JPS6475671A - Sputtering device - Google Patents
Sputtering deviceInfo
- Publication number
- JPS6475671A JPS6475671A JP23260987A JP23260987A JPS6475671A JP S6475671 A JPS6475671 A JP S6475671A JP 23260987 A JP23260987 A JP 23260987A JP 23260987 A JP23260987 A JP 23260987A JP S6475671 A JPS6475671 A JP S6475671A
- Authority
- JP
- Japan
- Prior art keywords
- target
- magnetic field
- vicinity
- electron beam
- impressing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To uniformly sputter the whole surface of a target, by impressing a vertical magnetic field on the target surface and also feeding an electron beam from a direction perpendicular to the above magnetic field. CONSTITUTION:At the time of carrying out sputtering by impressing a magnetic field 4 on the surface of a target 2 and ionizing a sputtering gas in the vicinity of the target surface, magnets 5, 3 are provided to a substrate 1 and the target 2, respectively, by which a magnetic field 4 is impressed on the surface of the target 2 in a vertical direction. Subsequently, an electron beam 7 is supplied by means of an electron-beam source 6 from a direction perpendicular to the above magnetic field 4. By this method, a rotary motion is provided to the electron beam 7 by means of Lorentz's force in the vicinity of the surface of the target 2 and the ionization of a sputtering gas in the vicinity of the target 2 surface is accelerated, by which the whole surface of the target 2 can be uniformly sputtered.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23260987A JPS6475671A (en) | 1987-09-18 | 1987-09-18 | Sputtering device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23260987A JPS6475671A (en) | 1987-09-18 | 1987-09-18 | Sputtering device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6475671A true JPS6475671A (en) | 1989-03-22 |
Family
ID=16942030
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23260987A Pending JPS6475671A (en) | 1987-09-18 | 1987-09-18 | Sputtering device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6475671A (en) |
-
1987
- 1987-09-18 JP JP23260987A patent/JPS6475671A/en active Pending
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