JPS5421974A - Spattering device - Google Patents

Spattering device

Info

Publication number
JPS5421974A
JPS5421974A JP8557277A JP8557277A JPS5421974A JP S5421974 A JPS5421974 A JP S5421974A JP 8557277 A JP8557277 A JP 8557277A JP 8557277 A JP8557277 A JP 8557277A JP S5421974 A JPS5421974 A JP S5421974A
Authority
JP
Japan
Prior art keywords
target
base plate
spattering device
confronting
carrying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8557277A
Other languages
Japanese (ja)
Inventor
Koichi Makino
Masaki Shinohara
Wakatake Matsuda
Seiji Hattori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Fujitsu Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Nippon Telegraph and Telephone Corp filed Critical Fujitsu Ltd
Priority to JP8557277A priority Critical patent/JPS5421974A/en
Publication of JPS5421974A publication Critical patent/JPS5421974A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Abstract

PURPOSE:To provide a spattering device of little temperature increase of a base plate and a high film-forming speed, comprising a shield chamber accommodating therein a target, a discharge electrode confronting at least a part of the target, and opening window confronting a base plate, and a mechanism for carrying out operational exhaust.
JP8557277A 1977-07-19 1977-07-19 Spattering device Pending JPS5421974A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8557277A JPS5421974A (en) 1977-07-19 1977-07-19 Spattering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8557277A JPS5421974A (en) 1977-07-19 1977-07-19 Spattering device

Publications (1)

Publication Number Publication Date
JPS5421974A true JPS5421974A (en) 1979-02-19

Family

ID=13862517

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8557277A Pending JPS5421974A (en) 1977-07-19 1977-07-19 Spattering device

Country Status (1)

Country Link
JP (1) JPS5421974A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59195323A (en) * 1983-04-20 1984-11-06 Victor Co Of Japan Ltd Manufacture of vertical magnetic recording medium
JPS59215025A (en) * 1983-05-21 1984-12-04 Ulvac Corp Manufacture of vertical magnetic recording body
FR2551460A1 (en) * 1983-09-02 1985-03-08 Leybold Heraeus Gmbh & Co Kg METHOD AND DEVICE FOR REACTIVE SPRAY DEPOSITION OF METAL COMPOUNDS AND SEMICONDUCTORS
JPS63161162A (en) * 1986-12-23 1988-07-04 Toshiba Corp Sputtering device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59195323A (en) * 1983-04-20 1984-11-06 Victor Co Of Japan Ltd Manufacture of vertical magnetic recording medium
JPS59215025A (en) * 1983-05-21 1984-12-04 Ulvac Corp Manufacture of vertical magnetic recording body
JPH0352136B2 (en) * 1983-05-21 1991-08-09 Ulvac Corp
FR2551460A1 (en) * 1983-09-02 1985-03-08 Leybold Heraeus Gmbh & Co Kg METHOD AND DEVICE FOR REACTIVE SPRAY DEPOSITION OF METAL COMPOUNDS AND SEMICONDUCTORS
JPS63161162A (en) * 1986-12-23 1988-07-04 Toshiba Corp Sputtering device

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