JPWO2007135900A1 - Gravure plate making roll and method for producing the same - Google Patents

Abstract

Provided are a gravure printing roll having improved durability and longer life than a conventional gravure printing roll with an exposed resin layer, and a method for producing the same. A plate base material, a resin layer provided on the surface of the plate base material, a gravure cell formed on the resin layer, and a surface-enhanced coating layer formed so as to cover the surfaces of the resin layer and the gravure cell And a gravure platemaking roll containing. The surface reinforcing coating layer is preferably a DLC coating layer, a silicon dioxide coating layer, or a chrome plating coating layer.

Description

  The present invention relates to a gravure plate-making roll used for gravure printing, and relates to a gravure plate-making roll having improved surface portion durability and a method for producing the same.

  Conventionally, as a gravure plate roll made of resin, for example, in a sheet-like resin base material, a light absorbing material wrapped with a hydrophilic substance or a hydrophilic film or a hydrophilic substance wrapped with a light absorbing film is incorporated. There is a thing (patent document 1).

  However, the resin-made gravure plate roll as described above has a drawback that its surface hardness is remarkably lower than that of a hard chrome plated metal, and includes a thermoplastic resin and a light absorber in order to eliminate such a drawback. In some plate materials for laser plate making, a water repellent or an oil repellent is further contained (Patent Document 2).

  However, the conventional gravure plate roll as described above has a problem in durability because the resin surface is exposed on the surface, and there is a problem that the life is reached by printing about several thousand sheets.

  In addition, the applicant of the present application forms a resin film on the surface of the plate base so that the film thickness becomes equal to the cell depth, forms an ultra-hard film on the surface of the resin film, and irradiates the laser with a super-hard film. A gravure printing plate has been proposed in which a part of a hard film and a part of a resin film are burned off to expose a plate substrate and a cell for containing ink is formed therein (Patent Document 3).

However, in Patent Document 3, it is necessary to remove the ultra-hard film and the resin film with a laser in order to form a gravure cell. For this reason, after the gravure cell is formed, there is a portion where the resin film and the plate base material are exposed, so that the printing durability is a problem.
JP-A-5-246165 JP-A-7-276837 JP-A-11-309950 JP 2003-197611 A

  The present invention has been made in view of the above-described problems of the prior art. A gravure printing roll with improved durability and longer life than a conventional gravure printing roll with an exposed resin layer, and a method for manufacturing the same. The purpose is to provide.

  In order to solve the above-described problems, a gravure plate making roll of the present invention includes a plate base material, a resin layer provided on the surface of the plate base material, a gravure cell formed on the resin layer, the resin layer, and And a surface-enhanced coating layer formed so as to cover the surface of the gravure cell.

  The method for producing a gravure plate roll of the present invention includes a step of preparing a plate base material, a resin layer forming step of forming a resin layer on the surface of the plate base material, and a gravure cell formation of forming a gravure cell on the resin layer And a resin layer on which the gravure cell is formed and a surface reinforcing coating layer forming step of forming a surface reinforcing coating layer so as to cover the surface of the gravure cell.

  As the plate base material, for example, aluminum, iron, or CFRP (carbon fiber reinforced resin) in a hollow roll shape is preferably used.

  It is preferable that the resin layer has a thickness of 5 μm to 50 μm, the gravure cell has a depth of 3 μm to 10 μm, and the surface reinforcing coating layer has a thickness of 0.1 to 10 μm.

  Examples of the resin (synthetic resin) used in the resin layer include phenol resin, polyethylene, polypropylene, polyester, polyacrylate, polystyrene, polyvinylidene chloride, polycarbonate, ethylene / vinyl acetate copolymer, ethylene / acrylic. Acid copolymer, ethylene / vinyl alcohol copolymer, polyvinyl acetate, urethane, polyacrylonitrile, polybutene, polyacetal, polyamide, polyimide, aramid, ionomer, nitrified cotton, polyethylene naphthalate, methyl terpene copolymer, polyfluorination Vinyl, fluorine resin, ethylene trifluoride ethylene, tetrafluoroethylene, carboxylated olefin, etc. can be applied.

