JPS648630U - - Google Patents
Info
- Publication number
- JPS648630U JPS648630U JP10174087U JP10174087U JPS648630U JP S648630 U JPS648630 U JP S648630U JP 10174087 U JP10174087 U JP 10174087U JP 10174087 U JP10174087 U JP 10174087U JP S648630 U JPS648630 U JP S648630U
- Authority
- JP
- Japan
- Prior art keywords
- heat
- amplifier
- pipe
- pair
- resistance wires
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012530 fluid Substances 0.000 claims 1
- 238000004804 winding Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
Landscapes
- Measuring Volume Flow (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10174087U JPS648630U (zh) | 1987-07-03 | 1987-07-03 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10174087U JPS648630U (zh) | 1987-07-03 | 1987-07-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS648630U true JPS648630U (zh) | 1989-01-18 |
Family
ID=31331012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10174087U Pending JPS648630U (zh) | 1987-07-03 | 1987-07-03 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS648630U (zh) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7264680B2 (en) | 1997-05-09 | 2007-09-04 | Semitool, Inc. | Process and apparatus for treating a workpiece using ozone |
| US7378355B2 (en) | 1997-05-09 | 2008-05-27 | Semitool, Inc. | System and methods for polishing a wafer |
| US7404863B2 (en) | 1997-05-09 | 2008-07-29 | Semitool, Inc. | Methods of thinning a silicon wafer using HF and ozone |
-
1987
- 1987-07-03 JP JP10174087U patent/JPS648630U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7264680B2 (en) | 1997-05-09 | 2007-09-04 | Semitool, Inc. | Process and apparatus for treating a workpiece using ozone |
| US7378355B2 (en) | 1997-05-09 | 2008-05-27 | Semitool, Inc. | System and methods for polishing a wafer |
| US7404863B2 (en) | 1997-05-09 | 2008-07-29 | Semitool, Inc. | Methods of thinning a silicon wafer using HF and ozone |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0421917U (zh) | ||
| JPS648630U (zh) | ||
| JPS6090622U (ja) | 熱式質量流量計 | |
| JPS60104739U (ja) | 温度，温度差同時測定用シ−ス熱電対 | |
| JPS6299865U (zh) | ||
| JPS6220322U (zh) | ||
| JPH0181553U (zh) | ||
| JPS61133830A (ja) | 低温高圧電流体熱量計 | |
| JPH01107902U (zh) | ||
| JPS61193322U (zh) | ||
| JPS5679258A (en) | Detecting body for thermoelectric and air-temperature anemometer | |
| JPS62158355U (zh) | ||
| JPH0433476U (zh) | ||
| JPS593315U (ja) | 熱的流量計 | |
| JPH0271226U (zh) | ||
| JPH0162855U (zh) | ||
| JPS6037826U (ja) | 境界層型流量計 | |
| JPH0418329U (zh) | ||
| JPS6367968U (zh) | ||
| JPS6298939U (zh) | ||
| JPH02110825U (zh) | ||
| JPH0469724U (zh) | ||
| JPH0217808U (zh) | ||
| JPS5773621A (en) | Measuring device for quantity of air flow | |
| JPS60111047U (ja) | ウエハ加熱用ホルダ |