JPS649900A - Jig for heat-treating semiconductor wafer - Google Patents
Jig for heat-treating semiconductor waferInfo
- Publication number
- JPS649900A JPS649900A JP16489587A JP16489587A JPS649900A JP S649900 A JPS649900 A JP S649900A JP 16489587 A JP16489587 A JP 16489587A JP 16489587 A JP16489587 A JP 16489587A JP S649900 A JPS649900 A JP S649900A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- jig
- heat
- semiconductor wafer
- contents
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To obtain the titled jig without occurrence of peeling or cracking in thermal cycling, by forming a pyrolytic carbon film on the surface of a specific carbonaceous substrate. CONSTITUTION:A carbonaceous material consisting of isotropic graphite material with <=300ppm ash content and respective <=50ppm contents of Fe, Ni, Co and V and respective <=20ppm contents of Na, Ca and Al in ash and 1.3-3.5 (10<-6>) average thermal expansion coefficient at 20-40 deg.C is heated at 800-2,800 deg.C and the surface of the substrate is brought into contact with a (halogenated) hydrocarbon to form a pyrolytic carbon film having 5-120mum thickness on the surface of the substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16489587A JPS649900A (en) | 1987-06-30 | 1987-06-30 | Jig for heat-treating semiconductor wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16489587A JPS649900A (en) | 1987-06-30 | 1987-06-30 | Jig for heat-treating semiconductor wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS649900A true JPS649900A (en) | 1989-01-13 |
JPH0471880B2 JPH0471880B2 (en) | 1992-11-16 |
Family
ID=15801908
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16489587A Granted JPS649900A (en) | 1987-06-30 | 1987-06-30 | Jig for heat-treating semiconductor wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS649900A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5277934A (en) * | 1990-06-27 | 1994-01-11 | Advanced Ceramico Corporation | Method for protecting a graphite chuck for a starter filament in the manufacture of polycrystalline silicon |
JP2005133133A (en) * | 2003-10-29 | 2005-05-26 | Toyobo Co Ltd | Deposition-preventive plate for vacuum thin film deposition apparatus |
EP1804284A1 (en) * | 2004-10-19 | 2007-07-04 | Canon Anelva Corporation | Substrate heat treatment apparatus and substrate transfer tray used in substrate heat treatment |
JP2013028494A (en) * | 2011-07-28 | 2013-02-07 | Sumitomo Electric Ind Ltd | Graphite and method for producing the same |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60103087A (en) * | 1983-11-08 | 1985-06-07 | 日立化成工業株式会社 | Graphite member for heating |
JPS6374995A (en) * | 1986-09-19 | 1988-04-05 | Toyo Tanso Kk | Graphite material for epitaxy |
-
1987
- 1987-06-30 JP JP16489587A patent/JPS649900A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60103087A (en) * | 1983-11-08 | 1985-06-07 | 日立化成工業株式会社 | Graphite member for heating |
JPS6374995A (en) * | 1986-09-19 | 1988-04-05 | Toyo Tanso Kk | Graphite material for epitaxy |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5277934A (en) * | 1990-06-27 | 1994-01-11 | Advanced Ceramico Corporation | Method for protecting a graphite chuck for a starter filament in the manufacture of polycrystalline silicon |
JP2005133133A (en) * | 2003-10-29 | 2005-05-26 | Toyobo Co Ltd | Deposition-preventive plate for vacuum thin film deposition apparatus |
EP1804284A1 (en) * | 2004-10-19 | 2007-07-04 | Canon Anelva Corporation | Substrate heat treatment apparatus and substrate transfer tray used in substrate heat treatment |
EP1804284A4 (en) * | 2004-10-19 | 2008-03-05 | Canon Anelva Corp | Substrate heat treatment apparatus and substrate transfer tray used in substrate heat treatment |
JP2013028494A (en) * | 2011-07-28 | 2013-02-07 | Sumitomo Electric Ind Ltd | Graphite and method for producing the same |
Also Published As
Publication number | Publication date |
---|---|
JPH0471880B2 (en) | 1992-11-16 |
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Legal Events
Date | Code | Title | Description |
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