JPS6491009A - Apparatus for evaluating flatness of thin film - Google Patents

Apparatus for evaluating flatness of thin film

Info

Publication number
JPS6491009A
JPS6491009A JP62247819A JP24781987A JPS6491009A JP S6491009 A JPS6491009 A JP S6491009A JP 62247819 A JP62247819 A JP 62247819A JP 24781987 A JP24781987 A JP 24781987A JP S6491009 A JPS6491009 A JP S6491009A
Authority
JP
Japan
Prior art keywords
thin film
flatness
reflected light
data
light receiving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62247819A
Other languages
English (en)
Inventor
Shigeru Takahashi
Hideo Sunami
Kiyohiko Funakoshi
Sadayuki Okudaira
Masao Tamura
Naoji Yoshihiro
Sukeyoshi Tsunekawa
Toru Kaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62247819A priority Critical patent/JPS6491009A/ja
Publication of JPS6491009A publication Critical patent/JPS6491009A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
JP62247819A 1987-10-02 1987-10-02 Apparatus for evaluating flatness of thin film Pending JPS6491009A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62247819A JPS6491009A (en) 1987-10-02 1987-10-02 Apparatus for evaluating flatness of thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62247819A JPS6491009A (en) 1987-10-02 1987-10-02 Apparatus for evaluating flatness of thin film

Publications (1)

Publication Number Publication Date
JPS6491009A true JPS6491009A (en) 1989-04-10

Family

ID=17169132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62247819A Pending JPS6491009A (en) 1987-10-02 1987-10-02 Apparatus for evaluating flatness of thin film

Country Status (1)

Country Link
JP (1) JPS6491009A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04255242A (ja) * 1991-02-06 1992-09-10 Mitsubishi Electric Corp ボンディング状態検査装置
JPH04294560A (ja) * 1991-03-23 1992-10-19 Nec Yamaguchi Ltd 絶縁膜の検査方法
WO2019123700A1 (ja) * 2017-12-20 2019-06-27 三菱日立パワーシステムズ株式会社 皮膜の検査方法及び装置並びに皮膜の形成方法
WO2020016468A1 (es) * 2018-07-18 2020-01-23 Elejoste Gonzalez Asier Miguel Rugosímetro sin contacto y método para la medición de rugosidad
CN112097722A (zh) * 2020-08-17 2020-12-18 山东东岳高分子材料有限公司 膜材料的平整度测试方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04255242A (ja) * 1991-02-06 1992-09-10 Mitsubishi Electric Corp ボンディング状態検査装置
JPH04294560A (ja) * 1991-03-23 1992-10-19 Nec Yamaguchi Ltd 絶縁膜の検査方法
WO2019123700A1 (ja) * 2017-12-20 2019-06-27 三菱日立パワーシステムズ株式会社 皮膜の検査方法及び装置並びに皮膜の形成方法
JP2019113312A (ja) * 2017-12-20 2019-07-11 三菱日立パワーシステムズ株式会社 皮膜の検査方法及び装置並びに皮膜の形成方法
WO2020016468A1 (es) * 2018-07-18 2020-01-23 Elejoste Gonzalez Asier Miguel Rugosímetro sin contacto y método para la medición de rugosidad
CN112097722A (zh) * 2020-08-17 2020-12-18 山东东岳高分子材料有限公司 膜材料的平整度测试方法

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