JPS647652B2 - - Google Patents

Info

Publication number
JPS647652B2
JPS647652B2 JP55154962A JP15496280A JPS647652B2 JP S647652 B2 JPS647652 B2 JP S647652B2 JP 55154962 A JP55154962 A JP 55154962A JP 15496280 A JP15496280 A JP 15496280A JP S647652 B2 JPS647652 B2 JP S647652B2
Authority
JP
Japan
Prior art keywords
electron beam
irradiation
resist
pattern
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55154962A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5778533A (en
Inventor
Masami Kakuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP55154962A priority Critical patent/JPS5778533A/ja
Publication of JPS5778533A publication Critical patent/JPS5778533A/ja
Publication of JPS647652B2 publication Critical patent/JPS647652B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP55154962A 1980-11-04 1980-11-04 Dry type development method Granted JPS5778533A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55154962A JPS5778533A (en) 1980-11-04 1980-11-04 Dry type development method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55154962A JPS5778533A (en) 1980-11-04 1980-11-04 Dry type development method

Publications (2)

Publication Number Publication Date
JPS5778533A JPS5778533A (en) 1982-05-17
JPS647652B2 true JPS647652B2 (show.php) 1989-02-09

Family

ID=15595704

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55154962A Granted JPS5778533A (en) 1980-11-04 1980-11-04 Dry type development method

Country Status (1)

Country Link
JP (1) JPS5778533A (show.php)

Also Published As

Publication number Publication date
JPS5778533A (en) 1982-05-17

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