JPS6475529A - Dimethyl(substituted phenyl)silylmethylpolysilane and production thereof - Google Patents
Dimethyl(substituted phenyl)silylmethylpolysilane and production thereofInfo
- Publication number
- JPS6475529A JPS6475529A JP23328687A JP23328687A JPS6475529A JP S6475529 A JPS6475529 A JP S6475529A JP 23328687 A JP23328687 A JP 23328687A JP 23328687 A JP23328687 A JP 23328687A JP S6475529 A JPS6475529 A JP S6475529A
- Authority
- JP
- Japan
- Prior art keywords
- amino
- substituted
- phenyldisilane
- dichloro
- trimethyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 title 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 title 1
- -1 dichloro-trimethyl-substituted phenyldisilane Chemical class 0.000 abstract 3
- 239000003513 alkali Substances 0.000 abstract 2
- 125000003545 alkoxy group Chemical group 0.000 abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 238000006482 condensation reaction Methods 0.000 abstract 2
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- 150000002367 halogens Chemical class 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 238000009835 boiling Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 239000012776 electronic material Substances 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- RQJRLVCBMAKXFG-UHFFFAOYSA-N phenyl(silyl)silane Chemical class [SiH3][SiH2]C1=CC=CC=C1 RQJRLVCBMAKXFG-UHFFFAOYSA-N 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
- 125000006239 protecting group Chemical group 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
Landscapes
- Silicon Polymers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23328687A JPS6475529A (en) | 1987-09-17 | 1987-09-17 | Dimethyl(substituted phenyl)silylmethylpolysilane and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23328687A JPS6475529A (en) | 1987-09-17 | 1987-09-17 | Dimethyl(substituted phenyl)silylmethylpolysilane and production thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6475529A true JPS6475529A (en) | 1989-03-22 |
| JPH0424365B2 JPH0424365B2 (enrdf_load_stackoverflow) | 1992-04-24 |
Family
ID=16952720
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23328687A Granted JPS6475529A (en) | 1987-09-17 | 1987-09-17 | Dimethyl(substituted phenyl)silylmethylpolysilane and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6475529A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003162058A (ja) * | 2001-11-28 | 2003-06-06 | Seiko Epson Corp | 膜パターンの形成方法、膜パターン、半導体装置の製造方法、半導体装置、電気光学装置の製造方法、及び電気光学装置 |
-
1987
- 1987-09-17 JP JP23328687A patent/JPS6475529A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003162058A (ja) * | 2001-11-28 | 2003-06-06 | Seiko Epson Corp | 膜パターンの形成方法、膜パターン、半導体装置の製造方法、半導体装置、電気光学装置の製造方法、及び電気光学装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0424365B2 (enrdf_load_stackoverflow) | 1992-04-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |