JPS6461645A - Dangerous harmful gas detecting method - Google Patents

Dangerous harmful gas detecting method

Info

Publication number
JPS6461645A
JPS6461645A JP62218830A JP21883087A JPS6461645A JP S6461645 A JPS6461645 A JP S6461645A JP 62218830 A JP62218830 A JP 62218830A JP 21883087 A JP21883087 A JP 21883087A JP S6461645 A JPS6461645 A JP S6461645A
Authority
JP
Japan
Prior art keywords
gas
piping
harmful gas
container
concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62218830A
Other languages
Japanese (ja)
Inventor
Naoto Sasaki
Takashi Akimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP62218830A priority Critical patent/JPS6461645A/en
Publication of JPS6461645A publication Critical patent/JPS6461645A/en
Pending legal-status Critical Current

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  • Sampling And Sample Adjustment (AREA)

Abstract

PURPOSE:To secure safety at the time of releasing a harmful gas by filling a vacuum container with vent gas temporarily above the atmospheric pressure, feeding the gas in this pressure state to piping connecting with a discharge duct, and measuring the concentration of the remaining dangerous harmful gas in this piping. CONSTITUTION:The dangerous harmful gas is admitted into the vacuum container 1 from a reactive gas intake pipe 4 through a cut valve 5 and a process such as deposition and etching is carried out. When the vacuum container 1 is ventilated after necessary processing, the container 1 is evacuated by a pump 2 to a high vacuum degree to reduce the concentration of the dangerous harmful gas in the container 1. Then a cut valve in piping 6 for vent gas is opened to admit the vent gas such as Ar to raise the pressure in the container above the atmospheric pressure. Then when a cut valve 9 provided to piping 8 connecting with the air discharge duct is opened, the pressurized gas in the vacuum container 1 enters the piping 8 by itself and enters a gas concentration detector 10 installed there, so that the concentration of the dangerous harmful gas is measured.
JP62218830A 1987-09-01 1987-09-01 Dangerous harmful gas detecting method Pending JPS6461645A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62218830A JPS6461645A (en) 1987-09-01 1987-09-01 Dangerous harmful gas detecting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62218830A JPS6461645A (en) 1987-09-01 1987-09-01 Dangerous harmful gas detecting method

Publications (1)

Publication Number Publication Date
JPS6461645A true JPS6461645A (en) 1989-03-08

Family

ID=16726011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62218830A Pending JPS6461645A (en) 1987-09-01 1987-09-01 Dangerous harmful gas detecting method

Country Status (1)

Country Link
JP (1) JPS6461645A (en)

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS513389U (en) * 1974-06-24 1976-01-12
JPS5367684A (en) * 1976-11-26 1978-06-16 Bosch Gmbh Robert Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering
JPS57198047U (en) * 1981-06-12 1982-12-16
JPS586245B2 (en) * 1973-10-25 1983-02-03 株式会社クラレ Hidouden Seibutsutaini Doudenseio Fuyosuruhouhou
JPS59138936A (en) * 1983-01-31 1984-08-09 Nippon Steel Corp Method and apparatus for breaking sample for metal grain boundary analysis
JPS59172237A (en) * 1983-03-18 1984-09-28 Fujitsu Ltd Plasma processor
JPS60145362U (en) * 1984-03-07 1985-09-26 株式会社日立製作所 Trace oxygen analyzer
JPS60158134U (en) * 1984-03-30 1985-10-21 株式会社フジクラ Concentration measuring device in gas transport path
JPS6171823A (en) * 1984-06-14 1986-04-12 ケルンフオルシユングスツエントルム・カ−ルスル−エ・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング Method for measuring and monitoring harmful substance content of waste gas stream loaded by solid substance for long period
JPS62116233A (en) * 1985-11-15 1987-05-27 Hitachi Koki Co Ltd Ion beam irradiation apparatus
JPS6447872A (en) * 1987-08-19 1989-02-22 Matsushita Electronics Corp Thin film forming device

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS586245B2 (en) * 1973-10-25 1983-02-03 株式会社クラレ Hidouden Seibutsutaini Doudenseio Fuyosuruhouhou
JPS513389U (en) * 1974-06-24 1976-01-12
JPS5367684A (en) * 1976-11-26 1978-06-16 Bosch Gmbh Robert Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering
JPS57198047U (en) * 1981-06-12 1982-12-16
JPS59138936A (en) * 1983-01-31 1984-08-09 Nippon Steel Corp Method and apparatus for breaking sample for metal grain boundary analysis
JPS59172237A (en) * 1983-03-18 1984-09-28 Fujitsu Ltd Plasma processor
JPS60145362U (en) * 1984-03-07 1985-09-26 株式会社日立製作所 Trace oxygen analyzer
JPS60158134U (en) * 1984-03-30 1985-10-21 株式会社フジクラ Concentration measuring device in gas transport path
JPS6171823A (en) * 1984-06-14 1986-04-12 ケルンフオルシユングスツエントルム・カ−ルスル−エ・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング Method for measuring and monitoring harmful substance content of waste gas stream loaded by solid substance for long period
JPS62116233A (en) * 1985-11-15 1987-05-27 Hitachi Koki Co Ltd Ion beam irradiation apparatus
JPS6447872A (en) * 1987-08-19 1989-02-22 Matsushita Electronics Corp Thin film forming device

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