JPS6488400A - Synchrotron radiation light exposing device - Google Patents

Synchrotron radiation light exposing device

Info

Publication number
JPS6488400A
JPS6488400A JP62248355A JP24835587A JPS6488400A JP S6488400 A JPS6488400 A JP S6488400A JP 62248355 A JP62248355 A JP 62248355A JP 24835587 A JP24835587 A JP 24835587A JP S6488400 A JPS6488400 A JP S6488400A
Authority
JP
Japan
Prior art keywords
radiation light
atmosphere
window
synchrotron radiation
filled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62248355A
Other languages
Japanese (ja)
Other versions
JPH0511651B2 (en
Inventor
Koichi Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62248355A priority Critical patent/JPS6488400A/en
Publication of JPS6488400A publication Critical patent/JPS6488400A/en
Publication of JPH0511651B2 publication Critical patent/JPH0511651B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Particle Accelerators (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To enable the use of a lubricant and to enhance reliability, etc., by providing a synchrotron radiation light source, high-speed shut-off valve, radiation light taking out window, beam line in which an inert as is filled, and an exposing machine installed in the atmosphere. CONSTITUTION:The synchrotron radiation light 10 past the beam line 3 is taken out into the atmosphere. The exposing machine 13 having a mechanism fro registration of a mask 11 and a wafer 12 is installed in the atmosphere. A chamber 9 in which the inert gas is filled is freshly provided on the down stream of the Be window. Gaseous helium or the like is filled in this chamber 9 to remove gaseous oxygen. The high-speed shut-off valve 8 is installed to provide against the breakage of the window 6 by the pressure exerted on the radiation light taking out window 6. Since the exposing in the atmosphere is possible according to this constitution, the use of the lubricant is enabled and the reliability and safety are enhanced.
JP62248355A 1987-09-30 1987-09-30 Synchrotron radiation light exposing device Granted JPS6488400A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62248355A JPS6488400A (en) 1987-09-30 1987-09-30 Synchrotron radiation light exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62248355A JPS6488400A (en) 1987-09-30 1987-09-30 Synchrotron radiation light exposing device

Publications (2)

Publication Number Publication Date
JPS6488400A true JPS6488400A (en) 1989-04-03
JPH0511651B2 JPH0511651B2 (en) 1993-02-16

Family

ID=17176868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62248355A Granted JPS6488400A (en) 1987-09-30 1987-09-30 Synchrotron radiation light exposing device

Country Status (1)

Country Link
JP (1) JPS6488400A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6034255A (en) * 1983-08-01 1985-02-21 Daifuku Co Ltd Operating method for conveyed work

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6034255A (en) * 1983-08-01 1985-02-21 Daifuku Co Ltd Operating method for conveyed work

Also Published As

Publication number Publication date
JPH0511651B2 (en) 1993-02-16

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