JPS646349A - Laser plasma x-ray generator and x-ray ejection port opening/closing mechanism - Google Patents
Laser plasma x-ray generator and x-ray ejection port opening/closing mechanismInfo
- Publication number
- JPS646349A JPS646349A JP62226699A JP22669987A JPS646349A JP S646349 A JPS646349 A JP S646349A JP 62226699 A JP62226699 A JP 62226699A JP 22669987 A JP22669987 A JP 22669987A JP S646349 A JPS646349 A JP S646349A
- Authority
- JP
- Japan
- Prior art keywords
- target material
- laser light
- ray
- chamber
- transfer device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lasers (AREA)
Abstract
PURPOSE:To allow the continuous use of an X-ray generator for a long time by arranging a target material transfer device in a chamber, feeding a target material to the transfer device from the outside of the chamber, and continuously feeding the new target material to a laser light collecting point. CONSTITUTION:A target material 15 made of a liquid or solid inert element is fed to a target material transfer device 14 in a chamber 10 by a target material feeding device 20, and the target material is continuously fed to the light collecting point 18 of the pulse laser light 13a by the transfer device 14. The pulse laser light emitted from a laser light source 13 is sent to the light collecting point via a light collecting mechanism, the target material 15 heated by the pulse laser light is converted into plasma, and X-rays are emitted from the target material 15. The emitted X-rays are ejected to the outside of the chamber 10 through the opening when an X-ray ejection port opening/closing mechanism 21 is opened. The stable and continuous radiation of X-rays is thereby allowed without replacing a target rotor with a high frequency.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62226699A JP2614457B2 (en) | 1986-09-11 | 1987-09-11 | Laser plasma X-ray generator and X-ray exit opening / closing mechanism |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61-214734 | 1986-09-11 | ||
JP21473486 | 1986-09-11 | ||
JP62226699A JP2614457B2 (en) | 1986-09-11 | 1987-09-11 | Laser plasma X-ray generator and X-ray exit opening / closing mechanism |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS646349A true JPS646349A (en) | 1989-01-10 |
JP2614457B2 JP2614457B2 (en) | 1997-05-28 |
Family
ID=26520474
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62226699A Expired - Fee Related JP2614457B2 (en) | 1986-09-11 | 1987-09-11 | Laser plasma X-ray generator and X-ray exit opening / closing mechanism |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2614457B2 (en) |
Cited By (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05258692A (en) * | 1992-03-10 | 1993-10-08 | Nikon Corp | X-ray generating method and x-ray generating device |
JPH05290993A (en) * | 1992-04-13 | 1993-11-05 | Nikon Corp | Laser plasma x-ray source |
JPH06223996A (en) * | 1991-03-25 | 1994-08-12 | Agency Of Ind Science & Technol | X-ray generation source |
JPH06283407A (en) * | 1993-03-26 | 1994-10-07 | Nikon Corp | X-ray source for laser plasma |
JPH07253499A (en) * | 1994-03-15 | 1995-10-03 | Nikon Corp | X-ray generator |
JPH0837095A (en) * | 1994-07-26 | 1996-02-06 | Nikon Corp | X-ray generating device |
JPH09320792A (en) * | 1996-05-27 | 1997-12-12 | Nikon Corp | X-ray generator |
JPH10221499A (en) * | 1997-02-07 | 1998-08-21 | Hitachi Ltd | Laser plasma x-ray source and device and method for exposing semiconductor using the same |
WO2000019496A1 (en) * | 1998-09-28 | 2000-04-06 | Hitachi, Ltd. | Laser plasma x-ray generator, semiconductor aligner having the generator, and semiconductor exposure method |
JP2000509190A (en) * | 1996-04-25 | 2000-07-18 | ジェテック、アクチボラグ | Method and apparatus for generating X-ray or extreme ultraviolet radiation |
JP2001068297A (en) * | 1999-08-30 | 2001-03-16 | Masaki Yamamoto | Debris removing mechanism for soft x-ray using device |
JP2001357997A (en) * | 2000-06-13 | 2001-12-26 | Teikoku Electric Mfg Co Ltd | Laser plasma x-ray generating device |
JP2003318107A (en) * | 2002-03-28 | 2003-11-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US6888921B2 (en) | 2002-07-04 | 2005-05-03 | Teikoku Electric Mfg. Co., Ltd. | Laser plasma X-ray generating apparatus |
JP2005197081A (en) * | 2004-01-07 | 2005-07-21 | Komatsu Ltd | Light source device and exposure device using it |
JP2006221946A (en) * | 2005-02-10 | 2006-08-24 | Horon:Kk | Electron microscope |
JP2007502000A (en) * | 2003-08-12 | 2007-02-01 | イェーノプティーク ミクロテヒニーク ゲゼルシャフト ミット ベシュレンクテル ハフツング | Plasma radiation source and apparatus for forming a gas curtain for a plasma radiation source |
JP2007505460A (en) * | 2003-09-11 | 2007-03-08 | コニンクリユケ フィリップス エレクトロニクス エヌ.ブイ. | Method and apparatus for generating extreme ultraviolet radiation or soft x-ray radiation |
JP2008294393A (en) * | 2007-04-27 | 2008-12-04 | Komatsu Ltd | Target supply device in euv light generator |
JP2010106958A (en) * | 2008-10-30 | 2010-05-13 | Nippon Pillar Packing Co Ltd | Gasket |
JP2011515810A (en) * | 2008-03-21 | 2011-05-19 | エーエスエムエル ネザーランズ ビー.ブイ. | Target material, radiation source, EUV lithography apparatus and device manufacturing method using them |
JP2016531316A (en) * | 2013-07-22 | 2016-10-06 | ケーエルエー−テンカー コーポレイション | System and method for generation of extreme ultraviolet light |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55173900U (en) * | 1979-05-31 | 1980-12-13 | ||
JPS60133644A (en) * | 1983-12-21 | 1985-07-16 | Hitachi Ltd | Plasma x-ray generator |
JPS61153935A (en) * | 1984-12-26 | 1986-07-12 | Toshiba Corp | Plasma x-ray generator |
-
1987
- 1987-09-11 JP JP62226699A patent/JP2614457B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55173900U (en) * | 1979-05-31 | 1980-12-13 | ||
JPS60133644A (en) * | 1983-12-21 | 1985-07-16 | Hitachi Ltd | Plasma x-ray generator |
JPS61153935A (en) * | 1984-12-26 | 1986-07-12 | Toshiba Corp | Plasma x-ray generator |
Cited By (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06223996A (en) * | 1991-03-25 | 1994-08-12 | Agency Of Ind Science & Technol | X-ray generation source |
JPH05258692A (en) * | 1992-03-10 | 1993-10-08 | Nikon Corp | X-ray generating method and x-ray generating device |
JPH05290993A (en) * | 1992-04-13 | 1993-11-05 | Nikon Corp | Laser plasma x-ray source |
JPH06283407A (en) * | 1993-03-26 | 1994-10-07 | Nikon Corp | X-ray source for laser plasma |
JPH07253499A (en) * | 1994-03-15 | 1995-10-03 | Nikon Corp | X-ray generator |
JPH0837095A (en) * | 1994-07-26 | 1996-02-06 | Nikon Corp | X-ray generating device |
JP2000509190A (en) * | 1996-04-25 | 2000-07-18 | ジェテック、アクチボラグ | Method and apparatus for generating X-ray or extreme ultraviolet radiation |
JPH09320792A (en) * | 1996-05-27 | 1997-12-12 | Nikon Corp | X-ray generator |
JPH10221499A (en) * | 1997-02-07 | 1998-08-21 | Hitachi Ltd | Laser plasma x-ray source and device and method for exposing semiconductor using the same |
WO2000019496A1 (en) * | 1998-09-28 | 2000-04-06 | Hitachi, Ltd. | Laser plasma x-ray generator, semiconductor aligner having the generator, and semiconductor exposure method |
JP2001068297A (en) * | 1999-08-30 | 2001-03-16 | Masaki Yamamoto | Debris removing mechanism for soft x-ray using device |
JP2001357997A (en) * | 2000-06-13 | 2001-12-26 | Teikoku Electric Mfg Co Ltd | Laser plasma x-ray generating device |
JP2003318107A (en) * | 2002-03-28 | 2003-11-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US6888921B2 (en) | 2002-07-04 | 2005-05-03 | Teikoku Electric Mfg. Co., Ltd. | Laser plasma X-ray generating apparatus |
JP2007502000A (en) * | 2003-08-12 | 2007-02-01 | イェーノプティーク ミクロテヒニーク ゲゼルシャフト ミット ベシュレンクテル ハフツング | Plasma radiation source and apparatus for forming a gas curtain for a plasma radiation source |
JP4766695B2 (en) * | 2003-08-12 | 2011-09-07 | イクストリーメ テクノロジース ゲゼルシャフト ミット ベシュレンクテル ハフツング | Plasma radiation source, apparatus for generating gas curtain and gas jet vacuum pump |
JP2007505460A (en) * | 2003-09-11 | 2007-03-08 | コニンクリユケ フィリップス エレクトロニクス エヌ.ブイ. | Method and apparatus for generating extreme ultraviolet radiation or soft x-ray radiation |
JP2005197081A (en) * | 2004-01-07 | 2005-07-21 | Komatsu Ltd | Light source device and exposure device using it |
JP2006221946A (en) * | 2005-02-10 | 2006-08-24 | Horon:Kk | Electron microscope |
JP2008294393A (en) * | 2007-04-27 | 2008-12-04 | Komatsu Ltd | Target supply device in euv light generator |
JP2011515810A (en) * | 2008-03-21 | 2011-05-19 | エーエスエムエル ネザーランズ ビー.ブイ. | Target material, radiation source, EUV lithography apparatus and device manufacturing method using them |
JP2010106958A (en) * | 2008-10-30 | 2010-05-13 | Nippon Pillar Packing Co Ltd | Gasket |
JP2016531316A (en) * | 2013-07-22 | 2016-10-06 | ケーエルエー−テンカー コーポレイション | System and method for generation of extreme ultraviolet light |
JP2020077007A (en) * | 2013-07-22 | 2020-05-21 | ケーエルエー コーポレイション | Device for generating extreme ultraviolet light |
Also Published As
Publication number | Publication date |
---|---|
JP2614457B2 (en) | 1997-05-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |