JPS6480026A - Resist coater - Google Patents

Resist coater

Info

Publication number
JPS6480026A
JPS6480026A JP23842687A JP23842687A JPS6480026A JP S6480026 A JPS6480026 A JP S6480026A JP 23842687 A JP23842687 A JP 23842687A JP 23842687 A JP23842687 A JP 23842687A JP S6480026 A JPS6480026 A JP S6480026A
Authority
JP
Japan
Prior art keywords
resist
spin cup
chuck
wafer
cleaning agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23842687A
Other languages
Japanese (ja)
Inventor
Katsuhiko Tamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP23842687A priority Critical patent/JPS6480026A/en
Publication of JPS6480026A publication Critical patent/JPS6480026A/en
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To enable the use of a less dangerous cleaning agent by forming on the inner surface of a spin cup a resist-resistant film of a fluroine resin having water repellancy, thereby increasing the release properties of the resist. CONSTITUTION:A resist coater comprises a chuck 10 which sucks and holds a wafer W and rotates around the vertical axis, a spin cup 11 surrounding the chuck 10 and the wafer W, a resist pipe 12, and resist recovery pipes 16, 17. At that time, on the inner surface of the spin cup 11, a resist-resistant film 18 of a fluorine resin totally covering it is formed. Whereupon, the water repellancy to the resist greatly increases beyond the prior example, whereby the release properties of the resist increase. With this, the use of a less dangerous cleaning agent is enabled.
JP23842687A 1987-09-21 1987-09-21 Resist coater Pending JPS6480026A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23842687A JPS6480026A (en) 1987-09-21 1987-09-21 Resist coater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23842687A JPS6480026A (en) 1987-09-21 1987-09-21 Resist coater

Publications (1)

Publication Number Publication Date
JPS6480026A true JPS6480026A (en) 1989-03-24

Family

ID=17030033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23842687A Pending JPS6480026A (en) 1987-09-21 1987-09-21 Resist coater

Country Status (1)

Country Link
JP (1) JPS6480026A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006049476A (en) * 2004-08-03 2006-02-16 Nikon Corp Aligner and device manufacturing method
WO2011017578A1 (en) 2009-08-07 2011-02-10 Bristol-Myers Squibb Company Sphingosine-1-phosphate receptor agonists
WO2011059784A1 (en) 2009-10-29 2011-05-19 Bristol-Myers Squibb Company Tricyclic heterocyclic compounds
WO2012012477A1 (en) 2010-07-20 2012-01-26 Bristol-Myers Squibb Company Substituted 3-phenyl-1,2,4-oxadiazole compounds
WO2012040532A1 (en) 2010-09-24 2012-03-29 Bristol-Myers Squibb Company Substituted oxadiazole compounds and their use as s1p1 agonists
JP2021128959A (en) * 2020-02-10 2021-09-02 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006049476A (en) * 2004-08-03 2006-02-16 Nikon Corp Aligner and device manufacturing method
WO2011017578A1 (en) 2009-08-07 2011-02-10 Bristol-Myers Squibb Company Sphingosine-1-phosphate receptor agonists
WO2011059784A1 (en) 2009-10-29 2011-05-19 Bristol-Myers Squibb Company Tricyclic heterocyclic compounds
WO2012012477A1 (en) 2010-07-20 2012-01-26 Bristol-Myers Squibb Company Substituted 3-phenyl-1,2,4-oxadiazole compounds
WO2012040532A1 (en) 2010-09-24 2012-03-29 Bristol-Myers Squibb Company Substituted oxadiazole compounds and their use as s1p1 agonists
JP2021128959A (en) * 2020-02-10 2021-09-02 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing device

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