JPWO2018131509A1 - 撮像素子、製造方法、および電子機器 - Google Patents
撮像素子、製造方法、および電子機器 Download PDFInfo
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Abstract
Description
・自動停止等の安全運転や、運転者の状態の認識等のために、自動車の前方や後方、周囲、車内等を撮影する車載用センサ、走行車両や道路を監視する監視カメラ、車両間等の測距を行う測距センサ等の、交通の用に供される装置
・ユーザのジェスチャを撮影して、そのジェスチャに従った機器操作を行うために、TVや、冷蔵庫、エアーコンディショナ等の家電に供される装置
・内視鏡や、赤外光の受光による血管撮影を行う装置等の、医療やヘルスケアの用に供される装置
・防犯用途の監視カメラや、人物認証用途のカメラ等の、セキュリティの用に供される装置
・肌を撮影する肌測定器や、頭皮を撮影するマイクロスコープ等の、美容の用に供される装置
・スポーツ用途等向けのアクションカメラやウェアラブルカメラ等の、スポーツの用に供される装置
・畑や作物の状態を監視するためのカメラ等の、農業の用に供される装置
本開示に係る技術(本技術)は、様々な製品へ応用することができる。例えば、本開示に係る技術は、内視鏡手術システムに適用されてもよい。
本開示に係る技術(本技術)は、様々な製品へ応用することができる。例えば、本開示に係る技術は、内視鏡手術システムに適用されてもよい。
本開示に係る技術(本技術)は、様々な製品へ応用することができる。例えば、本開示に係る技術は、自動車、電気自動車、ハイブリッド電気自動車、自動二輪車、自転車、パーソナルモビリティ、飛行機、ドローン、船舶、ロボット等のいずれかの種類の移動体に搭載される装置として実現されてもよい。
(1)
複数の画素が行列状に配置され、前記画素ごとに光を集光する複数のマイクロレンズが形成される有効画素領域と、
前記有効画素領域の外側を囲うように設けられ、前記有効画素領域の辺方向に対して直交する方向に長手方向が延在する複数本のスリット型の光回折格子が形成される有効画素周辺領域と
を備える撮像素子。
(2)
前記スリット型の光回折格子および前記マイクロレンズに対して反射防止膜が成膜されている
上記(1)に記載の撮像素子。
(3)
前記有効画素周辺領域における前記スリット型の光回折格子は、前記有効画素領域において前記マイクロレンズを形成するのと同一の工程において形成される
上記(1)または(2)に記載の撮像素子。
(4)
前記有効画素周辺領域の前記スリット型の光回折格子、および、前記有効画素領域の前記マイクロレンズは、エッチング法により形成される
上記(1)から(3)までのいずれかに記載の撮像素子。
(5)
前記有効画素周辺領域の前記スリット型の光回折格子、および、前記有効画素領域の前記マイクロレンズは、熱リフロー法により形成される
上記(1)から(3)までのいずれかに記載の撮像素子。
(6)
前記有効画素周辺領域の前記スリット型の光回折格子が、前記有効画素領域の前記マイクロレンズとは異なる材料で構成される
上記(1)から(5)までのいずれかに記載の撮像素子。
(7)
複数の画素が行列状に配置される有効画素領域に、前記画素ごとに光を集光する複数のマイクロレンズを形成し、
前記有効画素領域の外側を囲うように設けられる有効画素周辺領域に、前記有効画素領域の辺方向に対して直交する方向に長手方向が延在する複数本のスリット型の光回折格子を形成する
ステップを含む製造方法。
(8)
複数の画素が行列状に配置され、前記画素ごとに光を集光する複数のマイクロレンズが形成される有効画素領域と、
前記有効画素領域の外側を囲うように設けられ、前記有効画素領域の辺方向に対して直交する方向に長手方向が延在する複数本のスリット型の光回折格子が形成される有効画素周辺領域と
を有する撮像素子を備える電子機器。
Claims (8)
- 複数の画素が行列状に配置され、前記画素ごとに光を集光する複数のマイクロレンズが形成される有効画素領域と、
前記有効画素領域の外側を囲うように設けられ、前記有効画素領域の辺方向に対して直交する方向に長手方向が延在する複数本のスリット型の光回折格子が形成される有効画素周辺領域と
を備える撮像素子。 - 前記スリット型の光回折格子および前記マイクロレンズに対して反射防止膜が成膜されている
請求項1に記載の撮像素子。 - 前記有効画素周辺領域における前記スリット型の光回折格子は、前記有効画素領域において前記マイクロレンズを形成するのと同一の工程において形成される
請求項1に記載の撮像素子。 - 前記有効画素周辺領域の前記スリット型の光回折格子、および、前記有効画素領域の前記マイクロレンズは、エッチング法により形成される
請求項1に記載の撮像素子。 - 前記有効画素周辺領域の前記スリット型の光回折格子、および、前記有効画素領域の前記マイクロレンズは、熱リフロー法により形成される
請求項1に記載の撮像素子。 - 前記有効画素周辺領域の前記スリット型の光回折格子が、前記有効画素領域の前記マイクロレンズとは異なる材料で構成される
請求項1に記載の撮像素子。 - 複数の画素が行列状に配置される有効画素領域に、前記画素ごとに光を集光する複数のマイクロレンズを形成し、
前記有効画素領域の外側を囲うように設けられる有効画素周辺領域に、前記有効画素領域の辺方向に対して直交する方向に長手方向が延在する複数本のスリット型の光回折格子を形成する
ステップを含む製造方法。 - 複数の画素が行列状に配置され、前記画素ごとに光を集光する複数のマイクロレンズが形成される有効画素領域と、
前記有効画素領域の外側を囲うように設けられ、前記有効画素領域の辺方向に対して直交する方向に長手方向が延在する複数本のスリット型の光回折格子が形成される有効画素周辺領域と
を有する撮像素子を備える電子機器。
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