  As a method for forming the gravure cell, a laser method (laser oscillator, for example, a laser oscillated by a YAG laser device is used to irradiate the resin layer surface to form a predetermined gravure cell) or an electronic engraving method (diamond engraving by a digital signal) For example, a gravure cell may be engraved on the surface of the resin layer by mechanically operating a needle.

  As the surface-enhanced coating layer, a conventional surface-enhanced coating layer such as chrome plating, a diamond-like carbon (DLC) coating layer, a silicon dioxide coating layer formed from perhydropolysilazane, or the like can be applied.

  When chromium plating is performed as the surface reinforcing coating layer, chromium plating may be performed by a conventionally known method.

  When a DLC coating layer is formed as the surface reinforcing coating layer, it is preferable to provide an adhesion layer between the resin layer and the DLC coating layer.

As a method for forming the DLC coating layer, a PVD method or a CVD method can be used.
As the PVD method, a known method such as a sputtering method, a vacuum deposition method (electron beam method), an ion plating method, an MBE method (molecular beam epitaxy method), a laser ablation method, or an ion assist film forming method can be applied.
As the CVD method, an APCVD method (Atmospheric Pressure Chemical Vapor Deposition) for forming a film at normal pressure, an LPCVD method (Low Pressure Chemical Vapor Deposition) for forming a film at a reduced pressure of about 0.05 Torr, a pressure of about 600 Torr slightly lower than the normal pressure. SACVD method (Subatmospheric Pressure Chemical Vapor Deposition), ultrahigh vacuum UHVCVD method (Ultra-High-Vacuum Chemical Vapor Deposition), 600-1000 ° C high-temperature thermal CVD method, 200-450 ° C using high-frequency plasma energy Known methods such as plasma-enhanced chemical vapor deposition (plasma-enhanced chemical vapor deposition), photo-enhanced chemical vapor deposition using ultraviolet light excitation, and MOCVD (metal organic chemical vapor deposition) for compound crystal growth using an organic metal as a source Can be applied.

  In forming the DLC coating layer by the PVD method, it is preferable to form the DLC coating layer after providing a metal layer and a metal carbide layer of the metal as an adhesion layer on the resin layer. As the metal of the metal layer, a metal that can be carbonized and has high affinity with copper is preferably used. Tungsten (W), silicon (Si), titanium (Ti), chromium (Cr), tantalum (Ta) And one or more metals selected from the group consisting of zirconium (Zr) are preferably used. The metal carbide layer is a metal carbide gradient layer, and the composition ratio of carbon in the metal carbide gradient layer is set so that the carbon ratio gradually increases from the metal layer side to the DLC coating layer direction. It is preferable.

  In forming the DLC coating layer by the CVD method, it is preferable to form the DLC coating layer after providing the adhesion layer on the resin layer, and the adhesion layer includes aluminum (Al), phosphorus (P), More preferably, it is formed of one or more selected from the group consisting of titanium (Ti) and silicon (Si).

  When forming a silicon dioxide coating layer formed from a perhydropolysilazane solution as a surface reinforcing coating layer, a known solvent may be used as a solvent for dissolving perhydropolysilazane. For example, benzene, toluene, xylene, Ether, THF, methylene chloride, carbon tetrachloride, solvesso, diisopropyl ether, methyl tertiary butyl ether, decahydronaphthalene and anisole, decalin, cyclohexane, cyclohexene, methylcyclohexane, ethylcyclohexane, limonene as described in Patent Document 4 , Hexane, octane, nonane, decane, C8-C11 alkane mixture, C18-C11 aromatic hydrocarbon mixture, aliphatic / alicyclic hydrocarbon containing 5 to 25% by weight of C8 or more aromatic hydrocarbon Mixture, and dibutyl ether, etc. can be used.

  The perhydropolysilazane solution prepared by dissolving in the above-mentioned various solvents can be converted into silicon dioxide by heating with superheated steam, but the reaction rate is increased, the reaction time is shortened, the reaction temperature is decreased, and formed. It is preferable to use a catalyst for the purpose of improving the adhesion of the silicon dioxide coating layer. These catalysts are also known. For example, amines and palladium are used. Specifically, organic amines, for example, primary to tertiary straight chain in which 1-3 C1-C5 alkyl groups are arranged. Aliphatic amines, primary to tertiary aromatic amines having 1 to 3 phenyl groups arranged, pyridine or cyclic aliphatic amines in which an alkyl group such as methyl or ethyl group is substituted with a nucleus. More preferable examples include diethylamine, triethylamine, monobutylamine, monopropylamine, dipropylamine and the like. These catalysts may be added in advance to the perhydropolysilazane solution, or may be contained in a vaporized state in the treatment atmosphere during the heat treatment with superheated steam.

  As a method of applying the perhydropolysilazane solution, spray coating, inkjet coating, meniscus coating, fountain coating, dip coating, spin coating, roll coating, wire bar coating, air knife coating, blade coating, A known coating method such as curtain coating can be applied.

  In the silicon dioxide coating layer forming step in which the coating layer of the perhydropolysilazane solution is a silicon dioxide coating layer, the perhydropolysilazane coating layer is heated with superheated steam for a predetermined time to form a silicon dioxide coating layer having a predetermined hardness. Is preferred. The temperature of the superheated steam is 100 ° C. or higher, preferably more than 100 ° C. and 300 ° C. or lower. Needless to say, an optimum temperature is appropriately set according to the material of the hollow roll and the resin layer.

  The heat treatment in the silicon dioxide coating layer forming step is preferably a multi-step heat treatment including a primary heat treatment and a secondary heat treatment, and the conditions of the primary heat treatment are 100 ° C. to 170 ° C., 1 The temperature of the secondary heat treatment is set to 140 ° C. to 200 ° C. and 1 minute to 30 minutes, and the temperature of the secondary heat treatment is set higher than the temperature of the primary heat treatment. It is more preferable.

  ADVANTAGE OF THE INVENTION According to this invention, durability is improved rather than the conventional gravure printing roll which exposed the resin layer, and there exists a remarkable effect that the gravure printing roll and its manufacturing method which aimed at lifetime improvement can be provided. .

It is a schematic diagram which shows the process order of the manufacturing method of the gravure printing roll of this invention. It is a flowchart which shows the process order of the manufacturing method of the gravure printing roll of this invention.

Explanation of symbols

  10: Gravure plate making roll, 12: Plate base material, 14: Resin layer, 16: Gravure cell, 18: Surface strengthening coating layer.

  DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the accompanying drawings, but these embodiments are exemplarily shown, and it goes without saying that various modifications can be made without departing from the technical idea of the present invention. .

  FIG. 1 is a schematic diagram showing the order of steps of a method for producing a gravure plate-making roll of the present invention. FIG. 2 is a flowchart showing the order of steps in the method for producing a gravure printing roll according to the present invention.

  The gravure plate-making roll of this invention and its manufacturing method are demonstrated using FIG.1 and FIG.2. In the figure, reference numeral 10 denotes a gravure plate making roll of the present invention. As shown in FIG. 1 (d), the gravure plate roll 10 of the present invention includes a plate base material 12, a resin layer 14 provided on the surface of the plate base material 12, and a gravure formed on the resin layer 14. The cell 16 includes a resin layer 14 and a surface reinforcing coating layer 18 provided on the surface of the gravure cell 16.

  In producing the gravure plate making roll 10, first, a plate base material 12 is prepared (step 100 in FIG. 1 (a) and FIG. 2). As the plate base material 12, a hollow roll made of aluminum, iron, CFRP (carbon fiber reinforced resin) or the like can be used.

  Next, the resin layer 14 is formed on the surface of the plate base material 12 (step 102 in FIG. 1B and FIG. 2). Examples of the resin used for the resin layer 14 include phenol resin, polyethylene, polypropylene, polyester, polyacrylic ester, polystyrene, polyvinylidene chloride, polycarbonate, ethylene / vinyl acetate copolymer, ethylene / acrylic acid copolymer, Ethylene / vinyl alcohol copolymer, polyvinyl acetate, urethane, polyacrylonitrile, polybutene, polyacetal, polyamide, polyimide, aramid, ionomer, nitrified cotton, polyethylene naphthalate, methyl terpene copolymer, polyvinyl fluoride, fluorine resin, For example, ethylene trifluoride ethylene, tetrafluoroethylene, carboxylated olefin, and the like can be applied. In addition, when heat processing is performed in the formation process etc. of a surface reinforcement | strengthening coating layer, it is necessary to use resin which has heat resistance which can endure this heat processing. The thickness of the resin layer is preferably 5 μm to 50 μm.

  Next, the gravure cell 16 is formed in the resin layer 14 (step 104 in FIG. 1C and FIG. 2). As the method for forming the gravure cell 16, a laser method (laser oscillator, for example, a laser oscillated by a YAG laser device is applied to the resin layer surface to form a predetermined gravure cell) or an electronic engraving method (by a digital signal). A diamond engraving needle is mechanically operated to engrave a gravure cell on the surface of the resin layer). The depth of the gravure cell is preferably 3 μm to 10 μm.

  And the surface reinforcement | strengthening coating layer 18 is formed on the resin layer 14 in which the gravure cell 16 was formed (FIG.1 (d) and step 106 of FIG. 2). As the surface-enhanced coating layer 18, a diamond-like carbon (DLC) coating layer or a silicon dioxide coating layer formed using perhydropolysilazane as a raw material can be applied in addition to a conventionally known surface-enhanced coating layer such as a chromium plating coating layer. .

  When a chrome plating coating layer is applied as the surface reinforcing coating layer 18, chrome plating may be performed by a conventionally known method.

When a DLC coating layer is formed as the surface reinforcing coating layer 18, a PVD method or a CVD method can be used as a method for forming the DLC coating layer.
As the PVD method, a known method such as a sputtering method, a vacuum deposition method (electron beam method), an ion plating method, an MBE method (molecular beam epitaxy method), a laser ablation method, or an ion assist film forming method can be applied.

As the CVD method, an APCVD method (Atmospheric Pressure Chemical Vapor Deposition) for forming a film at normal pressure, an LPCVD method (Low Pressure Chemical Vapor Deposition) for forming a film at a reduced pressure of about 0.05 Torr, a pressure of about 600 Torr slightly lower than the normal pressure. SACVD method (Subatmospheric Pressure Chemical Vapor Deposition), ultra-high-vacuum UHVCVD method (Ultra-High-Vacuum Chemical Vapor Deposition), high-temperature thermal CVD method of 600-1000 ° C, and high-frequency plasma energy at 200-450 ° C Known methods such as plasma-enhanced chemical vapor deposition (plasma-enhanced chemical vapor deposition), photo-enhanced chemical vapor deposition using ultraviolet light excitation, and MOCVD (metal organic chemical vapor deposition) for compound crystal growth using an organic metal as a source Is applicable.
As the hydrocarbon-based source gas used for forming the DLC coating layer in the CVD method, one or more of known gas types such as cyclohexane, benzene, acetylene, methane, butylbenzene, toluene, and cyclopentane are used. Is used.

