JPS6480942A - Photosensitive microgel particles - Google Patents

Photosensitive microgel particles

Info

Publication number
JPS6480942A
JPS6480942A JP23814787A JP23814787A JPS6480942A JP S6480942 A JPS6480942 A JP S6480942A JP 23814787 A JP23814787 A JP 23814787A JP 23814787 A JP23814787 A JP 23814787A JP S6480942 A JPS6480942 A JP S6480942A
Authority
JP
Japan
Prior art keywords
microgel particles
microgel
particles
cinnamic acid
derivative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23814787A
Other languages
Japanese (ja)
Other versions
JP2582089B2 (en
Inventor
Chiaki Azuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Ink Mfg Co Ltd
Original Assignee
Toyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg Co Ltd filed Critical Toyo Ink Mfg Co Ltd
Priority to JP62238147A priority Critical patent/JP2582089B2/en
Publication of JPS6480942A publication Critical patent/JPS6480942A/en
Application granted granted Critical
Publication of JP2582089B2 publication Critical patent/JP2582089B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE:To obtain fine photosensitive particles having microgel particle structure, high sensitivity, and being freed of deterioration of resolution due to swelling of a material by allowing polyacrylate or polymethacrylate type microgel particles to react with cinnamic acid or its derivative. CONSTITUTION:The microgel particles of the acrylate or methacrylate polymer is produced by polymerizing a mixture of (meth)acrylate, and hydroxyethyl methacrylate having a group reactive with the cinnamic acid or its derivative, and when needed, a polyfunctional monomer, dissolving the microgel particles in a proper polar solvent, allowing the polymer to react with cinnamoyl chloride, cinnamate, or the like to combine the cinnamic acid derivative on the surface of each microgel particle, thus permitting the obtained photosensitive microgel particles to be available as a resist material and the like, high in sensitivity, superior in material characteristics, and high in resolution.
JP62238147A 1987-09-23 1987-09-23 Photosensitive microgel ultrafine particles Expired - Fee Related JP2582089B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62238147A JP2582089B2 (en) 1987-09-23 1987-09-23 Photosensitive microgel ultrafine particles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62238147A JP2582089B2 (en) 1987-09-23 1987-09-23 Photosensitive microgel ultrafine particles

Publications (2)

Publication Number Publication Date
JPS6480942A true JPS6480942A (en) 1989-03-27
JP2582089B2 JP2582089B2 (en) 1997-02-19

Family

ID=17025886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62238147A Expired - Fee Related JP2582089B2 (en) 1987-09-23 1987-09-23 Photosensitive microgel ultrafine particles

Country Status (1)

Country Link
JP (1) JP2582089B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0364755A (en) * 1989-08-03 1991-03-20 Fuji Photo Film Co Ltd Photosensitive composition
JP2010511094A (en) * 2006-11-28 2010-04-08 ポリエラ コーポレイション Photopolymer-based dielectric materials and methods for their preparation and use

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4940391A (en) * 1972-08-28 1974-04-15
JPS5365104A (en) * 1976-11-22 1978-06-10 Mitsui Toatsu Chemicals Photosensitive resin plate material
JPS54126019A (en) * 1978-03-23 1979-09-29 Mitsubishi Chem Ind Photosensitive composition
JPS5575403A (en) * 1978-12-01 1980-06-06 Japan Atom Energy Res Inst Preparation of reactive microgel
JPS55156941A (en) * 1979-05-24 1980-12-06 Tokyo Ohka Kogyo Co Ltd Micropattern forming method
JPS59117553A (en) * 1982-12-16 1984-07-06 ヘキスト・セラニーズ・コーポレーション Nucleating agent for polyethylene terephthalate forming material comprising alkali metal salt of bridged high molecular microgel
JPS59197413A (en) * 1983-04-04 1984-11-09 ピ−ピ−ジ−・インダストリ−ズ・インコ−ポレイテツド Microgel and manufacture
JPS62173455A (en) * 1986-01-22 1987-07-30 イー・アイ・デュポン・ドゥ・ヌムール・アンド・カンパニー Photosensitive composition containing microgel
JPS62177007A (en) * 1986-01-30 1987-08-03 Agency Of Ind Science & Technol Production of high-concentration reactive microgel

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4940391A (en) * 1972-08-28 1974-04-15
JPS5365104A (en) * 1976-11-22 1978-06-10 Mitsui Toatsu Chemicals Photosensitive resin plate material
JPS54126019A (en) * 1978-03-23 1979-09-29 Mitsubishi Chem Ind Photosensitive composition
JPS5575403A (en) * 1978-12-01 1980-06-06 Japan Atom Energy Res Inst Preparation of reactive microgel
JPS55156941A (en) * 1979-05-24 1980-12-06 Tokyo Ohka Kogyo Co Ltd Micropattern forming method
JPS59117553A (en) * 1982-12-16 1984-07-06 ヘキスト・セラニーズ・コーポレーション Nucleating agent for polyethylene terephthalate forming material comprising alkali metal salt of bridged high molecular microgel
JPS59197413A (en) * 1983-04-04 1984-11-09 ピ−ピ−ジ−・インダストリ−ズ・インコ−ポレイテツド Microgel and manufacture
JPS62173455A (en) * 1986-01-22 1987-07-30 イー・アイ・デュポン・ドゥ・ヌムール・アンド・カンパニー Photosensitive composition containing microgel
JPS62177007A (en) * 1986-01-30 1987-08-03 Agency Of Ind Science & Technol Production of high-concentration reactive microgel

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0364755A (en) * 1989-08-03 1991-03-20 Fuji Photo Film Co Ltd Photosensitive composition
JP2010511094A (en) * 2006-11-28 2010-04-08 ポリエラ コーポレイション Photopolymer-based dielectric materials and methods for their preparation and use

Also Published As

Publication number Publication date
JP2582089B2 (en) 1997-02-19

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees