JPS6475529A - Dimethyl(substituted phenyl)silylmethylpolysilane and production thereof - Google Patents
Dimethyl(substituted phenyl)silylmethylpolysilane and production thereofInfo
- Publication number
- JPS6475529A JPS6475529A JP23328687A JP23328687A JPS6475529A JP S6475529 A JPS6475529 A JP S6475529A JP 23328687 A JP23328687 A JP 23328687A JP 23328687 A JP23328687 A JP 23328687A JP S6475529 A JPS6475529 A JP S6475529A
- Authority
- JP
- Japan
- Prior art keywords
- amino
- substituted
- phenyldisilane
- dichloro
- trimethyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Silicon Polymers (AREA)
Abstract
PURPOSE:To obtain the titled polymer useful for e.g. electronic materials such as photoresist materials, organic semiconductors, and optical information recording materials, by condensation reaction, in the presence of an alkali (alkaline earth) metal, of a dichloro-trimethyl-substituted phenyldisilane. CONSTITUTION:The objective polymer constituted of recurring unit of formula II (R is OH, amino, vinyl, lower alkyl, lower alkoxy or halogen) can be obtained by condensation reaction, in the presence of an alkali (alkaline earth) metal, generally at temperatures ranging from 0 deg.C to the boiling point of the solvent to used for the reaction for 1-50hr, of a 1,1-dichloro-1,2,2-trimethyl-2-substituted phenyldisilane of formula I (R' is OH, amino, vinyl, lower alkyl, lower alkoxy, halogen, OH carrying protective group, or amino).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23328687A JPS6475529A (en) | 1987-09-17 | 1987-09-17 | Dimethyl(substituted phenyl)silylmethylpolysilane and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23328687A JPS6475529A (en) | 1987-09-17 | 1987-09-17 | Dimethyl(substituted phenyl)silylmethylpolysilane and production thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6475529A true JPS6475529A (en) | 1989-03-22 |
JPH0424365B2 JPH0424365B2 (en) | 1992-04-24 |
Family
ID=16952720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23328687A Granted JPS6475529A (en) | 1987-09-17 | 1987-09-17 | Dimethyl(substituted phenyl)silylmethylpolysilane and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6475529A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003162058A (en) * | 2001-11-28 | 2003-06-06 | Seiko Epson Corp | Film pattern forming method, film pattern, method for manufacturing semiconductor device, semiconductor device, method for manufacturing electrooptic device, and electrooptic device |
-
1987
- 1987-09-17 JP JP23328687A patent/JPS6475529A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003162058A (en) * | 2001-11-28 | 2003-06-06 | Seiko Epson Corp | Film pattern forming method, film pattern, method for manufacturing semiconductor device, semiconductor device, method for manufacturing electrooptic device, and electrooptic device |
Also Published As
Publication number | Publication date |
---|---|
JPH0424365B2 (en) | 1992-04-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |