JPS648285A - Dry washing method of quartz pipe - Google Patents

Dry washing method of quartz pipe

Info

Publication number
JPS648285A
JPS648285A JP16112187A JP16112187A JPS648285A JP S648285 A JPS648285 A JP S648285A JP 16112187 A JP16112187 A JP 16112187A JP 16112187 A JP16112187 A JP 16112187A JP S648285 A JPS648285 A JP S648285A
Authority
JP
Japan
Prior art keywords
quartz pipe
plasma
frequency electric
gas
plasma electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16112187A
Other languages
Japanese (ja)
Inventor
Takuya Watabe
Masahide Nishimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16112187A priority Critical patent/JPS648285A/en
Publication of JPS648285A publication Critical patent/JPS648285A/en
Pending legal-status Critical Current

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  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To subject a quartz pipe to dry washing uniformly and efficiently by impressing high-frequency electric power to a spirals plasma electrode provided between the quartz pipe and a heating means and subjecting etching gas allowed to flow through the inside of the quartz pipe to plasma. CONSTITUTION:A quartz pipe 1 to be washed on its inside is arranged to the inside of a heater 2 and heated at prescribed temp. A spiral plasma electrode is previously provided between the quartz pipe 1 and the heater 2 and high-frequency electric power is impressed thereto from a high-frequency electric source 4. Thereby etching gas such as NF3 which is allowed to flow through the inside of the quartz pipe 1 is subjected to plasma. Deposit such as polysilicon on the inner wall of the quartz pipe 1 is etched with this NF3 subjected to plasma and removed. In this case, the above-mentioned plasma electrode is made to a spiral shape having unequal intervals so that the feed side of gas is minute and the discharge side of gas is rough or made to a double winding and thereby uniformity of an etching rate is preferably contrived.
JP16112187A 1987-06-30 1987-06-30 Dry washing method of quartz pipe Pending JPS648285A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16112187A JPS648285A (en) 1987-06-30 1987-06-30 Dry washing method of quartz pipe

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16112187A JPS648285A (en) 1987-06-30 1987-06-30 Dry washing method of quartz pipe

Publications (1)

Publication Number Publication Date
JPS648285A true JPS648285A (en) 1989-01-12

Family

ID=15729001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16112187A Pending JPS648285A (en) 1987-06-30 1987-06-30 Dry washing method of quartz pipe

Country Status (1)

Country Link
JP (1) JPS648285A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62139884A (en) * 1985-12-16 1987-06-23 Teru Saamuko Kk Plasma cleaning device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62139884A (en) * 1985-12-16 1987-06-23 Teru Saamuko Kk Plasma cleaning device

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