JPS6461645A - Dangerous harmful gas detecting method - Google Patents
Dangerous harmful gas detecting methodInfo
- Publication number
- JPS6461645A JPS6461645A JP62218830A JP21883087A JPS6461645A JP S6461645 A JPS6461645 A JP S6461645A JP 62218830 A JP62218830 A JP 62218830A JP 21883087 A JP21883087 A JP 21883087A JP S6461645 A JPS6461645 A JP S6461645A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- piping
- harmful gas
- container
- concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Sampling And Sample Adjustment (AREA)
Abstract
PURPOSE:To secure safety at the time of releasing a harmful gas by filling a vacuum container with vent gas temporarily above the atmospheric pressure, feeding the gas in this pressure state to piping connecting with a discharge duct, and measuring the concentration of the remaining dangerous harmful gas in this piping. CONSTITUTION:The dangerous harmful gas is admitted into the vacuum container 1 from a reactive gas intake pipe 4 through a cut valve 5 and a process such as deposition and etching is carried out. When the vacuum container 1 is ventilated after necessary processing, the container 1 is evacuated by a pump 2 to a high vacuum degree to reduce the concentration of the dangerous harmful gas in the container 1. Then a cut valve in piping 6 for vent gas is opened to admit the vent gas such as Ar to raise the pressure in the container above the atmospheric pressure. Then when a cut valve 9 provided to piping 8 connecting with the air discharge duct is opened, the pressurized gas in the vacuum container 1 enters the piping 8 by itself and enters a gas concentration detector 10 installed there, so that the concentration of the dangerous harmful gas is measured.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62218830A JPS6461645A (en) | 1987-09-01 | 1987-09-01 | Dangerous harmful gas detecting method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62218830A JPS6461645A (en) | 1987-09-01 | 1987-09-01 | Dangerous harmful gas detecting method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6461645A true JPS6461645A (en) | 1989-03-08 |
Family
ID=16726011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62218830A Pending JPS6461645A (en) | 1987-09-01 | 1987-09-01 | Dangerous harmful gas detecting method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6461645A (en) |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS513389U (en) * | 1974-06-24 | 1976-01-12 | ||
JPS5367684A (en) * | 1976-11-26 | 1978-06-16 | Bosch Gmbh Robert | Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering |
JPS57198047U (en) * | 1981-06-12 | 1982-12-16 | ||
JPS586245B2 (en) * | 1973-10-25 | 1983-02-03 | 株式会社クラレ | Hidouden Seibutsutaini Doudenseio Fuyosuruhouhou |
JPS59138936A (en) * | 1983-01-31 | 1984-08-09 | Nippon Steel Corp | Method and apparatus for breaking sample for metal grain boundary analysis |
JPS59172237A (en) * | 1983-03-18 | 1984-09-28 | Fujitsu Ltd | Plasma processor |
JPS60145362U (en) * | 1984-03-07 | 1985-09-26 | 株式会社日立製作所 | Trace oxygen analyzer |
JPS60158134U (en) * | 1984-03-30 | 1985-10-21 | 株式会社フジクラ | Concentration measuring device in gas transport path |
JPS6171823A (en) * | 1984-06-14 | 1986-04-12 | ケルンフオルシユングスツエントルム・カ−ルスル−エ・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Method for measuring and monitoring harmful substance content of waste gas stream loaded by solid substance for long period |
JPS62116233A (en) * | 1985-11-15 | 1987-05-27 | Hitachi Koki Co Ltd | Ion beam irradiation apparatus |
JPS6447872A (en) * | 1987-08-19 | 1989-02-22 | Matsushita Electronics Corp | Thin film forming device |
-
1987
- 1987-09-01 JP JP62218830A patent/JPS6461645A/en active Pending
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS586245B2 (en) * | 1973-10-25 | 1983-02-03 | 株式会社クラレ | Hidouden Seibutsutaini Doudenseio Fuyosuruhouhou |
JPS513389U (en) * | 1974-06-24 | 1976-01-12 | ||
JPS5367684A (en) * | 1976-11-26 | 1978-06-16 | Bosch Gmbh Robert | Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering |
JPS57198047U (en) * | 1981-06-12 | 1982-12-16 | ||
JPS59138936A (en) * | 1983-01-31 | 1984-08-09 | Nippon Steel Corp | Method and apparatus for breaking sample for metal grain boundary analysis |
JPS59172237A (en) * | 1983-03-18 | 1984-09-28 | Fujitsu Ltd | Plasma processor |
JPS60145362U (en) * | 1984-03-07 | 1985-09-26 | 株式会社日立製作所 | Trace oxygen analyzer |
JPS60158134U (en) * | 1984-03-30 | 1985-10-21 | 株式会社フジクラ | Concentration measuring device in gas transport path |
JPS6171823A (en) * | 1984-06-14 | 1986-04-12 | ケルンフオルシユングスツエントルム・カ−ルスル−エ・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Method for measuring and monitoring harmful substance content of waste gas stream loaded by solid substance for long period |
JPS62116233A (en) * | 1985-11-15 | 1987-05-27 | Hitachi Koki Co Ltd | Ion beam irradiation apparatus |
JPS6447872A (en) * | 1987-08-19 | 1989-02-22 | Matsushita Electronics Corp | Thin film forming device |
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