In forming the DLC coating layer on the resin layer 14 as the surface reinforcing coating layer 18, it is preferable to form the DLC coating layer after providing an adhesion layer on the resin layer 14.
When the DLC coating layer is formed by the PVD method, it is preferable to provide a metal layer and a metal carbide layer, preferably a metal carbide gradient layer, as the adhesion layer. It is preferable that the metal layer has a thickness of 0.1 to 1 μm, the metal carbide layer has a thickness of 0.1 to 1 μm, and the DLC coating layer has a thickness of 0.1 to 10 μm.

Although the formation method of a metal layer and a metal carbide layer is not specifically limited, By using the same kind of method as the formation method of a DLC coating layer, the same apparatus can be used and it is suitable.
The metal in the metal layer may be one or more selected from the group consisting of tungsten (W), silicon (Si), titanium (Ti), chromium (Cr), tantalum (Ta), and zirconium (Zr). Metal is preferably used.

  As the metal in the metal carbide layer, preferably the metal carbide inclined layer, the same metal as the metal layer is used. The composition ratio of carbon in the metal carbide inclined layer is set so that the ratio of carbon gradually increases from the metal layer side to the DLC coating layer direction. That is, the film formation is performed so that the composition ratio of carbon increases from 0% to gradually (stepwise or steplessly), and finally becomes approximately 100%.

  In this case, a known method may be used to adjust the composition ratio of carbon in the metal carbide layer, preferably the metal carbide inclined layer. For example, a sputtering method (using a solid metal target and a hydrocarbon gas in an argon gas atmosphere) For example, by gradually increasing the injection amount of methane gas, ethane gas, propane gas, butane gas, acetylene gas or the like in a stepped or stepless manner, the proportion of carbon in the metal carbide layer is increased from the resin layer side to the DLC coating layer. A metal carbide layer in which the composition ratio of both carbon and metal is changed so as to gradually increase stepwise or steplessly with respect to the direction, that is, a metal carbide gradient layer can be formed.

  Thus, the adhesion degree of the metal layer and metal carbide layer with respect to both a resin layer and a DLC coating layer can be improved by adjusting the ratio of carbon of a metal carbide layer. Further, if the injection amount of hydrocarbon gas is constant, a metal carbide layer having a constant composition ratio of carbon and metal can be obtained, and the same action as that of the metal carbide gradient layer can be performed.

  When the DLC coating layer is formed by the CVD method, the adhesion layer is formed of one or more selected from the group consisting of aluminum (Al), phosphorus (P), titanium (Ti), and silicon (Si). Preferably it is done. The thickness of the adhesion layer is preferably 0.1 to 1 μm.

  The method for forming the adhesion layer is not particularly limited, but using the same type of method as the method for forming the DLC coating layer makes it possible to use the same apparatus, which is preferable. When forming an adhesion layer by CVD, one or more gases selected from the group consisting of trimethylaluminum, titanium tetraisopropoxide, titanium tetraethoxide, tetramethylsilane, trimethyl phosphite, and hexamethyldisiloxane It is preferred to use seeds.

  As a method for forming a silicon dioxide coating layer formed using a perhydropolysilazane solution as a raw material, a perhydropolysilazane coating layer is first formed on the surface of the resin layer. As a method for forming a perhydropolysilazane coating layer, a perhydropolysilazane solution is prepared by dissolving perhydropolysilazane in a known solvent as described above, and this perhydropolysilazane solution is spray coated, inkjet coated, meniscus coated, The coating may be performed by a known coating method such as tin coating, dip coating, spin coating, roll coating, wire bar coating, air knife coating, blade coating, or curtain coating.

  The coating film of the perhydropolysilazane solution is a coating film having a predetermined thickness according to the thickness of the silicon dioxide coating layer to be formed (rather than the silicon dioxide coating layer formed in consideration of the loss of heat treatment). It is preferable to form a thicker film). The thickness of the silicon dioxide coating layer is 0.1 to 10 μm, preferably 0.1 to 5 μm, more preferably 0.1 to 3 μm, and more preferably 0.1 to 1 μm.

  The perhydropolysilazane solution prepared by dissolving in the above-mentioned various solvents can be converted into silicon dioxide by heating with superheated steam, but the reaction rate is increased, the reaction time is shortened, the reaction temperature is decreased, and formed. It is preferable to use a catalyst as described above for the purpose of improving the adhesion of the silicon dioxide coating layer.

  In the silicon dioxide coating layer forming step in which the coating layer of the perhydropolysilazane solution is a silicon dioxide coating layer, the perhydropolysilazane coating layer is heated with superheated steam for a predetermined time to form a silicon dioxide coating layer having a predetermined hardness. Is preferred. The temperature of the superheated steam is 100 ° C. or higher, preferably more than 100 ° C. and 300 ° C. or lower. Needless to say, an optimum temperature is appropriately set according to the material of the hollow roll and the resin layer. The treatment time is about 1 minute to 1 hour, preferably about 5 minutes to 40 minutes, more preferably about 10 minutes to 30 minutes. If the treatment time is lengthened, the hardness of the silicon dioxide coating layer is increased accordingly, but the above treatment time is suitable in consideration of economy.

  The heat treatment with superheated steam may be a single-stage treatment, but is preferably a multi-stage heat treatment including a primary and a secondary heat treatment, and the conditions of the primary heat treatment are 100 ° C. to 170 ° C. ° C, preferably 105 ° C to 170 ° C, 1 minute to 30 minutes, and the conditions of the secondary heat treatment are 140 ° C to 200 ° C, 1 minute to 30 minutes, and the temperature of the secondary heat treatment is the primary heating. It is preferable to set the temperature higher than the temperature of the treatment, and the temperature of the secondary heat treatment is preferably 5 ° C. or more, more preferably 10 ° C. or more higher than the temperature of the primary heat treatment.

  It is preferable that the method further includes a step of washing the surface of the silicon dioxide coating layer formed by the heat treatment with cold water or warm water. The quality of the silicon dioxide coating layer can be improved by washing the surface of the formed silicon dioxide coating layer with cold water or warm water. Cold water should just use normal temperature water, and warm water should just use the heating water of about 40 to 100 degreeC. A washing time of about 30 seconds to 10 minutes is sufficient.

The present invention will be described more specifically with reference to the following examples. However, it is needless to say that these examples are shown by way of illustration and should not be construed in a limited manner.
(Example 1)
First, a plate base material (aluminum hollow roll) having a circumference of 600 mm and a surface length of 1100 mm was prepared. A resin layer and a gravure cell were formed on the plate base material by the following procedure. First, a 10 μm heat-resistant phenol resin layer was formed on the plate base material. The surface of the resin layer was polished using a 4H polishing machine (Sink Laboratory Co., Ltd. polishing machine) to make the surface of the resin layer a uniform polishing surface. Next, a gravure cell was formed on the surface of the resin layer using a laser oscillator (YAG laser).

  Next, a 20% dibutyl ether solution of perhydropolysilazane (product name: Aquamica (registered trademark of AZ Electronic Materials Co., Ltd.) NL120A, manufactured by AZ Electronic Materials Co., Ltd.) is used as a resin layer in which the gravure cell is formed. HVLP spray application was performed on a cylinder with The coating film thickness uniformly applied to the cylinder was 0.8 μm. The cylinder coated with this perhydropolysilazane was subjected to two-stage heat treatment with superheated steam (primary heating: treatment at 140 ° C. for 10 minutes, secondary heating: treatment at 170 ° C. for 10 minutes). Thus, the gravure platemaking roll of the present invention was completed.

  Subsequently, cyan ink (Zahn cup viscosity 18 seconds) (water-based ink super ramie pure indigo 800PR-5 manufactured by Sakata Inx Co., Ltd.) was applied to the produced gravure plate roll, and OPP (Oriented Polypropylene Film: biaxial stretching) A printing test (printing speed: 120 m / min) was performed using a polypropylene film. The obtained printed matter had no plate fog and could be printed up to a length of 50,000 m. The accuracy of the pattern did not change. Further, there was no problem in the adhesion of the silicon dioxide coating layer to the etched cylinder. The gradation from the highlight portion to the shadow portion of the gravure cylinder of the present invention is good, and it is judged that there is no problem in ink transferability.

(Example 2)
A gravure printing roll of the present invention was produced in the same manner as in Example 1 except that a DLC coating layer was formed by the PVD method in the following procedure instead of the silicon dioxide coating layer as the surface reinforcing coating layer. First, a tungsten layer was formed by sputtering on the upper surface of the resin layer on which the above gravure cell was formed. The sputtering conditions are as follows.
Tungsten sample: solid tungsten target, atmosphere: argon gas atmosphere, film formation temperature: 200 to 300 ° C., film formation time: 60 minutes, film formation thickness: 0.1 μm.

Next, a tungsten carbide layer was formed on the upper surface of the tungsten layer by a sputtering method. The sputtering conditions are as follows.
Tungsten sample: solid tungsten target, atmosphere: hydrocarbon gas gradually increased in an argon gas atmosphere, film formation temperature: 200 to 300 ° C., film formation time: 60 minutes, film formation thickness: 0.1 μm.

Furthermore, a DLC coating layer was formed on the upper surface of the tungsten carbide layer by sputtering. The sputtering conditions are as follows.
DLC sample: solid carbon target, atmosphere: argon gas atmosphere, deposition temperature: 200 to 300 ° C., deposition time: 150 minutes, deposition thickness: 1 μm.

  In this way, a gravure platemaking roll was completed. Using this gravure plate roll, a printing test was conducted in the same manner as in Example 1. As a result, good printing results similar to those in Example 1 could be obtained.

(Example 3)
A gravure printing roll of the present invention was produced in the same manner as in Example 1 except that a DLC coating layer was formed by the CVD method in the following procedure instead of the silicon dioxide coating layer as the surface reinforcing coating layer. First, an aluminum layer having a thickness of 0.1 μm was formed by plasma CVD using trimethylaluminum as a gas species on the upper surface of the resin layer on which the gravure cell was formed. Next, a DLC coating layer having a thickness of 1 μm was formed on the upper surface of the aluminum layer by plasma CVD. In this way, a gravure platemaking roll was completed. Using this gravure printing roll, a printing test was conducted in the same manner as in Example 1. As a result, good printing results similar to those in Example 1 could be obtained.

  A gravure printing roll of the present invention was produced in the same manner as in Example 1 except that a chromium plating coating layer was formed by a conventional method instead of the silicon dioxide coating layer of Example 1, and the same printing test was performed. It was confirmed that good printing results similar to those in Example 1 could be obtained.

Claims (4)

  A plate base material, a resin layer provided on the surface of the plate base material, a gravure cell formed on the resin layer, and a surface-enhanced coating layer formed so as to cover the surfaces of the resin layer and the gravure cell And a gravure printing roll characterized by comprising:   The gravure printing roll according to claim 1, wherein the surface-enhanced coating layer is a DLC coating layer, a silicon dioxide coating layer, or a chrome plating coating layer.   The gravure printing roll according to claim 2, wherein the surface-enhanced coating layer is a DLC coating layer, and has an adhesion layer between the resin layer and the DLC coating layer. A method for producing a gravure platemaking roll according to claim 1 or 2,
Preparing the plate base material; and
A resin layer forming step of forming a resin layer on the surface of the plate base material;
A gravure cell forming step of forming a gravure cell in the resin layer;
A surface-enhanced coating layer forming step of forming a surface-enhanced coating layer so as to cover the resin layer on which the gravure cell is formed and the surface of the gravure cell;
A method for producing a gravure plate making roll, comprising:

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