JPS6465838A - Manufacture of mask for x-ray exposure stepper - Google Patents

Abstract

PURPOSE:To prevent the generation of deformation and so on by a method wherein desired metallic patterns and annular metallic patterns are respectively formed on the central region of an X-ray transmitting film and the peripheral part of the X-ray transmitting film by a resist method and a plating is applied to the peripheral part using a resist film formed on the central region as a mask. CONSTITUTION:An Si wafer with such an X-ray transmitting film as a boron nitride film formed thereon is adhered on a ring 11 and thereafter, the Si wafer is etched to leave an annular wafer 12 and the X-ray transmitting film (boron nitride film) 13. A plated base film 3, a polyimide film 31, an Si dioxide film 32 and a resist film 33 are formed in order thereon. A resist pattern is formed by an electron beam lithography and so on to pattern the films 32 and 31 and a gold plating is applied on the film 13 to form desired metallic patterns 41 on the central part of the film 3 and to form annular metallic patterns 42 on the peripheral part of the film 3. The residual films 31-33 and the film 3 at apertures are removed. A resist film 5 to cover the central part other than the peripheral part is formed, a metallic film is plated on the peripheral part using this resist film 5 as a mask and the film 5 is removed.