日本スクリーン製造株式会社 Heat treatment equipment
JP2010056217A (en) 2008-08-27 2010-03-11 Dainippon Screen Mfg Co Ltd Substrate lifting apparatus and substrate processing apparatus
JP2011091070A (en) 2009-10-20 2011-05-06 Nikon Corp Holding member, stage device, reflective member, reflective device, measuring device, exposure device, device manufacturing method, method for changing shape of surface of plate-like member, exposure method, method for changing shape of reflective surface, and measuring method
JP5141707B2 (en) * 2010-03-24 2013-02-13 株式会社安川電機 SUPPORT MECHANISM AND SUPPORT METHOD FOR PROCESSED BODY AND CONVEYING SYSTEM HAVING THE SAME
EP2656378B1 (en) 2010-12-20 2015-03-18 Ev Group E. Thallner GmbH Accommodating device for retaining wafers
JP2013161946A (en) 2012-02-06 2013-08-19 Tokyo Electron Ltd Substrate processing apparatus and substrate processing method
JP5912654B2 (en) 2012-02-24 2016-04-27 株式会社東芝 Substrate holding device, pattern transfer device, and pattern transfer method
JP2014003259A (en) * 2012-06-21 2014-01-09 Nikon Corp Load method, substrate holding apparatus, and exposure apparatus
JP2015050418A (en) 2013-09-04 2015-03-16 東京エレクトロン株式会社 Substrate cooling device, substrate cooling method, and substrate processing device
KR102411747B1 (en) * 2013-10-30 2022-06-22 가부시키가이샤 니콘 Substrate-holding apparatus, exposure apparatus, and device manufacturing method
CN106255924B (en) 2014-05-06 2019-12-10 Asml荷兰有限公司 Substrate support, method for loading a substrate on a substrate support position, lithographic apparatus and device manufacturing method
JP5865475B2 (en) * 2014-12-16 2016-02-17 株式会社東芝 Substrate holding device, pattern transfer device, and pattern transfer method
EP3385792A3 (en) 2018-04-26 2018-12-26 ASML Netherlands B.V. Stage apparatus for use in a lithographic apparatus

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