JPS6476654A - Lens for field emission type electron gun - Google Patents

Lens for field emission type electron gun

Info

Publication number
JPS6476654A
JPS6476654A JP23145887A JP23145887A JPS6476654A JP S6476654 A JPS6476654 A JP S6476654A JP 23145887 A JP23145887 A JP 23145887A JP 23145887 A JP23145887 A JP 23145887A JP S6476654 A JPS6476654 A JP S6476654A
Authority
JP
Japan
Prior art keywords
coil
lens
permanent magnet
current flowing
field emission
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23145887A
Other languages
English (en)
Other versions
JPH0654643B2 (ja
Inventor
Takeshi Tomita
Kimiharu Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP62231458A priority Critical patent/JPH0654643B2/ja
Publication of JPS6476654A publication Critical patent/JPS6476654A/ja
Publication of JPH0654643B2 publication Critical patent/JPH0654643B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
JP62231458A 1987-09-14 1987-09-14 電界放射型電子銃用レンズ Expired - Fee Related JPH0654643B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62231458A JPH0654643B2 (ja) 1987-09-14 1987-09-14 電界放射型電子銃用レンズ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62231458A JPH0654643B2 (ja) 1987-09-14 1987-09-14 電界放射型電子銃用レンズ

Publications (2)

Publication Number Publication Date
JPS6476654A true JPS6476654A (en) 1989-03-22
JPH0654643B2 JPH0654643B2 (ja) 1994-07-20

Family

ID=16923825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62231458A Expired - Fee Related JPH0654643B2 (ja) 1987-09-14 1987-09-14 電界放射型電子銃用レンズ

Country Status (1)

Country Link
JP (1) JPH0654643B2 (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008120341A1 (ja) * 2007-03-29 2008-10-09 Advantest Corporation 電子銃及び電子ビーム露光装置
JP2009508303A (ja) * 2005-09-10 2009-02-26 アプライド マテリアルズ インコーポレイテッド 電子銃に用いる電子ビーム源
JPWO2008120412A1 (ja) * 2007-03-29 2010-07-15 株式会社アドバンテスト 電子銃及び電子ビーム露光装置
WO2011145645A1 (ja) * 2010-05-21 2011-11-24 株式会社日立ハイテクノロジーズ 電子顕微鏡
DE112010002063T5 (de) 2009-05-22 2012-07-19 Hitachi High-Technologies Corp. Elektronenkanone
US8390201B2 (en) 2008-06-24 2013-03-05 Advantest Corp. Multi-column electron beam exposure apparatus and magnetic field generation device
WO2020099095A1 (en) * 2018-11-16 2020-05-22 Asml Netherlands B.V. Electromagnetic compound lens and charged particle optical system with such a lens

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4913105A (ja) * 1972-06-01 1974-02-05
JPS5017760A (ja) * 1973-06-18 1975-02-25

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4913105A (ja) * 1972-06-01 1974-02-05
JPS5017760A (ja) * 1973-06-18 1975-02-25

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009508303A (ja) * 2005-09-10 2009-02-26 アプライド マテリアルズ インコーポレイテッド 電子銃に用いる電子ビーム源
US8330344B2 (en) 2007-03-29 2012-12-11 Advantest Corp. Electron gun minimizing sublimation of electron source and electron beam exposure apparatus using the same
JPWO2008120412A1 (ja) * 2007-03-29 2010-07-15 株式会社アドバンテスト 電子銃及び電子ビーム露光装置
WO2008120412A1 (ja) * 2007-03-29 2008-10-09 Advantest Corporation 電子銃及び電子ビーム露光装置
WO2008120341A1 (ja) * 2007-03-29 2008-10-09 Advantest Corporation 電子銃及び電子ビーム露光装置
US8390201B2 (en) 2008-06-24 2013-03-05 Advantest Corp. Multi-column electron beam exposure apparatus and magnetic field generation device
JP5363480B2 (ja) * 2008-06-24 2013-12-11 株式会社アドバンテスト マルチコラム電子ビーム露光装置及び磁場発生装置
DE112010002063T5 (de) 2009-05-22 2012-07-19 Hitachi High-Technologies Corp. Elektronenkanone
US8669535B2 (en) 2009-05-22 2014-03-11 Hitachi High-Technologies Corporation Electron gun
DE112010002063B4 (de) 2009-05-22 2018-10-04 Hitachi High-Technologies Corporation Feldemissions-Elektronenkanone und Elektronenstrahlvorrichtung mit einer solchen Feldemissions-Elektronenkanone
WO2011145645A1 (ja) * 2010-05-21 2011-11-24 株式会社日立ハイテクノロジーズ 電子顕微鏡
WO2020099095A1 (en) * 2018-11-16 2020-05-22 Asml Netherlands B.V. Electromagnetic compound lens and charged particle optical system with such a lens
CN113056806A (zh) * 2018-11-16 2021-06-29 Asml荷兰有限公司 电磁复合透镜和具有这样的透镜的带电粒子光学系统
TWI749396B (zh) * 2018-11-16 2021-12-11 荷蘭商Ａｓｍｌ荷蘭公司 電磁複合透鏡、帶電粒子光學系統、及用以組態具有光軸之電磁複合透鏡之方法
US11676793B2 (en) 2018-11-16 2023-06-13 Asml Netherlands B.V. Apparatus of plural charged particle beams

Also Published As

Publication number Publication date
JPH0654643B2 (ja) 1994-07-20

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees