JPS6491009A - Apparatus for evaluating flatness of thin film - Google Patents

Apparatus for evaluating flatness of thin film

Info

Publication number
JPS6491009A
JPS6491009A JP62247819A JP24781987A JPS6491009A JP S6491009 A JPS6491009 A JP S6491009A JP 62247819 A JP62247819 A JP 62247819A JP 24781987 A JP24781987 A JP 24781987A JP S6491009 A JPS6491009 A JP S6491009A
Authority
JP
Japan
Prior art keywords
thin film
flatness
reflected light
data
light receiving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62247819A
Other languages
Japanese (ja)
Inventor
Shigeru Takahashi
Hideo Sunami
Kiyohiko Funakoshi
Sadayuki Okudaira
Masao Tamura
Naoji Yoshihiro
Sukeyoshi Tsunekawa
Toru Kaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62247819A priority Critical patent/JPS6491009A/en
Publication of JPS6491009A publication Critical patent/JPS6491009A/en
Pending legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)

Abstract

PURPOSE:To obtain the flatness of a thin film quantitatively without cutting, by optically observing the thin film of a substrate in many aspects, collecting and recording the data of reflected light from each light receiving sensor for a short time and outputting the data as required. CONSTITUTION:Luminous flux from a light emitting source 12 in an observing part 10 is projected on a stage 11. The reflected light is received with light receiving sensors 13-15. The outputs from the light receiving sensors are controlled with a controller 21. The intensity of the reflected light which is detected for a short time of about 50ms is recorded in a recorder 23 as a digital quantity through a computer 22. The data are outputted to an output device 24 as required. The measures as standards of flatness are obtained in correspondence with the patterns of the intensity distribution of the reflected light of various samples or various thin films. The flatness of the thin film can be quantitatively evaluated and obtained without cutting based on these database.
JP62247819A 1987-10-02 1987-10-02 Apparatus for evaluating flatness of thin film Pending JPS6491009A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62247819A JPS6491009A (en) 1987-10-02 1987-10-02 Apparatus for evaluating flatness of thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62247819A JPS6491009A (en) 1987-10-02 1987-10-02 Apparatus for evaluating flatness of thin film

Publications (1)

Publication Number Publication Date
JPS6491009A true JPS6491009A (en) 1989-04-10

Family

ID=17169132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62247819A Pending JPS6491009A (en) 1987-10-02 1987-10-02 Apparatus for evaluating flatness of thin film

Country Status (1)

Country Link
JP (1) JPS6491009A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04255242A (en) * 1991-02-06 1992-09-10 Mitsubishi Electric Corp Bonding state inspecting device
JPH04294560A (en) * 1991-03-23 1992-10-19 Nec Yamaguchi Ltd Inspection of insulating film
WO2019123700A1 (en) * 2017-12-20 2019-06-27 三菱日立パワーシステムズ株式会社 Method and device for inspecting film, and method for forming film
WO2020016468A1 (en) * 2018-07-18 2020-01-23 Elejoste Gonzalez Asier Miguel Non-contact profilometer and method for measuring roughness
CN112097722A (en) * 2020-08-17 2020-12-18 山东东岳高分子材料有限公司 Flatness testing method for film material

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04255242A (en) * 1991-02-06 1992-09-10 Mitsubishi Electric Corp Bonding state inspecting device
JPH04294560A (en) * 1991-03-23 1992-10-19 Nec Yamaguchi Ltd Inspection of insulating film
WO2019123700A1 (en) * 2017-12-20 2019-06-27 三菱日立パワーシステムズ株式会社 Method and device for inspecting film, and method for forming film
JP2019113312A (en) * 2017-12-20 2019-07-11 三菱日立パワーシステムズ株式会社 Coating inspection method and apparatus, and coating formation method
WO2020016468A1 (en) * 2018-07-18 2020-01-23 Elejoste Gonzalez Asier Miguel Non-contact profilometer and method for measuring roughness
CN112097722A (en) * 2020-08-17 2020-12-18 山东东岳高分子材料有限公司 Flatness testing method for film material

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